Abstract: A system for measuring the irradiance of a fluorescently labeled particle having a cytometric flow chamber; a plurality of excitation light sources; a plurality of scatter detectors, each configured to detect light from only one of the plurality of excitation light sources and arranged so as to detect scattered light from the particle; a trigger connected to the plurality of scatter detectors, the trigger emitting a signal when scattered light incident on one of the scatter detectors is exceeding a predetermined threshold value; collection optics; at least one fluorescence detector to receive emissions collected by the collection optics and generate an output, the at least one fluorescence detector being configured to respond only to a discrete number of wavelength bands; and an integrator for recording the output of the at least one fluorescence detector in response to a signal from the trigger.

Abstract: A process for measuring both the reflectance and sheet resistance of a thin film, such as a metal film or a doped semiconductor, in a common apparatus comprises: directing a beam of radiation from a radiation source on the common apparatus onto a portion of the surface of the thin film, sensing the amount of radiation reflected from the surface of the thin film, and contacting the surface of the thin film with a sheet resistance measurement apparatus on the apparatus at a portion of the surface of the thin film coincident with or adjacent to the portion of the thin film contacted by the radiation beam to measure the sheet resistance of the thin film. The sheet resistance measurement apparatus may, by way of example, comprise a 4 point probe or an eddy current measurement apparatus. The respective measurements may be carried out either simultaneously or sequentially.