Patents Examined by Bernard F. Plantz
  • Patent number: 4535721
    Abstract: A process for making stacked high voltage rectifiers includes initially doping a plurality of silicon wafers with paint-on dopants applied with an applicator that is gradually moved from the center to the outer edge of each wafer while the wafer is peripherally supported and rotated sufficiently slowly to prevent spin-off and runover of each dopant onto the reverse side of the wafer. The dopants are driven in by heating in a diffusion furnace. The same slow rotation and moving applicator technique then is used to coat only the N-doped side of the wafer with a paint-on noble metal dopant. The noble metal is driven in using a diffusion furnace at a temperature that is selected in accordance with the measured reverse recovery time of the wafer prior to noble metal diffusion.The wafers are silver coated and stacked, and a compression jig is used to exert compressive force on the stack while it is heated in a alloying furnace to a temperature sufficiently high to cause "wetting" of the silver.
    Type: Grant
    Filed: March 16, 1984
    Date of Patent: August 20, 1985
    Assignee: California Linear Circuits, Inc.
    Inventor: John Yakura
  • Patent number: 4534314
    Abstract: In a vacuum system for processing workpieces, a vacuum chamber has a workpiece-entrance opening. Load lock means for said entrance opening include a door for sealing the outside of said opening, a movable closure member within the chamber to seal the entrance opening from the interior of the vacuum chamber, and forming a load lock chamber when the door and closure member are both in closed positions. The load lock chamber is connected to a roughing pump and is separately connected to a high vacuum pump through a pumping opening in one or the other of said internal closure member or said door. A large aperture valve is provided in said pumping opening. In one embodiment said pumping opening is connected via suitable conduits and valves to a roughing pump and also to a high vacuum pump.
    Type: Grant
    Filed: May 10, 1984
    Date of Patent: August 13, 1985
    Assignee: Varian Associates, Inc.
    Inventor: James W. Ackley
  • Patent number: 4534312
    Abstract: A vacuum evaporation apparatus for depositing an evaporant as a thin film on a substrate comprises a sealed container including a substrate support for mounting thereon the substrate. A heat medium such as of diphenyl, for example, is filled in the substrate support. The heat medium in the substrate support is supplied with heat by a heater. When heated, the heat medium is vaporized and the vapor gas having absorbed heat of evaporation is moved quickly from a high-temperature region to a low-temperature region. The vapor gas in the low-temperature region is supersaturated and turned into the heat medium liquid. The heat energy born as latent heat by the vapor gas is given off to heat the substrate support uniformly. With this thermosiphon action, the substrate can be heated through the substrate support so as to have a uniform overall temperature distribution for forming a uniformly deposited thin film on the substrate surface.
    Type: Grant
    Filed: August 30, 1983
    Date of Patent: August 13, 1985
    Assignee: Ricoh Company, Ltd.
    Inventors: Ryohei Shinya, Shin'ichi Miura, Rikio Aozuka
  • Patent number: 4532888
    Abstract: Electron-beam (EB) coating of broad strips with improved film quality, and without undue scattering and deflection of the electron beam at long beam paths is accomplished with a shielding mantle, placed between the EB gun and the evaporation crucible, providing vacuum-tight shielding of the beam path from the coating chamber.
    Type: Grant
    Filed: July 29, 1983
    Date of Patent: August 6, 1985
    Assignee: Bakish Materials Corp.
    Inventors: Manfred Neumann, Henry Morgner, Harry Forster, Gunter Jasch, Wilfried Kunack, Martin Godenschweg, Peter Unganz
  • Patent number: 4531475
    Abstract: An article decorating device, particularly for the decorating of eggs, having a formed, article receiving and cushioning surface, a slotted and formed or formable template receivable over the article to be decorated and a cover member arranged to be positioned over the article and template to positively hold the same in position with respect to one another and to the receiving surface during the decorating process. The template is selectively provided with apertures or slots therethrough to permit decorating devices such as pens to extend therethrough for contacting and applying decorating materials to the article.
    Type: Grant
    Filed: April 11, 1984
    Date of Patent: July 30, 1985
    Assignee: Spearhead Industries, Inc.
    Inventor: Gerald D. Thill
  • Patent number: 4530750
    Abstract: Vitreous optical fibers are useful in an expanding number of technologies. A process, corresponding apparatus, and a hermetically sealed fiber of the above nature are disclosed wherein high energy ionized plasmas are used in a continuous production of a coated vitreous optical fiber. Drawn fibers are axially aligned by ambient gases discharging through high vacuum gas locks. These fibers are then continuously fed through a high energy plasma zone so that the surface of the drawn fiber is subjected to ionized bombardment. This provides plasma-milling of the fiber surface for improving the fiber strength and for superior bonding of subsequently applied coatings.In preferred practice, a vacuum zone is used to deposit, from a plasma ion source, a diamond-like elemental carbon film onto the moving fiber. Another plasma vacuum zone may be used to deposit, over the carbon film, a very thin film of a conductive elemental metal illustratively; tin, indium and aluminum.
    Type: Grant
    Filed: September 10, 1984
    Date of Patent: July 23, 1985
    Assignee: A. S. Laboratories, Inc.
    Inventors: Sol Aisenberg, Martin L. Stein
  • Patent number: 4529028
    Abstract: A resin-bonded sand core for high-pressure die casting methods having a first refractory coating, such as of silica, with an inorganic binding agent of colloidal silica and a clay such as kaolin, and a second or top coating of a refractory material containing zircon and an organic binding agent, which combination of these two different coatings enables the bonded sand core to have high pressure and temperature resistance, good washout resistance, freedom from surface penetration, and good shake-out properties.
    Type: Grant
    Filed: May 9, 1983
    Date of Patent: July 16, 1985
    Assignee: Farley Metals, Inc.
    Inventors: Charles J. Dybala, John J. Maczko
  • Patent number: 4528939
    Abstract: The present invention is directed to a containment vessel which is particularly useful in melting aluminum. The vessel of the present invention is a multilayered vessel characterized by being electrically conductive, essentially nonwettable by and nonreactive with molten aluminum. The vessel is formed by coating a tantalum substrate of a suitable configuration with a mixture of yttria and particulate metal borides. The yttria in the coating inhibits the wetting of the coating while the boride particulate material provides the electrical conductivity through the vessel. The vessel of the present invention is particularly suitable for use in melting aluminum by ion bombardment.
    Type: Grant
    Filed: June 25, 1984
    Date of Patent: July 16, 1985
    Assignee: The United States of America as represented by the United States Department of Energy
    Inventors: Cressie E. Holcombe, Donald G. Scott
  • Patent number: 4526131
    Abstract: A magnetic recording medium manufacturing apparatus is comprised of a cooling rotary cylinder can and a small roller, arranged adjacent to each other, and with the small roller being swingable about the central axis of the can. A flexible endless belt is laid over the can and roller and carries a tape-shaped support. A ferromagnetic material, evaporated from an evaporation source disposed below the can and roller, is vacuum-deposited onto the tape-shaped support.
    Type: Grant
    Filed: March 8, 1984
    Date of Patent: July 2, 1985
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Ryuji Shirahata, Masaru Sekine, Goro Akashi
  • Patent number: 4526129
    Abstract: Miniature electronic component parts such as capacitors or resistors are end conductively coated by use of a part handling plate having a multiplicity of passageways therethrough with walls coated by resilient material to grip the parts. A bank of pins in a press (a) are used to move the parts in the passageways, (b) are used to load the parts into the passageways through the use of a loading plate housing part receiving openings filled with parts by the use of vibration equipment, and (c) are used to discharge the parts from the passageways into the recesses of an unloading plate. The parts are moved in the passageways first to expose one end to be coated and then second to expose the other end of the parts to be coated.
    Type: Grant
    Filed: October 22, 1981
    Date of Patent: July 2, 1985
    Assignee: Palomar Systems & Machines, Inc.
    Inventor: Denver Braden
  • Patent number: 4526802
    Abstract: This film deposition equipment is arranged so that metal is evaporated in atmosphere including reactive gas introduced in a vacuum, and pressure variation of the reactive gas caused by the metal evaporation is detected to know and control metal evaporation amount.
    Type: Grant
    Filed: March 31, 1983
    Date of Patent: July 2, 1985
    Assignee: Clarion Co., Ltd.
    Inventor: Kazuo Sato
  • Patent number: 4526132
    Abstract: An apparatus for performing deposition on a substrate wherein the discharger is disposed in an outwardly protruding portion of the vacuum chamber. The discharger is positioned in this outwardly protruding portion so that it is isolated from the evaporation space and directed away from both the substrate and evaporation space. The discharger comprises a gas introduction tube with a discharge electrode surrounding this tube.
    Type: Grant
    Filed: November 22, 1983
    Date of Patent: July 2, 1985
    Assignee: Konishiroku Photo Industry Co., Ltd.
    Inventor: Tatsuo Ohta
  • Patent number: 4524718
    Abstract: Apparatus for continuous of mixing two reactants in proximity to an object upon which a reaction product is to be coated continuously and uniformly means is provided for maintaining reactants from premature contact. The reactant-feed holes are placed at a distance above the surface to be coated to optimize the combination of manufacturing practicality and the precision with which the holes can be economically formed.
    Type: Grant
    Filed: August 10, 1983
    Date of Patent: June 25, 1985
    Inventor: Roy G. Gordon
  • Patent number: 4525381
    Abstract: In a photochemical vapor deposition apparatus, a reaction space in which a substrate is to be placed and a discharge space adjacent to the reaction space, in which electric plasma discharge is generated for radiating ultraviolet rays which cause photochemical decomposition reaction of a photoreactive gas, are surrounded by the same vessel, and discharging electrodes are provided in the discharge space so as to be opposite to each other in a first level and a second level, which are different in level in the direction in which the spaces align. The discharging electrode arranged in the first level, which is closer to the reaction space, has such a configuration or arrangement that an ultraviolet ray-passing opening is formed.According to the apparatus, a vapor-deposited film can be formed with high efficiency, because a large quantity of ultraviolet rays can be applied to the substrate without any damage of the vapor-deposited film.
    Type: Grant
    Filed: December 29, 1983
    Date of Patent: June 25, 1985
    Assignee: Ushio Denki Kabushiki Kaisha
    Inventors: Kazuya Tanaka, Shinji Sugioka
  • Patent number: 4524717
    Abstract: The present invention is a coating apparatus for temperature-sensitive broad strips or similar substrates. To obtain a high quality of coating, it is necessary to minimize the path of the electron beam (EB) through the vapor cloud, and to keep away backscattered electrons from the evaporating material. According to the invention, this problem is solved by assembling a sector field with a vertical field direction at the deflection system connected with the EB gun, which is followed by a deflection field with a horizontal field direction. The divergent electron beam is guided in lines to the evaporating material by the geometry of the fields.
    Type: Grant
    Filed: April 18, 1983
    Date of Patent: June 25, 1985
    Assignee: Bakish Materials Corp.
    Inventors: Manfred Neumann, Siegfried Schiller, Gerhard ZeiBig, Henry Morgner, Gunter Jasch
  • Patent number: 4525382
    Abstract: In a photochemical vapor deposition apparatus comprising a reaction space, which forms a passage for a photoreactive gas and in which a substrate is to be placed, and a discharge space, in which electric plasma discharge is generated for radiating ultraviolet rays which cause photochemical reaction of the photoreactive gas, both the spaces being surrounded by the same vessel, discharging electrodes arranged opposite one another with said discharge space therebetween, and a grid comprising a wire-netting of metal interposed between the discharge space and the reaction space, to which grid is applied a voltage of positive potential.This photochemical vapor deposition apparatus can achieve photochemical vapor deposition with high efficiency, because the diffusion of plasma into the reaction space is interrupted by the grid so that the substrate is permitted to be placed at a position closer to an ultraviolet ray source and ultraviolet rays of larger intensity are applied to the substrate.
    Type: Grant
    Filed: December 29, 1983
    Date of Patent: June 25, 1985
    Assignee: Ushio Denki Kabushiki Kaisha
    Inventor: Shinji Sugioka
  • Patent number: 4524719
    Abstract: A controlled temperature deposition device comprising an inner reaction chamber having gas distribution means for introducing gas into inner chamber and removing gas therefrom and a vacuum chamber means surrounding the inner deposition chamber and spaced from the walls thereof for maintaining a medium vacuum therein. Associated with the deposition device is a substrate loading and unloading fork which transfers substrates such as wafer boats from outside the device to a position in the inner deposition chamber and removes them from the inner deposition chamber following deposition.
    Type: Grant
    Filed: September 6, 1983
    Date of Patent: June 25, 1985
    Assignee: Anicon, Inc.
    Inventors: Bryant A. Campbell, Dale R. DuBois, Ralph F. Manriquez, Nicholas E. Miller
  • Patent number: 4523544
    Abstract: A thin amorphous film-forming apparatus comprising a plurality of discharge unit chambers connected in a loop, each provided with a glow discharge generating means and a space for storing a substrate, gas supply and discharge valves are provided between the unit chambers, and means for periodically changing the opening and closing of the valves.
    Type: Grant
    Filed: March 5, 1984
    Date of Patent: June 18, 1985
    Assignee: Tokyo Shibaura Denki Kabushiki Kaisha
    Inventors: Nozomu Harada, Hiroshi Ito, Toshikazu Adachi
  • Patent number: 4522149
    Abstract: A reactor for use in a chemical vapor deposition process occurring in a radiant absorption heater system employs a vertical gas flow reaction vessel and a novel substantially solid susceptor configured as a truncated wedge. The susceptor is characterized by a high utilized area, resulting in a high wafer capacity and low power requirement.
    Type: Grant
    Filed: November 21, 1983
    Date of Patent: June 11, 1985
    Assignee: General Instrument Corp.
    Inventors: Dennis Garbis, Joseph Y. Chan, Amedeo J. Granata, Robert C. Heller
  • Patent number: 4520753
    Abstract: A motor driven egg lathe, which may be in a self-storing container, and which maintains the functional relationship of the internal elements by embedding them in a cellular polymeric block.
    Type: Grant
    Filed: April 27, 1984
    Date of Patent: June 4, 1985
    Assignees: John F. Hinkle, Jr., Wendell B. Stockdale
    Inventor: Robert E. Breuninger