Patents Assigned to Soken Chemical & Engineering Co., Ltd.
  • Publication number: 20210125788
    Abstract: A solid electrolytic capacitor comprising an anode body having pores, a dielectric, a first conductive polymer layer and a second conductive polymer layer is provided. The dielectric is formed on a surface of the anode body. The first conductive polymer layer includes a first conductive polymer having at least one of structural units represented by the following formula (1) and the following formula (2) and is formed on the dielectric. In the formulas (1) and (2), R1 is an alkyl group having 1 to 12 carbon atoms, an alkoxy group having 1 to 12 carbon atoms, an alkylene oxide group having 1 to 12 carbon atoms, an aromatic group, or a heterocyclic group, each of which optionally has a substituent, A? is a monoanion derived from a dopant and n is 2 or more and 300 or less.
    Type: Application
    Filed: August 1, 2018
    Publication date: April 29, 2021
    Applicant: SOKEN CHEMICAL & ENGINEERING Co., Ltd.
    Inventor: Takeshi MIYAMOTO
  • Publication number: 20200118766
    Abstract: A method for manufacturing a conductive polymer solid electrolytic capacitor comprising a conductive polymer introduction step and a solvent removal step. The conductive polymer introduction step comprises impregnating a porous material with a dispersion. The dispersion includes a conductive polymer dispersed in a non-aqueous solvent and the conductive polymer includes at least one of the structural units represented by the following formula and the following formula.
    Type: Application
    Filed: May 28, 2018
    Publication date: April 16, 2020
    Applicant: SOKEN CHEMICAL & ENGINEERING Co., Ltd.
    Inventors: Takeshi MIYAMOTO, Hisakazu SAKAI
  • Patent number: 10487159
    Abstract: An object of the present invention is to achieve a high polymerization ratio and high functional group introduction ratio during production of a (meth)acrylic polymer having a functional group at one end, while suppressing formation of a disulfide. According to the constitution of the present invention, a method for producing a (meth)acrylic polymer having a functional group at one end includes subjecting a (meth)acrylic monomer to a polymerization reaction, in the presence of an inert gas containing 0.01% to 6.0% by volume of oxygen, by using, as an initiating species, a compound having a functional group and a thiol group.
    Type: Grant
    Filed: August 30, 2016
    Date of Patent: November 26, 2019
    Assignee: Soken Chemical & Engineering Co., Ltd.
    Inventors: Takeshi Miyamoto, Takahiro Okubo, Hiroto Matsumoto, Shu-ichi Goto, Shinsuke Yabunaka
  • Publication number: 20190144589
    Abstract: A photo-curable resin composition is provided that is capable of forming a resin layer having solvent resistance and capable of easily forming a releasing layer on the resin layer. According to the present invention, a photo-curable resin composition comprising a silicone oligomer having an alkoxy group bonded to a silicon atom and a (meth)acrylate compound is provided.
    Type: Application
    Filed: May 15, 2017
    Publication date: May 16, 2019
    Applicant: SOKEN CHEMICAL & ENGINEERING CO., LTD.
    Inventors: Yukihiro MIYAZAWA, Ai TAKEDA
  • Patent number: 10203597
    Abstract: A method of manufacturing a structure for suppressing in-mask curing corrosion while minimizing influence on shape stability of a fine pattern to be transferred to a resin layer. A method of manufacturing a structure is provided including: lamination forming, forming a lamination including, on a transparent substrate, a resin layer of an imprinting photo curable resin composition containing a photopolymerizable monomer and 0.1 parts or more respectively of a photo initiator and a polymerization inhibitor based on 100 parts of the monomer; covering, pressing a fine pattern of a mold on the resin layer and covering the lamination with a shading mask to cause a part of a region where the mold is pressed on to be exposed; curing the resin layer in the exposed region by radiating curing light to the resin layer; and repeating steps by moving the mold to an uncured area.
    Type: Grant
    Filed: November 11, 2014
    Date of Patent: February 12, 2019
    Assignee: SOKEN CHEMICAL & ENGINEERING Co., Ltd.
    Inventor: Yukihiro Miyazawa
  • Publication number: 20180364573
    Abstract: An imprinting photo curable resin composition is provided that is excellent in both transferability in imprinting and solvent resistance of the pattern transferred to a structure. According to the present invention, an imprinting photo curable resin composition is provided that at least includes a photopolymerizable (meth)acrylic monomer (A) and a photo initiator (B), wherein the (meth)acrylic monomer (A) is composed at ratios of: (a-1) from 60 to 97 mass % of a trifunctional (meth)acrylate compound; (a-2) from 3 to 40 mass % of a tetrafunctional or higher functional (meth)acrylate compound; and (a-3) from 0 to 37 mass % of a bifunctional or lower functional (meth)acrylate compound (where a sum from (a-1) to (a-3) is 100 mass %).
    Type: Application
    Filed: August 17, 2018
    Publication date: December 20, 2018
    Applicant: SOKEN CHEMICAL & ENGINEERING Co., Ltd.
    Inventor: Yukihiro MIYAZAWA
  • Publication number: 20180244838
    Abstract: Provided is a polymer having exceptional solubility in hydrophilic polar solvents and stability in solvents.
    Type: Application
    Filed: March 25, 2016
    Publication date: August 30, 2018
    Applicant: SOKEN CHEMICAL & ENGINEERING Co., Ltd.
    Inventors: Takeshi MIYAMOTO, Shuji OKAMOTO, Fumiaki KOBAYASHI
  • Patent number: 10052798
    Abstract: An imprint method including the steps of: an exposing step to irradiate a photo curing resin, coated on a large-area substrate, with a curing light while the light-transmitting imprint mold is pressed against the photo curing resin, an amount of the curing light applied onto the photo curing resin in a light shielding region provided with the light shielding member made less than an amount of the curing light applied onto the photo curing resin in a light transmitting region of the mold so that a portion of the photo curing resin in the light shielding region is semi-cured by the use of the light shielding member provided so as to reproduce the concave-convex pattern of the transparent substrate.
    Type: Grant
    Filed: January 21, 2014
    Date of Patent: August 21, 2018
    Assignee: SOKEN CHEMICAL & ENGINEERING CO., LTD.
    Inventor: Yukihiro Miyazawa
  • Patent number: 9951201
    Abstract: Provided is a method to produce resin particles having a uniform particle size by a suspension polymerization method, and to provide a method for simply producing resin particles having high dispersibility into an organic binder or an organic solvent, wherein a resin particle assemblage comprises a resin particle assemblage in which an ester moiety constituting a sorbitan fatty acid ester having no polyoxyalkylene group is buried in the resin particles, and a large number of sorbitan moieties bonded with the ester moiety exist on a surface of resin particles, and a coefficient of variation (CV value) of a mean particle diameter of the resin particles forming the resin particle assemblage is in the range of 30% or less.
    Type: Grant
    Filed: December 10, 2012
    Date of Patent: April 24, 2018
    Assignee: Soken Chemical & Engineering Co., LTD.
    Inventors: Satoru Yamamoto, Aya Kokaya, Chie Tsuchiya
  • Patent number: 9895838
    Abstract: A resin mold for nanoimprinting has a substrate, a resin layer formed upon the substrate and having a depressions and protrusions pattern on a surface, an inorganic substance layer formed of uniform thickness on at least the surface having the depressions and protrusions pattern of the resin layer, and a mold release agent layer formed of uniform thickness on at least the surface having the depressions and protrusions pattern of the inorganic substance layer. The resin of the resin layer includes constituent units derived from an epoxy group-containing unsaturated compound at a concentration of 1 to 50 percent relative to total constituent units, and the epoxy value is 7.0×10?4 to 4.0×10?2.
    Type: Grant
    Filed: May 17, 2017
    Date of Patent: February 20, 2018
    Assignee: Soken Chemical & Engineering Co., Ltd.
    Inventors: Hiroko Yamada, Takahide Mizawa
  • Patent number: 9815230
    Abstract: A method for manufacturing an imprint mold which can prevent accumulation of the transferring resin at the joining portion of the film mold is provided. A method for manufacturing an imprint mold, including a winding step to wind a resin film mold onto a cylindrical transferring roll, the resin film mold being provided with a reverse pattern of a desired fine concave-convex pattern and the resin film mold being wound onto the transferring roll so that a gap without the reverse pattern is provided at a butting portion of both ends of the resin film mold; a resin filling step to fill a resin composition into the gap; and a pattern forming step to form a pattern substantially the same as the reverse pattern onto the resin composition, is provided.
    Type: Grant
    Filed: November 18, 2013
    Date of Patent: November 14, 2017
    Assignee: SOKEN CHEMICAL & ENGINEERING Co., Ltd.
    Inventors: Takehide Misawa, Ikumi Sakata
  • Publication number: 20170315281
    Abstract: A polarizing plate is provided that is capable of transmitting a different polarization component for each region provided in the surface of the polarizing plate. The polarizing plate includes: a transparent substrate; a transparent resin layer formed on the transparent substrate and having a concave-convex pattern; and a polarization layer formed on the transparent resin layer. The transparent resin layer has a plurality of concave-convex regions with the concave-convex pattern extending in a different direction in each region, the directions in the concave-convex regions being different from each other.
    Type: Application
    Filed: October 14, 2015
    Publication date: November 2, 2017
    Applicant: SOKEN CHEMICAL & ENGINEERING Co., Ltd.
    Inventor: Yasuo SUTO
  • Patent number: 9776359
    Abstract: A method for manufacturing an imprint mold which can prevent accumulation of the transferring resin onto the transferring roll is provided. A method for manufacturing an imprint mold, including: a resin coating step to coat a photo-curing resin composition or a thermosetting resin composition onto a pattern transferring mold having a fine concave-convex pattern; and a transferring step to transfer the resin composition throughout the entire circumference of a cylindrical transferring roll and cure the resin composition so that a reverse pattern of the concave-convex pattern is formed throughout the entire circumference of the cylindrical transferring roll, is provided.
    Type: Grant
    Filed: November 18, 2013
    Date of Patent: October 3, 2017
    Assignee: SOKEN CHEMICAL & ENGINEERING Co., Ltd.
    Inventor: Yutaka Mizukami
  • Patent number: 9753189
    Abstract: An anti-reflection sheet includes a transparent substrate; and a resin layer formed on a surface of a transparent substrate. The resin layer includes a first surface that faces the surface of the transparent substrate; a second surface that faces away from the surface of the transparent substrate; and a plurality of projections arranged on the second surface of the resin layer so as to form a projection layer. Each of the plurality of projections has a cross section that includes an entire center axis perpendicular to the surface of the transparent substrate. Each of the plurality of projections has a cross section that is in a shape of quadratic function. An arranged pitch of each of the plurality of projections is not more than half of a wavelength of incident light. An aspect ratio of each of the plurality of projections is 1 or less. A difference between a refractive index n1 of the transparent substrate and a refractive index n2 of the resin layer satisfies the following expression: |n1?n2|?0.05.
    Type: Grant
    Filed: December 5, 2013
    Date of Patent: September 5, 2017
    Assignee: Soken Chemical & Engineering Co., Ltd.
    Inventors: Kosuke Sanari, Yoshinori Ito, Atsushi Okano, Yoshihiko Takagi
  • Patent number: 9713900
    Abstract: A resin mold for nanoimprinting has a substrate, a resin layer formed upon the substrate and having a depressions and protrusions pattern on a surface, an inorganic substance layer formed of uniform thickness on at least the surface having the depressions and protrusions pattern of the resin layer, and a mold release agent layer formed of uniform thickness on at least the surface having the depressions and protrusions pattern of the inorganic substance layer. The resin of the resin layer includes constituent units derived from an epoxy group-containing unsaturated compound at a concentration of 1 to 50 percent relative to total constituent units, and the epoxy value is 7.0×10?4 to 4.0×10?2.
    Type: Grant
    Filed: August 3, 2011
    Date of Patent: July 25, 2017
    Assignee: Soken Chemical & Engineering Co., Ltd.
    Inventors: Hiroko Yamada, Takahide Mizawa
  • Publication number: 20170205708
    Abstract: A step-and-repeat imprinting apparatus that is capable of restraining failures and mold breakage during imprinting. A step-and-repeat imprinting apparatus is provided that includes: a stage to place a stage base; a positioning mechanism configured to be relatively movable to the stage and to keep a flexible base to face the stage base; and a pressurizing mechanism to press, while deflecting the flexible base, the flexible base toward the stage base, wherein one of the stage base and the flexible base has a convex and concave pattern, and another of the stage base and the flexible base includes a transferred resin layer to have the convex and concave pattern transferred thereto, and the apparatus is so configured that the pressurizing mechanism presses, while deflecting, the flexible base toward the stage base, thereby transferring the convex and concave pattern to the transferred resin layer.
    Type: Application
    Filed: July 16, 2015
    Publication date: July 20, 2017
    Applicant: SOKEN CHEMICAL & ENGINEERING Co., Ltd.
    Inventor: Yukihiro MIYAZAWA
  • Publication number: 20170203330
    Abstract: A method of manufacturing a microstructure. While pressing a first pattern of a first mold against a first transferred resin layer obtained by applying a first photocurable resin composition on a transparent base having a light shielding pattern, a first cured resin layer with the first pattern transferred thereto is formed by irradiating the first transferred resin layer with an activation energy line through the first mold; While pressing a second pattern of a second mold against a second transferred resin layer obtained by applying a second photocurable resin composition on the first cured resin layer, a second cured resin layer is formed having a level difference shape including a lower level area and a higher level area by irradiating the second transferred resin layer with an activation energy line using the light shielding pattern as a mask to cure the second transferred resin layer in a partial region.
    Type: Application
    Filed: July 24, 2015
    Publication date: July 20, 2017
    Applicant: SOKEN CHEMICAL & ENGINEERING Co., Ltd.
    Inventor: Yukihiro MIYAZAWA
  • Publication number: 20170157836
    Abstract: A step-and-repeat imprinting mold is provided that is capable of restraining deformation of an end of a convex and concave pattern formed in a cured resin layer when the mold is removed. According to embodiments of the present invention, a step-and-repeat imprinting mold includes: a transparent base; a transparent resin layer formed thereon and having a pattern region formed with a convex and concave pattern; and a light shielding member provided between the transparent base and the transparent resin layer so as to overlap the pattern region in part of the pattern region.
    Type: Application
    Filed: July 7, 2015
    Publication date: June 8, 2017
    Applicant: SOKEN CHEMICAL & ENGINEERING Co., Ltd.
    Inventor: Yukihiro MIYAZAWA
  • Patent number: 9557448
    Abstract: Means of solution: Optical protrusions 23 of nano-size for restricting reflection of light and protection columns 24 for preventing crushing of the optical protrusions 23 are provided on a surface of a film substrate 22. The protection columns 24 have a frustum shape. When a ratio of a projection area in which all of lateral surfaces of a single protection column 24 are projected on a surface of the film substrate 22 from a direction that is perpendicular to the surface of the film substrate 22 to a divided area on the surface of the film substrate 22 with respect to the single protection column 24 is defined to be a lateral surface projection occupying area rate, the lateral surface projection occupying area rate of the antireflection film is not more than 0.25% and not less than 0.01%.
    Type: Grant
    Filed: September 14, 2012
    Date of Patent: January 31, 2017
    Assignee: Soken Chemical & Engineering Co., Ltd.
    Inventors: Tomonobu Kato, Tetsuya Minobe, Yoshihiko Takagi, Yuki Yamamoto
  • Patent number: 9511535
    Abstract: A resin mold includes a resin layer having a depressions and protrusions pattern formed in the surface thereof, and a release layer including a mold release agent and formed of uniform thickness on at least the depressions and protrusions pattern of the aforementioned resin layer. The aforementioned resin layer has a solvent soluble resin, and an additive that has bleeding ability with respect to the solvent soluble resin, has a substituent group capable of coupling with the aforementioned mold release agent, and has a substituent group having compatibility with the aforementioned solvent soluble resin. The aforementioned additive is localized in the vicinity of the aforementioned resin layer surface. The group of the additive capable of coupling with the mold release agent condenses with the aforementioned mold release agent so that the aforementioned resin layer and release layer are bonded together.
    Type: Grant
    Filed: August 3, 2011
    Date of Patent: December 6, 2016
    Assignee: Soken Chemical & Engineering Co., Ltd.
    Inventors: Satoshi Uehara, Takahide Mizawa