Abstract: A method of controlling wash equipment in an automated vehicle wash system having a conveyor includes, measuring one or more contours of a vehicle as the vehicle moves thorough an entry area of the automated vehicle wash system on the conveyor; tracking the distance a fixed point relative to the conveyor moves; associating the one or more contours of the vehicle with the position of the fixed point; determining, based on the one or more contours of the vehicle and the position of the fixed point, commands for operating the wash equipment; delivering the commands to the wash equipment; and operating the wash equipment in accordance with the commands.

Abstract: A debris collection and metrology system for collecting and analyzing debris from a tip used in nanomachining processes, the system including an irradiation source, an irradiation detector, an actuator, and a controller. The irradiation source is operable to direct incident irradiation onto the tip, and the irradiation detector is operable to receive a sample irradiation from the tip, the sample irradiation being generated as a result of the direct incident irradiation being applied onto the tip. The controller is operatively coupled to an actuator system and the irradiation detector, and the controller is operable to receive a first signal based on a first response of the irradiation detector to the sample irradiation, and the controller is operable to effect relative motion between the tip and at least one of the irradiation source and the irradiation detector based on the first signal.

Abstract: A substrate treatment device according to an embodiment includes: a liquid treatment part configured to supply a liquid onto a substrate to form a liquid film remaining in a liquid state on the substrate; an imaging part configured to capture an image of a front surface of the substrate, on which the liquid film remaining in the liquid state is formed; a determination part configured to determine a quality of a formation state of the liquid film based on the captured image of the substrate; and a post-treatment part configured to treat the substrate on which the liquid film is formed, when the determination part determines that the formation state of the liquid film is good.

Abstract: A cleaning process (blasted-particles cleaning process) includes performing, a plural number of consecutive cycles, an ultrasonic cleaning treatment including immersing a turbine rotor blade in a water basin and conducting an ultrasonic wave into the water basin to clean the turbine rotor blade, and a pressurized-water cleaning treatment including spraying pressurized water into an internal cooling flow channel after the ultrasonic cleaning treatment is performed. The cleaning process is performed after a bonding coat layer removing process of removing a bonding coat layer (first coating layer) by chemical treatment, and a cleaning process of cleaning the turbine blade by blast treatment. Heat tinging process is then performed.

Abstract: A substrate processing apparatus includes a liquid processing tank, a movement mechanism, an ejector, and a controller. The liquid processing tank stores a processing liquid. The movement mechanism moves a plurality of substrates immersed in the liquid processing tank to a position above the liquid surface of the processing liquid. The ejector ejects a vapor of an organic solvent toward portions of the plurality of substrates that are exposed from the liquid surface. The controller changes an ejection flow rate of the vapor ejected by the ejector as the plurality of substrates are moved up.

Abstract: Embodiments of the present disclosure generally include apparatus and methods for removing adhesive residues from a surface of a lithography mask. In particular, the processing systems described herein provide for the delivery of a solvent to a discrete plurality of locations on the surface of the lithography mask to facilitate the removal of adhesive residue therefrom. In one embodiment, a method of processing a substrate includes positioning the substrate on a substrate support of a processing system, sealing individual ones of a plurality of cleaning units to a surface of the substrate at a corresponding plurality of locations, heating a cleaning fluid to a temperature between about 50° C. and about 150° C., flowing the cleaning fluid to, and thereafter, from, the plurality of cleaning units, and exposing the surface of the substrate to the cleaning fluid at the plurality of locations.

Abstract: A cleaning device is provided that includes a handle and a cleaning implement depending from the handle. The cleaning implement has a wiper including a plurality of ridges and a flexible region. The plurality of ridges provide a plurality of cleaning edges to the wiper and the flexible region secures the wiper to the handle.

Abstract: A sealing system of a turbomachine for sealing a rotor of the turbomachine relative to a stator of the turbomachine, having a rotor-side component rotating together with the rotor, a stator-side component that is stationary together with the stator, and a dry gas seal, which includes a rotor-side sealing component and a stator-side sealing component compressed via a spring element forming a sealing gap, and a cleaning device, via which detergent is conducted in the direction of the spring element for cleaning the same and/or in the direction of the sealing gap for cleaning the same.

Abstract: A cleaning device for selectively applying a first medium to a surface includes a high pressure reservoir configured to store the first medium held under a storage pressure, a pulse nozzle configured to apply the first medium under the storage pressure in a pulsed manner to the surface, and a switching valve that includes a nozzle port and a high pressure reservoir port for selectively establishing a first connection between the high pressure reservoir and the pulse nozzle, and a feed port for establishing a second connection between the high pressure reservoir and a first medium source. The high pressure reservoir and the switching valve are structurally integrated in a reservoir valve module. The switching valve comprises a solenoid valve to switch between the first and the second connection when the high pressure reservoir port is under the storage pressure.

Abstract: An ultrasonication apparatus is provided for improving catheter function. The ultrasonication apparatus includes a transducer configured to produce ultrasonic waves for ultrasonication and a chamber for containing a fluid having a passage for receiving a catheter. The chamber is adapted to receive the ultrasonic waves from the transducer.

Abstract: The inventive concept relates to a dissolved ozone removal unit, a substrate treating apparatus including the same, and a substrate treating method. The dissolved ozone removal unit includes a fluid channel providing member having a fluid channel through which a processing liquid passes and a light source member that is mounted in the fluid channel providing member and that supplies UV light to the processing liquid, and the fluid channel providing member includes a helical fluid channel configured such that the processing liquid is exposed to the UV light while helically moving around the light source member.

Abstract: A wafer cleaning module and a method for cleaning a wafer with the wafer cleaning module are disclosed. For example, the wafer cleaning module includes a wafer chuck to hold a wafer, an ozone source to provide ozone gas towards the wafer, and an ultraviolet (UV) lamp module to provide UV light. The UV lamp module includes a UV light source and a rotatable reflector around the UV light source. The rotatable reflector is movable to adjust an amount of UV light directed towards a surface of the wafer.

Abstract: The inventive concept relates to an apparatus for treating a substrate. The apparatus includes a support unit that supports the substrate and a nozzle unit having a nozzle that dispenses a chemical onto the substrate, in which the nozzle is connected with a ground line, and a variable resistor is provided on the ground line.

Abstract: To dry a substrate formed with a pattern on a front surface satisfactorily and with excellent drying performance, a substrate processing method comprises: a liquid film formation step of forming a liquid film of a processing liquid, in which cyclohexanone oxime is dissolved in a solvent, on a front surface of a substrate formed with a pattern by supplying the processing liquid to the front surface of the substrate; a solidified film formation step of forming a solidified film of the cyclohexanone oxime by solidifying the liquid film of the processing liquid; and a sublimation step of removing the solidified film from the front surface of the substrate by sublimating the solidified film.

Abstract: 3D-printed parts may include binding agents to be removed following an additive manufacturing process. A debinding process removes the binding agents by immersing the part in a solvent bath causing chemical dissolution of the binding agents. The time of exposure of the 3D-printed part to the solvent is determined based on the geometry of the part, wherein the geometry is applied to predict the diffusion of the solvent through the 3D-printed part. The 3D-printed part is then immersed in the solvent bath to remove the binding agent, and is removed from the solvent bath after the time of exposure.

Abstract: A dosing method for dosing a chemical product, particularly a detergent, in a dishwasher includes detecting a first loading signal of a washing liquid in a washing tank of the dishwasher; dosing a first quantity of chemical product in the washing liquid to obtain a washing mixture; detecting a conductivity value of the washing mixture at a first loading condition of the dishwasher; storing a conductivity threshold value equal to the conductivity value of the washing mixture at a first loading condition; and dosing of a further quantity of chemical product in the washing mixture at an operation condition of the dishwasher in such a way to adjust a further conductivity value of the washing mixture detected in the operating condition until reaching the conductivity threshold value.

Abstract: A debris collection and metrology system for collecting and analyzing debris from a tip used in nanomachining processes, the system including an irradiation source, an irradiation detector, an actuator, and a controller. The irradiation source is operable to direct incident irradiation onto the tip, and the irradiation detector is operable to receive a sample irradiation from the tip, the sample irradiation being generated as a result of the direct incident irradiation being applied onto the tip. The controller is operatively coupled to an actuator system and the irradiation detector, and the controller is operable to receive a first signal based on a first response of the irradiation detector to the sample irradiation, and the controller is operable to effect relative motion between the tip and at least one of the irradiation source and the irradiation detector based on the first signal.

Abstract: The inventive concept relates to an apparatus and method for forming a film on a substrate by spin coating. The apparatus includes liquid dispensing units that dispense processing liquids to form liquid films on the first and second substrates, respectively, air-flow supply units that form downward air flows in the first and second spaces, respectively, and a controller that controls the liquid dispensing units and the air-flow supply units. Each of the liquid dispensing units includes a pre-treatment nozzle that dispenses a pre-treatment liquid and a coating solution nozzle that dispenses a coating solution onto a corresponding one of the first and second substrates. The controller controls the liquid dispensing units to dispense the pre-treatment liquids and thereafter the coating solutions onto the first and second substrates and adjusts supply states of the downward air flows according to amounts of the pre-treatment liquids dispensed.

Abstract: A cleaning device is described. In one embodiment, the cleaning device includes a cleaning member; a moving portion, a measurement portion, and a controller. The controller performs a reset operation in which the cleaning member is pressed against the reference member before cleaning, a cleaning member is moved in a direction away from the reference member after the measured value of the measurement portion reaches a predetermined reset load, when the measurement values of the measurement portion for each unit movement amount of the cleaning member become equal to each other at least twice consecutively, a position of the cleaning member at the time is set as a reference position of the cleaning member at the time of cleaning, and the measurement value of the measurement portion at the time is set as a pressing reference value at the time of cleaning.

Abstract: A wheel cleaning device (10) for cleaning vehicle wheels (12) having a rim and a tyre mounted on said rim is disclosed. The cleaning device (10) comprising a wheel cleaning zone (15) and a wheel conveying system (20) for conveying the wheels (12) to and from the wheel cleaning zone (15). The wheel conveying system comprises at least one vertically displaceable wheel engaging element (21, 22), and a wheel conveyor (20) extending at least partially in a horizontal direction, wherein the wheel conveying system is arranged for conveying wheels (12) individually, in consecutive order and in a lying position from a stack (14) of wheels (12) to the wheel cleaning zone (15) at least partially in the horizontal direction and then from the wheel cleaning zone (15) at least partially in the horizontal direction to output a stack (14) of cleaned wheels (12).