Patents Assigned to SCREEN Holdings Co., Ltd.
  • Patent number: 10790171
    Abstract: Over a front surface of a silicon semiconductor wafer is deposited a high dielectric constant film with a silicon oxide film, serving as an interface layer, provided between the semiconductor wafer and the high dielectric constant film. After a chamber houses the semiconductor wafer, a chamber's pressure is reduced to be lower than atmospheric pressure. Subsequently, a gaseous mixture of ammonia and nitrogen gas is supplied into the chamber to return the pressure to ordinary pressure, and the front surface is irradiated with a flash light, thereby performing post deposition annealing (PDA) on the high dielectric constant film. Since the pressure is reduced once to be lower than atmospheric pressure and then returned to ordinary pressure, a chamber's oxygen concentration is lowered remarkably during the PDA. This restricts an increase in thickness of the silicon oxide film underlying the high dielectric constant film by oxygen taken in during the PDA.
    Type: Grant
    Filed: June 25, 2019
    Date of Patent: September 29, 2020
    Assignee: SCREEN Holdings Co., Ltd.
    Inventors: Takayuki Aoyama, Hikaru Kawarazaki, Masashi Furukawa, Shinichi Kato, Kazuhiko Fuse, Hideaki Tanimura
  • Patent number: 10790151
    Abstract: Provided is a substrate processing method for processing a substrate. The substrate processing method includes a step of processing the substrate with a phosphoric acid liquid, a step of processing the substrate with a rinsing liquid, and a step of processing the substrate with a chemical liquid containing ammonia. After the substrate is processed with the rinsing liquid, the step of processing the substrate with a chemical liquid removes a portion of thickness of a film in a depth direction of a phosphorus diffusion region from the phosphorus diffusion region formed in the substrate when the substrate is processed with the phosphoric acid liquid.
    Type: Grant
    Filed: December 14, 2018
    Date of Patent: September 29, 2020
    Assignee: SCREEN Holdings Co., Ltd.
    Inventors: Rei Takeaki, Masayuki Hayashi, Takashi Ota
  • Patent number: 10786836
    Abstract: A substrate processing method includes a chemical liquid supplying step of supplying a chemical liquid to a substrate, an elapsed period measuring step of measuring an after-the-end elapsed period, a recovery step of controlling the switching unit to be in a recovery guiding state, when, at a start of the chemical liquid supplying step, the after-the-end elapsed period is less than a predetermined first period, and a draining step of controlling the switching unit to be in a drain guiding state, in which the liquid led to the recovery space is led to the drain line, when, at the start of the chemical liquid supplying step, the after-the-end elapsed period is not less than the predetermined first period and then switching to the recovery guiding state based on establishment of a predetermined draining ending condition.
    Type: Grant
    Filed: July 21, 2017
    Date of Patent: September 29, 2020
    Assignee: SCREEN Holdings Co., Ltd.
    Inventors: Atsuyasu Miura, Kazuhiro Fujita, Hiroki Tsujikawa, Yuya Tsuchihashi, Kenji Takemoto
  • Patent number: 10790134
    Abstract: A substrate processing method includes a substrate holding step of holding a substrate by means of a substrate holder which holds the substrate horizontally with an interval upward from an upper surface of a base, a first processing liquid supplying step of supplying a first processing liquid to an upper surface of the substrate held by the substrate holder, a cleaning liquid supplying step of supplying a cleaning liquid so as to wash away the first processing liquid attached to the upper surface of the base, to the upper surface of the base such that the cleaning liquid on the base does not contact a lower surface of the substrate held by the substrate holder, and a removing step of removing the cleaning liquid from the upper surface of the base.
    Type: Grant
    Filed: September 11, 2017
    Date of Patent: September 29, 2020
    Assignee: SCREEN Holdings Co., Ltd.
    Inventors: Taiki Hinode, Takashi Ota
  • Patent number: 10790166
    Abstract: A substrate processing method includes a replacing step of replacing the processing liquid with a low surface tension liquid, a liquid film forming step of forming a liquid film of the low surface tension liquid on the upper surface of the substrate, by continuing supplying the low surface tension liquid to the upper surface of the substrate after the replacing step, an opening forming step of forming an opening at a central region of the liquid film, an enlarging removing step of removing the liquid film from the upper surface of the substrate by enlarging the opening toward a peripheral edge of the substrate, and a liquid film contact step of bringing a proximity member into contact with the liquid film, by bringing the proximity member close to the peripheral edge of the substrate after starting the opening forming step.
    Type: Grant
    Filed: January 11, 2018
    Date of Patent: September 29, 2020
    Assignee: SCREEN Holdings Co., Ltd.
    Inventor: Tetsuya Emoto
  • Patent number: 10789679
    Abstract: A plurality of captured images is first acquired by capturing images of an object while changing a focal position along an optical axis. Then, variations in magnification among the captured images are acquired. On the basis of the variations in magnification, corresponding pixels in the captured images are specified, and definition is compared among the corresponding pixels. Then, an image reference value indicating the number of a captured image that is to be referenced as the luminance value of each coordinates in an omnifocal image is determined on the basis of the result of comparison of the definition. The omnifocal image is thereafter generated by referencing the luminance value in the captured image indicated by the image reference value for each coordinates. In this way, the omnifocal image that reflects the position and size of the object accurately can be generated.
    Type: Grant
    Filed: May 30, 2017
    Date of Patent: September 29, 2020
    Assignee: SCREEN HOLDINGS CO., LTD.
    Inventor: Takuya Yasuda
  • Patent number: 10790169
    Abstract: A discharge port 31 is arranged inside a chamber 9. A circulation flow passage 50 circulates a processing liquid, while maintaining the processing liquid at a predetermined temperature. A discharge flow passage 32 is branched from a circulation flow passage 50 to guide the processing liquid to the discharge port 31. A return flow passage 33 is connected to the discharge flow passage 32 inside the chamber 9 and allows the processing liquid running through the discharge flowpassage 32 to flow back to the circulation flow passage 50.
    Type: Grant
    Filed: January 10, 2018
    Date of Patent: September 29, 2020
    Assignee: SCREEN Holdings Co., Ltd.
    Inventors: Naoyuki Osada, Koji Hashimoto
  • Patent number: 10790165
    Abstract: A drive mechanism deforms two diaphragms to perform alternate increase and decrease in volume of a supply chamber. At this time, the two diaphragms are provided for the single supply chamber. This leads to possibility of suction and feed out of a desired amount of liquid even with limited deformation of the diaphragms. In addition, the two diaphragms achieve suppression in deformation thereof upon suction and feed out of a desired amount of liquid. This allows selection of the diaphragms each with a short stroke, yielding suppressed stagnation and quality degradation of the liquid.
    Type: Grant
    Filed: August 17, 2017
    Date of Patent: September 29, 2020
    Assignee: SCREEN Holdings Co., Ltd.
    Inventor: Masahito Kashiyama
  • Publication number: 20200303207
    Abstract: The substrate processing method includes alternately performing a plurality of times of a metal oxide layer forming process in which an oxidation fluid is supplied to a surface of the substrate and a metal oxide layer composed of a one-atom layer or a several-atom layer is formed on a surface layer of the metal layer; and a metal oxide layer removal process in which an etching solution is supplied to the surface of the substrate and the metal oxide layer is removed from the surface of the substrate. A final dissolved oxygen concentration which is a dissolved oxygen concentration in the etching solution supplied to the surface of the substrate in a final metal oxide layer removal process is lower than an initial dissolved oxygen concentration which is a dissolved oxygen concentration in the etching solution supplied to the substrate in an initial metal oxide layer removal process.
    Type: Application
    Filed: March 6, 2020
    Publication date: September 24, 2020
    Applicant: SCREEN HOLDINGS CO., LTD.
    Inventors: Ayumi HIGUCHI, Yuya AKANISHI
  • Patent number: 10784124
    Abstract: A substrate processing apparatus includes a substrate holding unit that holds a substrate horizontally while rotating the substrate around a vertical rotational axis running through its center portion, an opposed member having an opposed surface that is opposed to an upper surface of the substrate, and a processing liquid discharge unit that includes a center portion discharge port on the opposed surface, that opens being opposed to the upper surface center portion of the substrate, and a peripheral portion discharge port on the opposed surface, that opens being opposed to the upper surface peripheral portion of the substrate, that discharges a processing liquid from the center portion discharge port to supply the processing liquid between the substrate and the opposed surface, and discharges the processing liquid from the peripheral portion discharge port to replenish the processing liquid between the substrate and the opposed surface.
    Type: Grant
    Filed: May 25, 2017
    Date of Patent: September 22, 2020
    Assignee: SCREEN Holdings Co., Ltd.
    Inventor: Masayuki Otsuji
  • Patent number: 10784127
    Abstract: A pyrometer holder is mounted to an outer wall of a chamber while holding a lower radiation thermometer. The front end of the lower radiation thermometer is brought into abutment with a mounting portion of the pyrometer holder, and a bottom plate is brought into abutment with the rear end of the lower radiation thermometer. A tension spring is tensioned between the bottom plate and the mounting portion to prevent the lower radiation thermometer from falling off or misregistration. An angle adjusting mechanism adjusts the angle of the radiation thermometer with respect to the outer wall of the chamber, with the front end of the radiation thermometer serving as a supporting point. Thus, the measurement position of the lower radiation thermometer is adjusted.
    Type: Grant
    Filed: February 26, 2018
    Date of Patent: September 22, 2020
    Assignee: SCREEN HOLDINGS CO., LTD.
    Inventors: Kazuhiko Fuse, Shinji Miyawaki, Takahiro Kitazawa
  • Patent number: 10784125
    Abstract: Disclosed is a substrate treating apparatus including a first liquid treatment chamber that performs a liquid treatment to a substrate, a second liquid treatment chamber that is disposed below the first liquid treatment chamber and performs a liquid treatment to a substrate, a first feed channel that supplies gases to the first liquid treatment chamber, and a second feed channel that supplies gases to the second liquid treatment chamber. The first feed channel includes a first vertical member that extends substantially vertically. The second feed channel includes a second vertical member that extends substantially vertically. The first vertical member and the second vertical member both extend to a position lower in level than the second liquid treatment chamber.
    Type: Grant
    Filed: March 14, 2019
    Date of Patent: September 22, 2020
    Assignee: SCREEN Holdings Co., Ltd.
    Inventor: Yukihiko Inagaki
  • Patent number: 10784126
    Abstract: A substrate processing method includes a substrate holding step of holding a substrate horizontally, a hydrophobic agent supplying step of supplying to an upper surface of the substrate a hydrophobic agent which is a liquid for hydrophobizing the upper surface of the substrate, a low surface-tension liquid supplying step of supplying the low surface-tension liquid to the upper surface of the substrate in order to replace the hydrophobic agent on the substrate by a low surface-tension liquid lower in surface tension than water, and a humidity adjusting step of adjusting humidity of the atmosphere in contact with a liquid film on the substrate such that the humidity of the atmosphere in contact with a liquid film on the substrate in the hydrophobic agent supplying step reaches a first humidity and the humidity of the atmosphere in contact with a liquid film on the substrate in the low surface-tension liquid supplying step reaches a second humidity which is humidity lower than the first humidity.
    Type: Grant
    Filed: July 30, 2018
    Date of Patent: September 22, 2020
    Assignee: SCREEN Holdings Co., Ltd.
    Inventors: Taiki Hinode, Sadamu Fujii
  • Patent number: 10777432
    Abstract: A substrate processing apparatus includes a chamber body having an upper opening, a chamber lid part having a lower opening, and a shield plate arranged in a lid internal space of the chamber lid part. The radial dimension of the shield plate is greater than that of the lower opening. Covering the upper opening of the chamber body with the chamber lid part forms a chamber that internally houses a substrate. In the substrate processing apparatus, before the substrate is conveyed and the chamber is formed, the lid internal space of the chamber lid part is filled with the gas supplied from a gas supply part, in a state in which the shield plate overlaps with the lower opening. This allows the chamber to be quickly filled with the gas to achieve a desired low oxygen atmosphere after the formation of the chamber.
    Type: Grant
    Filed: February 23, 2015
    Date of Patent: September 15, 2020
    Assignee: SCREEN Holdings Co., Ltd.
    Inventor: Takeshi Yoshida
  • Patent number: 10777415
    Abstract: Hydrogen annealing for heating a semiconductor wafer on which a thin film containing a dopant is deposited to an annealing temperature under an atmosphere containing hydrogen is performed. A native oxide film is inevitably formed between the thin film containing the dopant and the semiconductor wafer, however, by performing hydrogen annealing, the dopant atoms diffuse relatively easily in the native oxide film and accumulate at the interface between the front surface of the semiconductor wafer and the native oxide film. Subsequently, the semiconductor wafer is preheated to a preheating temperature under a nitrogen atmosphere, and then, flash heating treatment in which the front surface of the semiconductor wafer is heated to a peak temperature for less than one second is performed. The dopant atoms are diffused and activated in a shallow manner from the front surface of the semiconductor wafer, thus, the low-resistance and extremely shallow junction is obtained.
    Type: Grant
    Filed: December 26, 2018
    Date of Patent: September 15, 2020
    Assignee: SCREEN HOLDINGS CO., LTD.
    Inventors: Kazuhiko Fuse, Hikaru Kawarazaki, Hideaki Tanimura, Shinichi Kato
  • Patent number: 10777404
    Abstract: A substrate processing apparatus includes a driving magnet that is disposed correspondingly to a movable pin and that has a predetermined polar direction with respect to a radial direction of a rotary table, a pressing magnet that has a magnetic pole that gives an attractive magnetic force or a repulsive magnetic force between the driving magnet and the pressing magnet and that presses a support portion against a peripheral edge of a substrate by urging the support portion toward a contact position by means of the attractive magnetic force or the repulsive magnetic force, and a pressing-force changing unit that changes a magnitude of a pressing force against the peripheral edge of the substrate pressed by the support portion while keeping the magnitude higher than zero in response to rotation of the rotary table.
    Type: Grant
    Filed: February 2, 2017
    Date of Patent: September 15, 2020
    Assignee: SCREEN Holdings Co., Ltd.
    Inventors: Hiromichi Kaba, Akihiko Taki, Tomomi Iwata, Toru Edo, Kunio Yamada
  • Patent number: 10777427
    Abstract: The temperature of a susceptor made of quartz is increased by heat transfer and heat radiation from a heated semiconductor wafer. When the treated semiconductor wafer is transported outwardly, the susceptor has a non-uniform temperature distribution in which a central portion thereof is higher in temperature than an edge portion thereof. In an early stage of preheating in which a new semiconductor wafer is held by the susceptor and starts being irradiated with light emanating from halogen lamps, an intensity ratio that is the ratio of the intensity of light emanating from a central portion of a light irradiator including an array of the halogen lamps to the intensity of light emanating from an edge portion thereof is less than 100%. Thereafter, the ratio of the intensity of light emanating from the central portion of the light irradiator to the intensity of light emanating from the edge portion thereof is increased.
    Type: Grant
    Filed: December 6, 2018
    Date of Patent: September 15, 2020
    Assignee: SCREEN HOLDINGS CO., LTD.
    Inventor: Masashi Furukawa
  • Patent number: 10766054
    Abstract: A substrate processing method comprises: a liquid film forming step of forming a liquid film of a rinsing liquid on a pattern forming surface of a substrate formed with a pattern; a liquid pool forming step of forming a liquid pool of an organic solvent by supplying the organic solvent to the liquid film near a center of rotation of the substrate; a replacement step of replacing the rinsing liquid constituting the liquid film with the organic solvent by supplying the organic solvent to the liquid pool while rotating the substrate at a rotational speed higher than in the liquid pool forming step; an application step of applying a filler solution to the pattern forming surface coated with the organic solvent; and a filling step of causing a filler contained in the filler solution and applied to the pattern forming surface to sink and filling concave portions of the pattern with the filler.
    Type: Grant
    Filed: September 21, 2017
    Date of Patent: September 8, 2020
    Assignee: SCREEN Holdings Co., Ltd.
    Inventor: Yasunori Kanematsu
  • Patent number: 10760852
    Abstract: A substrate drying method for drying a front surface of a substrate having a pattern includes a sublimation-agent-liquid-film placing step of placing a liquid film of a liquid sublimation-agent on the front surface of the substrate, a high vapor-pressure liquid placing step of placing a liquid film of a high vapor-pressure liquid that has vapor pressure higher than the sublimation agent and that does not include water on the liquid film of the sublimation-agent placed on the front surface of the substrate, a vaporizing/cooling step of losing vaporization heat in response to vaporization of the high vapor-pressure liquid, and, cooling the sublimation-agent, and, as a result, solidifying the liquid film of the sublimation-agent, and, forming a sublimation-agent film on the front surface of the substrate, and a sublimating step of sublimating the sublimation-agent film.
    Type: Grant
    Filed: July 27, 2018
    Date of Patent: September 1, 2020
    Assignee: SCREEN Holdings Co., Ltd.
    Inventors: Manabu Okutani, Noriyuki Kikumoto, Naohiko Yoshihara, Hiroshi Abe
  • Patent number: 10761422
    Abstract: A processing liquid supplying apparatus is arranged to discharge a processing liquid from a discharge port to supply the processing liquid to a processing object, and the processing liquid supplying apparatus includes a first piping, through the interior of which the processing liquid can flow, the interior of the first piping being in communication with the discharge port, and an X-ray irradiating means irradiating X-rays onto the processing liquid present inside the first piping. The first piping has an opening in its pipe wall and the opening is closed by a window member formed using a material that can transmit the X-rays, and the X-ray irradiating means irradiates the X-rays onto the processing liquid present inside the first piping via the window member.
    Type: Grant
    Filed: June 14, 2018
    Date of Patent: September 1, 2020
    Assignee: SCREEN Holdings Co., Ltd.
    Inventors: Masahiro Miyagi, Hiroyuki Araki, Masanori Suzuki, Tomokatsu Sato, Nobuo Kawase