Patents Examined by Connie P. Johnson
  • Patent number: 8092983
    Abstract: A method of making a lithographic printing plate includes the steps of: a) providing a lithographic printing plate precursor including (i) a support having a hydrophilic surface or which is provided with a hydrophilic layer, (ii) a coating on the support including a photopolymerizable layer and, optionally, an intermediate layer between the photopolymerizable layer and the support, wherein the photopolymerizable layer includes a polymerizable compound, a polymerization initiator, and a binder, b) image-wise exposing the coating in a plate setter, c) heating the precursor in a pre-heating unit, d) treating the precursor in a gumming station, including at least a first gumming unit, by applying a gum solution to the coating of the precursor, thereby removing the non-exposed areas of the photopolymerizable layer from the support, and wherein the steps (c) and (d) are carried out off-press in the pre-heating unit and the first gumming unit, and the pre-heating unit and the first gumming unit are coupled to each o
    Type: Grant
    Filed: November 9, 2006
    Date of Patent: January 10, 2012
    Assignee: Agfa Graphics NV
    Inventor: Marc Van Damme
  • Patent number: 8088547
    Abstract: A resist composition comprising (A) a hydrogen silsesquioxane resin, (B) an acid dissociable group-containing compound, (C) a photo-acid generator, (D) an organic solvent and optionally (E) additives. The resist composition has improved lithographic properties (such as high etch-resistance, transparency, resolution, sensitivity, focus latitude, line edge roughness, and adhesion) suitable as a photoresist.
    Type: Grant
    Filed: September 20, 2005
    Date of Patent: January 3, 2012
    Assignee: Dow Corning Corporation
    Inventors: Sanlin Hu, Sina Maghsoodi, Eric Scott Moyer, Sheng Wang
  • Patent number: 8080362
    Abstract: A positive resist composition comprising (a) a resin that is decomposed by the action of an acid to increase solubility in an alkali developing solution, contains a structural unit having a group represented by formula (X) defined in the specification, has a weight average molecular weight of not more than 5,000, and contains an acid decomposable group in an amount of not more than 40% based on the sum total of a number of the acid decomposable group and a number of an alkali-soluble group not protected with the acid decomposable group, and (b) a compound that generates an acid upon irradiation of an actinic ray or radiation.
    Type: Grant
    Filed: October 29, 2007
    Date of Patent: December 20, 2011
    Assignee: Fujifilm Corporation
    Inventors: Koji Shirakawa, Toru Fujimori, Shoichiro Yasunami
  • Patent number: 8057979
    Abstract: A photosensitive paste composition for forming a black layer on top of plasma display panel (PDP) barrier ribs includes black pigment nanoparticles for contrast enhancement and a cyclic acid anhydride for fundamentally preventing the gelation of the paste composition. The photosensitive paste composition prevents electrical or optical crosstalk between adjacent discharge cells to achieve better contrast. The fundamental prevention of the gelation of the paste composition permits the paste composition to have good storage stability.
    Type: Grant
    Filed: January 4, 2006
    Date of Patent: November 15, 2011
    Assignee: Samsung SDI Co., Ltd.
    Inventors: Beom-Wook Lee, Dong-Hee Han, Sang-Wook Sin, Jin-Hwan Jeon
  • Patent number: 8053160
    Abstract: An imaging composition, article and method of imaging are disclosed. The imaging composition is energy sensitive such that upon application of a sufficient amount of energy to the composition a color or shade change is affected. The imaging composition is coated on an article to form an energy sensitive article, which may be used in marking work pieces.
    Type: Grant
    Filed: July 13, 2005
    Date of Patent: November 8, 2011
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventors: Robert K. Barr, James T. Fahey, Corey O'Connor, James G. Shelnut
  • Patent number: 8053159
    Abstract: An absorbing composition is described herein that includes at least one inorganic-based compound, at least one absorbing compound, and at least one material modification agent. In addition, methods of making an absorbing composition are also described that includes: a) combining at least one inorganic-based compound, at least one absorbing compound, at least one material modification agent, and one or more solvents to form a reaction mixture, wherein the at least one material modification agent comprises at least one acid and water; and b) heating the reaction mixture to form an absorbing material, a coating or a film.
    Type: Grant
    Filed: November 18, 2003
    Date of Patent: November 8, 2011
    Assignee: Honeywell International Inc.
    Inventors: Bo Li, Joseph Kennedy, Nancy Iwamoto, Victor Lu, Roger Leung, Mark A. Fradkin, Makarem A. Hussein, Michael D. Goodner
  • Patent number: 8048606
    Abstract: An imaging method is disclosed. An imaging composition is coated on a work piece followed by applying a sufficient amount of energy from a 3-D imaging system to form an image on the coated work piece. The image may be a logo or marker for alignment of parts.
    Type: Grant
    Filed: March 17, 2006
    Date of Patent: November 1, 2011
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventors: Robert K. Barr, James T. Fahey, Corey O'Connor, James G. Shelnut
  • Patent number: 8048607
    Abstract: A compound having, in its molecule, a polymethine chain structure containing a partial structure represented by the following formula (1-1), and an image forming material containing the same. In the formula (1-1), R1, R2, R3, R4, and X each independently represent a hydrogen atom, a halogen atom, or a monovalent organic group. The image forming material is useful as the image recording layer of a planographic printing plate precursor.
    Type: Grant
    Filed: March 8, 2007
    Date of Patent: November 1, 2011
    Assignee: Fujifilm Corporation
    Inventors: Yu Iwai, Kazuto Kunita
  • Patent number: 8034531
    Abstract: The present invention relates to a photosensitive resin composition comprising a) as a component (A) a green colorant of the formula (I) in which the rings A, B, C and D are substituted by hydroxy or by moiety wherein R, is hydrogen or C1,-C4.-Alkyl, R2 is hydrogen or C1,-C4-Alkyl, n is 0, 1, 2 or 3 and the ring E is unsubstituted or substituted by C1,-C6alkyl, C1,-C6alkoxy, hydroxy, NHCOR3, NHSO2, R4 or SO2NHR5, wherein R3, is C1,-C4,-Alkyl or phenyl, R4, is C1,-C4-Alkyl or phenyl and R5 is C1,-C4-Alkyl or phenyl, b) as a component (B) an alkali soluble oligomer or polymer (reactive or unreactive), c) as a component (C) a polymerizable monomer, d) as a component (D) a photoinitiator, e) as a component (E) an epoxy compound, and also, if desired, f) as a component (F) further additives, used as solder resist, etching resist or plating resist in the manufacture of printed circuit boards.
    Type: Grant
    Filed: November 19, 2003
    Date of Patent: October 11, 2011
    Assignee: BASF SE
    Inventors: Hidetaka Oka, Jean-Marie Adam
  • Patent number: 8026043
    Abstract: A method of making a lithographic printing plate includes the steps of: a) providing a lithographic printing plate precursor including (i) a support having a hydrophilic surface or which is provided with a hydrophilic layer, (ii) a coating on the support including a photopolymerizable layer, a top layer and, optionally, an intermediate layer between the photopolymerizable layer and the support, wherein the photopolymerizable layer includes a polymerizable compound, a polymerization initiator, and a binder, b) image-wise exposing the coating in a plate setter, c) optionally, heating the precursor in a pre-heating unit, and d) treating the precursor in a gumming station, the gumming station including a first and at least a second gumming unit, wherein the precursor is washed in the first gumming unit by applying a gum solution to the coating thereby removing at least a portion of the top layer, and wherein, subsequently, the precursor is developed in the second gumming unit with a gum solution thereby removing
    Type: Grant
    Filed: November 9, 2006
    Date of Patent: September 27, 2011
    Assignee: Agfa Graphics NV
    Inventor: Marc Van Damme
  • Patent number: 8021819
    Abstract: A photosensitive composition, which comprises a compound represented by formula (I): wherein R1 to R13 each independently represents a hydrogen atom or a substituent, and at least one of R1 to R13 is a substituent containing an alcoholic hydroxyl group; Z represents a single bond or a divalent linking group; and X? represents a counter anion; and a pattern-forming method using the photosensitive composition.
    Type: Grant
    Filed: February 7, 2007
    Date of Patent: September 20, 2011
    Assignee: FUJIFILM Corporation
    Inventor: Yasutomo Kawanishi
  • Patent number: 8012665
    Abstract: A positive photosensitive composition comprising: (A) a compound capable of generating an acid upon irradiation with actinic rays or radiation; (B1) a resin of which solubility in an alkali developer increases under an action of an acid; and (B2) a resin that has at least one group selected from (a) an alkali-soluble group and (b) a group capable of decomposing under an action of an alkali to produce an alkali-soluble group, and the resin (B2) does not have a group capable of decomposing under an action of an acid; and a pattern forming method using the same.
    Type: Grant
    Filed: June 27, 2006
    Date of Patent: September 6, 2011
    Assignee: Fujifilm Corporation
    Inventors: Kunihiko Kodama, Fumiyuki Nishiyama
  • Patent number: 8007989
    Abstract: A method for forming a patterned ferroelectric layer, having ferroelectric electronic properties, on a substrate. A composite layer, made of ferroelectric layer producing metal acrylate compounds, a photoinitiator compound and an acrylate crosslinking compound is formed on the substrate. A photomask is formed on the composite layer. Unmasked areas of the composite layer are irradiated with ultraviolet light. A solvent removes non-irradiated areas of the composite layer from the substrate. The patterned composite layer is heated in an oxygen atmosphere to cause a chemical reaction among the ferroelectric layer producing metal acrylate compounds and oxygen, a patterned ferroelectric layer being formed on the substrate.
    Type: Grant
    Filed: April 11, 2008
    Date of Patent: August 30, 2011
    Assignee: The United States of America as represented by the Secretary of the Navy
    Inventor: Thomas Kirk Dougherty
  • Patent number: 8003309
    Abstract: The present invention relates to a composition comprising a photoresist polymer and a fluoropolymer. In one embodiment, the fluoropolymer comprises a first monomer having a pendant group selected from alicyclic bis-hexafluoroisopropanol and aryl bis-hexafluoroisopropanol and preferably a second monomer selected from fluorinated styrene and fluorinated vinyl ether. The invention composition has improved receding contact angles with high refractive index hydrocarbon fluids used in immersion lithography and, thereby, provides improved performance in immersion lithography.
    Type: Grant
    Filed: January 16, 2008
    Date of Patent: August 23, 2011
    Assignee: International Business Machines Corporation
    Inventors: Hiroshi Ito, Daniel Paul Sanders, Linda Karin Sundberg
  • Patent number: 7998652
    Abstract: A lithographic printing plate precursor comprising: a support; and at least one layer comprising an image-recording layer, the image-recording layer comprising (A) an infrared absorber, (B) a polymerization initiator, (C) a polymerizable compound, and (D) a binder polymer, wherein the image recording layer is capable of being removed with at least one of a printing ink and a fountain solution, wherein at least one of said at least one layer comprises a copolymer having (a1) a unit comprising at least one ethylenically unsaturated bond, and (a2) a unit comprising at least one functional group interacting with a surface of the support. And a lithographic printing method in which the lithographic printing plate precursor is used. The copolymer preferably has a hydrophilic segment. The copolymer preferably is contained in an undercoat layer formed between the support and the image-recording layer.
    Type: Grant
    Filed: September 29, 2004
    Date of Patent: August 16, 2011
    Assignee: Fujifilm Corporation
    Inventors: Naonori Makino, Toshifumi Inno, Sumiaki Yamasaki
  • Patent number: 7981588
    Abstract: There are provided a resist composition capable of forming a resist pattern with high sensitivity and high resolution, and a method of forming such a resist pattern. The negative resist composition includes an alkali soluble base component (A), an acid generator component (B) that generates acid by exposure, and a cross-linking agent component (C), wherein the base component (A) includes a polyhydric phenol compound (A1) containing two or more phenolic hydroxyl groups represented by the following general formula (I), with a molecular weight of 300 to 2500.
    Type: Grant
    Filed: February 1, 2006
    Date of Patent: July 19, 2011
    Assignee: Tokyo Ohka Kogyo Co., Ltd.
    Inventors: Takako Hirosaki, Taku Hirayama, Daiju Shiono
  • Patent number: 7977026
    Abstract: An imaging method is disclosed. An imaging composition is coated on a work piece followed by applying a sufficient amount of energy from a 3-D imaging system to form an image on the coated work piece. The image may be a logo or marker for alignment of parts.
    Type: Grant
    Filed: February 6, 2004
    Date of Patent: July 12, 2011
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventors: Robert K. Barr, James T. Fahey, Corey O'Connor, James G. Shelnut
  • Patent number: 7968268
    Abstract: New photoresist compositions are provided that are useful for immersion lithography. Preferred photoresist compositions of the invention comprise one or more materials that can be substantially non-mixable with a resin component of the resist. Further preferred photoresist compositions of the invention comprise 1) Si substitution, 2) fluorine substitution; 3) hyperbranched polymers; and/or 4) polymeric particles. Particularly preferred photoresists of the invention can exhibit reduced leaching of resist materials into an immersion fluid contacting the resist layer during immersion lithography processing.
    Type: Grant
    Filed: May 1, 2006
    Date of Patent: June 28, 2011
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventor: Deyan Wang
  • Patent number: 7951522
    Abstract: A chemically amplified positive photoresist composition for thick film that is used for forming a thick-film photoresist layer with a film thickness of 10 to 150 ?m on top of a support, comprising (A) a compound that generates acid on irradiation with active light or radiation, (B) a resin that displays increased alkali solubility under the action of acid, and (C) an alkali-soluble resin, wherein the component (B) comprises a resin formed from a copolymer containing a structural unit (b1) with a specific structure.
    Type: Grant
    Filed: December 29, 2004
    Date of Patent: May 31, 2011
    Assignee: Tokyo Ohka Kogyo Co., Ltd.
    Inventors: Toshiki Okui, Koichi Misumi
  • Patent number: 7939240
    Abstract: A lithographic printing plate precursor is provided and has a porous aluminum support, (1) a layer containing a water-soluble polymer resin having a hydrophilic substituent adsorbable to a surface of the porous aluminum support and a sulfonic acid, and (2) an image recording layer from which unexposed areas can be removed by supplying an oil-based ink and an aqueous component thereonto on a printing machine without being subjected to development after exposure. The layer containing the water-soluble polymer resin, which has come in contact with the oil-based ink and the aqueous component, has a sulfonic acid group left therein.
    Type: Grant
    Filed: December 6, 2005
    Date of Patent: May 10, 2011
    Assignee: Fujifilm Corporation
    Inventors: Akihiro Endo, Sumiaki Yamasaki, Seiji Uno