Patents Examined by Deoram Persaud
  • Patent number: 11372336
    Abstract: An immersion lithography apparatus controller configured to control a positioner to move a support table to follow an exposure route and to control a liquid confinement structure, the controller configured to: predict whether liquid will be lost from an immersion space during at least one motion of the route in which an edge of the object passes under an edge of the immersion space, and if liquid loss from the immersion space is predicted, modify the fluid flow such that a first fluid flow rate into or out of an opening at a leading edge of the liquid confinement structure is different to a second fluid flow rate into or out of an opening at a trailing edge of the liquid confinement structure during the motion of predicted liquid loss or a motion of the route subsequent to the motion of predicted liquid loss.
    Type: Grant
    Filed: November 1, 2017
    Date of Patent: June 28, 2022
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Erik Henricus Egidius Catharina Eummelen, Frank Debougnoux, Koen Cuypers, Han Henricus Aldegonda Lempens, Theodorus Wilhelmus Polet, Jorge Alberto Vieyra Salas, John Maria Bombeeck, Johannes Cornelis Paulus Melman, Giovanni Luca Gattobigio
  • Patent number: 11348756
    Abstract: A lens element of a charged particle system comprises an electrode having a central opening. The lens element is configured for functionally cooperating with an aperture array that is located directly adjacent said electrode, wherein the aperture array is configured for blocking part of a charged particle beam passing through the central opening of said electrode. The electrode is configured to operate at a first electric potential and the aperture array is configured to operate at a second electric potential different from the first electric potential. The electrode and the aperture array together form an aberration correcting lens.
    Type: Grant
    Filed: May 22, 2018
    Date of Patent: May 31, 2022
    Assignee: ASML Netherlands B.V.
    Inventors: Alexander Hendrik Vincent Van Veen, Willem Henk Urbanus, Marco Jan-Jaco Wieland
  • Patent number: 11333983
    Abstract: A light source for EUV is provided. The light source includes a target droplet generator, a laser generator, and a controller. The target droplet generator is configured to provide target droplets to a source vessel. The laser generator is configured to provide first laser pulses according to a control signal to irradiate the target droplets in the source vessel. The controller is configured to provide the control signal according to at least two of process parameters including temperature of the source vessel, droplet positions of the target droplets, and beam sizes and focal points of the first laser pulses. When the average value or the standard deviation of the temperature of the source vessel and the droplet positions of the target droplets exceed the predetermined range, the controller is configured to provide the control signal to the laser generator to stop providing the first laser pulses.
    Type: Grant
    Filed: October 22, 2020
    Date of Patent: May 17, 2022
    Assignee: Taiwan Semiconductor Manfacturing Company, Ltd.
    Inventors: Chi Yang, Ssu-Yu Chen, Shang-Chieh Chien, Chieh Hsieh, Tzung-Chi Fu, Bo-Tsun Liu, Li-Jui Chen, Po-Chung Cheng
  • Patent number: 11327027
    Abstract: The invention relates to a method for checking the quality of a product (1) comprising at least two cardboard portions (2) connected to each other such that a slot (10) extends between the cardboard portions from one side of the product (1) to the opposite side, with the slot (10) being expected to extend perpendicularly with respect to an outer edge of the product (1), comprising the steps of: capturing a 2D image of the slot (10) at one side of the product (1) and of the slot at the opposite side of the product, analyzing the images so as to recognize the slot (10), comparing the positions of the slot of one product at the opposite sides, making a determination whether or not a difference between the positions is within a predefined range of tolerance.
    Type: Grant
    Filed: August 16, 2018
    Date of Patent: May 10, 2022
    Assignee: BOBST MEX SA
    Inventor: Alexandre Pauchard
  • Patent number: 11300890
    Abstract: A support table configured to support a substrate, the support table having a support section to support a substrate and a conditioning system to supply heat energy to and/or remove heat energy from the support section, wherein the conditioning system comprises a plurality of conditioning units that are independently controllable.
    Type: Grant
    Filed: December 20, 2019
    Date of Patent: April 12, 2022
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Johan Gertrudis Cornelis Kunnen, Johannes Henricus Wilhelmus Jacobs, Coen Cornelis Wilhelmus Verspaget, Ronald Van Der Ham, Ivo Adam Johannes Thomas, Martijn Houben, Thibault Simon Mathieu Laurent, Gregory Martin Mason Corcoran, Ruud Hendrikus Martinus Johannes Bloks, Gerben Pieterse, Pieter Lein Joseph Gunter, Marinus Jan Remie, Sander Catharina Reinier Derks
  • Patent number: 11300891
    Abstract: Offline metrology measurements are performed on substrates that have been subjected to lithographic processing. Model parameters are calculated by fitting the measurements to an extended high-order substrate model defined using a combination of basis functions that include an edge basis function related to a substrate edge. A radial edge basis function may be expressed in terms of distance from a substrate edge. The edge basis function may, for example, be an exponential decay function or a rational function. Lithographic processing of a subsequent substrate is controlled using the calculated high-order substrate model parameters, in combination with low-order substrate model parameters obtained by fitting inline measurements to a low order model.
    Type: Grant
    Filed: December 3, 2020
    Date of Patent: April 12, 2022
    Assignee: ASML Netherlands B.V.
    Inventors: Jasper Menger, Paul Cornelis Hubertus Aben, Everhardus Cornelis Mos
  • Patent number: 11302590
    Abstract: A system for laser enhanced voltage contrast using an optical fiber is provided. The system includes a vacuum chamber with a stage that secures a wafer. A laser light source outside the vacuum chamber directs light to an optical fiber. The optical fiber transmits all wavelengths of light from the laser light source into the vacuum chamber through a wall of the vacuum chamber.
    Type: Grant
    Filed: November 22, 2019
    Date of Patent: April 12, 2022
    Assignee: KLA CORPORATION
    Inventors: Emanuel Saerchen, Donald W. Pettibone, Oscar Florendo, Li-Min Chen, Martin Brutsch
  • Patent number: 11294290
    Abstract: Disclosed are reticle fabrication methods and semiconductor device fabrication methods. The reticle fabrication method includes performing a photolithography process on a test substrate using a first reticle having first patterns, measuring the test substrate to obtain measured images, designing a second reticle having second patterns, redesigning the second reticle based on a margin of the photolithography process, and manufacturing the redesigned second reticle. Redesigning the second reticle includes obtaining sample images from the measured images when the first patterns are the same as the second patterns, obtaining contour images that have contours of sample patterns in the sample images, overlapping the contours to obtain a contour overlay value, and comparing the contour overlay value with a reference value to determine defects of the second patterns.
    Type: Grant
    Filed: June 25, 2020
    Date of Patent: April 5, 2022
    Inventors: Woo-Yong Cho, Sangwook Kim, Jaewon Yang
  • Patent number: 11293877
    Abstract: A defect detecting device includes an illumination that irradiates a measuring object with illumination light, an imager that images the illumination light reflected by the measuring object, and a detector that detects a defect at a surface of the measuring object based on a captured image obtained by imaging the illumination light by the imager. The captured image includes a plurality of spectral images having different spectral wavelengths, and the detector detects a diffuse reflection region by which the illumination light is diffusely reflected based on the plurality of spectral images, and determines a size of the defect based on the spectral wavelength of the spectral image in which the diffuse reflection region is detected.
    Type: Grant
    Filed: December 13, 2019
    Date of Patent: April 5, 2022
    Assignee: SEIKO EPSON CORPORATION
    Inventor: Ryohei Kuri
  • Patent number: 11281115
    Abstract: A lithographic apparatus is disclosed that includes a substrate table configured to support a substrate on a substrate supporting area and a heater and/or temperature sensor on a surface adjacent the substrate supporting area.
    Type: Grant
    Filed: January 6, 2020
    Date of Patent: March 22, 2022
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Nicolaas Ten Kate, Joost Jeroen Ottens, Bastiaan Andreas Wilhelmus Hubertus Knarren, Robbert Jan Voogd, Giovanni Francisco Nino, Marinus Jan Remie, Johannes Henricus Wilhelmus Jacobs, Thibault Simon Mathieu Laurent, Johan Gertrudis Cornelis Kunnen
  • Patent number: 11275319
    Abstract: Provided is a lithography apparatus capable of detecting the abnormal holding of an original in a shorter period of time. The lithography apparatus is configured to form a pattern on a substrate through use of the original, and includes: a holding unit configured to hold the original on which a first mark is formed; a measuring unit configured to pick up an image of the first mark; and a control unit configured to: cause the measuring unit to obtain the image of the first mark on the original held by the holding unit with a focus position of the measuring unit being adjusted to a reference position; and determine that the original is being abnormally held by the holding unit when a change in a first contrast, which is a contrast of the image of the first mark with respect to a reference contrast, falls out of an allowable range.
    Type: Grant
    Filed: November 21, 2019
    Date of Patent: March 15, 2022
    Assignee: CANON KABUSHIKI KAISHA
    Inventors: Koshiro Arahara, Kazumasa Tanaka
  • Patent number: 11268912
    Abstract: A substrate inspection method includes: acquiring a feature amount of each of divided areas in an inspection target peripheral edge image, the inspection target peripheral edge image being an image of a peripheral portion of a target substrate as an inspection target, the divided areas being obtained by dividing a predetermined area in the image of the peripheral portion of the target substrate into a plurality of areas; and performing a predetermined determination concerning inspection of the peripheral portion of the target substrate based on an acquisition result in the acquiring the feature amount.
    Type: Grant
    Filed: July 17, 2019
    Date of Patent: March 8, 2022
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Kazuya Hisano, Akiko Kiyotomi
  • Patent number: 11256182
    Abstract: Proposed for cleaning optical elements for the ultraviolet wavelength range having at least one metal-containing layer on a surface is a process that includes: —supplying activated hydrogen to the surface having the metal-containing layer; subsequently supplying inert gas having an H2O volume fraction of below 5 ppm, preferably below 1 ppm, particularly preferably below 0.2 ppm. To this end, an optical system (1) includes a housing (122), a supply line (161) of activated hydrogen, a supply line (162) of inert gas having an H2O volume fraction of below 5 ppm and a discharge line (163) for pumping gas out of the housing.
    Type: Grant
    Filed: October 28, 2019
    Date of Patent: February 22, 2022
    Assignee: CARL ZEISS SMT GMBH
    Inventors: Konstantin Forcht, Olaf Rogalsky, Irene Ament
  • Patent number: 11256179
    Abstract: A lithography system includes a load lock chamber comprising an opening configured to receive a mask, an exposure module configured to expose a semiconductor wafer to a light source through use of the mask, and a cleaning module embedded inside the lithography tool, the cleaning module being configured to clean carbon particles from the mask.
    Type: Grant
    Filed: October 22, 2019
    Date of Patent: February 22, 2022
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
    Inventors: Shu-Hao Chang, Norman Chen, Jeng-Horng Chen, Kuo-Chang Kau, Ming-Chin Chien, Shang-Chieh Chien, Anthony Yen, Kevin Huang
  • Patent number: 11243470
    Abstract: An optical system delivers illuminating radiation and collects radiation after interaction with a target structure on a substrate. A measurement intensity profile is used to calculate a measurement of the property of the structure. The optical system may include a solid immersion lens. In a method, the optical system is controlled to obtain a first intensity profile using a first illumination profile and a second intensity profile using a second illumination profile. The profiles are used to derive a correction for mitigating the effect of, e.g., ghost reflections. Using, e.g., half-moon illumination profiles in different orientations, the method can measure ghost reflections even where a solid immersion lens would cause total internal reflection. The optical system may include a contaminant detection system to control a movement based on received scattered detection radiation. The optical system may include an optical component having a dielectric coating to enhance evanescent wave interaction.
    Type: Grant
    Filed: August 21, 2017
    Date of Patent: February 8, 2022
    Assignee: ASML Netherlands B.V.
    Inventors: Nitish Kumar, Adrianus Johannes Hendrikus Schellekens, Sietse Thijmen Van Der Post, Ferry Zijp, Willem Maria Julia Marcel Coene, Peter Danny Van Voorst, Duygu Akbulut, Sarathi Roy
  • Patent number: 11231655
    Abstract: To provide a control apparatus, with which driving of a driving unit can be controlled with high accuracy with a simple configuration, the control apparatus (100) according to the present invention include: a plurality of current sources (20) each being configured to supply current based on a PWM method; a first detection unit configured to detect a driving state of a driving unit (14); and a control unit (50) configured to change values of a plurality of currents (Ixf, Ixb, Iyl, and Iyr) which are supplied from the plurality of current sources (20) based on a result of the detection by the first detection unit, and which are required to drive the driving unit (14), when a value of at least one of the plurality of currents (Ixf, Ixb, Iyl, and Iyr) is a predetermined value.
    Type: Grant
    Filed: January 24, 2020
    Date of Patent: January 25, 2022
    Assignee: CANON KABUSHIKI KAISHA
    Inventor: Takeshi Motegi
  • Patent number: 11231375
    Abstract: An apparatus for measurement of surface relief provides a phase sensitive camera and processing to reconstruct a wavefront profile matching the surface when illuminated with a known light source thereby providing noncontact surface relief measurements.
    Type: Grant
    Filed: May 20, 2019
    Date of Patent: January 25, 2022
    Assignee: Wisconsin Alumni Research Foundation
    Inventors: Soongyu Yi, Zongfu Yu
  • Patent number: 11226440
    Abstract: A method of forming patterned features on a substrate is provided. The method includes positioning a plurality of masks arranged in a mask layout over a substrate. The substrate is positioned in a first plane and the plurality of masks are positioned in a second plane, the plurality of masks in the mask layout have edges that each extend parallel to the first plane and parallel or perpendicular to an alignment feature on the substrate, the substrate includes a plurality of areas configured to be patterned by energy directed through the masks arranged in the mask layout. The method further includes directing energy towards the plurality of areas through the plurality of masks arranged in the mask layout over the substrate to form a plurality of patterned features in each of the plurality of areas.
    Type: Grant
    Filed: January 6, 2020
    Date of Patent: January 18, 2022
    Assignee: Applied Materials, Inc.
    Inventors: Yongan Xu, Rutger Meyer Timmerman Thijssen, Jinrui Guo, Ludovic Godet
  • Patent number: 11226554
    Abstract: An imprint apparatus executes imprint processing of curing imprint material in a state in which the imprint material supplied onto a substrate and a mold are in contact with each other. The imprint apparatus includes a modulator configured to modulate incident light, a first optical system configured to guide first light from a first light source to the modulator, and second light from a second light source that has a wavelength different from that of the first light to the modulator, and a second optical system configured to guide modulated light modulated by the modulator to the substrate.
    Type: Grant
    Filed: November 4, 2019
    Date of Patent: January 18, 2022
    Assignee: CANON KABUSHIKI KAISHA
    Inventors: Kenichi Kobayashi, Tatsuya Arakawa
  • Patent number: 11226567
    Abstract: Methods and associated apparatus for reconstructing a free-form geometry of a substrate, the method including: positioning the substrate on a substrate holder configured to retain the substrate under a retaining force that deforms the substrate from its free-form geometry; measuring a height map of the deformed substrate; and reconstructing the free-form geometry of the deformed substrate based on an expected deformation of the substrate by the retaining force and the measured height map.
    Type: Grant
    Filed: August 8, 2018
    Date of Patent: January 18, 2022
    Assignee: ASML Netherlands B.V.
    Inventors: Richard Johannes Franciscus Van Haren, Leon Paul Van Dijk, Ilya Malakhovsky, Ronald Henricus Johannes Otten, Mahdi Sadeghinia