Patents Examined by Connie P. Johnson
  • Patent number: 8323869
    Abstract: A positive resist composition including a polymeric compound (A1) having a structural unit (a0) represented by general formula (a0-1) (R represents a hydrogen atom, an alkyl group of 1 to 5 carbon atoms or a halogenated alkyl group of 1 to 5 carbon atoms, R2 represents a divalent linking group, R3 represents a cyclic group containing —SO2— within the ring skeleton thereof) and a structural unit (a1) derived from an acrylate ester containing an acid dissociable, dissolution inhibiting group, an acid-generator component (B) and a fluorine-containing polymeric compound (F1) having a structural unit containing a base dissociable group.
    Type: Grant
    Filed: March 10, 2010
    Date of Patent: December 4, 2012
    Assignee: Tokyo Ohka Kogyo Co., Ltd.
    Inventors: Hiroaki Shimizu, Hideto Nito, Junichi Tsuchiya, Takahiro Dazai
  • Patent number: 8313892
    Abstract: Technologies to form fine resist patterns consistently by solving the problem of poor patterning influenced by a resist-protecting film, are provided. A layer made of a resist (resist layer) is formed on a substrate, a resist-protecting film comprising an antistatic resin and a photo-acid generating agent is formed on the resist layer, and active-energy rays are selectively irradiated over the resist-protecting film, so that a resist pattern is formed by developing the resist.
    Type: Grant
    Filed: February 7, 2005
    Date of Patent: November 20, 2012
    Assignee: Fujitsu Limited
    Inventor: Junichi Kon
  • Patent number: 8298744
    Abstract: A coating material for a photoresist pattern includes a water-soluble polymer and an additive mixed with the water-soluble polymer. The additive may be at least one selected from the group represented by Formulas 1 and 2: wherein X and Y respectively represent one selected from a heteroatom group consisting of N, O and S, and R1 to R8 respectively represent one selected from an electron donating group consisting of an alkyl group and —H, and wherein X and Y respectively represent one selected from a heteroatom group consisting of N, O and S, and R1 to R7 respectively represent one selected from an electron donating group consisting of an alkyl group and —H.
    Type: Grant
    Filed: April 28, 2008
    Date of Patent: October 30, 2012
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Joon-Seok Oh, Ju-Young Kim
  • Patent number: 8293450
    Abstract: Briefly described, embodiments of this disclosure include, coating layers image recording media, and methods for forming an image.
    Type: Grant
    Filed: November 28, 2006
    Date of Patent: October 23, 2012
    Assignee: Hewlett-Packard Development Company, L.P.
    Inventors: Vladek Kasperchik, Susan E. Bailey
  • Patent number: 8283100
    Abstract: Compositions and methods for forming color images on a substrate capable of development at desired wavelengths or energy levels are disclosed and described. The color forming composition can include a carrier system and a latent pigment with a pendent group, wherein the latent pigment is colorless or pale in color while the pendent group is attached, and wherein the latent pigment is convertible to a colored pigment upon removal of the pendent group. Alternatively, the latent pigment can have multiple states of conjugation where the latent pigment is colorless or pale in a first conjugation state, and colored in a second conjugation state. The color forming compositions are useful in forming images on a wide variety of substrates, such as optical disks.
    Type: Grant
    Filed: May 16, 2006
    Date of Patent: October 9, 2012
    Assignee: Hewlett-Packard Development Company, L.P.
    Inventors: Jayprakash C. Bhatt, Sundar Vasudevan
  • Patent number: 8278022
    Abstract: Provided are a novel positive resist composition that includes a low molecular weight material as a base material component, and a method of forming a resist pattern using the positive resist composition. A positive resist composition including: a base material component (A) that exhibits increased solubility in an alkali developing solution under the action of acid; and an acid generator component (B) that generates acid upon exposure, wherein the base material component (A) comprises a compound (A1) in which either a portion of, or all of, the hydrogen atoms of hydroxyl groups (—OH) within a phenolic compound (I) described below have been substituted with a group containing an acid dissociable, dissolution inhibiting group: the phenolic compound (I) including 4 triphenylmethane structures, and a tetravalent linking moiety that links the 4 triphenylmethane structures, wherein at least one of the 4 triphenylmethane structures has at least one phenolic hydroxyl group.
    Type: Grant
    Filed: June 18, 2009
    Date of Patent: October 2, 2012
    Assignee: Tokyo Ohka Kogyo Co., Ltd.
    Inventors: Takeyoshi Mimura, Makiko Irie
  • Patent number: 8268530
    Abstract: A positive resist composition including a base component (A) which exhibits increased solubility in an alkali developing solution under the action of acid and an acid generator component (B) which generates acid upon exposure, wherein the base component (A) includes a polymeric compound (A1) having a structural unit (a0) containing an acid-dissociable, dissolution-inhibiting group, and the acid-dissociable, dissolution-inhibiting group has a 1,3-dioxole skeleton.
    Type: Grant
    Filed: April 19, 2010
    Date of Patent: September 18, 2012
    Assignee: Tokyo Ohka Kogyo Co., Ltd.
    Inventors: Yoshiyuki Utsumi, Jun Iwashita
  • Patent number: 8257906
    Abstract: A radiation imageable coating includes a first thermochromic layer including a bleachable antenna dye and a second thermochromic layer including a non-bleachable antenna dye.
    Type: Grant
    Filed: March 29, 2006
    Date of Patent: September 4, 2012
    Assignee: Hewlett-Packard Development Company, L.P.
    Inventors: Andrew L. Van Brocklin, Susan E. Bailey, Makarand P. Gore
  • Patent number: 8247165
    Abstract: An immersion upper layer film composition is provided which exhibits sufficient transparency for the exposure wavelength 248 nm(KrF) and 193 nm(ArF), can form a protective film on the photoresist film without being intermixed with the photoresist film, is not eluted into water used during immersion exposure to maintain a stable film, and can be easily dissolved in an alkaline developer. The composition applied to coat on the photoresist film when using an immersion exposure device which is irradiated through water provided between a lens and the photoresist film, the composition comprises a resin forming a water-stable film during irradiation and being dissolved in a subsequent developer, and a solvent containing a monovalent alcohol having 6 or less carbon atoms, and the resin contains a resin component having an alcoholic hydroxyl group on the side chain containing a fluoroalkyl group on at least the carbon atom of ?-position.
    Type: Grant
    Filed: January 14, 2005
    Date of Patent: August 21, 2012
    Assignee: JSR Corporation
    Inventors: Toru Kimura, Yukio Nishimura, Tomohiro Utaka, Hiroaki Nemoto, Atsushi Nakamura, Takashi Chiba, Hiroki Nakagawa
  • Patent number: 8241833
    Abstract: A positive resist composition comprising (A) resin having a monocyclic or polycyclic alicyclic hydrocarbon structure and capable of decomposing by the action of an acid to increase the solubility in an alkaline developer, (B) a compound capable of generating an acid upon treatment with one of an actinic ray and radiation and (F) a specific surfactant containing a fluorine atom in an amount of from 30 to 60 mass %, and a pattern-forming method using the same.
    Type: Grant
    Filed: May 21, 2010
    Date of Patent: August 14, 2012
    Assignee: FUJIFILM Corporation
    Inventors: Hiromi Kanda, Fumiyuki Nishiyama
  • Patent number: 8241835
    Abstract: A relief printing form is prepared from a photosensitive element in an environment having controlled oxygen concentration during exposure to actinic radiation. An in situ mask is formed on a photosensitive element, the element is exposed to actinic radiation through the in-situ mask in an environment having an inert gas and a concentration of oxygen between 190,000 and 100 ppm, and the exposed element is treated to form the relief printing form having a pattern of raised surface areas.
    Type: Grant
    Filed: March 10, 2009
    Date of Patent: August 14, 2012
    Assignee: E I du Pont de Nemours and Company
    Inventors: Michael Lee Rudolph, Joseph Anthony Perrotto, Dhiren V. Patel, Robert A. McMillen
  • Patent number: 8236479
    Abstract: A pattern of ink is printed on a substrate, such as corrugated paperboard with a relief printing form made from a photosensitive element. An in-situ mask is formed for the photosensitive element, the element is exposed to actinic radiation through the in-situ mask in an environment having an inert gas and a concentration of oxygen between 190,000 and 100 ppm, and the exposed element is treated to form the relief printing form having a pattern of printing areas. Printing is accomplished by securing the relief printing form to a print press, applying the ink to the printing areas on the printing form, and contacting the ink from the printing areas to the substrate to transfer the pattern of ink onto the substrate.
    Type: Grant
    Filed: January 7, 2009
    Date of Patent: August 7, 2012
    Assignee: E I du Pont de Nemours and Company
    Inventor: Michael Lee Rudolph
  • Patent number: 8236482
    Abstract: The present invention relates to a composition comprising a photoresist polymer and a fluoropolymer. In one embodiment, the fluoropolymer comprises a first monomer having a pendant group selected from alicyclic bis-hexafluoroisopropanol and aryl bis-hexafluoroisopropanol and preferably a second monomer selected from fluorinated styrene and fluorinated vinyl ether. The invention composition has improved receding contact angles with high refractive index hydrocarbon fluids used in immersion lithography and, thereby, provides improved performance in immersion lithography.
    Type: Grant
    Filed: June 27, 2008
    Date of Patent: August 7, 2012
    Assignee: International Business Machines Corporation
    Inventors: Hiroshi Ito, Daniel Paul Sanders, Linda Karin Sundberg
  • Patent number: 8221960
    Abstract: Images can be provided using a method comprising thermally imaging a negative-working imageable element to provide an imaged element with exposed regions and non-exposed regions, the exposed regions consisting essentially of coalesced core-shell particles, and developing the imaged element on-press to remove only the non-exposed regions using a lithographic printing ink, fountain solution, or both. The imageable element comprises a single thermally-sensitive imageable layer consisting essentially of an infrared radiation absorbing compound and core-shell particles that coalesce upon thermal imaging. The core of the core-shell particles is composed of a hydrophobic thermoplastic polymer, the shell of the core-shell particles is composed of a hydrophilic polymer that is covalently bonded to the core hydrophobic thermoplastic polymer, and the thermally-sensitive imageable layer comprises less than 10 weight % of free polymer.
    Type: Grant
    Filed: June 3, 2009
    Date of Patent: July 17, 2012
    Assignee: Eastman Kodak Company
    Inventors: Domenico Balbinot, Mathias Jarek
  • Patent number: 8211612
    Abstract: A method for forming a protective film of a fluorine-containing polymer composition excellent in smoothness and adhesiveness on a photoresist. Moreover, there is provided a means for removing the protective film without impairing the underlying photoresist. A polymer coating composition obtainable by dissolving a fluorine-containing polymer compound in a solvent comprising a fluorinated acetal having a specific structure is applied on a photoresist and dried to form a protective film. A fluorinated acetal having the specific structure is suitable as a solvent for being brought into contact with a fluorine-containing polymer film, peeling the film, and forming a photoresist or a lithographic pattern.
    Type: Grant
    Filed: November 2, 2006
    Date of Patent: July 3, 2012
    Assignee: Central Glass Company, Limited
    Inventors: Kazuhiko Maeda, Mitsutaka Otani, Haruhiko Komoriya, Takeo Komata, Shinya Akiba
  • Patent number: 8206887
    Abstract: A positive resist composition includes a base material component (A) which exhibits increased alkali solubility under an action of an acid, and an acid generator component (B) which generates an acid upon exposure, wherein the base material component (A) contains a compound (A1) in which phenolic hydroxyl groups in a polyhydric phenol compound (a) containing two or more phenolic hydroxyl groups and having a molecular weight of 300 to 2,500 are protected with acid dissociable, dissolution inhibiting groups, and the compound (A1) exhibits a standard deviation (sn) of the number of protective groups per molecule of less than 1, or exhibits a standard deviation (sp) of a protection ratio (mol %) per molecule of less than 16.7.
    Type: Grant
    Filed: April 26, 2006
    Date of Patent: June 26, 2012
    Assignee: Tokyo Ohka Kogyo Co., Ltd.
    Inventors: Takako Hirosaki, Daiju Shiono, Taku Hirayama
  • Patent number: 8187786
    Abstract: A pattern forming materials includes a thermal sensitive material layer formed on a target substrate, a first light-to-heat converting layer formed between the thermal sensitive material layer and the target substrate, and a second light-to-heat converting layer formed on a surface of the thermal sensitive material layer opposite to the first light-to-heat converting layer, the thermal sensitive material layer being interposed between the first and second light-to-heat converting layers. A higher aspect ratio fine pattern can be formed in the thermal sensitive material layer made of photoresist using heat generated in the first and second light-to-heat converting layers formed on both surfaces of the thermal sensitive material layer.
    Type: Grant
    Filed: October 20, 2003
    Date of Patent: May 29, 2012
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Joo-Ho Kim, Junji Tominaga, Masashi Kuwahara
  • Patent number: 8127675
    Abstract: A lithographic printing plate precursor comprising a support and an image recording layer capable of drawing an image by exposure with an infrared laser, wherein the image recording layer contains (A) an infrared absorbent and (B) an iodonium salt represented by the following formula (1): wherein Ar1 and Ar2 each represents a benzene ring which may have a substituent, provided that two benzene rings are differing in the substituent from each other and a total of Hammett's ? values of substituents on at least one of the benzene rings is a negative value, and Z represents a counter anion.
    Type: Grant
    Filed: August 27, 2009
    Date of Patent: March 6, 2012
    Assignee: Fujifilm Corporation
    Inventors: Hidekazu Oohashi, Kazuto Shimada
  • Patent number: 8119330
    Abstract: A method of making a lithographic printing plate includes the steps of: a) providing a lithographic printing plate precursor including (i) a support having a hydrophilic surface or which is provided with a hydrophilic layer, (ii) a coating on the support including a photopolymerizable layer and, optionally, an intermediate layer between the photopolymerizable layer and the support, wherein the photopolymerizable layer includes a polymerizable compound, a polymerization initiator and a binder, b) image-wise exposing the coating in a plate setter, c) heating the precursor in a pre-heating unit within a time period of less than 10 minutes after step (b), d) treating the precursor in a gumming station, including at least one gumming unit, whereby a gum solution is applied to the precursor, thereby removing non-exposed areas of the photopolymerizable layer from the support and gumming the plate in a single step.
    Type: Grant
    Filed: November 9, 2006
    Date of Patent: February 21, 2012
    Assignee: Agfa Graphics NV
    Inventor: Marc Van Damme
  • Patent number: 8119329
    Abstract: A method of making a lithographic printing plate includes the steps of a) providing a lithographic printing plate precursor including (i) a support having a hydrophilic surface or which is provided with a hydrophilic layer, (ii) a coating on the support including a photopolymerizable layer, a top layer, and optionally, an intermediate layer between the photopolymerizable layer and the support, wherein the photopolymerizable layer includes a polymerizable compound, a polymerization initiator, and a binder; b) image-wise exposing the coating in a plate setter; c) optionally, heating the precursor in a pre-heating unit; d) washing the precursor in a pre-washing station by applying water or an aqueous solution to the coating, thereby removing at least a portion of the top layer; and e) developing the precursor in a gumming station by applying a gum solution to the coating of the precursor, thereby removing the non-exposed areas of the photopolymerizable layer from the support and gumming the plate in a single ste
    Type: Grant
    Filed: November 9, 2006
    Date of Patent: February 21, 2012
    Assignee: Agfa Graphics NV
    Inventor: Marc Van Damme