Abstract: A resist transfer pad and method of use are described for forming a uniform photoresist on the surface of a workpiece such as a slider. The resist transfer pad includes a layer of cured polydimethylsiloxane (PDMS) on a cushioning layer, e.g. silicone rubber, and an optional stiffening layer. The sliders are preferably mounted on a carrier or pallet. In one preferred embodiment the loaded resist transfer pads are applied to the slider surface by roll lamination where the loaded resist transfer pad is transported by a roller system using a cover-tape and pressed against the slider surface. Subsequently the cover-tape and the resist transfer pad are lifted off and the photoresist remains on the transducer. An alternative embodiment uses a vacuum, piston laminator to press the loaded resist transfer pad onto the surface of the transducer.

Abstract: The present invention relates to an improved slip film composition for use in manufacturing flexographic printing plates. The improved slip film composition of the invention comprises one or more solvents, one or more polymeric binders, a layered silicate, and optionally, a surfactant. The use of the layered silicate as a filler in the slip film composition produces an slip film composition with improved release properties and improved imaging. The slip film of the invention can be used with flexographic printing plates that are solvent developed or thermally developed.

Abstract: A semiconductor process technique to help reduce semiconductor process effects, such as undesired line edge roughness, insufficient lithographical resolution, and limited depth of focus problems associated with the removal of a photoresist layer. More particularly, embodiments of the invention use a photoacid generator (PAG) material in conjunction with a sacrificial light absorbing material (SLAM) to help reduce these and other undesired effects associated with the removal of photoresist in a semiconductor manufacturing process. Furthermore, embodiments of the invention allow a PAG to be applied in a semiconductor manufacturing process in an efficient manner, requiring fewer processing operations than typical prior art techniques.

Abstract: The invention provides a planographic printing plate precursor that is writable by laser exposure and is composed of a support, a photosensitive recording layer formed on the support, and a backcoat layer containing an epoxy resin, the backcoat layer being formed on the side of the support opposite to the photosensitive recording layer side; and a stack of the planographic printing plate precursors. According to the invention, scratches on the photosensitive recording side of the planographic printing plate precursor can be prevented when brought into contact with another planographic printing plate precursor in the stack without interleaving slip sheets, and productivity in a plate making process can be improved.

Abstract: Compositions and methods for production of color images which are developable with improved marking sensitivity and image contrast are disclosed and described. Specifically, a color forming composition can comprise a polymeric activator phase including a polymer matrix and an activator dissolved therein, a color former phase including a color former, and a radiation absorber in thermal contact with the color former phase. Particularly, the color former phase can be finely dispersed within the polymeric activator phase at an average particle size of less than 2 ?m.

Abstract: A polymer compound that, within a chemically amplified positive resist system, exhibits a significant change in alkali solubility from a state prior to exposure to that following exposure, as well as a photoresist composition that includes such a polymer compound and a method for forming a resist pattern, which are capable of forming fine patterns with a high level of resolution. The polymer compound includes, as an alkali-soluble group (i), a substituent group in which a group selected from amongst alcoholic hydroxyl groups, carboxyl groups, and phenolic hydroxyl groups is protected with an acid dissociable, dissolution inhibiting group (ii) represented by a general formula (1) shown below: (wherein, A represents an organic group of 1 to 20 carbon atoms with a valency of at least n+1, and n represents an integer from 1 to 4).

Abstract: A process for preparing a flexographic printing plate comprising providing a photosensitive element comprising a support and at least one photopolymerizable layer, providing a photomask adjacent the photopolymerizable layer opposite the support, exposing the photosensitive element with ultraviolet radiation between 200 and 300 nm through the photomask, exposing the photosensitive element with ultraviolet radiation between 310 and 400 nm through the photomask to photopolymerize areas of the photopolymerizable layer, and treating the exposed photosensitive element to remove unpolymerized areas, thereby forming a relief surface suitable for printing.

Abstract: An object of the present invention is to provide a lithographic printing plate with a hydrophilic layer mainly made from resins which has a photosensitivity to the light in near infrared region, on which images can be printed directly with laser beam, requiring no development and wiping off operation, and immediately recovering from ink stains without any difficulties when an ink attaches to non-image areas on printing, and a photosensitive resin composition applied to the printing plate. A lithographic printing original plate having a photosensitive layer formed on a support is characterized in that the surface of the photosensitive layer has a phase-separation structure, and the recessed parts are formed on the surface of a photosensitive layer by the dissolution of one component of photosensitive layer constituting the phase-separation and the surface of the photosensitive layer is changed to have affinity for ink by irradiation with light.

Abstract: The present invention provides an imageable element including a lithographic substrate and an imageable layer disposed on the substrate. The imageable layer includes a radically polymerizable component, an initiator system capable of generating radicals sufficient to initiate a polymerization reaction upon exposure to imaging radiation, and a polymeric binder having a hydrophobic backbone and including constitutional units having a pendant group including a hydrophilic poly(alkylene oxide) segment. The imageable element can be developed using an aqueous developer solution. Alternatively, the imageable element can be developed on-press by contact with ink and/or fountain solution.

Abstract: Non-chemically amplified radiation sensitive resist compositions containing silicon are especially useful for lithographic applications, especially E-beam lithography. More particularly, radiation-sensitive resist compositions comprising a polymer having at least one silicon-containing moiety and at least one radiation-sensitive moiety cleavable upon radiation exposure to form aqueous base soluble moiety can be used to pattern sub-50 nm features with little or no blur.

Abstract: Methods for carrying out lithography with a carbon dioxide development system are described. This invention involves methods for preferential removal of the darkfield region of conventional chemically amplified positive tone resists. The carbon dioxide development systems include one or more derivatizing agents, which may be an onium salt or a neutral compound.

Abstract: The present invention provides a chemically amplified positive resist composition comprising (i) a polymer which is insoluble or poorly soluble in an alkali aqueous solution but becomes soluble in an alkali aqueous solution by the action of an acid, (ii) an acid generator, and (iii) a compound of the formula (I). The present invention also provides an ester derivative useful as a component of the chemically amplified positive resist composition, and process for producing the ester derivative.

Abstract: An imaging method is disclosed. An imaging composition is coated on a work piece followed by applying a sufficient amount of energy from a 3-D imaging system to form an image on the coated work piece. The image may be a logo or marker for alignment of parts.

Abstract: Imaging layers, image recording media, and methods of preparation of each, are disclosed.

Abstract: A method of marking a thermoplastic article can comprise: combining a thermoplastic with a light-marking additive to form a composition, forming the composition into an article having a maximum optical absorption wavelength; and illuminating, at a marking wavelength, at least a portion of the article with a device having a power of less than or equal to about 200 mW, to form a light-mark. The light-mark can have a size, as measured along a major axis, of greater than or equal to about 10 micrometers. The light-mark can also have a mark absorption wavelength that is greater than or equal to about ±100 nm of the maximum optical absorption wavelength, and can have a spectral absorption curve.

Abstract: Methods for carrying out lithography with a carbon dioxide development system are described. In some embodiments the methods involve preferential removal of a darkfield region; in other embodiments the methds involve preferential removal of a light field region. The carbon dioxide development systems include a quaternary ammonium salt, preferably a quaternary ammonium hydroxide, halide, or carbonate. Compositions for carrying out the methods are also described. The quaternary ammonium salts preferably contain at least one CO2-philic group, such as a siloxane-containing group or a fluorine-containing group.

Abstract: Disclosed herein is multilayered sheet comprising a core layer comprising a thermoplastic polymer and an IR absorbing additive; wherein the IR absorbing additive is a metal oxide; and a first cap layer comprising a thermoplastic polymer and an electromagnetic radiation absorbing additive; wherein a surface of the first cap layer is disposed upon and in intimate contact with a surface of the core layer. Disclosed herein too is a method for manufacturing a multilayered sheet comprising melt blending a composition comprising a thermoplastic polymer and an IR absorbing additive to produce a core layer; melt blending a composition comprising a thermoplastic polymer and an ultraviolet radiation absorber to produce a first cap layer; combining the core layer with the first cap layer in such a manner that the cap layer is disposed upon and in intimate contact with a surface of the core layer.

Abstract: The present invention provides the following process for production of an ether compound, which is useful for chemical amplification type resist compositions, synthetic intermediates of pharmaceuticals, paints, or the like, with less side reaction and in high yield. A process for producing an ether compound having a group represented by the general formula (II) wherein R1, R2 and R3 may be the same or different, and represent substituted or unsubstituted alkyl, substituted or unsubstituted aryl or substituted or unsubstituted aralkyl, or R1 and R2 form cycloalkyl together with an adjacent carbon atom, which comprises allowing a compound having a hydroxyl group (including a carboxyl group) to react with an alkenyl ether represented by the general formula (I) wherein R1, R2 and R3 have the same significances as defined above, respectively.

Abstract: A photosensitive lithographic printing plate comprises a photosensitive layer and a protective layer formed in this order on a support, wherein the photosensitive layer has a maximum peak of spectral sensitivity within a wavelength range ranging from 390 to 430 nm, the minimum exposure for the photosensitive lithographic printing plate for image formation at a wavelength of 410 nm (S410) is at most 100 ?J/cm2, and the relation between the minimum exposure for image formation at a wavelength of 450 nm (S450) and the minimum exposure for image formation at a wavelength of 410 nm (S410) is 0<S410/S450?0.1.

Abstract: The present invention provides a visible light-sensitive composition which is highly sensitive to a visible light and is useful as an electronic circuit forming material, a lithographic printing material, etc., said visible light-sensitive composition comprising (a) a polymer comprising a repeating unit represented by general formula (I): wherein R1, R2, and R3 are the same or different and each represents substituted or unsubstituted alkyl, substituted or unsubstituted aryl, or substituted or unsubstituted aralkyl, or alternatively R1 and R2 form cycloalkyl together with the adjacent carbon atom, and R4 represents lower alkyl, (b) a compound that generates an acid by visible light irradiation and (c) a sensitizing dye.