Abstract: Disclosed is a system for generating EUV radiation in which current flowing through target material in the orifice 320 of a nozzle in a droplet generator is controlled by providing alternate lower impedance paths for the current and/or by limiting a high frequency component of a drive signal applied to the droplet generator.

Abstract: Disclosed embodiments include an energy directing device having one or more energy relay elements configured to direct energy from one or more energy locations through the device. In an embodiment, surfaces of the one or more energy relay elements may form a singular seamless energy surface where a separation between adjacent energy relay element surfaces is less than a minimum perceptible contour. In disclosed embodiments, energy is produced at energy locations having an active energy surface and a mechanical envelope. In an embodiment, the energy directing device is configured to relay energy from the energy locations through the singular seamless energy surface while minimizing separation between energy locations due to their mechanical envelope. In embodiments, the energy relay elements may comprise energy relays utilizing transverse Anderson localization phenomena.

Abstract: A system and method for ion implantation is described, which includes a gas or gas mixture including at least one ionizable gas used to generate ionic species and an arc chamber that includes two or more different arc chamber materials. Using the system ionic species are generated in the arc chamber with liner combination, and one or more desired ionic species display a higher beam current among the ionic species generated, which is facilitated by use of the different materials. In turn improved implantation of the desired ionic species into a substrate can be achieved. Further, the system can minimize formation of metal deposits during system operation, thereby extending source life and promoting improved system performance.

Abstract: A reflective optical element includes a first, inner surface region for reflecting a first inner beam portion of a light beam impinging on the reflective optical element in order to form a first reflected light beam, and at least one second, outer surface region for reflecting at least one second outer beam portion of the impinging light beam for forming at least one second reflected light beam. The second surface region is designed to reduce a beam cross section of the second reflected light beam by comparison to the first reflected light beam such that the second reflected light beam extends along a superposition length completely within the first reflected light beam. In addition a beam guiding device has at least one such reflective optical element and an EUV-beam generating device has such a beam guiding device.

Abstract: Supersonic gas jets are provided near the immediate focus of a lithography apparatus in order to deflect tin debris generated by the lithography process away from a scanner side and towards a debris collection device. The gas jets can be positioned in a variety of useful orientations, with adjustable gas flow velocity and gas density in order to prevent up to nearly 100% of the tin debris from migrating to the reticle on the scanner side.

Abstract: Apparatuses, systems, and methods for inspecting a semiconductor sample are disclosed. In some embodiments, the sample may comprise a structure having a plurality of openings in a top layer of the structure. In some embodiments, the method may comprise generating an image of the structure using a SEM; inspecting an opening of the plurality of openings by determining a dimension of the opening based on the image and determining an open-state of the opening, based on a contrast of the image; and determining a quality of the opening based on both the determined dimension and the determined open-state of the opening.

Abstract: A system of shields designed to provide substantially greater protection, head to toe, against radiation exposure to health care workers in a hospital room during procedures which require real-time imaging. The shields are placed around the patient and the x-ray table and provide protection even when the x-ray tube is moved to various angles around the patient.

Abstract: The invention relates to a method of preparing a biological sample for study in an analysis device, said method comprising the steps of: providing a biological material to be studied; providing a sample holder that is configured to be placed in said analysis device; and transferring said biological material onto said sample holder for preparing said biological sample. According to the invention, the method comprises the steps of: acquiring a specimen of said biological material provided on said sample holder; transferring said specimen to a screening device for screening said specimen; and evaluating said biological sample based on results obtained by said screening device. With the method, time and resources may be more effectively used in studying biological samples, for example using charged particle microscopy in the form of cryo-EM.

Abstract: In one embodiment, a method includes receiving measured linescan information describing a pattern structure of a feature, applying the received measured linescan information to an inverse linescan model that relates measured linescan information to feature geometry information, and identifying, based at least in part on the applying the received measured linescan model to the inverse linescan model, feature geometry information that describes a feature that would produce a linescan corresponding to the received measured linescan information. The method also includes determining, at least in part using the inverse linescan model, feature edge positions of the identified feature, analyzing the feature edge positions to determine errors in the manufacture of the pattern structure, and controlling a lithography tool based on the analysis of the feature edge positions.

Abstract: An edge detection system is provided that generates a scanning electron microscope (SEM) linescan image of a pattern structure including a feature with edges that require detection. The edge detection system includes an inverse linescan model tool that receives measured linescan information for the feature from the SEM. In response, the inverse linescan model tool provides feature geometry information that includes the position of the detected edges of the feature.

Abstract: A system for filtering ions includes first and second surfaces extending along first and second perpendicularly arranged directions, an ion channel between the surfaces configured to receive an ion stream, and first and second electrode arrays associated with the first and second surfaces, respectively. The first and second electrode arrays include a first plurality of electrodes arranged along the first direction and a second plurality of electrodes arranged along the second direction. A controller is configured to apply a first voltage signal to the first plurality of electrodes, which are configured to generate a drive potential traveling along the first direction, and a second voltage signal to the electrode arrays, which are configured to generate an electric potential. The drive and electric potentials are configured to direct ions having mobilities in a first range along a first path and ions having mobilities in a second range along a second path.

Abstract: A target supply device may include a tank configured to store a target substance, a pressure adjuster configured to adjust a pressure in the tank, a filter configured to filter the target substance in the tank, a nozzle configured to output a droplet of the target substance having passed through the filter, a droplet detector configured to detect outputting of the droplet from the nozzle, and a processor configured to control the pressure adjuster so that a pressure-increasing speed of the pressure in the tank is higher after detection of outputting of the droplet than before detection of outputting of the droplet, during a period in which the pressure in the tank is increased to a target pressure from a pressure at which outputting of the droplet is detected by the droplet detector for the first time after installation of the target supply device.

Abstract: Disclosed are systems and methods to provide rapid and autonomous detection of analyte particles in gas and liquid samples. Disclosed are methods and devices for identifying biological aerosol analytes using MALDI-MS and chemical aerosol analytes using LDI and MALDI-MS using time-of-flight mass spectrometry (TOFMS).

Abstract: Provided is a sample support body that includes a substrate, an ionization substrate, and a support. The ionization substrate has a plurality of measurement regions for dropping a sample on a second surface. A plurality of through-holes that open in a first surface and the second surface are formed at least in the measurement regions of the ionization substrate. A conductive layer is provided on peripheral edges of the through-holes at least on the second surface. The support has a first support provided on peripheral edges of the measurement regions on the first surface to separate the plurality of measurement regions when viewed in the direction in which the substrate and the ionization substrate face each other.

Abstract: The present invention is to generate a spatially phase modulated electron wave. A laser radiating apparatus, a spatial light phase modulator, and a photocathode are provided. The photocathode has a semiconductor film having an NEA film formed on a surface thereof, and a thickness of the semiconductor film is smaller than a value obtained by multiplying a coherent relaxation time of electrons in the semiconductor film by a moving speed of the electrons in the semiconductor film. According to the configuration, a spatial distribution of phase and a spatial distribution of intensity of spatial phase modulated light are transferred to an electron wave, and the electron wave emitted from an NEA film is modulated into the spatial distribution of phase and the spatial distribution of intensity of the light.

Abstract: A surface-assisted laser desorption/ionization method according to an aspect includes: a first process of preparing a sample support (2) having a substrate (21) in which a plurality of through-holes (S) passing from one surface (21a) thereof to the other surface (21b) thereof are provided and a conductive layer (23) that covers at least the one surface (21a); a second process of placing a sample (10) on a sample stage (1) and arranging the sample support (2) on the sample (10) such that the other surface (21b) faces the sample (10); and a third process of applying a laser beam (L) to the one surface (21a) and ionizing the sample (10) moved from the other surface (21b) side to the one surface (21a) side via the through-holes (S) due to a capillary phenomenon.

Abstract: A light source is provided capable of maintaining the temperature of a collector surface at or below a predetermined temperature. The light source in accordance with various embodiments of the present disclosure includes a processor, a droplet generator for generating a droplet to create extreme ultraviolet light, a collector for reflecting the extreme ultraviolet light into an intermediate focus point, a light generator for generating pre-pulse light and main pulse light, and a thermal image capture device for capturing a thermal image from a reflective surface of the collector.

Abstract: A radiation shield assembly includes a shield configured to block radiation and a rail assembly configured to position the shield in between the radiation table and a radiation source. The shield is movable between a retracted position and an extended position along a length of the rail assembly. In the extended position, the shield extends along a portion of a radiation table and blocks radiation from the radiation source to the portion of the radiation table. In the retracted position, the shield exposes at least some of the portion of the radiation table to the radiation.

Abstract: A system for eradicating pathogens is disclosed. A lamp is provided that emits a far-ultraviolet C (far-UVC) light generates an irradiation zone. A biometric sensor determines whether an individual is present in the irradiation zone. The biometric sensor signals a processor to determine whether the individual has been exposed to a threshold limit of far-UVC light. The processor determines whether the time an individual has been in the irradiation zone exceeds a threshold limit. If the individual has been in the irradiation zone a period of time exceeds the threshold, the lamp is deactivated. A pathogen detection sensor provides user feedback of the existence pathogens and signals the processor to terminate irradiation or provide user feedback to terminate irradiation. The system and method are included in a passenger compartment of a vehicle to eradicate pathogens on surfaces and aerosol. Threshold limits allow eradication while the vehicle is occupied.

Abstract: A nozzle for an ionisation source comprises: a light passage having an inlet end and an outlet end; and a gas flow passage in fluid communication with the light passage, wherein the gas flow passage is configured to convey, in use, a flow of gas into the light passage such that the flow of gas travels substantially towards the outlet end of the light passage.