Patents Examined by George F. Lesmes
  • Patent number: 5656414
    Abstract: Simple and cost-effective methods for forming tall, high-aspect ratio structures in a material layer comprising a first layer of a image-reversal-type photo-sensitive material and a second layer of a positive-type photo-sensitive material is disclosed. The layers are formed, exposed to actinic radiation, and developed such that the formation, exposure, and development of the second layer does not substantially modify or destroy the patterns formed in the first layer. In one embodiment, the first layer is exposed to actinic radiation through a first mask comprising the complimentary image, or negative, of a desired high-aspect ratio structure. The image in the first layer is then reversed by heating to an elevated temperature and subsequently blank flood exposure of actinic radiation. A second layer of a positive type photo-sensitive material chemically compatible with the IRP layer is then formed over the first layer.
    Type: Grant
    Filed: April 23, 1993
    Date of Patent: August 12, 1997
    Assignee: Fujitsu Limited
    Inventors: William Tai-Hua Chou, Wen-chou Vincent Wang
  • Patent number: 5652052
    Abstract: A cloth employing graphite fibers may be subjected to different composite material formation processes so that three separate sections of heat capability may result across continuous fibers. Thus, one section may have optimum cold temperature strength while a removed section may have optimum high-temperature strength, with a transition section interceding. The existence of continuous fibers across these sections obviates the necessity for a mechanical joint thereby maximizing the reliability and performance characteristics of a resulting composite structure.
    Type: Grant
    Filed: March 12, 1992
    Date of Patent: July 29, 1997
    Assignee: Northrop Grumman Corporation
    Inventors: Robert A. Haslett, Willy A. Wolter, Robert G. Micich
  • Patent number: 5648196
    Abstract: The present invention provides positive-tone and negative-tone photoresists including a photoinitiator comprising a compound of Formula (I): ##STR1## wherein R.sub.1 and R.sub.2 are independently selected from C.sub.1 -C.sub.6 alkyl; n is a number from 2 to 5, and An.sup.- is an anion. The photoinitiator comprising the compound of Formula (I) being soluble in water. Methods of preparing positive-tone and negative-tone photoresists are also provided.
    Type: Grant
    Filed: July 14, 1995
    Date of Patent: July 15, 1997
    Assignee: Cornell Research Foundation, Inc.
    Inventors: Jean M. J. Frechet, Sang-Yeon Shim
  • Patent number: 5648201
    Abstract: A process for efficient modification and metallization of substrates includes the steps of providing a substrate with highly photoefficient chemical functional groups on at least a portion of this substrate, exposing the substrate to actinic radiation to transform, deactivate, or remove these chemical functional groups, to modify their chemical reactivity, and carrying out further chemical reaction steps on these modified chemical functional groups.
    Type: Grant
    Filed: December 16, 1992
    Date of Patent: July 15, 1997
    Assignee: The United Sates of America as represented by the Secretary of the Navy
    Inventors: Charles S. Dulcey, Timothy S. Koloski, Walter J. Dressick, Jeffrey M. Calvert, Brian M. Peek
  • Patent number: 5645974
    Abstract: Compositions comprising a linear base polymer, an ethylenically unsaturated addition-polymerizable compound and a combination of (A) a 1-benzoyl-1-amino-substituted-1-benzylalkane with (B) an .alpha.-phenyl-.alpha.,.alpha.-dialkoxyacetophenone as photopolymerization initiator are suitable for the production of thick-film printing plates.
    Type: Grant
    Filed: April 22, 1996
    Date of Patent: July 8, 1997
    Assignees: Tokyo Ohka Kogyo, K.K., Ciba-Geigy Corporation
    Inventors: Katsuyuki Ohta, Toshiya Takagi, Toshimi Aoyama
  • Patent number: 5637440
    Abstract: A composition for forming a metal oxide thin film pattern which is a solution containing one or more hydrolytic metal compounds selected from the group consisting of hydrolytic organometallic compounds (e.g., metal alkoxide) and metal halides, and a water generating agent which frees water under the effect of irradiation with active rays (e.g., o-nitrobenzyl alcohol and 2-nitroethanol) and, as required, an acid generating agent which frees acid under the effect of irradiation with active rays is disclosed. A thin film pattern is formed by coating the composition onto a substrate, irradiating active rays for forming an image on the resultant photosensitive coating film, developing the same with water or an alcoholic solvent to remove the non-exposed portion, and heat-treating the substrate to convert the remaining film into a metal oxide, thereby forming a negative-type metal oxide thin film pattern.
    Type: Grant
    Filed: December 22, 1994
    Date of Patent: June 10, 1997
    Assignee: Mitsubishi Materials Corporation
    Inventors: Katsumi Ogi, Tsutomu Atsuki, Go Sasaki, Tadashi Yonezawa, Nobuyuki Soyama
  • Patent number: 5637443
    Abstract: An uncomplicated and easy to control process for forming patterns, wherein an active beam sensitive resin is exposed to an active beam such that a correctly formed pattern is produced on the resin. The process comprises the steps of forming a film of an active beam sensitive resin on a substrate, exposing the film to an active beam, and developing the exposed film with a developing solution comprising a weakly basic salt in a basic aqueous solution having a hydrogen ion concentration sufficient to finish the developing within a desired period of time and an ionic strength sufficient to prevent a substantial decrease in the thickness of the exposed film.
    Type: Grant
    Filed: July 5, 1994
    Date of Patent: June 10, 1997
    Assignee: Mitsubishi Denki Kabushiki Kaisha
    Inventors: Yasuhiro Yoshida, Shigeru Kubota, Akihiko Yamaguchi, Kenichiro Ishibashi
  • Patent number: 5637432
    Abstract: The present invention provides a toner for developing an electrostatic image, comprising toner particles and external additives, wherein;said external additives comprise (A) titanium oxide particles having a weight average particle diameter of from 0.01 .mu.m to 0.2 .mu.m, having been subjected to hydrophobic treatment, (B) organic resin particles having a weight average particle diameter of from 0.02 .mu.m to 0.5 .mu.m and (C) an inorganic compound having a weight average particle diameter of from 0.5 .mu.m to 2.5 .mu.m; said external additives being added in an amount satisfying the relationship:(A):(B)=2:1 to 10:1(A):(C)=1:1 to 5:1; andsaid toner contains toner particles having a particle diameter of from 2 .mu.m to 5 .mu.m in an amount of from 15% by number to 40% by number.
    Type: Grant
    Filed: February 28, 1995
    Date of Patent: June 10, 1997
    Assignee: Canon Kabushiki Kaisha
    Inventors: Kenji Okado, Toshiyuki Ugai, Ryoichi Fujita, Tsuyoshi Takiguchi, Yasuhiro Ichikawa
  • Patent number: 5635332
    Abstract: A photoresist composition containing an alkylsulfonium salt compound represented by the following general formula (I): ##STR1## wherein R.sup.1 and R.sup.2 may be the same or different, each being a linear, branched or cyclic C.sub.1 to C.sub.8 alkyl radical, R.sup.3 is a linear, branched or cyclic C.sub.1 to C.sub.8 alkyl radical, a C.sub.5 to C.sub.7 2-oxocycloalkyl radical, or a linear or branched C.sub.3 to C.sub.8 2-oxoalkyl radical, and Y.sup.- represents a counter ion. The photoresist composition has high transparency to deep U.V. light having wavelengths of 220 nm or less and is capable of forming good fine patterns with high sensitivity, thus being useful as chemically amplified type resist which is exposed to the deep U.V. light from an ArF excimer laser.
    Type: Grant
    Filed: July 13, 1994
    Date of Patent: June 3, 1997
    Assignee: NEC Corporation
    Inventors: Kaichiro Nakano, Katsumi Maeda, Shigeyuki Iwasa, Etsuo Hasegawa
  • Patent number: 5631120
    Abstract: A stepped pattern is formed in a photoresist film (10) by heating the photoresist at a first temperature to soft bake it, and then heating only a selected portion (15) of the photoresist. That portion of the photoresist film is then heated at a temperature sufficient to partially degrade the photoresist. Another portion (22) of the photoresist film is then exposed to ultraviolet light to degrade it more fully than in the earlier step. The photoresist film is then developed under conditions sufficient to completely remove the portion exposed to ultraviolet light, and to partially remove the portion heated in the first step, thereby creating a stepped feature in the photoresist film.
    Type: Grant
    Filed: March 20, 1996
    Date of Patent: May 20, 1997
    Assignee: Motorola, Inc.
    Inventors: Thomas J. Swirbel, Dale W. Dorinski
  • Patent number: 5629354
    Abstract: Improved photopolymerization initiator systems are comprised of a spectral sensitizer that sensitizes in the ultraviolet or visible regions of the spectrum and an N-aryl, O-aryl or S-aryl polycarboxylic acid co-initiator. The improved initiator systems are incorporated in photo-polymerizable compositions containing one or more addition-polymerizable ethylenically-unsaturated compounds to form compositions suitable for the preparation of radiation-sensitive layers in lithographic printing plates adapted to be imagewise-exposed with ultraviolet- or visible-light-emitting lasers such as argon-ion lasers and frequency doubled Nd:YAG lasers. Such plates are able to effectively meet the dual requirements of very high photospeed and very good shelf-life required in computer-to-plate systems.
    Type: Grant
    Filed: February 28, 1995
    Date of Patent: May 13, 1997
    Assignee: Eastman Kodak Company
    Inventors: Paul R. West, Jeffery A. Gurney
  • Patent number: 5624776
    Abstract: An electrophotographic photosensitive member comprising a substrate and a light receiving layer composed of a silicon-containing non-single crystal material disposed on said substrate, characterized in that said light receiving layer contains a plurality of columnar structure regions each grown from a nucleus situated in said light receiving layer wherein said plurality of columnar structure regions are arranged substantially in parallel to the thicknesswise direction of said light receiving layer and at a density in the range of 5/cm.sup.2 to 500/cm.sup.2.
    Type: Grant
    Filed: February 18, 1994
    Date of Patent: April 29, 1997
    Assignee: Canon Kabushiki Kaisha
    Inventors: Tetsuya Takei, Hirokazu Ohtoshi, Takehito Yoshino, Ryuji Okamura, Yasuyoshi Takai
  • Patent number: 5624790
    Abstract: A backside textured papermaking belt is disclosed which is comprised of a framework and a reinforcing structure. The framework has a first surface which defines the paper-contacting side of the belt, a second surface opposite the first surface, and conduits which extend between first and second surfaces of the belt. The first surface of the framework has a paper side network formed therein which defines the conduits. The second surface of the framework has a backside network with passageways that provide surface texture irregularities in the backside network. The papermaking belt is made by applying a coating of photosensitive resinous material to a reinforcing structure which has opaque portions, and then exposing the photosensitive resinous material to light of an activating wavelength through a mask which has transparent and opaque regions and also through the reinforcing structure.
    Type: Grant
    Filed: December 20, 1995
    Date of Patent: April 29, 1997
    Assignee: The Procter & Gamble Company
    Inventors: Paul D. Trokhan, Glenn D. Boutilier
  • Patent number: 5622813
    Abstract: A photosensitive resin composition is provided for flexographic printing plates which has excellent water developability and storage stability. The resin composition comprises (a) 10 to 99 parts by weight of a resin particle having an average particle size of 0.01 to 5 .mu.m, which has a core/shell structure, at least the shell portion of which has a three-dimensionally crosslinked structure, (b) 1 to 90 parts by weight of a compound having a photopolymerizable group, and (c) 0.01 to 10 parts by weight of a photopolymerization initiator, based on the total (100 parts by weight) of the components (a), (b) and (c). The core portion of the resin particle (a) has a Tg of 0.degree. C. or lower, and the shell portion has a Tg of 30.degree. C. or higher.
    Type: Grant
    Filed: December 22, 1994
    Date of Patent: April 22, 1997
    Assignee: Nippon Paint Co., Ltd.
    Inventors: Kazunori Kanda, Tadashi Hayashi
  • Patent number: 5622805
    Abstract: The present invention provides a non-contact ink developing method for developing an electrostatic latent image formed on an electrostatic latent image formation member with ink, characterized by employing a conductive ink as the ink and a conductive developing roller disposed close to the electrostatic latent image formation member and whose surface has a water-repellent finish for producing very small ink droplets which are substantially spherical. The method comprising the steps of supplying the conductive ink to the surface of the conductive roller to produce a large number of very small ink droplets, and ejecting the ink droplets toward the electrostatic latent image in a developing area facing the electrostatic latent image formation member by an electrostatic induction force generated by charges of the electrostatic latent image and charges of opposite polarity induced in the ink droplets by the electrostatic latent image, and attaching the droplets to the electrostatic latent image.
    Type: Grant
    Filed: September 1, 1995
    Date of Patent: April 22, 1997
    Assignee: Fuji Xerox Co., Ltd.
    Inventors: Yasuhiro Uehara, Masahiro Sato, Yuji Kobayashi, Yasuhiro Kusumoto, Tsutomu Sugimoto, Yoshio Shoji
  • Patent number: 5620827
    Abstract: A lithographic printing plate precursor for use on a printing press, with minimal or no additional processing after exposure to actinic radiation, comprises a printing plate substrate, a polymeric resist layer capable of imagewise photodegradation or photohardening, and a plurality of microencapsulated developers capable of blanket-wise promoting the washing out of either exposed or unexposed areas of the polymeric resist. The microencapsulated developers may be integrated into the polymeric resist layer, or may form a separate layer deposited atop the polymeric resist layer, or may be coated onto a separate sheet support capable of being brought into face-to-face contact with conventional printing plates.
    Type: Grant
    Filed: June 6, 1995
    Date of Patent: April 15, 1997
    Assignee: Polaroid Corporation
    Inventors: Chieh-Min Cheng, Anthony C. Giudice, John M. Hardin, Rong-Chang Liang, Leonard C. Wan
  • Patent number: 5618870
    Abstract: It is herein disclosed a polymer blend having and exhibiting excellent tribological properties comprising a major amount of polyketone polymers and a minor amount of one or more silicone oil. The blend also has and exhibits improved lubricity and has a low DCOF of from about 0.3-0.4. The blend is particularly useful in the manufacture of articles used in applications where surfaces are in contact during motion.
    Type: Grant
    Filed: March 23, 1995
    Date of Patent: April 8, 1997
    Assignee: Shell Oil Company
    Inventors: John E. Flood, John W. Kelley, Davis R. Roane, John M. Clasby
  • Patent number: 5616439
    Abstract: The invention relates to an imaged element comprising(1) a carrier element having a release surface wherein the carrier element is resistant to aqueous development; (2) a first adhesive layer; (3) a first colored pattern, resulting from the imagewise exposure and washout development of a first unpigmented, photosensitive layer comprising an aqueous liquid developable photosensitive composition and at least one overlying acqueous permeable colorant-containing composition; (4) and a transfer element having a release surface. There is an adhesion force F1, F2 and F3 between the various layers wherein each of F2 and F3 is greater than F1 and F2 is greater than F3.
    Type: Grant
    Filed: May 18, 1995
    Date of Patent: April 1, 1997
    Assignee: E. I. du Pont de Nemours and Company
    Inventors: Gregory A. Bodager, Phillip L. Beighle
  • Patent number: 5614340
    Abstract: A bleachable composition, including an acid photogenerator and a near-infrared radiation-absorbing dye or pigment, is utilized in a method of migration imaging to prevent unwanted absorptions. This composition can be incorporated either in the thermoplastic imaging surface layer of the imaging element, in the marking particles applied to the element, or both. Alternatively, the components of the bleachable composition can be separated with one in the thermoplastic imaging surface layer and the other in the marking particles. After the imaging element is marked and exposed with near-infrared radiation, the bleachable composition caused exposed portions of the imaging element to be bleached. If further bleaching is needed, the element can subsequently be exposed with near-ultraviolet radiation. A migration imaging method, which does not employ the bleachable composition of the present invention, wherein marking particles are magnetically attracted to the imaging element, is also provided.
    Type: Grant
    Filed: September 27, 1993
    Date of Patent: March 25, 1997
    Assignee: Eastman Kodak Company
    Inventors: Douglas E. Bugner, William Mey, Dennis R. Kamp
  • Patent number: RE35537
    Abstract: A color proof formation method includes the steps of bringing a first color separated film original mounted upon an original mounting table into tight contact with a photosensitive material fixed upon a mounting table, and exposing the film original; separating the photosensitive material mounting table from the original mounting table; replacing or exchanging the first film original upon the original mounting table with a second color separated film original; and bringing the second film original into tight contact with the photosensitive material. The steps are repeatedly performed a predetermined number of times so as to form a color proof.
    Type: Grant
    Filed: March 3, 1995
    Date of Patent: June 17, 1997
    Assignee: Konica Corporation
    Inventors: Hitoshi Shimaoka, Shigeru Mizuo, Akira Akashi, Miyuki Hosoi