Patents Examined by George F. Lesmes
  • Patent number: 5763327
    Abstract: A composite of an anti-reflective coating on polysilicon is accurately etched to form a polysilicon pattern by initially etching the ARC with gaseous plasma containing helium and/or nitrogen which is substantially inert with respect to polysilicon.
    Type: Grant
    Filed: November 8, 1995
    Date of Patent: June 9, 1998
    Assignee: Advanced Micro Devices, Inc.
    Inventors: Tom Blasingame, Subash Gupta, Scott A. Bell
  • Patent number: 5759743
    Abstract: It is an object of the present invention to provide a developer-circulating method and an apparatus for carrying out the method in making a flexographic printing plate which prevents dissolved chemical substance from adversely affecting human bodies and has excellent safety; capable of preventing the increase of the viscosity of developer; and capable of effectively preventing the dissolved chemical substance from adhering to the apparatus, thus preventing the life of the apparatus from being reduced and collecting the dissolved chemical substance in a short period of time and which is superior in operation efficiency, work efficiency, and treating efficiency. Solid content of liquid containing resin component which has eluted from flexographic printing plates 3, 42 and dispersed in developer is flocculated by flocculating agent, and the liquid containing the flocculated solid content is separated into the liquid and solid contents.
    Type: Grant
    Filed: March 11, 1996
    Date of Patent: June 2, 1998
    Assignee: Nippon Paint Co., Ltd.
    Inventors: Hisaichi Muramoto, Yasushi Umeda
  • Patent number: 5759932
    Abstract: An improved thermal barrier coating for metal substrates such as superalloys is provided. The coating is a slurry composition, comprising spheres of zirconia, at least some of which are hollow, contained within a porous oxide matrix, such as aluminosilicate. The slurry composition can be applied by slurry casting or similar techniques to the desired surface. Coating methods involve the application of successive layers of variations of the slurry composition, with various curing techniques used between layers and after the final coating is applied. Another embodiment of this invention embraces a composite coating, comprising (i) an oxide matrix phase; (ii) zirconia spheres embedded in the oxide matrix; and (iii) a porous phase.
    Type: Grant
    Filed: November 8, 1996
    Date of Patent: June 2, 1998
    Assignee: General Electric Company
    Inventors: D. Sangeeta, Lawrence Edward Szala, David Winfield Woodruff, Bangalore Aswatha Nagaraj, Daniel Scott McAtee, Clifford Lawrence Spiro
  • Patent number: 5756258
    Abstract: The present invention relates to photopolymerizable compositions comprising an addition-polymerizable compound which has at least one ethylenically unsaturated double bond; a radical-producing agent and a squarylium compound represented by the formula (I): ##STR1## The compositions are highly sensitive to visible and near infrared lights, particularly He-Ne laser, LED, diode laser, etc. having oscillation wavelengths in a wavelength region of 600 nm or more, and thus are useful as materials for holograms, presentized plates for laser direct process, dry film resists, digital proofs, photosensitive microcapsules.
    Type: Grant
    Filed: February 10, 1995
    Date of Patent: May 26, 1998
    Assignee: Kyowa Hakko Co., Ltd.
    Inventors: Tsuguo Yamaoka, Kenichi Koseki, Mitsuharu Obara, Ikuo Shimizu, Yukiyoshi Ito, Hitoshi Kawato
  • Patent number: 5756266
    Abstract: A lithographic process for fabricating a device is disclosed. An area of radiation sensitive material is formed on a substrate. The radiation sensitive material contains a polymeric component The polymeric component is the copolymerization product of a maleimide monomer and at least two other monomers. Acid labile groups are pendant to one of the monomers with which the maleimide monomer is copolymerized. The acid labile groups are pendant to less than 50 mole percent of the monomers that make up the copolymer. The acid labile groups are not pendant to the maleimide monomer.The radiation sensitive material is patternwise exposed to radiation after it is formed on the substrate. The patternwise exposure transfers an image into the radiation sensitive material. The image is developed into a pattern in the radiation sensitive material. The pattern is then transferred into the substrate.
    Type: Grant
    Filed: July 15, 1996
    Date of Patent: May 26, 1998
    Assignee: Lucent Technologies Inc.
    Inventors: Mary Ellen Galvin-Donoghue, Elsa Reichmanis
  • Patent number: 5756235
    Abstract: A phase shift mask provided with an alignment error measuring pattern which is a phase shift film pattern portion formed in a space defined between dense patterns of the phase shift mask having an alternating type pattern structure so that an error in alignment between a chromium pattern and a phase shift film pattern occurring in the fabrication of the phase shift mask can be measured by checking, through a microscope, a wafer provided with a pattern formed using the phase shift mask. The phase shift film pattern portion is arranged on the central portion of a quartz substrate.
    Type: Grant
    Filed: September 17, 1996
    Date of Patent: May 26, 1998
    Assignee: Hyundai Electronics Industries Co., Ltd.
    Inventor: Hung Eil Kim
  • Patent number: 5752130
    Abstract: An image forming apparatus includes a first image-bearing member, latent image-forming unit for forming an electrostatic latent image on the first image-bearing member, developer for developing the electrostatic latent image with a toner to form a toner image, an intermediate transfer member for receiving the toner image by primary transfer and transferring the toner image onto a second image-bearing member by secondary transfer, a charging member for charging a residual toner remaining on the intermediate transfer member after the secondary transfer, and a recovery member for recovering the charged residual toner at a recovery position by voltage application. The intermediate transfer member exhibits a charging characteristic such that it has a surface potential of at most 500 volts as an absolute value at the recovery position.
    Type: Grant
    Filed: July 3, 1996
    Date of Patent: May 12, 1998
    Assignee: Canon Kabushiki Kaisha
    Inventors: Atsushi Tanaka, Hiroyuki Kobayashi, Akihiko Nakazawa, Tsunenori Ashibe, Takashi Kusaba
  • Patent number: 5747545
    Abstract: Disclosed is a method for decreasing NMDA receptor-mediated neuronal damage in a mammal by administering to the mammal a nitroso-compound that generates nitric-oxide or related redox species, in a concentration effective to effect neuroprotection. Also disclosed is a method for decreasing NMDA receptor-mediated neuronal damage in a mammal by administering to the mammal a nitroso-compound that generates nitric oxide (or a related redox species such as NO.sup.- or NO.sup.+ equivalent), or a physiologically concentration effective to cause such neuroprotection.
    Type: Grant
    Filed: March 22, 1995
    Date of Patent: May 5, 1998
    Assignee: The Children's Medical Center Corporation
    Inventor: Stuart A. Lipton
  • Patent number: 5747206
    Abstract: An electrophotographic photoreceptor comprising a conductive substrate having thereon an undercoat layer and a photoconductive layer, the undercoat layer comprising a specific polymer compound which is prepared by using at least one of monomers represented by formula (1): ##STR1## wherein R.sup.1 represents a hydrogen atom or a methyl group; and A represents a group represented by formula (2), (3), (4), (5) or (6): ##STR2## where the symbols in the above formulae are defined in the specification.
    Type: Grant
    Filed: August 13, 1996
    Date of Patent: May 5, 1998
    Assignee: Fuji Xerox Co., Ltd.
    Inventors: Takeshi Agata, Akira Imai, Yasuo Yamamoto, Yutaka Sugizaki, Katsuhiro Sato
  • Patent number: 5741616
    Abstract: A method of developing latent electrostatic images and a developer-bearing member for use in the method are disclosed, which method includes the steps of (a) forming numerous micro closed electric fields near the surface of a rotatable developer-bearing member which comprises an electroconductive support and a surface layer formed thereon comprising an electroconductive organic polymeric matrix and numerous minute charge-retainable insulating segments distributed at least one the surface of the surface layer, by electrically charging the surface of the charge-retainable insulating segments; (b) supplying a one-component type developer comprising toner particles to the rotatable developer-bearing member to hold the developer on the rotatable developer-bearing member to hold the developer on the rotatable developer-bearing member by the numerous micro closed electric fields; and (c) bringing the rotatable developer-bearing member near or into contact with a latent-electrostatic-image-bearing member which bears
    Type: Grant
    Filed: November 14, 1994
    Date of Patent: April 21, 1998
    Assignee: Ricoh Company, Ltd.
    Inventors: Yasuo Hirano, Jun Aoto, Kazuo Nojima, Koji Suzuki, Hiroshi Takashima, Shigekazu Enoki, Yuichi Ueno, Naoki Iwata
  • Patent number: 5741628
    Abstract: A resist film is formed on a semiconductor substrate by using a chemical amplification resist which generates an acid in response to the radiation of KrF excimer laser light and which reacts with the acid. If the resist film is irradiated with the KrF excimer laser light through a mask, the acid is generated in the surface of an exposed portion of the resist film, so that the surface of the exposed portion is made hydrophilic by the acid. If water vapor is supplied to the surface of the resist film, water is diffused from the surface of the exposed portion into a deep portion. If vapor of methyltriethoxysilane is sprayed onto the surface of the resist film in air at a relative humidity of 95%, an oxide film with a sufficiently large thickness is selectively formed on the surface of the exposed portion.
    Type: Grant
    Filed: October 7, 1996
    Date of Patent: April 21, 1998
    Assignee: Matsushita Electric Industrial Co., Ltd.
    Inventors: Takahiro Matsuo, Kazuhiro Yamashita, Masayuki Endo, Masaru Sasago
  • Patent number: 5741615
    Abstract: A light receiving member comprising a substrate and a light receiving layer disposed on said substrate, said light receiving layer being composed of a non-Si (H,X) material containing silicon atoms (Si) as a matrix and at least one kind of atoms selected from the group consisting of hydrogen atoms (H) and halogen atoms (X), characterized in that said light receiving layer further contains at least chromium atoms (Cr), iron atoms (Fe)f nickel atoms (Ni), sodium atoms (Na), and magnesium atoms (Mg) respectively in an amount of 0.9 atomic ppm or less.The light receiving member is suitable for use as electronic devices such as electrophotographic light receiving members, solar cells, and the like, wherein it stably and continuously exhibits desirable characteristics without being deteriorated even upon repeated use over a long period of time.
    Type: Grant
    Filed: June 2, 1994
    Date of Patent: April 21, 1998
    Assignee: Canon Kabushiki Kaisha
    Inventors: Keishi Saitoh, Kozo Arao, Tatsuyuki Aoike
  • Patent number: 5741618
    Abstract: A process for producing a polymer toner comprises the steps of pouring a polymerizable monomer composition containing at least a polymerizable monomer and a colorant, but containing no oil-soluble polymerization initiator into an aqueous dispersion medium containing a dispersing agent; adding an oil-soluble polymerization initiator to the polymerizable monomer composition while stirring the composition to form primary droplets thereof, thereby bringing the droplets of the polymerizable monomer composition into contact with droplets of the oil-soluble polymerization initiator to form droplets of a polymerizable monomer composition containing the oil-soluble polymerization initiator; further continuing the stirring to form secondary droplets having desired droplet sizes; and then conducting suspension polymerization of the polymerizable monomer composition.
    Type: Grant
    Filed: October 10, 1996
    Date of Patent: April 21, 1998
    Assignee: Nippon Zeon Co. Ltd.
    Inventors: Kazunori Shigemori, Tokudai Ogawa
  • Patent number: 5741621
    Abstract: A process for preparing an image on a substrate by applying a photoimageable composition on a first substrate, wherein the photoimageable composition, having a solids content from 25 to 60 weight percent, contains a partially neutralized acid-containing polymer formed from a precursor polymer having an acid number from 90 to 160 prior to neutralization and wherein 1 to 15% of acid-containing groups of the precursor polymer are neutralized with base; an ethylenically unsaturated monomer; a photoinitiator or photoinitiating system, water; 0-5% by weight a solution polymer, based on the weight of total polymer present in the composition; and 0-25% by weight of an organic solvent based on the total weight of the organic solvent and water; wherein the liquid composition is present as a stable emulsion, and wherein the liquid composition has a Brookfield viscosity, at 25.degree. C.
    Type: Grant
    Filed: December 23, 1996
    Date of Patent: April 21, 1998
    Assignee: E. I. du Pont de Nemours and Company
    Inventors: Richard Joseph Kempf, John Haetak Choi, Harvey Walter Taylor, Jr.
  • Patent number: 5741629
    Abstract: Polymers suitable for chemically amplified resists based on styrene chemistry are advantageously formed with a meta substituent on the phenyl ring of the styrene moiety. Additionally, polymers for such applications including, but not limited to, meta substituted polymers are advantageously formed by reacting a first monomer having a first protective group with a second monomer having a second protective group. After polymerization, the second protective group is removed without substantially affecting the first protective group. For example, if the first protective group is an alkoxy carbonyl group, and the second protective group is a silyl ether group, treatment with a lower alcohol with trace amounts of acid transforms the silyl group into an OH-moiety without affecting the alkoxy carbonyl group.
    Type: Grant
    Filed: October 15, 1996
    Date of Patent: April 21, 1998
    Assignee: Lucent Technologies Inc.
    Inventors: Edwin Arthur Chandross, Janet Mihoko Kometani, Omkaram Nalamasu, Elsa Reichmanis, Kathryn Elizabeth Uhrich
  • Patent number: 5738971
    Abstract: A photosensitive composition comprises an organic polymer and a photo-polymerizable monomer. The photo-polymerizable monomer has the following formula: ##STR1## in which R.sup.1 represents an alkylene group having 2 to 5 carbon atoms, R.sup.2 represents a hydrogen atom or an alkyl group having 1 to 5 carbon atoms, and n represents the number of 0.5 to 5.
    Type: Grant
    Filed: December 20, 1995
    Date of Patent: April 14, 1998
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Tamotsu Suzuki, Mikio Totsuka
  • Patent number: 5736297
    Abstract: The invention relates to a positive-working radiation-sensitive mixture containing a) a compound which forms acid when exposed to actinic radiation, b) a compound containing at least one C--O--C or C--O--Si bond which can be cleaved by said acid, and c) a water-insoluble polymeric binder which is soluble, or at least swellable, in aqueous alkaline solutions, wherein the compound a) comprises the structure of the formulae I, II or III: ##STR1## The radiation-sensitive mixture according to the invention is notable for a high resolution and a high sensitivity over a wide spectral range. It also has high thermal stability and does not form any corrosive photolysis products on exposure to light.The invention furthermore relates to a radiation-sensitive recording material produced therefrom which is suitable for producing photoresists, electronic components, printed circuit boards or for chemical milling.
    Type: Grant
    Filed: July 22, 1996
    Date of Patent: April 7, 1998
    Assignee: Clariant GmbH
    Inventors: Horst Roeschert, Georg Pawloski
  • Patent number: 5736298
    Abstract: A photo-sensitive resin composition is provided which contains (1) a particulate polymer of a carboxy-group-containing-diene having a cross-linked structure; (2) a polymer having two or more photo-polymerizable unsaturated groups at its molecular chain terminals, and, optionally, a photo-polymerizable unsaturated group, carboxyl group, hydroxy group, amino group, or epoxy group in side chains, or (2') a non-diene-type polymer having a photo-polymerizable unsaturated group, carboxyl group, hydroxy group, amino group, or epoxy group in side chains, or a low molecular weight linear diene-type polymer; (3) a photo-polymerizable unsaturated monomer; (4) a polymer containing an amino group; and (5) a photo-polymerization initiator. The photo-sensitive resin composition has excellent water-developing capability and shows almost no swelling in water, causing minimal reduction in strength and only minimal dimensional changes during development.
    Type: Grant
    Filed: October 2, 1995
    Date of Patent: April 7, 1998
    Assignee: Japan Synthetic Rubber Co., Ltd.
    Inventors: Katsuo Koshimura, Takayoshi Tanabe, Hozumi Sato, Noboru Ohshima, Takashi Nishioka
  • Patent number: 5736291
    Abstract: A combination of five colored toners containing resin and certain pigments of magenta, yellow, orange, red, and black, and processes for the preparation of these toners by, for example, mixing a cyan, magenta, orange, or red and yellow pigment water wet cake with toner resin, followed by substantially removing the water to generate pigmented resin.
    Type: Grant
    Filed: October 9, 1996
    Date of Patent: April 7, 1998
    Assignee: Xerox Corporation
    Inventors: Edul N. Dalal, Sue E. Blaszak, Kristen M. Natale-Hoffman, Jacques C. Bertrand, Roger N. Ciccarelli, Denise R. Bayley
  • Patent number: 5733700
    Abstract: The present invention is directed to an encapsulated toner for heat-and-pressure fixing whose shell contains a copolymer having one or more acid anhydride groups as the main component. The encapsulated toner of the present invention has excellent offset resistance and fixing ability even at a low fixing temperature, and also it is excellent in blocking resistance. Further, since the resin having a negative charge is used as a shell material, clear images free from background contamination can be stably formed for a large number of copying.
    Type: Grant
    Filed: January 17, 1997
    Date of Patent: March 31, 1998
    Assignee: Kao Corporation
    Inventors: Tetsuya Asano, Mitsuhiro Sasaki, Kuniyasu Kawabe