Abstract: Semiconductor device and fabrication method are provided. The method includes a base substrate including a first region, a second region, and a third region arranged in a first direction; a first doped layer at the first region and a second doped layer at the third region; a first gate structure at the second region; a first dielectric layer on the base substrate; forming first trenches in the first dielectric layer, where the first trenches include second sub-regions arranged in a direction in parallel with a second direction, and a minimum distance between a second sub-region and a contact region of the first gate structure is greater than zero; forming a first conductive layer in the first trenches; forming a second conductive layer on a surface of the first conductive layer at the second sub-regions; and forming a third conductive layer on the contact region of the first gate structure.

Abstract: Semiconductor device and transistor are provided. The semiconductor device includes a plurality of first fin structures formed on a substrate, each first fin structure having a first width along a first direction perpendicular to a length direction of the first fin structure; a plurality of second fin structures, each formed on a first fin structure and including a first region located on the first fin structure and a second region located on the first region, the first region having a second width along the first direction, and the second region having a third width along the first direction; a first isolation layer, formed on the substrate and between adjacent first fin structures and adjacent second fin structures; and a second isolation layer formed on the first region and between a bottom portion of sidewall surfaces of each second region and the first isolation layer.

Abstract: A semiconductor structure and fabrication method thereof are provided. The fabrication method includes: providing a base substrate including a substrate and a plurality of fins on the substrate; forming gate structures across the fins, to cover a portion of sidewalls of the fins and a portion of top surfaces of the fins; forming stress layers in the fins on sides of each gate structure; forming barrier layers on sidewalls of the gate structure; and forming doped regions by applying first ion implantation processes to the fins under the stress layers using the barrier layers as a mask.

Abstract: A semiconductor structure and a forming method thereof are provided.

Abstract: A data reading circuit and a storage unit are provided. The data reading circuit includes a being read unit, a reference current generation unit, a current adjustment unit, a reference unit, a comparison unit, and a voltage stabilization unit corresponding to the reference unit. The being read unit is connected to the current adjustment unit and the comparison unit. The reference current generation unit is connected to the current adjustment unit. The current adjustment unit is connected to the reference current generation unit, the being read unit, and the comparison unit. The reference unit is connected to the voltage stabilization unit. The comparison unit is connected to the voltage stabilization unit, the being read unit, and the current adjustment unit. The voltage stabilization unit is connected to the reference unit and the comparison unit.

Abstract: A method for fabricating a semiconductor structure includes providing a substrate and forming a plurality of fins on a surface of the substrate. Along an extending direction of the fins, the fins include first regions, second regions, and gate structures across the second regions. The first regions are located at both sides of the second regions. The method also includes forming first openings in the fins by removing the first regions of the fins at both sides of the gate structures until the substrate is exposed. Further, the method includes forming thermal conductive layers in the first openings, and forming doped layers on top surfaces of the thermal conductive layers. A material of the fins has a first thermal conductivity, a material of the thermal conductive layers have a second thermal conductivity, and the second thermal conductivity is larger than the first thermal conductivity.

Abstract: A semiconductor structure and a formation method thereof are disclosed. The formation method includes: providing a base, wherein a first mandrel layer and a first mask layer located on the first mandrel layer are formed on the base, and openings exposing the first mandrel layer are formed in the first mask layer; forming a second mandrel layer covering the first mask layer, wherein the second mandrel layer also fills the openings; forming first trenches running through the second mandrel layer, the first mask layer and the first mandrel layer, wherein the side walls of the first trenches expose the second mandrel layer in the openings; forming side wall layers on the side walls of the first trenches; and etching to remove the second mandrel layer and the first mandrel layer below the positions of the openings by taking the side wall layers as masks to form second trenches running through the first mandrel layer, wherein the second trenches and the first trenches are isolated by the side wall layers.

Abstract: A fabrication method for a semiconductor structure is provided. The method includes: forming a base substrate; forming gate structures on the base substrate where each gate structure includes a first gate portion with first doping ions on the base substrate and a second gate portion on the first gate portion; forming a metal layer on the second gate portions; and forming a metal silicide layer by reacting a portion of the metal layer with each second gate portion through an annealing process. When forming the metal silicide layers, a reaction between the metal layer and the second gate portions has a first reacting rate and a reaction between the metal layer and the first gate portions has a second reacting rate; and the second reacting rate is smaller than the first reacting rate.

Abstract: The present disclosure provides HKMG transistor structures and fabrication methods thereof. An exemplary method includes providing a base substrate having a first region and a second region; forming a dielectric layer having a first opening in the first region and a second opening in the second region over; forming a gate dielectric layer on a side surface of the first opening and a portion of the base substrate in the first opening and on a side surface of the second opening and a portion of the base substrate in the second opening; filling a sacrificial layer in the first opening; forming a second work function layer in the second opening and a second gate electrode layer on the second work function layer; removing the sacrificial layer; and forming a first work function layer in the first opening and a first gate electrode layer on the first work function layer.

Abstract: A semiconductor structure and a forming method thereof are provided. One form of the forming method includes: providing a base, where a well region and a drift region adjacent to the well region are formed in the base; forming a trench in the drift region; forming a diffusion barrier layer in the trench; after the diffusion barrier layer is formed, forming a gate structure on the base at a junction between the well region and the drift region, where the gate structure is located on a side of the diffusion barrier layer near the well region; and forming a source region in the well region on one side of the gate structure, and forming a drain region in the drift region on the other side of the gate structure, where the drain region is located on a side of the diffusion barrier layer in the drift region away from the well region.

Abstract: An apparatus for detecting a defect on a surface of a substrate includes an optical microlens array disposed adjacent to the substrate and including an array of microlenses configured to direct light incident on a second surface of the optical microlens array to exit a first surface of the optical microlens array opposite the second surface for irradiating the surface of the substrate and converge light emitted from the irradiated surface of the substrate, and an imaging member including a plurality of imaging units configured to receive the converged light of the optical microlens array. Each of the imaging units corresponds to a microlens of the optical microlens array and includes a plurality of pixels and a light transmission opening for transmitting a portion of the incident light. The apparatus requires significantly less time to detect surface defects than conventional substrate surface defect detection devices.

Abstract: Semiconductor device, static random access memory (SRAM), and their fabrication methods are provided. The semiconductor device includes a base substrate with first fins formed in adjacent device regions. An isolation structure is formed on the base substrate having a top lower than the first fins. The isolation structure includes a first region and a second region, on opposite sidewalls of a corresponding first fin. The first region is between the adjacent first fins. The isolation structure has a top in the first region higher than that in the second region. A first doped layer is formed in the first fin having a portion in the second region. A dielectric layer is formed over the base substrate and a first contact hole is formed in the dielectric layer to expose a top of the first doped layer and a sidewall surface of the first doped layer, in the second region.

Abstract: A fin field effect transistor is provided. The FinFET device includes a base substrate; an isolation layer on the base substrate; first fins in the isolation layer and on the base substrate. The first fins is made of a material having a thermal conductivity greater than a material of the base substrate.

Abstract: A fin field-effect transistor (fin-FET) includes a substrate having a plurality of discrete fin structures thereon; a chemical oxide layer on at least a sidewall of a fin structure; a doped layer containing doping ions on the chemical oxide layer; and a doped region in the fin structure containing doping ions diffused from the doping ions in the doped layer.

Abstract: A semiconductor structure and a forming method thereof are provided.

Abstract: A method for manufacturing a semiconductor device includes providing a semiconductor structure having a semiconductor substrate and a gate structure on the semiconductor substrate. The gate structure includes a gate dielectric layer on the semiconductor substrate, a gate on the gate dielectric layer, and a spacer layer on opposite sides of the gate. The method also includes etching the semiconductor substrate to form first and second recesses, etching a portion of the spacer layer to expose a surface portion of the semiconductor substrate, and forming a source filling the first recess and a drain filling the second recess. The source (drain) includes a first source (drain) portion in the first (second) recess and a second source (drain) portion on the first source (drain) portion. The second source portion or the second drain portion covers the exposed surface portion of the semiconductor substrate.

Abstract: Circuits and methods for measuring a working current of a circuit module. An exemplary circuit for measuring a working current of a circuit module includes a capacitor. The capacitor supplies a voltage to the circuit module using a voltage on the two terminals of the capacitor. The circuit also includes a voltage measuring module. The voltage measuring module measures a voltage change amount on the two terminals of the capacitor in an unit time. The working current of the circuit module is determined by the circuit according to the voltage change amount on the two terminals of the capacitor in the unit time and a capacitance of the capacitor.

Abstract: A semiconductor structure is provided and includes a substrate; a gate dielectric layer on the substrate; a dielectric barrier layer structure on the gate dielectric layer; a work function layer on the dielectric barrier layer structure; a gate barrier layer structure on the work function layer; and a gate electrode layer on the gate barrier layer structure. The dielectric barrier layer structure is doped with silicon and the gate barrier layer structure is doped with silicon.

Abstract: A method for fabricating a semiconductor structure includes forming a fin structure and a gate structure; and forming a source/drain trench in the fin structure on each side of the gate structure. The source/drain trench includes a bottom region and a top region located above the bottom region. Along an extension direction of the fin structure, the dimension of the top region of the source/drain trench is larger than the dimension of the bottom region of the source/drain trench. Along the extension direction of the fin structure, the shortest distance from a sidewall surface of the top region of the source/drain trench to a sidewall surface of the gate structure is smaller than the shortest distance from a sidewall surface of the bottom region of the source/drain trench to the sidewall surface of the gate structure. The method further includes forming a source/drain doped layer in the source/drain trench.

Abstract: Semiconductor devices and fabrication methods are provided. An exemplary fabrication method includes forming a first type of fin sidewall spacers and a second type of fin sidewall spacers. The first type of fin sidewall spacers are formed on two sidewall surfaces of a third fin portion group along a width direction of the third fin portions and two sidewall surfaces of a fourth fin portion group along a width direction of the fourth fin portions. The second type of fin sidewall spacers are formed between adjacent third fin portions and sidewall surfaces of the third fin portions and between adjacent fourth fin portions and on sidewall surfaces of the fourth fin portions. Top surfaces of the first type of fin sidewall spacers are higher than top surfaces of the second type of fin sidewall spacers and top surfaces of the third fin portions and the fourth fin portions.