Abstract: Method for providing dielectric isolation of an epitaxial layer of a compound semiconductor or for providing separation and protection of pn-junction of a compound semiconductor by applying plasma oxidation.
Abstract: A non-phosphate built granular detergent composition is prepared which exhibits a free-flowing character resulting from the addition to the composition of benzoate salts as an anti-caking aid.
Abstract: Liquid foam-regulated washing and cleansing agent compositions containing non-ionic surface-active compounds and organic water-miscible solvents of the following composition:A. 30 to 60 percent by weight of a combination of two ethoxylated alcohols having from 12 to 20 carbon atoms,B. 2 to 6 percent by weight of an alkali metal soap of fatty acids with substantially 12 to 18 carbon atoms,C. 0.1 to 1 percent by weight of a water-soluble organic sequestering agent for heavy metal ions,D. 20 to 35 percent by weight of a water-miscible organic solvent combination of an aliphatic ether alcohol with 5 to 8 carbon atoms and an alkanediol with 2 to 6 carbon atoms, optionally with up to 3 percent by weight of ethanol or isopropyl alcohol, andE. at least 8 percent by weight up to the balance of 100 percent by weight, of water; as well as the method of washing solid articles utilizing the said compositions.
December 11, 1974
Date of Patent:
January 6, 1976
Henkel & Cie G.m.b.H.
Albrecht Lohr, Manfred Hennemann, Gunter Jakobi
Abstract: This invention generally relates to the production of alkali metal silicates. More particularly the invention relates to the production of compressed alkali metal silicate granules of desirable density and particle properties.