Patents Assigned to Suzhou Maizheng Technology Co., Ltd.
  • Publication number: 20240392436
    Abstract: The present application discloses a method for cleaning a process chamber and an application thereof. The method for cleaning a process chamber includes: (a) turning on a remote plasma system, exciting a clean-process gas into plasma, and supplying remote plasma to the process chamber; (b) after operation of the remote plasma system reaches a stable state, turning on a radio-frequency power supply system in the process chamber, re-exciting and enhancing the remote plasma positioned in the process chamber by the radio-frequency power supply system, and using both the remote plasma system and the radio-frequency power supply system for jointly acting and cleaning the process chamber during a period of cleaning time; (c) when the cleaning of the process chamber is completed, firstly turning off the radio-frequency power supply system in the process chamber; and (d) then turning off the remote plasma system.
    Type: Application
    Filed: August 5, 2024
    Publication date: November 28, 2024
    Applicants: Suzhou Maxwell Technologies Co., Ltd., Suzhou Maizheng Technology Co., Ltd.
    Inventors: QINGYUAN QU, XUEYONG HE, JIAN ZHOU, ERCHENG WEN, XIANFEI FANG, DENGZHI WANG