Abstract: The present invention provides a method and a system for pixelating a vector graphic into an image. First, a vector graphic defined by an arbitrary curve boundary is approximated as a vector graphic of a Manhattan structure, and then a fast algorithm is used to pixelate the approximate Manhattan vector graphic into a two-dimensional image. A process of moving quadrant planes to superimpose on vertices of the vector graphic is replaced with convolution of an image resulting from a template rectangle image and Dirac pulse functions of the vertices of the vector graphic, and a pixelated image of this vector graphic is obtained through convolution of the template rectangle and a sparse image composed of Dirac pulses located at the positions of the vertices of the vector graphic.

Abstract: Light source calibration methods and systems employed in source mask optimization are provided. The method includes: initializing a light source pattern and a mask pattern; using an SMO algorithm to iteratively optimize the light source pattern and the mask pattern; using a pre-established light source error correction model to correct the light source pattern after each iterative optimization, and updating the light source pattern after each iterative optimization with a corrected light source pattern in a current iteration process. The light source error correction model is established according to an input and output data set consisting of an input target light source pattern and an output actual light source pattern of a PIS. The method includes determining, according to an evaluation criterion or a condition of convergence of iteration of the SMO algorithm, whether the optimization meets a requirement.

Abstract: A method and a system for correcting lithography process hotspots based on stress damping adjustment are provided. The method includes: acquiring a mark hotspot of a mask pattern; forming N annuli centered on the mark hotspot from inner to outer on a mask; moving vertexes of the mask pattern located in each annulus by a specific distance in a direction deviating from the mark hotspot and connecting the moved vertexes according to an original connection relationship to acquire an updated layout; verifying electrical characteristics of the updated layout, determining whether a deviation of the electrical characteristics of the updated layout is within a tolerable range, and performing geometric correction to compensate for a deviation of electrical parameters if no is determined and then ending correction, or ending the correction if yes is determined.