Patents Assigned to United States of America as represented by the Director, National Security Agency The United
  • Patent number: 7442577
    Abstract: The present invention is a method of fabricating a patterned device using a sacrificial spacer layer. The first step in this process is to select an appropriate substrate and form a step thereon. The sacrificial layer is then applied to the substrate and a blocking layer is deposited on the sacrificial layer. The blocking layer is etched back to define the mask for the semiconductor structure and the sacrificial layer is removed. The substrate is then etched using the gap created by removal of the sacrificial layer.
    Type: Grant
    Filed: February 14, 2006
    Date of Patent: October 28, 2008
    Assignee: United States of America as represented by the Director, National Security Agency The United
    Inventors: John Leslie Fitz, Harris Turk