Abstract: An embodiment relates to a device comprising a unit cell on a SiC substrate, the unit cell comprising a gate insulator film, a trench in the well region, and a first sinker region of a second conduction type, wherein the first sinker region has a depth that is equal to or greater than a depth of a well region; wherein the device has an on-resistance of less than 3 milliohm-cm2, a gate threshold voltage of greater than 2.8V, a breakdown voltage of greater than 1450V, and an electric field of less than 3.5 megavolt/cm in the gate insulator film at a drain voltage of less than or equal to 1200 V.

Abstract: An integrated circuit that includes a plurality of GaN transistor sets. A first set of the plurality of GaN transistor sets includes transistors with a first drain-to-source distance, and wherein a second of the plurality of GaN transistor sets includes transistors with a second drain-to-source distance that is greater than the first drain-to-source distance.

Abstract: An anti-fuse structure, a method for fabricating the anti-fuse structure, and a semiconductor device are disclosed. The anti-fuse structure includes a semiconductor substrate, a fuse oxide layer, a gate material layer, a first electrode and a second electrode. An active area is defined on the semiconductor substrate by an isolation structure. The active area includes a wide portion and a narrow portion connected to each other. The fuse oxide layer is located on the semiconductor substrate, covers the narrow portion and extends to cover a first part of the wide portion. The gate material layer is formed on the fuse oxide layer. The first electrode is formed on and electrically connected to the gate material layer, while the second electrode is formed on and electrically connected to a second part of the wide portion not covered by the fuse oxide layer.

Abstract: Described is a packaging technology to improve performance of an AI processing system. An IC package is provided which comprises: a substrate; a first die on the substrate, and a second die stacked over the first die. The first die includes memory and the second die includes computational logic. The first die comprises DRAM having bit-cells. The memory of the first die may store input data and weight factors. The computational logic of the second die is coupled to the memory of the first die. In one example, the second die is an inference die that applies fixed weights for a trained model to an input data to generate an output. In one example, the second die is a training die that enables learning of the weights. Ultra high-bandwidth is changed by placing the first die below the second die. The two dies are wafer-to-wafer bonded or coupled via micro-bumps.

Abstract: Techniques are disclosed for co-integrating thin-film bulk acoustic resonator (TFBAR, also called FBAR) devices and III-N semiconductor transistor devices. In accordance with some embodiments, a given TFBAR device may include a superlattice structure comprising alternating layers of an epitaxial piezoelectric material, such as aluminum nitride (AlN), and any one, or combination, of other III-N semiconductor materials. For instance, aluminum indium nitride (AlxIn1-xN), aluminum gallium nitride (AlxGa1-xN), or aluminum indium gallium nitride (AlxInyGa1-x-yN) may be interleaved with the AlN, and the particular compositional ratios thereof may be adjusted to customize resonator performance. In accordance with some embodiments, the superlattice layers may be formed via an epitaxial deposition process, allowing for precise control over film thicknesses, in some cases in the range of a few nanometers.

Abstract: System and method for reducing contact resistance and prevent variations due to misalignment of contacts is disclosed. A preferred embodiment comprises a non-planar transistor with source/drain regions located within a fin. An inter-layer dielectric overlies the non-planar transistor, and contacts are formed to the source/drain region through the inter-layer dielectric. The contacts preferably come into contact with multiple surfaces of the fin so as to increase the contact area between the contacts and the fin.

Abstract: A semiconductor device includes a semiconductor substrate, a conductive pad disposed on the semiconductor substrate, and a pillar pattern disposed on the conductive pad. The semiconductor device further includes a solder seed pattern disposed on the pillar pattern, and a solder portion disposed on the pillar pattern and the solder seed pattern. A first width of the solder seed pattern is less than a second width of a top surface of the pillar pattern.

Abstract: A semiconductor device is proposed. The semiconductor device includes a source region of a field effect transistor having a first conductivity type, a body region of the field effect transistor having a second conductivity type, and a drain region of the field effect transistor having the first conductivity type. The source region, the drain region, and the body region are located in a semiconductor substrate of the semiconductor device and the body region is located between the source region and the drain region. The drain region extends from the body region through a buried portion of the drain region to a drain contact portion of the drain region located at a surface of the semiconductor substrate, the buried portion of the drain region is located beneath a spacer doping region, and the spacer doping region is located within the semiconductor substrate.

Abstract: An embodiment method includes forming a semiconductor liner layer on a first fin structure and on a second fin structure and forming a first capping layer on the semiconductor liner layer disposed on the first fin structure. The method further includes forming a second capping layer on the semiconductor liner layer disposed on the first fin structure, where a composition of the first capping layer is different from a composition of the second capping layer. The method additionally includes performing a thermal process on the first capping layer, the second capping layer, and the semiconductor liner layer to form a first channel region in the first fin structure and a second channel region in the second fin structure. A concentration profile of a material of the first channel region is different from a concentration profile of a material of the second channel region.

Abstract: A thin-film transistor substrate includes a thin-film transistor and a light-shielding part. The thin-film transistor includes a gate electrode, a semiconductor part made from a semiconductor material and superimposed on a part of the gate electrode via a first insulating film, a source electrode on a part of the semiconductor part and connected to the semiconductor part, and a drain electrode on a part of the semiconductor part and connected to the semiconductor part with spaced apart from the source electrode. The light-shielding part includes a first light-shielding section disposed above the semiconductor part, the source electrode, and the drain electrode via the second insulating film and superimposed on the semiconductor part, and a second light-shielding section not to be superimposed on the gate electrode, the source electrode, and the drain electrode and having an opening adjacent to the thin-film transistor.

Abstract: A hollow type semiconductor device has a pre-molded substrate (15) in which an element mounting portion, top surfaces of inner leads (2), and a top surface of frame-shaped wiring (7) are exposed on a first surface of a resin sealing body (6), and back surfaces of outer leads (3) and a back surface of a first frame-shaped wall (8) are exposed on a back surface of the resin sealing body (6). A hollow sealing body (14) including a second frame-shaped wall (9) and a sealing plate (4) is provided on the pre-molded substrate (15). The second frame-shaped wall (9) and the sealing plate (4) enclose a hollow portion (13) in which a semiconductor element (1) is kept.

Abstract: The present disclosure relates to an electroluminescence device, a lighting panel and a vehicle lamp group. An electroluminescence device includes an anode, a cathode and a functional layer between the anode and the cathode, which includes: a light emitting layer; a first type carrier transport layer on a first side of the light emitting layer, configured to transport a first type carrier and a second type carrier and having a light emitting function; and a second type carrier block layer between the light emitting layer and the first type carrier transport layer, configured to block migration of the second type carrier when a working voltage is within a first voltage range and allow the second type carrier to cross the second type carrier block layer when the working voltage is within a second voltage range, within which any voltage value is greater than that within the first voltage range.

Abstract: Memristive devices and methods for setting the resistance of a memristive device include a first mixed conducting layer formed from a first material having a resistance that changes depending on an ion concentration and having multiple coexisting phases from concentration-dependent metastability. A second metastable, mixed conducting layer is formed from the first material. A barrier layer between the first conductor layer and the second conductor layer is formed from a second mixed conducting material having a chemical potential that prevents thermal ion diffusion between the first and second layer. The barrier layer provides an electrical threshold, above which ions are transferred between the first and second layer and below which the resistance of the device is read.

Abstract: A transistor structure may include a first electrode, a second electrode, a third electrode, a substrate, and a semiconductor member. The semiconductor member overlaps the third electrode and includes a first semiconductor portion, a second semiconductor portion, and a third semiconductor portion. The first semiconductor portion directly contacts the first electrode, is directly connected to the third semiconductor portion, and is connected through the third semiconductor portion to the second semiconductor portion. The second semiconductor portion directly contacts the second electrode and is directly connected to the third semiconductor portion. A minimum distance between the first semiconductor portion and the substrate is unequal to a minimum distance between the second semiconductor portion and the substrate.

Abstract: In a described example, an integrated circuit (IC) package includes an IC die disposed on a die attach pad; a plurality of leads electrically connected to terminals on the IC die, the leads including a base metal; and molding compound material encapsulating portions of the IC die, the die attach pads, and the plurality of leads; the plurality of leads having a solder joint reinforcement tab. The solder joint reinforcement tabs include a first side, a second side opposite to the first side, a third side, a fourth side opposite to and in parallel to the third side, a fifth side forming an end portion of the solder joint reinforcement tab, the solder joint reinforcement tabs including a solderable metal layer on the second, third and fourth sides and on portions of the fifth side.

Abstract: An array substrate and a display device are disclosed. The array substrate includes: a base substrate; and a first electrically conductive layer and a second electrically conductive layer on the base substrate; wherein the base substrate is provided with at least one thin film transistor, each of the at least one thin film transistor includes a gate electrode disposed in the first electrically conductive layer, and a source electrode and a drain electrode disposed in the second electrically conductive layer; and wherein, at least one of the drain electrode and the source electrode includes an electrode body and an extending portion, the electrode body overlapping with the gate electrode, and the extending portion overlapping with a portion of the first electrically conductive layer other than the gate electrode.

Abstract: A method of forming an active device having self-aligned source/drain contacts and gate contacts, including, forming an active area on a substrate, where the active area includes a device channel; forming two or more gate structures on the device channel; forming a plurality of source/drains on the active area adjacent to the two or more gate structures and device channel; forming a protective layer on the surfaces of the two or more gate structures, plurality of source/drains, and active layer; forming an interlayer dielectric layer on the protective layer; removing a portion of the interlayer dielectric and protective layer to form openings, where each opening exposes a portion of one of the plurality of source/drains; forming a source/drain contact liner in at least one of the plurality of openings; and forming a source/drain contact fill on the source/drain contact liner.

Abstract: A method for forming a semiconductor device having a lateral semiconductor heterojunction involves forming a first metal chalcogenide layer of the lateral semiconductor heterojunction adjacent to a first metal electrode on a substrate. The first metal chalcogenide layer includes a same metal as the first metal electrode and at least some of the first metal chalcogenide layer includes metal from the first metal electrode. A second metal chalcogenide layer of the lateral semiconductor heterojunction is formed adjacent to the first metal chalcogenide layer. A second metal electrode is formed adjacent to the second metal chalcogenide layer. The second metal chalcogenide layer includes a same metal as the second metal electrode.

Abstract: Semiconductor device assemblies with molded support substrates and associated methods are disclosed herein. In one embodiment, a semiconductor device assembly includes a support substrate, a first semiconductor die embedded within the support substrate, a second semiconductor die coupled to the support substrate, and a third semiconductor die coupled to the support substrate. The assembly can also include a redistribution network formed on a first and/or second side of the support substrate, and a plurality of conductive contacts electrically coupled to at least one of the first, second or third semiconductor dies.

Abstract: Embodiments of the present disclosure provide an integrated circuit package in a true wireless stereo (TWS) headphone. The integrated circuit package includes a package substrate, an inductor structure, a sensing chip, and a semiconductor device. The inductor structure is on a first surface of the package substrate configured to sense a deformation of the TWS headphone. The sensing chip is attached to a second surface of the package substrate and configured to sense an inductance change in the inductor structure. The semiconductor device is attached to the second surface of the package substrate configured to process a sensed inductance change.