Abstract: The present disclosure relates to a Gallium-Nitride (GaN) based module, which includes a module substrate, a thinned switch die residing over the module substrate, a first mold compound, and a second mold compound. The thinned switch die includes an electrode region, a number of switch interconnects extending from a bottom surface of the electrode region to the module substrate, an aluminium gallium nitride (AlGaN) barrier layer over a top surface of the electrode region, a GaN buffer layer over the AlGaN barrier layer, and a lateral two-dimensional electron gas (2DEG) layer realized at a heterojunction of the AlGaN barrier layer and the GaN buffer layer. The first mold compound resides over the module substrate, surrounds the thinned switch die, and extends above a top surface of the thinned switch die to form an opening over the top surface of the thinned switch die. The second mold compound fills the opening.

Abstract: A component-embedded substrate includes a first wiring substrate, an electronic component provided on the first wiring substrate, an intermediate wiring substrate provided around the electronic component on the first wiring substrate and connected to the first wiring substrate via a first connection member, a second wiring substrate provided above the first wiring substrate, the electronic component and the intermediate wiring substrate, and connected to the intermediate wiring substrate via a second connection member, and an encapsulating resin filled between the first wiring substrate and the second wiring substrate and covering the electronic component and the intermediate wiring substrate. Side surfaces of the intermediate wiring substrate are entirely covered by the encapsulating resin.

Abstract: A semiconductor device includes: a first semiconductor region; and a first electrode on the first semiconductor region; wherein first semiconductor region includes a first layer and a second layer, the second layer includes a first portion and a second portion adjacent to the first portion, the first portion has a first thickness, the second portion has a second thickness less than the first thickness, the first layer includes a first material and a first dopant, the first material includes multiple elements, the first dopant has a first concentration, the second layer includes a second material and a second dopant, the second material includes multiple elements, the second dopant has a second concentration, one of the elements of the first material of the first layer is different from the elements of the second material of the second layer.

Abstract: A semiconductor package includes: a frame substrate having a plurality of wiring layers and a cavity; an adhesive member disposed at the bottom of the cavity; a semiconductor chip disposed in the cavity, with a connection pad on an upper surface and the lower surface in contact with the adhesive member; a first conductive bump disposed on the connection pad; a second conductive bump disposed on the uppermost of the plurality of wiring layers; an insulating post disposed in the cavity and whose lower surface contacts the adhesive member; an encapsulant filling the cavity and covering side surfaces of the first and second conductive bumps and the insulating post’ and a redistribution structure disposed on the encapsulant, including a redistribution layer electrically connected to the first and second conductive bumps, wherein the insulating post includes a material having a greater hardness than that of the first and second conductive bumps.

Abstract: A semiconductor device with different gate structure configurations and a method of fabricating the same are disclosed. The semiconductor device includes a fin structure disposed on a substrate, and first and second gate structures on the fin structure. The first and second gate structures includes first and second interfacial oxide layers, respectively, first and second high-K gate dielectric layers disposed on the first and second IO layers, respectively, and first and second dopant control layers disposed on the first and second HK gate dielectric layers, respectively. The second dopant control layer has a silicon-to-metal atomic concentration ratio greater than an Si-to-metal atomic concentration ratio of the first dopant control layer. The semiconductor further includes first and second work function metal layers disposed on the first and second dopant control layers, respectively, and first and second gate metal fill layers disposed on the first and second work function metal layers, respectively.

Abstract: To achieve a size reduction of a semiconductor package while securing stability in mounting. Three terminals t1, t2, and t4 are individually arranged on a semiconductor package 10 having a rectangular shape as viewed in plan in such a manner that the center in the longitudinal direction of the semiconductor package 10 of each of the three terminals t1, t2, and t4 and the center in the longitudinal direction of each of the other terminals are not overlapped with each other as viewed from the side of the long side.

Abstract: A solid-state imaging device according to the present disclosure includes a photoelectric conversion film that is provided outside a semiconductor substrate on a pixel-by-pixel basis, performs photoelectric conversion on light having a predetermined wavelength range, and transmits light having wavelength ranges other than the predetermined wavelength range, and a photoelectric conversion region that is provided inside the semiconductor substrate on a pixel-by-pixel basis and performs photoelectric conversion on the light having the wavelength ranges, the light having the wavelength ranges having passed through the photoelectric conversion film. The photoelectric conversion film includes a film having an avalanche function.

Abstract: A light-emitting device (20) includes a first light-emitting member (10a) and a second light-emitting member (10b). Each of the first light-emitting member (10a) and the second light-emitting member (10b) includes a first surface (12) and a second surface (14), and light is emitted from the first surface (12). The first light-emitting member (10a) includes a first region (16a) and a second region (16b), the first region (16a) of the first light-emitting member (10a) being located on the second surface (14) side of the second light-emitting member (10b) and the second region (16b) of the first light-emitting member (10a) being located on the first surface (12) side of the second light-emitting member (10b).

Abstract: A semiconductor package according to an exemplary embodiment of the present disclosure may comprise a semiconductor chip comprising a chip pad; a redistribution layer electrically connected to the chip pad of the semiconductor chip; an external connection terminal electrically connected to the redistribution layer; a sealing material covering the semiconductor chip and configured to fix the semiconductor chip and the redistribution layer; an adhesive film positioned on the upper surface of the sealing material; and a heat sink formed on the upper surface of the adhesive film and having a stepped portion at the periphery thereof.

Abstract: A display device is provided. The display device includes: a display substrate on which a plurality of light-emitting areas are defined; and a color conversion substrate on which a plurality of light-transmitting areas respectively associated with the plurality of light-emitting areas and light-blocking areas between the plurality of light-transmitting areas are defined, the color conversion substrate comprising color patterns in the light-blocking areas, and light-blocking members on the color patterns, wherein at least one of the light-emitting areas has an area smaller than the area of the light-transmitting area that overlaps it in a thickness direction, and the color patterns include a blue colorant.

Abstract: A pixel bank manufacturing method, a pixel bank structure, a pixel structure, and a display panel are provided. The method includes providing a base substrate, wherein a plurality of anode thin film layers are manufactured on the base substrate; coating a photoresist layer used for covering the plurality of anode thin film layers on the base substrate; performing a photolithography on the photoresist layer by an exposing patterning structure, and baking to cure a remained photoresist layer after the photolithography to form a first bank layer; the exposing patterning structure is a structure that full via holes, first half via holes, a plurality of blind via holes, and second half via holes are arranged repeatedly; forming a second bank layer on the first bank layer; the second bank layer is a black bank layer.

Abstract: Disclosed herein are tunneling field effect transistors (TFETs), and related methods and computing devices. In some embodiments, a TFET may include: a first source/drain material having a p-type conductivity; a second source/drain material having an n-type conductivity; a channel material at least partially between the first source/drain material and the second source/drain material, wherein the channel material has a first side face and a second side face opposite the first side face; and a gate above the channel material, on the first side face, and on the second side face.

Abstract: A display panel and a manufacturing method thereof, the display panel includes a first sub-pixel strip, a second sub-pixel strip, and a third sub-pixel strip arranged in a row direction or a column direction. The sub-pixels on each sub-pixel strip of the present disclosure have the same color and are arranged in series. The first sub-pixels on the first sub-pixel strip and the second sub-pixels on the second sub-pixel strip are staggered to improve flatness of printing the luminous material and luminous uniformity of OLED devices.

Abstract: A wiring substrate includes a resin layer formed of an insulating resin, a first component, at least a part of which is embedded in the resin layer, a first wiring embedded in the resin layer, the first wiring including an exposed surface exposed from the resin layer at a first surface-side of the resin layer, and a first electrode including a wiring portion and an electrode portion, the wiring portion embedded in the resin layer and connecting to the first component in the resin layer, the electrode portion protruding from the first surface-side of the resin layer to a position higher than the exposed surface of the first wiring.

Abstract: An organic light-emitting display panel and a manufacturing method thereof are provided. A thin-film encapsulation layer in the organic light-emitting panel extends to cover a wall surface of the functional structure layer facing to a light-transmitting hole, and comprehensively protects the functional structure layer and the light-emitting layer.

Abstract: An electronic component includes a first insulating layer, a resistance layer including a metal thin film that is formed on the first insulating layer, the resistance layer having a first end portion, a second end portion and a central portion between the first end portion and the second end portion, a first electrode having a first contact portion and a second contact portion spaced away from the first contact portion both of which are in contact with the resistance layer at a portion of the first end portion side with respect to the central portion of the resistance layer, a notched portion formed in the first end portion of the resistance layer and between the first contact portion and the second contact portion, and a second electrode having a contact portion in contact with the resistance layer at a portion of the second end portion side with respect to the central portion of the resistance layer.

Abstract: At least one polymer material may be employed to facilitate bonding between the semiconductor dies. Plasma treatment, formation of a blended polymer, or formation of polymer hairs may be employed to enhance bonding. Alternatively, air gaps can be formed by subsequently removing the polymer material to reduce capacitive coupling between adjacent bonding pads.

Abstract: Embodiments of 3D memory devices and methods for forming the same are disclosed. In an example, a method for forming a 3D memory device is disclosed. A stop layer, a first polysilicon layer, a sacrificial layer, a second polysilicon layer, and a dielectric stack are sequentially formed at a first side of a substrate. A channel structure extending vertically through the dielectric stack, the second polysilicon layer, the sacrificial layer, and the first polysilicon layer, stopping at the stop layer, is formed. An opening extending vertically through the dielectric stack and the second polysilicon layer, stopping at the sacrificial layer to expose part of the sacrificial layer, is formed. The sacrificial layer is replaced, through the opening, with a third polysilicon layer between the first and second polysilicon layers. The substrate is removed from a second side opposite to the first side of the substrate, stopping at the stop layer.

Abstract: A semiconductor device includes a substrate, a semiconductor fin, source region, a gate electrode, a source contact, and a source via. The semiconductor fin has a length extending above the substrate. The source region is on the semiconductor fin. The gate electrode has a length across the semiconductor fin. The source contact is above the source region. The source via lands on the source contact and has a first dimension along a lengthwise direction of the semiconductor fin and has a second dimension along a lengthwise direction of the gate electrode from a top view. A ratio of the second dimension to the first dimension of the source via is greater than about 2.

Abstract: A method for forming a semiconductor structure includes: forming a first gate structure in a predetermined low-potential region of a substrate and a second gate structure in a predetermined high-potential region of the substrate; sequentially forming a first dielectric layer and a second dielectric layer covering the first gate structure and the second gate structure; forming a portion of a third dielectric layer along sidewalls of the second gate structure and on the second dielectric layer; and etching the first dielectric layer and the second dielectric layer with the portion of the third dielectric layer as an etching hard mask to form a first composite spacer covering sidewalls of the first gate structure, and a second composite spacer covering the sidewalls of the second gate structure, wherein a width of the first composite spacer is less than a width of the second composite spacer.