Patents Examined by Hung Henry Nguyen
  • Patent number: 10185225
    Abstract: A lithography apparatus includes a detector that detects an original-side mark image and a substrate-side mark image via a projection optical system, and a controller. The detector generates refocusable light field image data that includes the original-side mark image and the substrate-side mark image. The controller performs, based on the light field image data obtained from the detector, a refocus operation of reconstructing a plurality of images different in position in a focus direction and adjusts a position of at least one of the original holder and the substrate holder based on the plurality of images reconstructed by the refocus operation.
    Type: Grant
    Filed: October 13, 2017
    Date of Patent: January 22, 2019
    Assignee: CANON KABUSHIKI KAISHA
    Inventor: Shinichi Egashira
  • Patent number: 10185229
    Abstract: A movable body apparatus includes a base member, a movable body that is movable at least two-dimensionally, parallel to a predetermined plane, on the base member, a planar motor of a magnetic levitation method having a stator provided at the base member and a mover provided at the movable body, a measurement system that measures a position of the movable body in a direction parallel to the predetermined plane, and a controller. The controller limits movement of the movable body in the direction parallel to the predetermined plane by applying, to the movable body, a driving force generated by the planar motor, directed from the movable body to the base member in a direction intersecting the predetermined plane.
    Type: Grant
    Filed: October 4, 2017
    Date of Patent: January 22, 2019
    Assignee: NIKON CORPORATON
    Inventor: Tomoki Miyakawa
  • Patent number: 10180629
    Abstract: A lithographic projection apparatus is disclosed in which a space between the projection system and a sensor is filled with a liquid.
    Type: Grant
    Filed: December 20, 2016
    Date of Patent: January 15, 2019
    Assignee: ASML Netherlands B.V.
    Inventors: Joeri Lof, Hans Butler, Sjoerd Nicolaas Lambertus Donders, Aleksey Yurievich Kolesnychenko, Erik Roelof Loopstra, Hendricus Johannes Maria Meijer, Johannes Catherinus Hubertus Mulkens, Roelof Aeilko Siebranc Ritsema, Frank Van Schaik, Timotheus Franciscus Sengers, Klaus Simon, Joannes Theodoor De Smit, Alexander Straaijer, Bob Streefkerk, Erik Theodorus Maria Bijlaart, Christian Alexander Hoogendam, Helmar Van Santen, Marcus Adrianus Van De Kerkhof, Mark Kroon, Arie Jeffrey Den Boef, Joost Jeroen Ottens, Jeroen Johannes Sophia Maria Mertens
  • Patent number: 10156795
    Abstract: A substrate processing apparatus includes: a rotary cylindrical member (DR) that includes a cylindrical supporting surface curved with a constant radius from a predetermined center line (AX2) and that feeds a substrate (P) in a length direction of the substrate; a processing mechanism that performs a predetermined process on the substrate at a specific position (PA, EL2) of a part of the substrate; a scale member (SD) that rotates about the center line along with the rotary cylindrical member so as to measure a displacement in a circumferential direction of the supporting surface of the rotary cylindrical member or a displacement in a direction of the center line of the rotary cylindrical member and that includes a scale portion (GP) carved in a ring shape; and a reading mechanism (EN1, EN2) that faces the scale portion, that is disposed in substantially a same direction as the specific position when viewed from the center line, and that reads the scale portion.
    Type: Grant
    Filed: May 21, 2018
    Date of Patent: December 18, 2018
    Assignee: NIKON CORPORATION
    Inventors: Masaki Kato, Tohru Kiuchi
  • Patent number: 10151989
    Abstract: An immersion lithography apparatus comprises a temperature controller configured to adjust a temperature of a projection system, a substrate and a liquid towards a common target temperature. Controlling the temperature of these elements and reducing temperature gradients may improve imaging consistency and general lithographic performance. Measures to control the temperature may include controlling the immersion liquid flow rate and liquid temperature, for example, via a feedback circuit.
    Type: Grant
    Filed: August 2, 2017
    Date of Patent: December 11, 2018
    Assignee: ASML Netherlands B.V.
    Inventors: Bob Streefkerk, Antonius Theodorus Anna Maria Derksen, Joeri Lof, Klaus Simon, Alexander Straaijer
  • Patent number: 10146142
    Abstract: A lithographic projection apparatus is disclosed for use with an immersion liquid positioned between the projection system and a substrate. Several methods and mechanism are disclosed to protect components of the projection system, substrate table and a liquid confinement system. These include providing a protective coating on a final element of the projection system as well as providing one or more sacrificial bodies upstream of the components. A two component final optical element of CaF2 is also disclosed.
    Type: Grant
    Filed: January 30, 2017
    Date of Patent: December 4, 2018
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Erik Roelof Loopstra, Johannes Jacobus Matheus Baselmans, Marcel Mathijs Theodore Marie Dierichs, Johannes Christiaan Maria Jasper, Matthew Lipson, Hendricus Johannes Maria Meijer, Uwe Mickan, Johannes Catharinus Hubertus Mulkens, Tammo Uitterdijk
  • Patent number: 10141186
    Abstract: A target image-capture device may be configured to capture an image of a target that is made into plasma when irradiated with laser light and generates extreme-ultraviolet-light. The target image-capture device may include a droplet detector configured to detect passage of a droplet output as the target, and output a detection signal, an illumination light source, an image capturing element, a shutter device, and a controller configured to output, to the image capturing element, an exposure signal allowing the image capturing element to perform image capturing, and output, to the shutter device, a shutter open/close signal allowing a shutter to perform an open and close operation upon input of the detection signal. The controller may output the shutter open/close signal to the shutter device to make the shutter closed during when the droplet is irradiated with the laser light so that the plasma is generated.
    Type: Grant
    Filed: August 8, 2017
    Date of Patent: November 27, 2018
    Assignee: Gigaphoton Inc.
    Inventors: Hirokazu Hosoda, Takayuki Yabu, Hideo Hoshino
  • Patent number: 10133195
    Abstract: An exposure apparatus exposes a substrate with illumination light via a projection optical system, and includes a frame member, a mark detection system that detects a mark of the substrate, a mask stage system having a first movable body to hold a mask, a first encoder system having first heads that each irradiate a first measurement beam to a first grating section, a substrate stage system having a second movable body to hold the substrate, a second encoder system having second heads that each irradiate a second measurement beam to a second grating section, and a controller that controls driving of the first movable body and of the second movable body, based on measurement information of the first and second encoder systems. In each of an exposure operation and a detection operation, the positional information of the second movable body is measured by the second encoder system.
    Type: Grant
    Filed: September 17, 2014
    Date of Patent: November 20, 2018
    Assignee: NIKON CORPORATION
    Inventor: Yuichi Shibazaki
  • Patent number: 10133186
    Abstract: An alignment apparatus for aligning a substrate, and a substrate processing system including such alignment apparatus. The alignment apparatus includes an alignment base for supporting the substrate and/or a substrate support member. A force generating device applies a contact force on the substrate. The force generating device includes an arm including a rigid proximal end and a rigid distal end. The distal end is provided with a contact section for contacting an edge of the substrate and an elastically deformable arm section extending between the proximal and distal ends. The connection part connects the proximal end to the alignment base. The arm is movable with respect to the alignment base via the connection part. The alignment apparatus also includes an actuator for causing a displacement of the proximal end, whereby the contact force, defined by the elastically deformable arm section, is applied to the substrate by the contact section.
    Type: Grant
    Filed: October 20, 2016
    Date of Patent: November 20, 2018
    Assignee: MAPPER LITHOGRAPHY IP B.V.
    Inventor: Bart Schipper
  • Patent number: 10132763
    Abstract: An inspection method determines values of profile parameters of substrate patterns. A baseline substrate with a baseline pattern target (BP) is produced that has a profile described by profile parameters, for example CD (median critical dimension), SWA (side wall angle) and RH (resist height). Scatterometry is used to obtain first and second signals from first and second targets. Values of differential pattern profile parameters are calculated using a Bayesian differential cost function based on a difference between the baseline pupil and the perturbed pupil and dependence of the pupil on pattern profile parameters. For example, the difference is measured between a baseline process and a perturbed process for stability control of a lithographic process. Fed-forward differential stack parameters are also calculated from observations of stack targets on the same substrates as the pattern targets.
    Type: Grant
    Filed: June 18, 2013
    Date of Patent: November 20, 2018
    Assignee: ASML Netherlands B.V.
    Inventors: Hugo Augustinus Joseph Cramer, Robert John Socha, Patricius Aloysius Jacobus Tinnemans, Jean-Pierre Agnes Henricus Marie Vaessen
  • Patent number: 10120176
    Abstract: A method for manufacturing an integrated circuit includes scanning a wafer with respect to a catadioptric projection objective and imaging a pattern on a mask onto a wafer while scanning the wafer. The imaging includes illuminating the mask with radiation; imaging, using the radiation, the pattern into a first intermediate image, the first intermediate image to a second intermediate image, and the second intermediate image into an image field arranged in an image surface where the wafer is arranged; and, manipulating one or more of optical elements while scanning the wafer to reduce errors in the image at the image field. A concave mirror arranged in a region of a pupil surface reflects the radiation. The projection objective also includes mirrors to deflect the radiation from the object field towards the concave mirror and to deflect the radiation from the concave mirror towards the image field.
    Type: Grant
    Filed: October 13, 2017
    Date of Patent: November 6, 2018
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Thomas Schicketanz, Toralf Gruner
  • Patent number: 10120292
    Abstract: A support apparatus for a lithographic apparatus has an object holder and an extraction body radially outward of the object holder. The object holder is configured to support an object. The extraction body includes an extraction opening configured to extract fluid from a top surface of the support apparatus. The extraction body is spaced from the object holder such that the extraction body is substantially decoupled from the object holder. The extraction body comprises a projection configured such that it surrounds the object holder and such that, in use, a layer of liquid is retained on the projection and in contact with an object supported on the object holder.
    Type: Grant
    Filed: October 18, 2016
    Date of Patent: November 6, 2018
    Assignee: ASML NETHERLANDS, B.V.
    Inventors: Raymond Wilhelmus Louis Lafarre, Adrianus Hendrik Koevoets, Sjoerd Nicolaas Lambertus Donders, Menno Fien, Antonius Franciscus Johannes De Groot, Christiaan Alexander Hoogendam, Johannes Henricus Wilhelmus Jacobs, Nicolaas Ten Kate, Martijn Houben, Jan Steven Christiaan Westerlaken, Jim Vincent Overkamp, Maarten Van Beijnum
  • Patent number: 10114289
    Abstract: The invention is directed at an exposure head for use in an exposure apparatus for illuminating a surface, the exposure head comprising one or more radiative sources for providing one or more beams, an optical scanning unit arranged for receiving the one or more beams and for directing the beams towards the surface for impinging each of the beams on an impingement spot, a rotation actuating unit connected to the optical scanning unit for at least partially rotating the optical scanning unit, wherein the impingement spots of the one or more beams are scanned across the surface by said at least partial rotation of the optical scanning unit, wherein the optical scanning unit comprises a transmissive element including one or more facets for receiving the one or more beams and for outputting the beams after conveying thereof through the transmissive element, for displacing the beams upon said rotation of the transmissive element for enabling the scanning of the impingement spots.
    Type: Grant
    Filed: April 14, 2015
    Date of Patent: October 30, 2018
    Assignee: Nederlandse Organisatie voor toegepast-natuurwetenschappelijk onderzoek TNO
    Inventors: Jacobus Hubertus Theodoor Jamar, Herman Hendrikus Maalderink, Erwin Rinaldo Meinders, Peter Theodorus Maria Giesen, Erwin John van Zwet, Henri Jacques Antoine Jean Starmans
  • Patent number: 10108096
    Abstract: A method and apparatus for treating a substrate and, in particular, making secondary adjustments to the results of a primary process applied to the substrate, leading to improved uniformity of the overall process, in which a substrate is positioned on a substrate holder; a scanning a beam of light is directed onto the surface of the substrate; and the amplitude of the scanned beam is varied by location based on a substrate signature.
    Type: Grant
    Filed: August 31, 2016
    Date of Patent: October 23, 2018
    Assignee: Lithoptek LLC
    Inventors: Mark Schattenburg, Rudolf Hendel, John Glenn
  • Patent number: 10108097
    Abstract: The disclosure relates to arrangements for manipulating the position of an element. An arrangement according has at least one actuator for each degree of freedom of the positional manipulation for exerting adjustable forces on the element, at least one position sensor for each degree of freedom of the positional manipulation for generating in each case a sensor signal that is characteristic of the position of the element, and at least one position controller, which in a position control circuit controls a force exerted on the element by the at least one actuator for the positioning of the element in dependence on the at least one sensor signal. At least one actuator and at least one position sensor are mounted on a common module frame.
    Type: Grant
    Filed: July 12, 2017
    Date of Patent: October 23, 2018
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Ulrich Schoenhoff, Eylem Bektas, Markus Hauf
  • Patent number: 10101651
    Abstract: A photo mask assembly including a photo mask, a first adhesive layer adhered with the photo mask, a pellicle frame and a pellicle is provided. The pellicle frame includes a plurality of recesses for accommodating the first adhesive layer. The pellicle frame is adhered with the photo mask through the first adhesive layer accommodated in the plurality of recesses. The pellicle is disposed on the pellicle frame. The pellicle frame is between the pellicle and the first adhesive layer. An optical apparatus including the above-mentioned photo mask assembly is also provided.
    Type: Grant
    Filed: April 13, 2017
    Date of Patent: October 16, 2018
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: SHao-Chi Wei, Cheng-Ming Lin, Sheng-Chang Hsu, Yu-Hsin Hsu, Hao-Ming Chang
  • Patent number: 10095122
    Abstract: A lithography system includes an illumination source, a pattern mask, and an optical element configured to expose a sample with an image of the pattern mask for the fabrication of one or more printed device structures and one or more metrology target structures. The pattern mask includes a device pattern mask area and a metrology target pattern mask area. The device pattern mask area includes a set of device pattern elements distributed with a device pitch. The metrology target pattern mask area includes a set of metrology target pattern elements. The one or more printed metrology target structures include a set of metrology target elements distributed with a metrology target pitch. Regions of the metrology target pattern mask area include sub-resolution features having widths smaller than the resolution of the optical element such that the sub-resolution pattern elements are not included on the one or more printed metrology target structures.
    Type: Grant
    Filed: October 10, 2016
    Date of Patent: October 9, 2018
    Assignee: KLA-Tencor Corporation
    Inventors: Myungjun Lee, Mark D. Smith
  • Patent number: 10095120
    Abstract: A vibration-compensated optical system for a lithography apparatus includes an optical element, a carrying element, an actuator for actuating the optical element relative to the carrying element, a first elastic element which directly couples the optical element to the carrying element, a reaction mass, and a second elastic element. The actuator couples the optical element to the reaction mass. The second elastic element directly couples the reaction mass to the carrying element. For a mass (m1) of the optical element, a stiffness (k1) of the first elastic element, a mass (m2) of the reaction mass and a stiffness (k2) of the second elastic element the following holds true: m 1 m 2 = k 1 k 2 .
    Type: Grant
    Filed: August 15, 2016
    Date of Patent: October 9, 2018
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Yim-Bun Patrick Kwan, Tim Groothuijsen
  • Patent number: 10095130
    Abstract: An apparatus has a first component with a first surface and a second component with a second surface, wherein the first and second components can undergo relative movement. The first surface and the second surface face each other. The first surface accommodates a barrier system to provide a barrier to reduce or prevent an inflow of ambient gas into a protected volume of gas between the first and second surfaces. The barrier system includes a curtain opening adapted for a flow of curtain gas therefrom for establishing a gas curtain enclosing part of the protected volume, and an inner entrainment opening, located inward of the curtain opening with respect to the protected volume, adapted for a flow of inner entrainment gas therefrom for being entrained into the flow of curtain gas. The apparatus is configured such that the inner entrainment gas flow is less turbulent than the curtain gas flow.
    Type: Grant
    Filed: March 9, 2016
    Date of Patent: October 9, 2018
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Johannes Pieter Kroes, Kevin Nicolas Stephan Couteau, Rachid El Boubsi, Rob Johan Theodoor Rutten, Patrick Johannes Cornelus Hendrik Smulders, Martijn Lambertus Peter Visser, Jan Steven Christiaan Westerlaken
  • Patent number: 10095126
    Abstract: The present application discloses a component having a movably mounted component element of a projection exposure apparatus and in particular a movement limiting apparatus, and a method for limiting the movement of movable component elements of a component of a projection exposure apparatus.
    Type: Grant
    Filed: July 25, 2017
    Date of Patent: October 9, 2018
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Jens Prochnau, Marwene Nefzi, Dirk Schaffer