Patents Assigned to Sumitomo Chemical Company
  • Patent number: 11873364
    Abstract: A method for producing conjugated diene rubber is provided, including: a first step of obtaining a conjugated diene polymer chain having an active end by polymerizing a monomer comprising a conjugated diene compound and a vinyl compound having a functional group interactive with silica using a polymerization initiator in an inert solvent; a second step of reacting a siloxane compound with the active end of the conjugated diene polymer chain having the active end; and a third step of reacting a hydrocarbyloxysilane compound with the conjugated diene polymer chain with which the siloxane compound has been reacted that is obtained in the second step.
    Type: Grant
    Filed: March 26, 2019
    Date of Patent: January 16, 2024
    Assignees: ZEON CORPORATION, SUMITOMO CHEMICAL COMPANY, LIMITED, ZS ELASTOMERS CO., LTD.
    Inventors: Takuro Sakurai, Takashi Iizuka, Mana Fujii, Hisakatsu Hama
  • Patent number: 11873578
    Abstract: A method for manufacturing a nitride semiconductor substrate by using a vapor phase growth method includes: a step of preparing a base substrate that is constituted by a material different from a single crystal of a group III nitride semiconductor; a step of growing a base layer on the upper side of the base substrate; a first step of growing a first layer by epitaxially growing a single crystal of a group III nitride semiconductor directly on the base surface of the base layer, the single crystal of the group III nitride semiconductor having a top surface at which a (0001) plane is exposed, and a plurality of recessed portions formed by inclined interfaces other than the (0001) plane being generated in the top surface; and a second step of growing a second layer that has a mirror-finished surface.
    Type: Grant
    Filed: November 29, 2019
    Date of Patent: January 16, 2024
    Assignee: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventor: Takehiro Yoshida
  • Patent number: 11877459
    Abstract: This light detecting element has a simple configuration, and is highly sensitive to a prescribed wavelength region. The light detecting element comprises a positive electrode, a negative electrode, and an active layer that is provided between the positive electrode and the negative electrode, and that includes a p-type semiconductor material and n-type semiconductor material. The thickness of the active layer is at least 800 nm. The weight ratio between the p-type semiconductor material and the n-type semiconductor material included in the active layer (p/n ratio) is at most 99/1. The work function of the negative electrode side surface in contact with the active layer is lower than the absolute value of the LUMO energy level of the n-type semiconductor material.
    Type: Grant
    Filed: July 26, 2019
    Date of Patent: January 16, 2024
    Assignee: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Giovanni Ferrara, Takahiro Seike
  • Publication number: 20240010648
    Abstract: A compound of formula (I) or its N-oxide, where Z represents an oxygen atom or the like; G1 represents CR3a or the like; G2 represents CR3b or the like; G3 represents CR3c or the like; G4 represents CR3d or the like; A1 represents CR4a or the like; A2 represents CR4b or the like; A3 represents CR4c or the like; A4 represents CR4d or the like; A5 represents CR4c or the like; R1 represents a C1-C6 chain hydrocarbon group or the like; R2 represents a C1-C6 alkyl group or the like; R3a, R3b, R3c, and R3d are identical to or different from each other, and each represent a C1-C6 chain hydrocarbon group or the like; R4a, R4b, R4c, R4d, and R4e are identical to or different from each other, and each represent a C1-C6 chain hydrocarbon group or the like; and n represents 0, 1, or 2.
    Type: Application
    Filed: September 29, 2021
    Publication date: January 11, 2024
    Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Ayano SHIMAMURA, Takayuki SHIODA, Takeshi TSURUDA, Risa KONO, Saki SATO
  • Publication number: 20240008488
    Abstract: A compound of formula (I) or its N-oxide, where Q is Q1; ? represents the binding site to the rest of molecule; Z represents an oxygen atom; A3 represents CR4b; B1 represents CR1; B2 represents CR6b; B3 represents CR6c; B4 represents CR6d; R6 represents a C1-C6 chain hydrocarbon group; G1 represents a nitrogen atom or CR3a; G2 represents a nitrogen atom or CR3b; G3 represents a nitrogen atom or CR3c; G4 represents a nitrogen atom or CR3d; R1 represents a C1-C6 chain hydrocarbon group optionally substituted with one or more substituent(s) selected from the group consisting of a cyano group and a halogen atom; R2 represents a C1-C6 alkyl group; R3a, R3b, R3c, R3d, R4b, R6b, R6c, and R6d are identical to or different from each other, and each represent a C1-C6 alkyl group optionally substituted with one or more halogen atom(s); and n represents 0, 1, or 2.
    Type: Application
    Filed: September 29, 2021
    Publication date: January 11, 2024
    Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Koichiro DOTA, Takayuki SHIODA, Ryota MAEHATA, Yasumasa SAITO
  • Publication number: 20240008489
    Abstract: A solid pesticidal composition comprises a compound represented by the following formula (I), a surfactant, and a solid carrier, wherein a water content is 0.3 wt % or more and 5.0 wt % or less.
    Type: Application
    Filed: November 30, 2021
    Publication date: January 11, 2024
    Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Atsushi OKA, Ai RUSU
  • Publication number: 20240008490
    Abstract: A liquid composition includes pesticidal active compounds, a hydrophobic organic solvent, a first surfactant, a second surfactant and water. The pesticidal active compounds are a first ingredient which is a compound of formula (I), and a second ingredient consisting of one or more pesticidal active compounds that differ from the first ingredient, are poorly water-insoluble, and are solid at a temperature of 25° C.
    Type: Application
    Filed: November 30, 2021
    Publication date: January 11, 2024
    Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventor: Iki TAKETANI
  • Publication number: 20240000081
    Abstract: Provided is a pesticidal composition comprising a compound represented by the formula (I), a herbicidal active salt, a surfactant and water, wherein a pH value at 25° C. is higher than 3.5 and lower than 8.8.
    Type: Application
    Filed: November 30, 2021
    Publication date: January 4, 2024
    Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Saki MATSUSHITA, Ai RUSU
  • Publication number: 20240004289
    Abstract: Disclosed are a salt represented by formula (1), an acid generator, and a resist composition: wherein Q1, Q2, R1 and R2 each represent a hydrogen atom, a fluorine atom, an alkyl group, etc.; z represents an integer of 0 to 6; X1 represents *—CO—O—, *—O—CO—, etc.; L1 and L2 each represent a single bond or an aliphatic hydrocarbon group; Ar1 represents an aromatic hydrocarbon group or a heterocyclic aromatic hydrocarbon group; R3 represents *—O— R10, *—O—CO—R10, etc., and R10 represents an acid-labile group; R4 represents a halogen atom, a haloalkyl group, or a hydrocarbon group; and m4 represents an integer of 0 to 8; and Z+ represent an organic cation.
    Type: Application
    Filed: June 20, 2023
    Publication date: January 4, 2024
    Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Katsuhiro KOMURO, Koji ICHIKAWA
  • Publication number: 20240000079
    Abstract: Provided is a liquid pesticidal composition having good storage stability at low temperatures. The liquid pesticidal composition comprises (a) a compound represented by the formula (I), (b) a solvent having a water solubility at 25° C. of 10 mass % or less, (c) a surfactant, and (d) 0.04 mass % or more and 3.30 mass % or less of water.
    Type: Application
    Filed: November 30, 2021
    Publication date: January 4, 2024
    Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventor: Takuya TANAKA
  • Patent number: 11862443
    Abstract: A sputtering target comprising a target material, wherein a sputtering face of the target material has a ramp provided to reduce a thickness of the target material at a position where erosion concentrates most intensively during sputtering.
    Type: Grant
    Filed: November 2, 2020
    Date of Patent: January 2, 2024
    Assignee: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Toshiaki Kuroda, Mikio Takigawa
  • Publication number: 20230418159
    Abstract: Disclosed are a carboxylate represented by formula (I), a carboxylic acid generator and a resist composition: wherein L1 and L2 each represent a single bond or a hydrocarbon group which may have a substituent, —CH2— included in the hydrocarbon group may be replaced by —O—, —S—, —SO2— or —CO—, Ar1 represents an aromatic hydrocarbon group or a heterocyclic aromatic hydrocarbon group, R3 represents *—O—R10, *—O—CO—R10, etc., R10 represents an acid-labile group, R4 represents a halogen atom, a haloalkyl group or a hydrocarbon group, the hydrocarbon group may have a substituent, —CH2— included in the haloalkyl group and the hydrocarbon group may be replaced by —O—, —CO—, —S— or —SO2—, m4 represents an integer of 0 to 8, and Z+ represents an organic cation.
    Type: Application
    Filed: June 20, 2023
    Publication date: December 28, 2023
    Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Katsuhiro Komuro, Koji Ichikawa
  • Publication number: 20230415087
    Abstract: Provided is a method for efficiently reducing carbon dioxide in a living space. This method for efficiently reducing carbon dioxide in a living space includes: a step for causing carbon dioxide to be adsorbed to a carbon dioxide adsorbent by bringing the carbon dioxide adsorbent into contact with a gas including moisture and carbon dioxide in a living space; a step for separating carbon dioxide from the carbon dioxide adsorbent by heating the carbon dioxide adsorbent having adsorbed thereto carbon dioxide to 50-900° C.; and a step for discharging the separated carbon dioxide to the outside of the living space. The carbon dioxide adsorbent contains: at least one alkali metal carbonate containing an alkali metal; and a metal compound containing at least one element selected from the group consisting of Group 3 elements in the periodic table and Group 4 elements in the periodic table.
    Type: Application
    Filed: December 14, 2021
    Publication date: December 28, 2023
    Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventor: Munehiro HAYASHI
  • Publication number: 20230413860
    Abstract: The present invention provides a pig feed which can increase a productivity of pork and can reduce a cold stress or a heat stress. The present invention provides also a pig feed comprising abscisic acid and/or its salt; a method for breeding a pig which comprises taking the pig feed to a pig; a method for preventing and/or improving the reduction of a productivity in a pig due to a cold and/or a heat; a method for increasing a feed efficiency in a pig; and a method for improving antioxidant potency of a pig by increasing a reduced glutathione in a body of a pig.
    Type: Application
    Filed: December 15, 2021
    Publication date: December 28, 2023
    Applicant: Sumitomo Chemical Company, Limited
    Inventors: Tsuyoshi Tonoue, Hiroshi Kojo, Makoto Anryu
  • Publication number: 20230413821
    Abstract: Provided is a liquid pesticidal composition having favorable stability of an emulsion when mixed with water. The liquid pesticidal composition comprises (a) a compound represented by the following formula (I), and (b) one or more organic solvents selected from the group consisting of butyl propionate, benzoic acid esters, dimethyl isosorbide, 2-heptanone, benzyl acetate and butylbiphenyl.
    Type: Application
    Filed: November 30, 2021
    Publication date: December 28, 2023
    Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Iki TAKETANI, Ai RUSU
  • Patent number: 11850558
    Abstract: The present invention provides a composition containing the following components (A)-(C): (A) an alkali metal compound, (B) a polymer having an acidic dissociative group, and (C) a compound having an acidic dissociative group and an amino group, and having ? of more than 0.0 and less than 1.0 as calculated by the formula (I): ?={amount (mol) of alkali metal in component (A)?amount (mol) of acidic dissociative group in component (B)}/amount (mol) of acidic dissociative group in component (C).
    Type: Grant
    Filed: September 12, 2019
    Date of Patent: December 26, 2023
    Assignee: Sumitomo Chemical Company, Limited
    Inventors: Shohei Kasahara, Kosuke Makiguchi, Taigo Kashiwabara
  • Patent number: 11856845
    Abstract: Compound A compound of formula (I): (I) wherein R1 and R2 are each independently a linear, branched or cyclic C1-20alkyl group; and Ar1 and Ar2 are each independently an aromatic or heteroaromatic group which is unsubstituted or substituted with one or more substituents. The compound may be used in n-doping of an organic semiconductor. Such an n-doped organic semiconductor may be used in an organic electronic device, for example an electron injection layer of an organic light-emitting device.
    Type: Grant
    Filed: December 20, 2018
    Date of Patent: December 26, 2023
    Assignee: Sumitomo Chemical Company Limited
    Inventors: Nazrul Islam, William Tarran, Jean-Benoit Giguere
  • Patent number: 11851558
    Abstract: There are provided a methacrylic resin composition capable of producing a molded article excellent in a Charpy impact strength, and the like. Provided is a methacrylic resin composition containing a methacrylic resin (A) and a methacrylic resin (B), and satisfying the following requirements (1) to (4): (1) each of the methacrylic resin (A) and the methacrylic resin (B) has a structural unit derived from a methacrylic acid ester, and a content of the structural unit derived from the methacrylic acid ester contained in the methacrylic resin composition is 98.0% by mass or more with respect to a total content of 100% by mass of all structural units contained in the methacrylic resin composition; (2) W1 is 10 to 25; (3) W2 is 3 to 15; and (4) a ratio (Mw/Mn) of a mass average molecular weight of the methacrylic resin composition to a number average molecular weight of the methacrylic resin composition is 2.0 to 3.2.
    Type: Grant
    Filed: March 24, 2021
    Date of Patent: December 26, 2023
    Assignee: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Ryosuke Okazaki, Makoto Manabe
  • Patent number: 11849728
    Abstract: The present invention provides a method for controlling a soybean rust fungus having an amino acid substitution of F129L on mitochondrial cytochrome b protein, by applying a compound represented by formula (I) [wherein Q represents a group represented by the following Q1, Q2, Q3, Q4 or Q5 (in the formulae, ? represents a binding site to benzene ring); X represents an oxygen atom or NH; L represents CH2, an oxygen atom or NCH3; E represents a C6-C10 aryl group, etc.; R1 represents a C1-C3 chain hydrocarbon group or a cyclopropyl group, etc.; R2 represents a C1-C3 chain hydrocarbon group or a cyclopropyl group, etc.; R3 represents a C1-C3 alkoxy group or a C1-C3 chain hydrocarbon group, etc.; and n is 0, 1, 2, or 3] or its N oxide or an agriculturally acceptable salt thereof.
    Type: Grant
    Filed: July 31, 2019
    Date of Patent: December 26, 2023
    Assignee: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Yuichi Matsuzaki, Hidekatsu Tobita, Hiroto Tamashima, Yuko Semba
  • Patent number: 11855247
    Abstract: This lithium-containing transition metal composite oxide includes secondary particles that are aggregates of primary particles into or from which lithium ions are dopable or dedopable, and satisfies the following conditions: (1) the lithium-containing transition metal composite oxide is represented by Formula (I), Li[Lix(Ni(1-y-z-w)CoyMnzMw)1-x]O2??(I) (2) from X-ray photoelectron spectroscopy, a specific ? is calculated for each of the surface of the secondary particle and the inside of the secondary particle, and when the ? value of the surface of the secondary particle is referred to as ?1 and the ? value of the inside of the secondary particle is referred to as ?2, ?1 and ?2 satisfy the condition of Formula (II). 0.3??1/?2?1.
    Type: Grant
    Filed: November 30, 2018
    Date of Patent: December 26, 2023
    Assignees: SUMITOMO CHEMICAL COMPANY, LIMITED, TANAKA CHEMICAL CORPORATION
    Inventors: Takashi Arimura, Kenji Takamori, Jun-Ichi Kageura, Yuichi Sato, Yusuke Maeda