Abstract: A photomask-forming glass substrate having a square major surface is provided wherein two strip regions are defined on the major surface near a pair of opposed sides such that each region spans between 2 mm and 10 mm inward of the side and excludes end portions extending 2 mm inward from the opposed ends of the side, a least squares plane is computed for each of the two strip regions, the angle included between normal lines to the least squares planes of two strip regions is within 10 seconds, and the height difference between two strip regions is up to 0.5 ?m.

Abstract: A process for producing a conjugated diene polymer composition, which comprises of polymerizing a conjugated diene compound or a conjugated diene compound and an aromatic vinyl compound in a hydrocarbon solvent in the presence of at least one compound selected from the group consisting of organoalkali metals and organoalkaline earth metals as an initiator and then reacting the active end of the resulting polymer with a low molecular compound represented by the following formula (1) or the following formula (2): (wherein in the formula (1), R1 represents an organic group containing an N atom not adjacent to the N atom of the aminosilyl group and having a molecular weight not greater than 1000, R2 represents a C1-10 hydrocarbon group or a C1-10 hydrocarbon group having no active hydrogen and substituted with an Si, O, N or S atom, R3 and R4 each independently represents a C1-20 alkyl group or aryl group, R5, R6, and R7 each represents a C1-20 alkyl group or aryl group or a C1-12 alkoxy group and g stands fo