Patents Examined by James Beyer
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Patent number: 5463221Abstract: When an image display unit displays a magnified image of an object being examined, a measuring unit automatically computes the dimensions of the image at the preset position. A tolerance range setting unit has been supplied with an upper and a lower limit value according to which it can judge the dimensions of the object at the preset position to be normal, whereas a comparison-decision unit decides that the dimensions thus computed are held between the upper and lower limit values. When the measured result is found outside the range of upper to lower limit values, the right-or-wrong decision data is stored in a memory and is redisplayed in the form of an image by the image display unit at proper timing.Type: GrantFiled: March 23, 1994Date of Patent: October 31, 1995Assignee: Hitachi, Ltd.Inventors: Tadashi Otaka, Hiroyoshi Mori, Hideo Todokoro
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Patent number: 5463218Abstract: The invention relates to a method and a device for detecting very large molecular ions in a time-of-flight mass spectrometer, in which the molecules to be detected first fall with high energy (>8 keV) onto a conversion dynode and are then converted into an electronic signal in a sequence of stages. The rnolecules to be detected are at least partly converted into small (<200 u) positive and negative secondary ions on the conversion dynode. The secondary ions formed are accelerated, optionally positive or negative, onto a microchannel plate, where they are converted into electrons. The electrons are amplified in the microchannel plate and then accelerated onto a scintillator. The electron signal is converted into a light signal in the scintillator, being further amplified. A connecting fiber-optic light guide supplies the photons to a photomultiplier, in which they are converted in customary manner into a signal which can be evaluated electronically.Type: GrantFiled: May 19, 1994Date of Patent: October 31, 1995Assignee: Bruker-Franzen Analytik GmbHInventor: Armin Holle
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Patent number: 5459315Abstract: A quadrupole mass analyzer in which a pair of heat sink plates 16, 17 and springs 18 clamp ceramic holders 13, 14 that hold the four rod electrodes 12 of the quadrupole unit. The dielectric heat generated in the ceramic holders 13, 14 by the high frequency alternating electromagnetic field due to the AC voltage applied on the four rod electrodes 12 is promptly transferred to the heat sink plates 16, 17. Thus displacement of the four rod electrodes 12 or loss of symmetry is prevented when mass of ions is analyzed.Type: GrantFiled: November 10, 1994Date of Patent: October 17, 1995Assignee: Shimadzu CorporationInventor: Hiroaki Waki
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Patent number: 5457316Abstract: The present invention relates to an ion mobility spectrometer sensor apparatus which is in a hermetically sealed housing, utilizing a drift gas for the determination of trace contaminants in a carrier gas, including a container for a sample gas containing an analyte the concentration of which is to be determined, means for purifying the sample gas to produce the carrier gas from it, the means for purifying being hermetically connected from the container through a metallic pipe, a source for the purified drift gas which may be the same or different than the carrier gas, an ion mobility spectrometer sensor having a carrier gas entrance and a drift gas entrance and a gas exit, the ion mobility spectrometer sensor being hermetically connected by a metallic pipe from the purifying means and from the source of the drift gas, a back diffusion trap is hermetically connected from the gas exit, and a signal readout is electrically and hermetically connected from the ion mobility spectrometer sensor for electrically senType: GrantFiled: December 23, 1994Date of Patent: October 10, 1995Assignee: PCP, Inc.Inventors: Martin J. Cohen, Robert M. Stimac, Roger F. Wernlund
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Patent number: 5457317Abstract: An electron microscope uses a camera with a plurality of fluorescent elements separated by walls and a corresponding plurality of detector elements which receive light from fluorescent elements. The walls prevent electrons incident on one fluorescent element from affecting an adjacent fluorescent element, thereby reducing blurring of the image produced by the camera. The fluorescent elements may be connected to the detector elements by waveguides having filters which permit the intensity of light transmitted to each detector element to be adjusted to give a uniform response. The fluorescent elements may be arranged in a linear array, and the electron microscope is then operated to cause an image of a sample to scan across the array.Type: GrantFiled: September 16, 1993Date of Patent: October 10, 1995Assignee: Hitachi, Ltd.Inventors: Katsuhisa Yonehara, Teiji Katsuta, Isao Matsui
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Patent number: 5455427Abstract: An apparatus for exposing a radiation sensitive workpiece to define patterns therein includes an electron gun, a mask with spaced apertures for passing electron radiation, and a radiation deflector-blanker to direct the radiation to selected ones of the apertures and to form separate beamlets from the apertures then demagnify the separate beamlets and direct them onto the workpiece without crossing them. In one embodiment, the groups of apertures are fixed on the mask and define fixed undivided profiles in the path of the radiation.Type: GrantFiled: April 28, 1993Date of Patent: October 3, 1995Assignee: Lepton, Inc.Inventors: Martin P. Lepselter, Sheldon M. Kugelmass
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Patent number: 5453616Abstract: By indirectly measuring the movement of a first scanner comprising a piezoelectric element which moves a specimen or a detecting part by providing a second scanner separate from the first scanner and disposing a displacement detecting sensor in the vicinity of the second scanner and causing the second scanner to move in a similar way as the first scanner, the error between the results after image processing and the actual shape, coming from the non-linearity between the impressed voltage and the amount of displacement of the piezoelectric element, is reduced.Type: GrantFiled: October 18, 1994Date of Patent: September 26, 1995Assignee: Seiko Instruments, Inc.Inventor: Shigeru Wakiyama
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Patent number: 5451794Abstract: An electron linear accelerator for use in industrial material processing, comprises an elongated, resonant, electron accelerator structure defining a linear electron flow path and having an electron injection end and an electron exit end, an electron gun at the injection end for producing and delivering one or more streams of electrons to the electron injection end of the structure during pulses of predetermined length and of predetermined repetition rate, the structure being comprised of a plurality of axially coupled resonant microwave cavities operating in the .pi./2 mode and including a graded-.beta. capture section at the injection end of the structure for receiving and accelerating electrons in the one or more streams of electrons, a .beta.Type: GrantFiled: January 25, 1995Date of Patent: September 19, 1995Assignee: Atomic Energy of Canada LimitedInventors: Joseph McKeown, Stuart T. Craig, Norbert H. Drewell, Jean-Pierre Labrie, Court B. Lawrence, Victor A. Mason, James Ungrin, Bryan F. White
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Patent number: 5449920Abstract: A large area ion implantation apparatus which selects ions having predetermined characteristics for implantation. The ions having predetermined characteristics are selected from a plasma contained within a magnetic bottle and heated by a radio frequency source. The selected ions in one embodiment escape from the magnetic bottle and bombard a substrate located external to the magnetic bottle. In another embodiment the selected ions are retained within the magnetic bottle and bombard a substrate which is also located within the bottle. In yet another embodiment of the apparatus, a positive potential on an electrostatic grid located between the substrate and the plasma prevents ions from bombarding a substrate maintained at a negative potential until the potential on the grid is reduced to approximately zero volts.Type: GrantFiled: April 20, 1994Date of Patent: September 12, 1995Assignee: Northeastern UniversityInventor: Chung Chan
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Patent number: 5449901Abstract: An optical scan type tunnel microscope based on a new principle, having higher resolution, is provided. The apparatus of the invention is comprised of at least an optical fiber 3 whose head portion is covered by an energy acceptor 6, a prism on which a sample which contains an energy donator 7 or is covered by the energy donator 7 is placed, a XY-axis transfer mechanism 9, XY-axis control mechanism 10, Z-axis transfer mechanism 11, Z-axis control mechanism 12, light source 13, optical system 14, and an optical detecting system 15.Type: GrantFiled: July 22, 1993Date of Patent: September 12, 1995Assignees: Seiko Instruments Inc., Masamichi FujihiraInventors: Masamichi Fujihira, Tatsuaki Ataka, Hiroshi Muramatsu
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Patent number: 5448061Abstract: A method of using a quadrupole ion trap mass spectrometer for high resolution mass spectroscopy is disclosed. In the preferred embodiment, the space charge in the ion trap is controlled to high accuracy. This is done by using a prescan of the trap before each analytical scan, where the ionization parameters used in the prescan are not fixed, but rather are based on the previous analytical scan. The method is especially useful in connection with performance of high resolution MS/MS experiments of the type described in the inventor's prior U.S. Pat. No. 5,198,665.Type: GrantFiled: January 10, 1994Date of Patent: September 5, 1995Assignee: Varian Associates, Inc.Inventor: Gregory J. Wells
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Patent number: 5444243Abstract: A Wien filter is used with secondary electrons that are emitted from a primary electron beam scanning a sample surface in a scanning electron microscope (SEM) used as an energy analyzer or a spin rotater with charged particle beams. The beam is focussed into an interior area of the filter that has magnetic and electric fields generated to cross one another. The beam intersects the crossed fields perpendicularly. The faces of either the magnetic pole pieces or the electrodes have a shape approximating the shape of a portion of a hyperbola, while the other of the faces are substantially planar. Auxiliary electrodes extend parallel to the beam's path of travel between the electrodes. The filter provides a wide area that enables stigmatic focussing of a wide diameter beam.Type: GrantFiled: August 15, 1994Date of Patent: August 22, 1995Assignee: Hitachi, Ltd.Inventors: Teruo Kohhashi, Hideo Matsuyama
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Patent number: 5444263Abstract: An object of the invention is to provide a pocket sized instrument for reliable recognition of authenticity features of banknotes and other security documents. A basic embodiment of the instrument includes an elongated rod with a handle part at one end. The handle part contains the battery housing and the switch and is provided with a clip for facilitating handling. The other end of the rod includes a frontal test part. A banknote can be passed through a slit in the frontal test part and exposed to the enclosed optical elements. Authenticity features of the document become visible through illumination.Type: GrantFiled: June 9, 1994Date of Patent: August 22, 1995Assignee: Systec Ausbausysteme GmbHInventor: Wolfgang R. Mastnak
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Patent number: 5442185Abstract: A large area ion implantation apparatus which selects ions having predetermined characteristics for implantation. The ions having predetermined characteristics are selected from a plasma contained within a magnetic bottle and heated by a radio frequency source. The selected ions in one embodiment escape from the magnetic bottle and bombard a substrate located external to the magnetic bottle. In another embodiment the selected ions are retained within the magnetic bottle and bombard a substrate which is also located within the bottle. In yet another embodiment of the apparatus, a positive potential on an electrostatic grid located between the substrate and the plasma prevents ions from bombarding a substrate maintained at a negative potential until the potential on the grid is reduced to approximately zero volts.Type: GrantFiled: December 9, 1994Date of Patent: August 15, 1995Assignee: Northeastern UniversityInventor: Chung Chan
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Patent number: 5442186Abstract: A source capsule containing a radioactive isotope is put inside of an outer protective jacket or capsule and the outer jacket is sealed. The outer protective jacket is so designed that it can be reopened without disturbing the radioactive isotope source capsule contained therein. Thus, when it becomes necessary to recondition the source capsule, the inner source capsule can be removed from the outer protective jacket and it can be re-encapsulated in another outer protective jacket. There is provided an encapsulated radioactive isotope source which comprises an outer protective jacket in the form of a can having a side wall, an integrally formed bottom wall and an open upper end. A source capsule containing a radioactive isotope is received within this outer protective jacket. A jacket cap is received within the outer protective jacket so as to close the open end of the jacket, with the source capsule thus located within the outer protective jacket.Type: GrantFiled: December 7, 1993Date of Patent: August 15, 1995Assignee: Troxler Electronic Laboratories, Inc.Inventors: William F. Walker, Peter D. Muse
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Patent number: 5442183Abstract: A charged particle beam apparatus includes a charged particle beam generating system for causing a charged particle source to generate a charged particle beam. A focusing system focuses the charged particle beam onto a sample. A deflecting system causes the focused charged particle beam to scan the surface of the sample. An evacuating system evacuates a space through which the charged particle beam passes. A detector detects information obtained by irradiating the charged particle beam onto the sample. An image display system displays as an image the status of distribution of the information over the sample surface based on a detection signal forwarded from the detector. The focusing system is entirely constituted by an electrostatic lens containing a plurality of lens electrodes, one of the lens electrodes being a final electrode located closest to the sample.Type: GrantFiled: October 19, 1993Date of Patent: August 15, 1995Assignee: Hitachi, Ltd.Inventors: Hironobu Matsui, Mikio Ichihashi, Shinjiroo Ueda, Tadashi Otaka, Kazue Takahashi, Toshiaki Kobari, Kenji Odaka
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Patent number: 5440123Abstract: A method for processing sample material for use with transmission electron microscopes utilizes a sheet mesh for supporting the sample material during irradiation processing. The sheet mesh is formed of a metallic sheet material having a single opening provided in a central portion thereof, a circumferential edge portion of the opening is tapered from one side of the sheet mesh through to the other and the ankle of the taper corresponds to the ankle of irradiation. Position determining portions are provided on the sheet mesh to assure reliable positioning of the sample material. Also, the method provides a for preparation of the sample material including a protective layer formed over a membrane layer for allowing adhesion of membrane layers made of materials which would otherwise degrade the adhesion layer during processing.Type: GrantFiled: August 27, 1993Date of Patent: August 8, 1995Assignee: Sony CorporationInventor: Yuji Ikeda
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Patent number: 5440131Abstract: A wiper assembly is provided for cleaning the reactor tubes of an ultraviolet-light reactor. The wiper assembly is positioned inside a reactor chamber of the ultraviolet-light reactor. The wiper assembly includes a wiper that has a circular opening sufficiently large to accommodate a reactor tube. A wiper blade is formed on the wiper circumferential of the opening and being deflected such that when the reactor tube is positioned through the opening, the blade engages the outer surface of the reactor tube. The wiper is formed of a plastic material. The wiper is connected to a platform positioned within the reactor chamber. The platform supports the wiper in the reactor chamber such that the reactor tube extends through the opening in the wiper. According to one aspect of the invention, at least one rod is connected to the platform. The rod extends out of the reactor chamber.Type: GrantFiled: July 21, 1994Date of Patent: August 8, 1995Assignee: Solar Kinetics Inc.Inventors: Joseph A. Hutchison, Paul T. Schertz
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Patent number: 5440137Abstract: An apparatus and method for curing radiation curable material includes a lamp unit providing radiation in a converging beam directed toward a focal plane and forming a curing zone at a curing position for receiving the curable material. The lamp unit is mounted in a boot member having a spiral external thread for engaging a spiral internal thread on the wall of a housing chamber for receiving the boot member. The engagement of the threads is such that rotation of the boot member controllably varies the intensity of radiation in the curing zone by changing the distance between the radiation outlet of the lamp unit and the curing position. The curing zone may be an elongated band such that rotation of the boot member also provides angular adjustment of the elongated band relative to a curing path for the curable material. The boot member may include internal cooling passages and these passages may contain overlapping light baffles blocking the escape of harmful radiation.Type: GrantFiled: September 6, 1994Date of Patent: August 8, 1995Assignee: Fusion Systems CorporationInventor: Kenneth G. Sowers
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Patent number: 5438203Abstract: A magnetic deflection system for scanning an ion beam over a selected surface comprising: a magnetic structure having poles with respective scanning coils and respective pole faces that define therebetween a gap through which the ion beam passes; a primary current source coupled to the scanning coils adapted to apply to the scanning coils an excitation current to generate a substantially unipolar oscillatory magnetic field in the gap that alternates in polarity as a function of time to cause scanning of the ion beam, the substantially unipolar magnetic field having a magnitude sufficiently greater than zero to prevent the transverse cross-section of the ion beam from substantially fluctuating in size while the ion beam is being scanned across the selected surface.Type: GrantFiled: June 10, 1994Date of Patent: August 1, 1995Assignee: Nissin Electric CompanyInventors: Hilton F. Glavish, Michael A. Guerra, Tadashi Kawai, Masao Naito, Nobuo Nagai