Patents Examined by David E. Aylward
  • Patent number: 6893736
    Abstract: The present invention provides a thermosetting resin composition useful as a highly filled low CTE underfilling sealant composition which completely fills the underfill space in a semiconductor device, such as a flip chip assembly which includes a semiconductor chip mounted on a carrier substrate, enables the semi-conductor to be securely connected to a circuit board by heat curing and with good productivity, and demonstrates acceptable heat shock properties (or thermal cycle properties). The thermosetting resin composition which is used as an underfilling sealant between such a semiconductor device and a circuit board to which the semiconductor device is electrically connected, includes an epoxy resin component, a latent hardener component, and a polysulfide-based toughening component. The latent hardener component includes a modified amide component and a latent catalyst therefor.
    Type: Grant
    Filed: November 15, 2002
    Date of Patent: May 17, 2005
    Assignee: Henkel Corporation
    Inventor: Mark M. Konarski
  • Patent number: 6756453
    Abstract: The present invention relates to alicyclic epoxy compounds obtained by selectively hydrogenating aromatic rings of aromatic epoxy compounds in the presence of a hydrogenation catalyst, the concentration of the platinum group element in the product alicyclic epoxy compound being not more than 2 ppm.
    Type: Grant
    Filed: June 25, 2002
    Date of Patent: June 29, 2004
    Assignee: Mitsubishi Chemical Corporation
    Inventors: Kouya Murai, Mineo Nishi, Masayuki Honda
  • Patent number: 6753040
    Abstract: A curable composition comprising a) an epoxy resin having on average more than one epoxide group per molecule and b1) an alkyldipropylenetrimine of general formula (I) and/or b2) an adduct of an alkyldipropylenetrimine of general formula (I) with b3) an epoxide compound having on average at least one epoxide group per molecule in which R is hydrocarbon radical 8 to 22 carbon atoms, and the use of this composition for mineral and metallic substrates.
    Type: Grant
    Filed: March 21, 2002
    Date of Patent: June 22, 2004
    Assignee: Vantico GmbH & Co. KG
    Inventors: Wolfgang Scherzer, Jörg Volle
  • Patent number: 6743837
    Abstract: Disclosed are a resin dispersion and a cationic electrodeposition coating composition including the same, in which the dried coating film of the electrodeposition paint is lead-free and has an epoxy-acrylic double-layered structure for displaying excellent properties, and in which an organic solvent content can be minimized. A resin dispersion of a cationic electrodeposition includes an aqueous dispersion prepared by the following processes. The resin dispersion includes a cationic electrodeposition resin, deionized water, an acid for neutralization, a reaction product of manganese phosphate and an acid diluted in an deionized water to 10%, and a cationic surfactant.
    Type: Grant
    Filed: August 14, 2001
    Date of Patent: June 1, 2004
    Assignee: DIP Co. Ltd.
    Inventors: Hoon Chung, Seung-Jae Baek, Jong-Myung Hong, Ki-Myong Song
  • Patent number: 6743510
    Abstract: A composition comprising a cationic polymerization compound and a porous fine particle, a coating made from the composition and a laminated plate comprising a substrate and the coating are provided. The coating is superior in adhering properties to a substrate and is equipped with an adequate hardness.
    Type: Grant
    Filed: November 7, 2002
    Date of Patent: June 1, 2004
    Assignee: Sumitomo Chemical Company, Limited
    Inventor: Shinsuke Ochiai
  • Patent number: 6733902
    Abstract: A liquid epoxy resin composition includes (A) a liquid epoxy resin, (B) a curing agent, (C) a curing accelerator, (D) an inorganic filler, and (E) a silicone-modified resin resulting from addition reaction of an alkenyl-containing epoxy or phenolic resin with an organopolysiloxane, the liquid epoxy resin composition curing into a product having a Tg of 30-120° C. and a specific dynamic viscoelasticity behavior. The composition is adherent to silicon chips, the cured product is highly resistant to heat and thermal shocks, and the composition is useful as sealant for flip chip type semiconductor devices.
    Type: Grant
    Filed: August 15, 2002
    Date of Patent: May 11, 2004
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Kazuaki Sumita, Tatsuya Kanamaru, Toshio Shiobara
  • Patent number: 5922817
    Abstract: A water-dispersible polymer and a coating composition containing the water-dispersible polymer are disclosed. The water-dispersible polymer is prepared from: (a) an epoxy compound having about two epoxy groups, such as an epoxy resin, (b) a linking compound having (i) conjugated carbon--carbon double bonds or a carbon--carbon triple bond and (ii) a moiety capable of reacting with an epoxy group, such as sorbic acid, and (c) acrylic monomers, at least a portion of which are capable of rendering the polymer water dispersible, such as acrylic acid, wherein the epoxy portion (a) of the polymer is covalently linked to the polymerized acrylic portion (c) by linking compound (b). The coating composition contains the water-dispersible polymer, a fugitive base to solubilize the polymer, a curing agent, and a carrier containing water.
    Type: Grant
    Filed: May 11, 1998
    Date of Patent: July 13, 1999
    Assignee: The Dexter Corporation
    Inventors: Walter R. Pedersen, Joseph Devasia Ponmankal
  • Patent number: 5183874
    Abstract: A class of catalysts for the anionic copolymerization of cyclic lactams in the presence of .omega.-(N-acyllactam)polyorganosiloxanes, .alpha.,.omega.-di-(N-acyllactam)polyorganosiloxanes or star-shaped .omega.-(N-acyllactam)polyorganosiloxanes is disclosed. The catalysts successfully protect the siloxane prepolymer from harmful depolymerization reactions at elevated temperatures while anionically polymerizing the cyclic lactams via ringopening. Diblock, triblock, multiblock and star-block copolymers, e.g., of a polyorganosiloxane and a polyamide, with advantageously high polyorganosiloxane and polyamide block molecular weights and superior heat resistance can be synthesized with the catalysts. The composition of these block copolymers, with the structure AB, ABA, and star-(BA).sub.r, r .gtoreq.3, where A=polyamide and B=polyorganosiloxane, and the process for producing them are also described.
    Type: Grant
    Filed: October 18, 1990
    Date of Patent: February 2, 1993
    Assignee: Technical Development Associates
    Inventor: Cary A. Veith
  • Patent number: 5182351
    Abstract: A thermosetting resin composition comprising a maleimide having at least one N-substituted maleimide group in the molecule thereof and a silicon compound having conjugated double bonds is easily workable and yields cured products having improved heat resistance.
    Type: Grant
    Filed: September 11, 1990
    Date of Patent: January 26, 1993
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Toshio Shiobara, Hisashi Shimizu
  • Patent number: 5171787
    Abstract: A silicone-based composite rubber composition having good processability on rolls which is obtained by compounding a rubber-forming polymer (A) comprising a polyorganosiloxane and an organic rubber, a silicon compound (B) having at least two hydrolyzable groups per molecule which are able to undergo hydrolysis and condensation reactions with silanols, and a heavy metal compound, amine, or quaternary ammonium salt (C) which catalyzes the hydrolysis and condensation reactions, and allowing the resulting formulation to undergo hydrolysis and condensation reactions while the formulation is kept being deformed by shearing; a crosslinkable, silicone-based composite rubber composition comprising the silicone-based composite rubber composition having blended therewith an organic rubber-crosslinking agent; and an oil seal and a rubber hose both obtained from the crosslinkable, silicone-based composite rubber composition.
    Type: Grant
    Filed: June 26, 1990
    Date of Patent: December 15, 1992
    Assignees: Japan Synthetic Rubber Co., Ltd., Toshiba Silicone Co., Ltd.
    Inventors: Yoshiaki Zama, Itsuki Umeda, Seizo Katayama, Yuichi Funahashi, Junichiro Watanabe, Kiyoshi Takeda, Hirofumi Yoshida
  • Patent number: 5171794
    Abstract: An amorphous modified poly(2,6-dimethyl-p-oxyphenylene) (PPO) is described with a glass transition temperature (Tg) within the range of 170.degree.-220.degree. C., of which the macromolecules contain units having trialkylsilyl groups bonded to the nucleus and/or to the methyl: ##STR1## together with units having hydroxyethyl groups bonded to the nucleus and/or to the methyl: ##STR2## This modified PPO is prepared by metalating PPO with a metalating agent and reacting the formed metalated PPO with a trialkylsilyl halide and with ehtylene oxide in succession.The use of the thus modified PPO for the preparation of flat, including asymmetric, membranes useful in gas mixture separation processes is described.
    Type: Grant
    Filed: July 10, 1990
    Date of Patent: December 15, 1992
    Assignees: Eniricerche S.p.A., Snam S.p.A., Agip Petroli S.p.A.
    Inventors: Amalia Assogna, Alberto Gandini, Arnaldo Roggero, Raffaello Sisto, Alessandro Stopponi, Claudio Valentini
  • Patent number: 5135993
    Abstract: This invention relates to certain new high modulus silicones, toughened epoxy thermoset resin systems made from those silicones, and composites that are prepared from the new toughened epoxy resin systems. The silicone resins are specifically monophenyl-containing polysiloxanes.
    Type: Grant
    Filed: September 11, 1990
    Date of Patent: August 4, 1992
    Assignees: Dow Corning Corporation, Toray Industries
    Inventors: Gary T. Decker, Gerald A. Gornowicz, Kuniaki Tobukuro
  • Patent number: 5068292
    Abstract: A composite material is comprised of an in situ polymerized rigid rod polymer and an in situ polymerized matrix polymer. The composite material is isotropic and has enhanced mechanical properties as well as improved temperature resistance, improved solvent resistance and improved moisture resistance.
    Type: Grant
    Filed: July 11, 1989
    Date of Patent: November 26, 1991
    Assignee: GenCorp Inc.
    Inventors: Gerd M. Lenke, Donald R. Wiff
  • Patent number: 5045608
    Abstract: Block copolymers of polyimide and poly (phenylquinoxaline) have been synthesized. They are useful, particularly as dielectric layers in thin film multilayer structures. The most preferred embodiments are formed from polyimides which are those from pyromellitic dianhydride and oxydianiline. The most preferred poly (phenylquinoxaline) is a monofunctional oligomer, which yields the best microstructure.
    Type: Grant
    Filed: September 27, 1989
    Date of Patent: September 3, 1991
    Assignee: IBM Corporation
    Inventors: James L. Hedrick, Jr., Donald C. Hofer, Jeffrey W. Labadie, Sally A. Swanson, Willi Volksen