Abstract: A method of treating a drainage system includes puncturing, by a controller, a pod retained by a pod housing, wherein the pod contains a drain treatment compound, and introducing, by the controller, water from a water supply to the pod retained by the pod housing to deliver the drain treatment compound dispersed in the water to a drain.

Abstract: Devices include first and second frame elements having mounting points connectable to opposite ends (e.g., first end, second end) of the touchscreen. First and second rollers are connected, respectively, to the first and second frame elements. A web of transparent material is supported by and between the first and second rollers. Further, an ultraviolet light device is connected to the second frame element and is positioned to expose the web of transparent material to ultraviolet radiation to disinfect the transparent material between users.

Abstract: With respect to a cleaning method of cleaning an inside of a processing chamber in a film deposition apparatus including a rotary table rotatably provided in the processing chamber, multiple mounting areas being provided on the rotary table in a circumferential direction, the cleaning method includes (a) discharging a carrier gas and a cleaning gas with rotating the rotary table, a flow rate of the carrier gas being adjusted to a first flow rate, (b) discharging the carrier gas and the cleaning gas with rotating the rotary table, the flow rate of the carrier gas being adjusted to a second flow rate less than the first flow rate, and (c) performing switching from (a) to (b) and switching from (b) to (a) a predetermined number of times while the rotary table rotates by one revolution, the predetermined number being equal to a number of the multiple mounting areas.

Abstract: A system and a method include a tool having an operative portion. The tool is disposed in relation to a first side of one or more components. An anvil is disposed in relation to a second side of the one or more components. The second side is opposite from the first side. The anvil includes a first portion separated from a second portion by a gap. A fluid circuit includes a fluid stream that extends through the gap. The fluid circuit is configured to remove foreign object debris generated in relation to the second side of the one or more components.

Abstract: A method includes performing a cleaning operation on a supporting surface of a wafer table by using a cleaning scrubber having a plurality of microstructures, the plurality of microstructures being spaced apart from each other and having a tapered width; placing a semiconductor wafer on the supporting surface of the wafer table; and performing a photolithography process on the semiconductor wafer.

Abstract: Provided are a cleaning robot and a control method thereof. The control method of the cleaning robot including a first rotation member and a second rotation member each performing a rotational motion around a first rotation axis and a second rotation axis according to the present disclosure includes: obtaining acceleration of the cleaning robot and at least one of rotational loads and rotational speeds of the respective first and second rotation members, during driving of the cleaning robot; determining whether the obtained acceleration is abnormal and whether at least one of the obtained rotational loads or at least one of the obtained rotational speeds is abnormal; and determining that an obstacle is detected when the acceleration is determined to be abnormal and at least one of the rotational loads or at least one of the rotational speeds is determined to be abnormal.

Abstract: Turbines and associated equipment are normally cleaned via water or chemical pressure washing via a mist, spray systems. However, these systems fail to reach deep across the gas path to remove fouling materials. Various embodiments herein pertain to apparatus and methods that utilize the water and exiting chemicals to generate a foam. The foam can be introduced at that gas-path entrance of the equipment, where it contacts the stages and internal surfaces. In one embodiment, the method can include: forming a first foam with a liquid cleaning agent and pressurized gas; flowing the first foam over a member or matrix and increasing the size of the cells of the first foam to form a second foam; and flowing the second foam through a structure such as a mesh or one or more apertured plates and decreasing the size of the cells of the second foam to form a third foam.

Abstract: A system for performing a bevel cleaning process on a substrate includes a substrate support including an electrode and a plurality of plasma needles arranged around a perimeter of the substrate support. The plasma needles are in fluid communication with a gas delivery system and are configured to supply reactive gases from the gas delivery system to a bevel region of the substrate when the substrate is arranged on the substrate support and electrically couple to the electrode of the substrate support and generate plasma around the bevel region of the substrate.

Abstract: A household appliance includes a control device configured to carry out a treatment program from a plurality of treatment programs, with each of the plurality of treatment programs being determined by a plurality of program parameters, an output unit configured to output a feedback survey in accordance with a feedback cycle to a user of the household appliance, and an adjustment unit configured to adjust the feedback cycle depending on a user feedback detected by an input means.

Abstract: A cleaning indicator including a substrate having an image upon it that can be interrogated to assist in monitoring a process for washing articles in a washing machine system. The image can be a printed image, which in turn is covered at least partially by a test soil to be removed by the washing process. Alternatively, the test soil can be formed into an image on the substrate. The cleaning indicator can be imaged before the start of a washing process to allow the washing process to proceed only if the appropriate image is observed. The cleaning indicator can be imaged during operation of the washing process, and when a criterion for cleanliness is met, the washing process can be automatically terminated. A washing system for using the cleaning indicator in an automated washing process is also disclosed.

Abstract: A processing apparatus configured to process a substrate includes a substrate holder having a substrate holding surface configured to attract and hold the substrate thereon; and an edge cleaning device configured to clean an edge portion of the substrate holding surface. Further, a processing method of processing a rear surface of the substrate by using the processing apparatus includes processing the rear surface of the substrate while a front surface of the substrate is attracted to and held by a substrate holding surface of a substrate holder; and cleaning an edge portion of the substrate holding surface.

Abstract: A system for cleaning a plurality of sensors of a motor vehicle includes a plurality of devices for spraying a cleaning fluid onto the sensors and a cleaning fluid storage reservoir. The cleaning system includes a distribution circuit connected to the storage reservoir and to which each of the spray devices is connected via a solenoid valve. The cleaning system further includes an electronic management unit for controlling the operation of at least the distribution circuit. In addition, the cleaning system includes an electronically controlled pump, the electronic control unit of which modifies a parameter pertaining to the flow of the cleaning fluid in the distribution circuit.

Abstract: An optical system includes a plurality of laser light sources and an optical component. A first set of one or more laser light sources is configured to emit optical disinfection light at the optical component. A second set of one or more laser light sources is configured to emit optical communication light at the optical component. The optical component is configured to distribute the optical disinfection light in a first light distribution pattern, and to distribute the optical communication light in a second light distribution pattern. The optical component includes a first set of one or more metamaterial structures configured to distribute, in the first light distribution pattern, the optical disinfection light that is incident on the optical component, and a second set of one or more metamaterial structures configured to distribute, in the second light distribution pattern, the optical communication light that is incident on the optical component.

Abstract: A cleaning device is provided. The cleaning device includes a power source and a pump in selective electrical communication with the power source. A storage container is provided. A valve assembly is disposed in the storage container and is in fluid communication with the pump. The valve assembly selectively flows cleaning fluid from a first portion and a second portion of the storage container. A cleaning element having a spray nozzle is in fluid communication with the pump.

Abstract: A cleaner comes into contact with a lower-surface center region of a substrate held by a first holder, so that the lower-surface center region is cleaned. The cleaner comes into contact with a lower-surface outer region of the substrate rotated by a second holder, so that the lower-surface outer region of the substrate is cleaned. During cleaning of the lower-surface center region, the second holder is rotated about a vertical axis while not holding the substrate. Alternatively, during cleaning of the lower-surface center region, the gas injector arranged between the cleaner and the second holder injects gas toward the substrate from a first height spaced apart from the substrate by a predetermined distance. Further, during drying of the lower-surface center region, the gas injector injects gas toward the substrate from a second height closer to the substrate than the first height.

Abstract: The present invention relates to a method of rapidly decontaminating hydrocarbon contaminated equipment by sequencing a cleaning mist or foam, an encapsulating mist or foam and a dry carrier gas.

Abstract: The present invention relates to a substrate cleaning method and a substrate cleaning apparatus for cleaning a substrate, such as a wafer. The substrate cleaning method includes: holding a periphery of a substrate (W) with holding rollers (6); rotating the substrate (W) about its central axis by rotating the holding rollers (6) about their respective central axes; delivering a two-fluid jet from a two-fluid jet nozzle (2) to a surface of the substrate (W) while moving the two-fluid jet nozzle (2) in a radial direction of the substrate (W), the two-fluid jet (2) being composed of a mixture of a first liquid and a gas; and when the two-fluid jet is being delivered to the surface of the substrate (W), delivering a fan-shaped jet of a second liquid from a spray nozzle (3) to the surface of the substrate (W) to form a flow of the second liquid on the surface of the substrate (W). The fan-shaped jet is located away from the two-fluid jet.

Abstract: A wiping member to wipe a nozzle surface of a liquid discharging head includes a first layer configured to be brought into contact with the nozzle surface and one or more other layers, wherein the following relation is satisfied: t1<t2, where t1 represents the thickness of the first layer and t2 represents the thickness of the one or more other layers, wherein the porosity of the first layer is smaller than the porosity of at least one of the one or more other layers.

Abstract: A device and method for protecting an optical sensor of a vehicle are disclosed, wherein the sensor is protected from environmental pollutants which may adhere to an optical surface of the sensor if the sensor is exposed to them, and wherein the environmental pollutants are kept away from the sensor by an ultrasonic cleaning of the sensor surface using an ultrasonic field. The ultrasonic field of the ultrasonic cleaning is emitted by a protection device into the air to provide a protection zone around the optical surface of the sensor such that a contact of the optical surface with the environmental pollutants is avoided, wherein the environmental pollutants are moved and/or destroyed in the air away from the sensor if they enter the protection zone), and wherein the protection zone provides a contactless cleaning of the sensor.

Abstract: A system and method of testing a part manufactured using an additive manufacturing process. The part may be excited via an input mechanism that imparts an excitation force on the part to induce a dynamic response in the part. An output mechanism may be used to sense the dynamic response in the part. A processing element may be used to compare the dynamic response with a reference to identify an indication of excess powder in the part.