Abstract: A microcrystalline starch-based product comprising microcrystalline starch, glucose and short chain glucooligosaccharides and having an average particle size of less than about 10 .mu., and a process for making the microcrystalline starch-based product consisting of optionally debranching, retrograding and hydrolyzing a starch are disclosed. Also disclosed are food formulations comprising the microcrystalline resistant starch-based product.

Abstract: A method for producing cardable, hydrophobic polyolefin-based staple fibers by applying to spun filaments a first spin finish comprising at least one cationic antistatic agent, in particular a quaternary ammonium salt, stretching the filaments, applying to the stretched filaments a second spin finish in the form of a dispersion comprising at least one hydrophobic lubricant selected from a fatty acid amide condensation product and a hydrocarbon wax, the second spin finish optionally further comprising a polydiorganosiloxane in an amount of up to 15% by weight, and crimping, drying and cutting the filaments to obtain staple fibers; as well as textured, cardable, polyolefin-based staple fibers prepared by the method and hydrophobic nonwoven materials produced from such fibers.

Abstract: A process for novel sphingolipids and other secondary sphingosine-based compounds is provided which comprises the culturing of an appropriate fungus, harvesting mycelium from the fungus and isolating the sphingolipid from the mycelium. The sphingosine-based materials inhibit protein kinase C, provide an anti-inflammatory effect or provide an anti-tumor effect; furthermore, these sphingosine-based materials provide protection for plants against pathogenic microorganisms.

Abstract: The present invention provides a method of delivering an emulsion or suspension containing a supersaturated gas into a gas-depleted environment. The method generally comprises the steps of preparing an emulsion or suspension, exposing the emulsion or suspension to a gas at a pressure greater than 2 bar, and delivering the emulsion or suspension to a gas-depleted environment at ambient pressure.

Abstract: A method of assaying normal aglycans and an assaying kit therefor, which method comprises separating normal aglycans having an avidity for hyaluronic acid and present in a specimen from proteoglycans not having such an avidity and detecting only the normal aglycans. The separated normal aglycans are detected by the technique of detecting proteoglycans. The specimen is preferably a joint fluid originating in the joint as the target of judgement.

Abstract: A flavorant agent is prepared by incubating a medium of baker's yeast, elemental sulfur and a reducing sugar to obtain a reaction medium from which hydrogen sulfide gas evolves and then the reaction medium is treated with heat to obtain the flavorant agent. A further flavorant agent is obtained by separating the supernatant of the reaction medium from reaction medium residue, and the reaction medium or supernatant may be mixed with a flavor precursor material and heated to obtain a flavorant composition.

Abstract: A plasma processing apparatus includes a processing vessel for accommodating an object to be processed, a processing supplying mechanism for supplying processing gas into the processing vessel, first and second electrodes arranged to oppose each other in the processing vessel, and high-frequency power supply for supplying a high-frequency power to at least one of the first and second electrodes. The apparatus forms a plasma of the processing gas by using discharge occurring between the first and second electrodes due to the high-frequency power and performs a plasma process for the object by using the plasma. The surface of a solid except for the object to be processed in the processing vessel has a corner portion and a portion other than the corner portion, and the solid surface has a shape by which the thickness of a sheath formed between the solid surface and the plasma is nearly uniform in the corner portion and the other portion.

Abstract: Specific primers that amplify a portion of the 3'-noncoding regions of dengue virus types 1, 2, 3 and 4, and a method of using these primers in a rapid reverse transcriptase-polymerase chain reaction (RT-PCR) for specific detection of dengue viruses, but not other flaviviruses, is disclosed.

Abstract: The present invention relates to a process for the dispersion of at least one pulverulent organic filler and/or of at least one pulverulent inorganic filler in a vehicle composed of at least one fatty phase, by mixing the filler or fillers in the vehicle by high-pressure homogenization in one or a number of passes, to the cosmetic or dermatological compositions capable of being obtained by this process. The present invention also relates to the use of the compositions obtained by this process as the basis for care, make-up and/or hygiene products. The present invention also relates to the use of the compositions obtained by this process as the basis for products for protecting the skin, hair, scalp, nails, eyelashes, eyebrows and/or mucous membranes against the effects of ultraviolet radiation.

Abstract: The present invention provides systems, methods and apparatus for high temperature (at least about 500-800.degree. C.) processing of semiconductor wafers. The systems, methods and apparatus of the present invention allow multiple process steps to be performed in situ in the same chamber to reduce total processing time and to ensure high quality processing for high aspect ratio devices. Performing multiple process steps in the same chamber also increases the control of the process parameters and reduces device damage. In particular, the present invention can provide high temperature deposition, heating and efficient cleaning for forming dielectric films having thickness uniformity, good gap fill capability, high density, low moisture, and other desired characteristics.

Abstract: The present invention describes a method for forming submicron critical dimension shallow trenches with improved etch selectivity and etch bias control. In one embodiment of the present invention, three separate etch steps are performed. A polish stop layer (or an etch hard mask layer) and an oxide layer are etched during the first and second etch steps and the underlying substrate is etched during the third etch step. In the first etch step a carbon-fluorine based etchant is used in order to form a polymer layer along the photoresist, polish stop layer (or etch hard mask layer), and oxide layer. After the first etch step, a second etch step is used to remove the polymer from the horizontal surfaces of the semiconductor structures thereby forming polymer sidewalls as well as completing the etching of the polish stop layer (or etch hard mask layer) and the oxide layer.

Abstract: The invention relates to a method of treating sleep disorders in a patient in need thereof comprising the administration of a hypnotically effective amount of a non-allosteric GABA.sub.A agonist.

Abstract: The invention features a purified nucleic acid that encodes a member of the hepadnavirus family of cellular receptors. The receptor is a 170 kD cell surface glycoprotein, and is referred to as the p170 receptor. The pre-S domain of the duck hepatitis B virus envelope protein binds the p170 receptor at a major neutralizing epitope, within which are two basic amino acids required for virion-receptor interaction.

Abstract: A cleaning apparatus (10) is disclosed for cleaning electronic components within JEDEC or Auer containers (59). The containers with electronic components and assemblies therein are conveyed through the apparatus by a conveyor assembly (18). A manifold assembly (16) defining precision planar surfaces (60) establishes a predetermined separation, preferably 0.020 inches, between the manifolds and the tops (57) of the containers (59) to prevent the electronic components and assemblies from being lifted out of the containers under the influence of the washing and rinsing operation The manifolds have apertures formed therethrough for spraying the washing and rinsing fluids and drying gases onto the electronic components and assemblies.

Abstract: Method for semiconductor processing comprising etching of oxide layers, especially etching thick SiO.sub.2 layers and/or last step in the cleaning process wherein the oxide layers are etched in the gas phase with a mixture of hydrogen fluoride and one or more carboxylic acids, eventually in admixture with water.

Abstract: The present invention provides a method of delivering an emulsion or suspension containing a supersaturated gas into a gas-depleted environment. The method generally comprises the steps of preparing an emulsion or suspension, exposing the emulsion or suspension to a gas at a pressure greater than 2 bar, and delivering the emulsion or suspension to a gas-depleted environment at ambient pressure.

Abstract: A lower insulating member 13 is arranged around a suscepter 6 as a lower electrode, and an upper insulating member 31 is arranged around an upper electrode 21. An outer end portion 31a of the upper insulating member is positioned outside an lower insulating member 13, to be lower than the upper surface of a wafer W. The narrowest distance between the lower insulating member 13 and the upper insulating member 31 is arranged to be smaller than a gap G between electrodes. Diffusion of a plasma generated between electrodes is restricted and prevented from spreading to the sides, so that inner walls of a processing container 3 are not sputtered.

Abstract: A liposome or microsphere containing guaiac or other reagent is used in an immunoassay to detect an antigen or antibody. The guaiac or other reagent reacts with hemoglobin or other blood constituent to produce color indicating a positive result.

Abstract: A photo-catalyzer for deodorizing, cleaning, sterilizing, and water purifying operations includes a substrate, a titanium dioxide film disposed on the substrate and functioning as a photo-catalyst, and a light-emitting diode disposed adjacent to the titanium dioxide film and producing ultraviolet light having a wavelength from 360 to 400 nm onto the titanium dioxide film. The photo-catalyzer can be used in places where there is no sunlight because it is optionally provided with a light-emitting diode. The light-emitting diode does not require a large installation space because it is an extremely small light-emitting device. Hence, the photo-catalyzer has a compact structure and can be used easily anywhere, including small places. The substrate can be fabricated into a variety of useful appliances to take advantage of the strong oxidizing properties of the photo-catalyzer.

Abstract: A silicon wafer is held in an airtight chamber by a silicon wafer holder. The silicon wafer holder is cooled by a cooler. High purity nitric acid is stored in a storage container disposed in the airtight container. The storage container is heated by a heater, thereby producing nitric acid gas. The nitric acid gas is condensed on the surface of the silicon wafer so that a thin film is formed. Thus, the surface of the silicon wafer is rendered hydrophilic. Thereafter, high purity hydrofluoric acid is dropped on high purity nitric acid in the storage container by an acid dropper, thereby producing hydrofluoric acid gas. By introducing the hydrofluoric acid gas into the thin film formed on the surface of the silicon wafer, an etching is performed while maintaining the surface of the silicon wafer in a good condition.