Patents Examined by Christina D McClure
  • Patent number: 10526701
    Abstract: Methods of depositing uniform films on substrates using multi-cyclic atomic layer deposition techniques are described. Methods involve varying one or more parameter values from cycle to cycle to tailor the deposition profile. For example, some methods involve repeating a first ALD cycle using a first carrier gas flow rate during precursor exposure and a second ALD cycle using a second carrier gas flow rate during precursor exposure. Some methods involve repeating a first ALD cycle using a first duration of precursor exposure and a second ALD cycle using a second duration of precursor exposure.
    Type: Grant
    Filed: July 30, 2015
    Date of Patent: January 7, 2020
    Assignee: Lam Research Corporation
    Inventors: Purushottam Kumar, Adrien LaVoie, Hu Kang, Jun Qian, Tuan Nguyen, Ye Wang
  • Patent number: 10513772
    Abstract: Methods are disclosed herein for depositing a passivation layer comprising fluorine over a dielectric material that is sensitive to chlorine, bromine, and iodine. The passivation layer can protect the sensitive dielectric layer thereby enabling deposition using precursors comprising chlorine, bromine, and iodine over the passivation layer.
    Type: Grant
    Filed: October 14, 2010
    Date of Patent: December 24, 2019
    Assignee: ASM International N.V.
    Inventors: Tom E. Blomberg, Eva E. Tois, Robert Huggare, Jan Willem Maes, Vladimir Machkaoutsan, Dieter Pierreux
  • Patent number: 10505246
    Abstract: A method for preventing corona effects in an electronic circuit comprising the steps of applying a parylene coating to a surface of the electronic circuit, and applying a polyalphaolefin dielectric oil having a dielectric constant that is lower than that of the parylene coating on an exposed surface of the first material.
    Type: Grant
    Filed: August 18, 2016
    Date of Patent: December 10, 2019
    Assignee: Lockheed Martin Corporation
    Inventor: Kevin L. Robinson
  • Patent number: 10500605
    Abstract: An apparatus for coating electrode active material slurry includes: a transfer unit continuously transferring an electrode current collector in a predetermined process direction; and a coating die which is reciprocally movable in the process direction or an opposite direction to the process direction and coats the active material slurry on a predetermined coating area of the electrode current collector transferred by the transfer unit, wherein the coating die stands by at a predetermined coating start position and, when a balcony region corresponding to a leading end of the coating area reaches the coating start position, coats the active material slurry on the balcony region while moving from the coating start position to a main coating position that is spaced apart from the coating start position by a predetermined distance in the opposite direction.
    Type: Grant
    Filed: June 9, 2016
    Date of Patent: December 10, 2019
    Assignee: LG Chem, Ltd.
    Inventors: Jin-Young Son, Taek-Soo Lee, Hyun-Won Lee, Ki-Won Sung, Do-Hwa Jung
  • Patent number: 10480067
    Abstract: A film deposition method for filling a recessed pattern with a SiN film is provided. NH2 groups are caused to adsorb on a surface of a substrate containing a recessed pattern formed in a top surface of the substrate by supplying a first process gas containing NH3 converted to first plasma to the surface of the substrate containing the recessed pattern. The NH2 groups is partially converted to N groups by supplying a second process gas containing N2 converted to second plasma to the surface of the substrate containing the recessed pattern on which the NH2 groups is adsorbed. A silicon-containing gas is caused to adsorb on the NH2 groups by supplying the silicon-containing gas to the surface of the substrate containing the recessed pattern on which the NH2 groups and the N groups are adsorbed. The above steps are cyclically repeated.
    Type: Grant
    Filed: January 31, 2017
    Date of Patent: November 19, 2019
    Assignee: Tokyo Electron Limited
    Inventors: Hitoshi Kato, Masahiro Murata, Jun Sato, Shigehiro Miura
  • Patent number: 10403443
    Abstract: A solid electrolytic capacitor and method for forming a solid electrolytic capacitor with high temperature leakage stability is described. The solid electrolytic capacitor has improved leakage current and is especially well suited for high temperature environments such as down-hole applications.
    Type: Grant
    Filed: September 30, 2015
    Date of Patent: September 3, 2019
    Assignee: KEMET Electronics Corporation
    Inventors: Antony P. Chacko, Randolph S. Hahn, Pablo Antonio Ruiz
  • Patent number: 10385459
    Abstract: Disclosed herein are methods for fabricating layered ceramic materials via field assisted sintering technology. A method includes forming a ceramic green body on a surface of a substrate, and sintering the ceramic green body using a field-assisted sintering process to form a ceramic layer joined to the substrate.
    Type: Grant
    Filed: May 14, 2015
    Date of Patent: August 20, 2019
    Assignee: Applied Materials, Inc.
    Inventors: Jennifer Y. Sun, Yikai Chen, Biraja Prasad Kanungo
  • Patent number: 10361016
    Abstract: A one-pot process for the electroless-plating of silver onto graphite powder is disclosed. No powder pretreatment steps for the graphite, which typically require filtration, washing or rinsing, are required. The inventive process comprises mixing together three reactant compositions in water: an aqueous graphite activation composition comprising graphite powder and a functional silane, a silver-plating composition comprising a silver salt and a silver complexing agent, and a reducing agent composition.
    Type: Grant
    Filed: June 12, 2014
    Date of Patent: July 23, 2019
    Assignee: HENKEL IP & HOLDING GMBH
    Inventors: Jie Cao, Wenhua Huang, Allison Yue Xiao
  • Patent number: 10358723
    Abstract: A method of forming surface modified substrates includes providing a substrate of material (M) having a bulk portion and an outer surface integrated with the bulk portion. A coating is deposited including metal organic molecules including at least one metal X or particles of metal X onto the outer surface. The coating is laser irradiated with a laser beam, where atoms of metal X diffuse into the outer surface to form a modified surface layer including both M and atoms of metal X on the bulk portion. The modified surface layer has a thickness of at least 1 nm, and a 25° C. electrical conductivity that is at least 2.5% above or 2.5% below a 25° C. electrical conductivity in the bulk portion.
    Type: Grant
    Filed: August 16, 2013
    Date of Patent: July 23, 2019
    Assignee: University of Central Florida Research Foundation, Inc.
    Inventors: Rajan Vaidyanathan, Aravinda Kar
  • Patent number: 10128467
    Abstract: The invention relates to a method for depositing a target material onto an organic electrically functional material. The method includes the steps of: providing a substrate with an organic electrically functional material, like an emissive electroluminescent layer; creating a vapor plume of target material by pulsed laser deposition; depositing a first layer of target material on the organic electrically functional material, while maintaining the maximum particle velocity of the deposited particles below a preset value; and depositing a second layer of target material on the first layer of target material, while the maximum particle velocity of the deposited particles is above the preset value. The invention also relates to an intermediate product and to an organic light emitting diode.
    Type: Grant
    Filed: October 14, 2013
    Date of Patent: November 13, 2018
    Assignee: Solmates B.V.
    Inventors: Jan Matthijn Dekkers, Jan Arnaud Janssens
  • Patent number: 10125053
    Abstract: A method of treating a ceramic surface containing zirconia, whereby the ceramic surface is ablated by directing a laser beam with a diameter of 200-400 ?m produced by a CO2 laser with a pulse frequency of 1200-1800 Hz onto the ceramic surface, and a N2 assist gas is concurrently applied with a pressure of 550-650 KPa co-axially with the laser beam to form an ablated ceramic surface comprising microgrooves with ZrN present on a surface of the microgrooves, wherein the ablated ceramic surface has a higher surface hydrophobicity than the ceramic surface prior to the ablating.
    Type: Grant
    Filed: May 19, 2017
    Date of Patent: November 13, 2018
    Assignee: King Fahd University of Petroleum and Minerals
    Inventors: Bekir Sami Yilbas, Haider Ali
  • Patent number: 10072331
    Abstract: A formation method of a silicon film which contributes to improvements in cycle characteristics and an increase in charge/discharge capacity and can be used as an active material layer is provided. In addition, a manufacturing method of a power storage device including the silicon film is provided. The formation method is as follows. A crystalline silicon film is formed over a conductive layer by an LPCVD method. The supply of a source gas is stopped and heat treatment is performed on the silicon film while the source gas is exhausted. The silicon film is grown to have whisker-like portions by an LPCVD method while the source gas is supplied into the reaction space. A power storage device is manufactured using, as an active material layer included in a negative electrode, the silicon film grown to have whisker-like portions.
    Type: Grant
    Filed: June 29, 2012
    Date of Patent: September 11, 2018
    Assignee: Semiconductor Energy Laboratory Co., Ltd.
    Inventors: Toshihiko Takeuchi, Kazutaka Kuriki, Makoto Ishikawa
  • Patent number: 9988713
    Abstract: A method for preparing a device having a film on a substrate is disclosed. In the method, a film is deposited on a polymeric substrate. The film includes at least one metal. A metal in the film is converted to a metal oxide using microwave radiation. One example device prepared by the method includes a polyethylene napthalate substrate and a film on the substrate, wherein the film includes a semiconducting copper oxide and silver as a dopant.
    Type: Grant
    Filed: March 12, 2014
    Date of Patent: June 5, 2018
    Assignee: Arizona Board of Regents on Behalf of Arizona State University
    Inventors: Terry Alford, Sayantan Das
  • Patent number: 9972415
    Abstract: Resin composition comprising a) the reaction product of a1) one or more epoxy compounds having at least 2 epoxy groups, and a2) sorbic acid as component A; b) a solvent containing vinyl groups as component B.
    Type: Grant
    Filed: April 4, 2012
    Date of Patent: May 15, 2018
    Assignee: ELANTAS GMBH
    Inventors: Majdi Al Masri, Anne-Gönke Huesmann, Klaus-Wilhelm Lienert, Hans-Ulrich Moritz
  • Patent number: 9945507
    Abstract: An applicator machine and a process for heating and coating a section of pipeline. The applicator machine includes a frame configured to rotate about a section of pipeline to be heated and coated, rotating means operable to rotate the frame, and coating material applicators induction coils and radiant heaters mounted on the frame and rotatable therewith. The induction coil is configured to heat a section of pipeline adjacent to the induction coil to a coating material application temperature. The radiant heaters are configured to heat factory-applied coatings. Each coating material applicator sprays coating material through an aperture in a respective induction coil. The applicator includes an enclosure configured to surround a section of pipeline and provision for evacuating and collecting waste coating material. The coating material applicator may be configured to spray powder coating material, such as fusion bonded epoxy powder material and/or chemically modified polypropylene powder material.
    Type: Grant
    Filed: July 17, 2015
    Date of Patent: April 17, 2018
    Assignee: PIPELINE INDUCTION HEAT LIMITED
    Inventors: Michael George, Jason Montgomery
  • Patent number: 9923200
    Abstract: A method for making a sulfur-graphene composite material is provided. In the method, an elemental sulfur solution and a graphene dispersion are provided. The elemental sulfur solution includes a first solvent and an elemental sulfur dissolved in the first solvent. The graphene dispersion includes a second solvent and graphene sheets dispersed in the second solvent. The elemental sulfur solution is added to the graphene dispersion, a number of elemental sulfur particles are precipitated and attracted to a surface of the graphene sheets to form the sulfur-graphene composite material. The sulfur-graphene composite material is separated from the mixture.
    Type: Grant
    Filed: November 2, 2016
    Date of Patent: March 20, 2018
    Assignees: Tsinghua University, HON HAI PRECISION INDUSTRY CO., LTD.
    Inventors: Li Wang, Xiang-Ming He, Jian-Jun Li, Jian-Wei Guo, Wen-Ting Sun, Jian-Guo Ren
  • Patent number: 9920431
    Abstract: A method of preparing a substrate to receive a metal coating deposited by thermal spraying, the method including the following steps: a) depositing a layer of adhesive on the zone to be coated, the layer having a uniform thickness greater than 10 ?m and less than 100 ?m; b) before the adhesive dries, cold spraying a metal powder onto the zone to be coated, so that powder particles become embedded at least in part in the layer of adhesive; and c) drying the adhesive in which the powder particles remain held captive, thereby forming an undercoat suitable for receiving a metal coating deposited by thermal spraying. The method is applicable to protecting the leading edges of fan blades.
    Type: Grant
    Filed: July 3, 2014
    Date of Patent: March 20, 2018
    Assignee: SNECMA
    Inventors: Laurent Paul Dudon, Antonio Cremildo Arantes