Patents Assigned to Shipley Company, L.L.C.
  • Patent number: 7776508
    Abstract: Antihalation compositions and methods for reducing the reflection of exposure radiation of a photoresist overcoated said compositions. The antihalation compositions of the invention comprise a resin binder and material capable of causing a thermally induced crosslinking reaction of the resin binder.
    Type: Grant
    Filed: October 31, 2007
    Date of Patent: August 17, 2010
    Assignee: Shipley Company, L.L.C.
    Inventors: James W. Thackeray, George W. Orsula
  • Publication number: 20090220888
    Abstract: The present invention provides new photoresist compositions that comprise a resin binder, a photoactive component, particularly an acid generator, and a dye material that contains one or more chromophores that can reduce undesired reflections of exposure radiation. Preferred dye compounds are polymeric materials that include one or more chromophores such as anthracene and other polycyclic moieties that effectively absorb deep UV exposure radiation.
    Type: Application
    Filed: December 12, 2008
    Publication date: September 3, 2009
    Applicant: Shipley Company, L.L.C.
    Inventors: James Michael Mori, James W. Thackeray, Roger F. Sinta, Rosemary Bell, Robin L. Miller-Fahey, Timothy G. Adams, Thomas M. Zydowsky, Edward K. Pavelchek, Manual doCanto
  • Patent number: 7482107
    Abstract: Photoresist compositions having a resin binder with an acid labile blocking group with an activation energy in excess of 20 Kcal/mol. for deblocking, a photoacid generator capable of generating a halogenated sulfonic acid upon photolysis and optionally, a base.
    Type: Grant
    Filed: March 23, 2006
    Date of Patent: January 27, 2009
    Assignee: Shipley Company, L.L.C.
    Inventors: James W. Thackeray, James F. Cameron, Roger F. Sinta
  • Publication number: 20080285601
    Abstract: The present invention concerns a design for an external cavity single mode laser wherein a short optical path length for the optical cavity (e.g., ˜3 to 25 mm) provides sufficient spacing of the longitudinal modes allowing a single wavelength selective element, such as a microfabricated etalon, to provide a single mode of operation, and optionally a selectable mode of operation.
    Type: Application
    Filed: November 13, 2007
    Publication date: November 20, 2008
    Applicant: Shipley Company, L.L.C.
    Inventors: David W. Sherrer, Hui Luo
  • Publication number: 20080248426
    Abstract: Antihalation compositions and methods for reducing the reflection of exposure radiation of a photoresist overcoated said compositions. The antihalation compositions of the invention comprise a resin binder and material capable of causing a thermally induced crosslinking reaction of the resin binder.
    Type: Application
    Filed: October 31, 2007
    Publication date: October 9, 2008
    Applicant: Shipley Company, L.L.C.
    Inventors: James W. Thackeray, George W. Orsula
  • Patent number: 7378222
    Abstract: Antihalation compositions and methods for reducing the reflection of exposure radiation of a photoresist overcoated said compositions. The antihalation compositions of the invention comprise a resin binder and material capable of causing a thermally induced crosslinking reaction of the resin binder.
    Type: Grant
    Filed: January 9, 2006
    Date of Patent: May 27, 2008
    Assignee: Shipley Company, L.L.C.
    Inventors: James W. Thackeray, George W. Orsula
  • Patent number: 7345316
    Abstract: An optical device package includes a substrate having an upper surface, a distal end, a proximal end, and distal and proximal longitudinally extending notches co-linearly aligned with each other. A structure is mounted to the substrate and has at least one recessed portion. The structure can be a lid or a frame to which a lid is bonded. An optical fiber is positioned within at least one of the proximal longitudinally extending notch and the distal longitudinally extending notch and within the recessed portion of the structure mounted to the substrate. The optical device package can also include conductive legs extending upwardly from bonding pads on the upper surface of the substrate to facilitate flip mounting of the optical device package onto a circuit board or other such platform.
    Type: Grant
    Filed: October 24, 2001
    Date of Patent: March 18, 2008
    Assignee: Shipley Company, L.L.C.
    Inventors: David W. Sherrer, Mindaugus F. Dautargas, Neil Ricks, Dan A. Steinberg
  • Patent number: 7344970
    Abstract: Photoresist compositions and methods suitable for depositing a very thick photoresist layer in a single coating process are provided. Such photoresist layers are particularly suitable for use in chip scale packaging.
    Type: Grant
    Filed: April 7, 2003
    Date of Patent: March 18, 2008
    Assignee: Shipley Company, L.L.C.
    Inventors: Robert S. Forman, Jill E. Steeper, Eric C. Huenger
  • Publication number: 20080050582
    Abstract: A multi-level optical device includes a substrate having a baseline level. At least one feature is disposed at a level above the baseline level. At least one feature is disposed at a level below the baseline level, or in the feature above the baseline level is located at a distance apart from the feature below the baseline level. The distance has an accuracy inn the range of approximately ±0.05 ?m to less than approximately ±1.0 ?m. A method of fabricating an optical device includes forming at least one feature at a level of above a baseline level of a substrate; and forming at least one feature at a baseline level below the baseline level of the substrate, wherein the feature at a level above the baseline level and the feature at a level below the baseline level are patterned in a single-mask step using a multi-level mask.
    Type: Application
    Filed: August 13, 2007
    Publication date: February 28, 2008
    Applicant: Shipley Company, L.L.C.
    Inventors: Dan Steinberg, David Sherrer
  • Patent number: 7333945
    Abstract: A computerized data processing system can assist a user in locating specialty chemical products having particular intrinsic properties specified by the user. The system can query a database to identify commercially available chemical product(s) that best conform to the intrinsic properties identified by the user. Query results are sent to a client computer for presentation to a user. In some cases, the user may request formulation of a new product conforming to the search parameters. The ability to automatically request formulation of a new product can assist the user where, for example, the commercially available chemical products do not adequately conform to the desired properties. This formulation request is received at the server and a formulator database is queried to select a set of experts with appropriate product formulation skills. The system can then automatically distribute the user's formulation request to each of these experts.
    Type: Grant
    Filed: November 24, 2000
    Date of Patent: February 19, 2008
    Assignee: Shipley Company, L.L.C.
    Inventor: Eric R. Alling
  • Publication number: 20080038518
    Abstract: A method of forming air gaps within a solid structure is provided. In this method, a sacrificial material is covered by an overlayer. The sacrificial material is then removed through the overlayer to leave an air gap. Such air gaps are particularly useful as insulation between metal lines in an electronic device such as an electrical interconnect structure. Structures containing air gaps are also provided.
    Type: Application
    Filed: August 13, 2007
    Publication date: February 14, 2008
    Applicant: Shipley Company, L.L.C.
    Inventors: Michael Gallagher, Dana Gronbeck, Timothy Adams, Jeffrey Calvert
  • Publication number: 20080032232
    Abstract: Provided are new resins that comprise carbocyclic aryl units with hetero substitution units and photoresists that contain such resins. Particularly preferred photoresists of the invention comprise a deblocking resin that contains hydroxy naphthyl units and can be effectively imaged with sub-200 nm radiation such as 193 nm radiation.
    Type: Application
    Filed: July 13, 2007
    Publication date: February 7, 2008
    Applicant: Shipley Company, L.L.C.
    Inventors: Young Bae, George Barclay
  • Patent number: 7306892
    Abstract: Multilayer photoresist systems are provided. In particular aspects, the invention relates to underlayer composition for an overcoated photoresist, particularly an overcoated silicon-containing photoresist that is imaged at short exposure wavelengths.
    Type: Grant
    Filed: November 20, 2003
    Date of Patent: December 11, 2007
    Assignee: Shipley Company, L.L.C.
    Inventors: George G. Barclay, James F. Cameron
  • Patent number: 7294453
    Abstract: Disclosed are methods of manufacturing electronic devices, particularly integrated circuits. Such methods include the use of low dielectric constant material prepared by using a removable porogen material.
    Type: Grant
    Filed: February 19, 2004
    Date of Patent: November 13, 2007
    Assignee: Shipley Company, L.L.C.
    Inventors: Michael K. Gallagher, Yujian You
  • Patent number: 7294280
    Abstract: The present invention concerns a design for an external cavity single mode laser wherein a short optical path length for the optical cavity (e.g., ˜3 to 25 mm) provides sufficient spacing of the longitudinal modes allowing a single wavelength selective element, such as a microfabricated etalon, to provide a single mode of operation, and optionally a selectable mode of operation.
    Type: Grant
    Filed: May 24, 2004
    Date of Patent: November 13, 2007
    Assignee: Shipley Company, L.L.C.
    Inventors: David W. Sherrer, Hui Luo
  • Patent number: 7290321
    Abstract: An apparatus for passively aligning first and second substrates having micro-components disposed thereon when the substrates do not include patterned surfaces which face each other. The apparatus includes a first depression which cooperates with an alignment sphere to mechanically engage a corresponding depression disposed on the front surface of the first substrate and a second depression which cooperates with a second alignment sphere to mechanically engage a corresponding depression disposed on the front surface of the second substrate. The first and second depression of the alignment apparatus and the alignment spheres cooperate to passively align micro-components disposed on each of the substrates.
    Type: Grant
    Filed: August 7, 2006
    Date of Patent: November 6, 2007
    Assignee: Shipley Company, L.L.C.
    Inventors: Dan A. Steinberg, Mindaugas F. Dautartas, Jasean Rasnake
  • Patent number: 7267781
    Abstract: A method of fabricating optical filter is disclosed. The method includes providing the substrate and selectively etching the substrate to form a plurality of freestanding layers. A plurality of dielectric layers is disposed over an outer surface of each of the freestanding layers. The resultant optical filters may be used in a variety of applications including etalon applications.
    Type: Grant
    Filed: June 2, 2004
    Date of Patent: September 11, 2007
    Assignee: Shipley Company, L.L.C.
    Inventors: Dan A. Steinberg, Mindaugas F. Dautartas, David W. Sherrer
  • Patent number: 7255978
    Abstract: A multi-level optical device includes a substrate having a baseline level. At least one feature is disposed at a level above the baseline level. At least one feature is disposed at a level below the baseline level, or in the feature above the baseline level is located at a distance apart from the feature below the baseline level. The distance has an accuracy inn the range of approximately ±0.05 ?m to less than approximately ±1.0 ?m. A method of fabricating an optical device includes forming at least one feature at a level of above a baseline level of a substrate; and forming at least one feature at a baseline level below the baseline level of the substrate, wherein the feature at a level above the baseline level and the feature at a level below the baseline level are patterned in a single-mask step using a multi-level mask.
    Type: Grant
    Filed: May 16, 2001
    Date of Patent: August 14, 2007
    Assignee: Shipley Company, L.L.C.
    Inventors: Dan A. Steinberg, David W. Sherrer
  • Patent number: 7256127
    Abstract: A method of forming air gaps within a solid structure is provided. In this method, a sacrificial material is covered by an overlayer. The sacrificial material is then removed through the overlayer to leave an air gap. Such air gaps are particularly useful as insulation between metal lines in an electronic device such as an electrical interconnect structure. Structures containing air gaps are also provided.
    Type: Grant
    Filed: September 13, 2003
    Date of Patent: August 14, 2007
    Assignee: Shipley Company, L.L.C.
    Inventors: Michael K. Gallagher, Dana A. Gronbeck, Timothy G. Adams, Jeffrey M. Calvert
  • Patent number: 7251406
    Abstract: An optical device is disclosed which includes a single-mode waveguide (700) which supports a first optical mode in a first region and a second optical mode in a second region. The waveguide includes a guiding layer (703) having at least one wing (750) extended outwardly from the guiding layer (703). The guiding layer (703) may desirably have a rib waveguide (706, 707) cross sectional shape at the wings. The wings (750) decrease in width along the length of the guiding layer to convert a rib waveguide mode at the wings to a channel waveguide mode.
    Type: Grant
    Filed: December 5, 2002
    Date of Patent: July 31, 2007
    Assignee: Shipley Company, L.L.C.
    Inventors: Hui Luo, Mindaugas F. Dautartas, Dan A. Steinberg, David W. Sherrer