Abstract: The present invention provides oxygen partial pressure control apparatuses that can control the partial pressure of oxygen in atmospheric gases in processing apparatuses or the like to within the range of 0.2 to 10?30 atm, while maintaining low material and operational cost conditions.
Type:
Application
Filed:
May 19, 2005
Publication date:
September 11, 2008
Applicants:
National Institute of Advanced Industrial Science and Technology, STLAB, Incorporated