Patents Examined by James Beyer
  • Patent number: 5463221
    Abstract: When an image display unit displays a magnified image of an object being examined, a measuring unit automatically computes the dimensions of the image at the preset position. A tolerance range setting unit has been supplied with an upper and a lower limit value according to which it can judge the dimensions of the object at the preset position to be normal, whereas a comparison-decision unit decides that the dimensions thus computed are held between the upper and lower limit values. When the measured result is found outside the range of upper to lower limit values, the right-or-wrong decision data is stored in a memory and is redisplayed in the form of an image by the image display unit at proper timing.
    Type: Grant
    Filed: March 23, 1994
    Date of Patent: October 31, 1995
    Assignee: Hitachi, Ltd.
    Inventors: Tadashi Otaka, Hiroyoshi Mori, Hideo Todokoro
  • Patent number: 5463218
    Abstract: The invention relates to a method and a device for detecting very large molecular ions in a time-of-flight mass spectrometer, in which the molecules to be detected first fall with high energy (>8 keV) onto a conversion dynode and are then converted into an electronic signal in a sequence of stages. The rnolecules to be detected are at least partly converted into small (<200 u) positive and negative secondary ions on the conversion dynode. The secondary ions formed are accelerated, optionally positive or negative, onto a microchannel plate, where they are converted into electrons. The electrons are amplified in the microchannel plate and then accelerated onto a scintillator. The electron signal is converted into a light signal in the scintillator, being further amplified. A connecting fiber-optic light guide supplies the photons to a photomultiplier, in which they are converted in customary manner into a signal which can be evaluated electronically.
    Type: Grant
    Filed: May 19, 1994
    Date of Patent: October 31, 1995
    Assignee: Bruker-Franzen Analytik GmbH
    Inventor: Armin Holle
  • Patent number: 5459315
    Abstract: A quadrupole mass analyzer in which a pair of heat sink plates 16, 17 and springs 18 clamp ceramic holders 13, 14 that hold the four rod electrodes 12 of the quadrupole unit. The dielectric heat generated in the ceramic holders 13, 14 by the high frequency alternating electromagnetic field due to the AC voltage applied on the four rod electrodes 12 is promptly transferred to the heat sink plates 16, 17. Thus displacement of the four rod electrodes 12 or loss of symmetry is prevented when mass of ions is analyzed.
    Type: Grant
    Filed: November 10, 1994
    Date of Patent: October 17, 1995
    Assignee: Shimadzu Corporation
    Inventor: Hiroaki Waki
  • Patent number: 5457316
    Abstract: The present invention relates to an ion mobility spectrometer sensor apparatus which is in a hermetically sealed housing, utilizing a drift gas for the determination of trace contaminants in a carrier gas, including a container for a sample gas containing an analyte the concentration of which is to be determined, means for purifying the sample gas to produce the carrier gas from it, the means for purifying being hermetically connected from the container through a metallic pipe, a source for the purified drift gas which may be the same or different than the carrier gas, an ion mobility spectrometer sensor having a carrier gas entrance and a drift gas entrance and a gas exit, the ion mobility spectrometer sensor being hermetically connected by a metallic pipe from the purifying means and from the source of the drift gas, a back diffusion trap is hermetically connected from the gas exit, and a signal readout is electrically and hermetically connected from the ion mobility spectrometer sensor for electrically sen
    Type: Grant
    Filed: December 23, 1994
    Date of Patent: October 10, 1995
    Assignee: PCP, Inc.
    Inventors: Martin J. Cohen, Robert M. Stimac, Roger F. Wernlund
  • Patent number: 5457317
    Abstract: An electron microscope uses a camera with a plurality of fluorescent elements separated by walls and a corresponding plurality of detector elements which receive light from fluorescent elements. The walls prevent electrons incident on one fluorescent element from affecting an adjacent fluorescent element, thereby reducing blurring of the image produced by the camera. The fluorescent elements may be connected to the detector elements by waveguides having filters which permit the intensity of light transmitted to each detector element to be adjusted to give a uniform response. The fluorescent elements may be arranged in a linear array, and the electron microscope is then operated to cause an image of a sample to scan across the array.
    Type: Grant
    Filed: September 16, 1993
    Date of Patent: October 10, 1995
    Assignee: Hitachi, Ltd.
    Inventors: Katsuhisa Yonehara, Teiji Katsuta, Isao Matsui
  • Patent number: 5455427
    Abstract: An apparatus for exposing a radiation sensitive workpiece to define patterns therein includes an electron gun, a mask with spaced apertures for passing electron radiation, and a radiation deflector-blanker to direct the radiation to selected ones of the apertures and to form separate beamlets from the apertures then demagnify the separate beamlets and direct them onto the workpiece without crossing them. In one embodiment, the groups of apertures are fixed on the mask and define fixed undivided profiles in the path of the radiation.
    Type: Grant
    Filed: April 28, 1993
    Date of Patent: October 3, 1995
    Assignee: Lepton, Inc.
    Inventors: Martin P. Lepselter, Sheldon M. Kugelmass
  • Patent number: 5453616
    Abstract: By indirectly measuring the movement of a first scanner comprising a piezoelectric element which moves a specimen or a detecting part by providing a second scanner separate from the first scanner and disposing a displacement detecting sensor in the vicinity of the second scanner and causing the second scanner to move in a similar way as the first scanner, the error between the results after image processing and the actual shape, coming from the non-linearity between the impressed voltage and the amount of displacement of the piezoelectric element, is reduced.
    Type: Grant
    Filed: October 18, 1994
    Date of Patent: September 26, 1995
    Assignee: Seiko Instruments, Inc.
    Inventor: Shigeru Wakiyama
  • Patent number: 5451794
    Abstract: An electron linear accelerator for use in industrial material processing, comprises an elongated, resonant, electron accelerator structure defining a linear electron flow path and having an electron injection end and an electron exit end, an electron gun at the injection end for producing and delivering one or more streams of electrons to the electron injection end of the structure during pulses of predetermined length and of predetermined repetition rate, the structure being comprised of a plurality of axially coupled resonant microwave cavities operating in the .pi./2 mode and including a graded-.beta. capture section at the injection end of the structure for receiving and accelerating electrons in the one or more streams of electrons, a .beta.
    Type: Grant
    Filed: January 25, 1995
    Date of Patent: September 19, 1995
    Assignee: Atomic Energy of Canada Limited
    Inventors: Joseph McKeown, Stuart T. Craig, Norbert H. Drewell, Jean-Pierre Labrie, Court B. Lawrence, Victor A. Mason, James Ungrin, Bryan F. White
  • Patent number: 5449920
    Abstract: A large area ion implantation apparatus which selects ions having predetermined characteristics for implantation. The ions having predetermined characteristics are selected from a plasma contained within a magnetic bottle and heated by a radio frequency source. The selected ions in one embodiment escape from the magnetic bottle and bombard a substrate located external to the magnetic bottle. In another embodiment the selected ions are retained within the magnetic bottle and bombard a substrate which is also located within the bottle. In yet another embodiment of the apparatus, a positive potential on an electrostatic grid located between the substrate and the plasma prevents ions from bombarding a substrate maintained at a negative potential until the potential on the grid is reduced to approximately zero volts.
    Type: Grant
    Filed: April 20, 1994
    Date of Patent: September 12, 1995
    Assignee: Northeastern University
    Inventor: Chung Chan
  • Patent number: 5449901
    Abstract: An optical scan type tunnel microscope based on a new principle, having higher resolution, is provided. The apparatus of the invention is comprised of at least an optical fiber 3 whose head portion is covered by an energy acceptor 6, a prism on which a sample which contains an energy donator 7 or is covered by the energy donator 7 is placed, a XY-axis transfer mechanism 9, XY-axis control mechanism 10, Z-axis transfer mechanism 11, Z-axis control mechanism 12, light source 13, optical system 14, and an optical detecting system 15.
    Type: Grant
    Filed: July 22, 1993
    Date of Patent: September 12, 1995
    Assignees: Seiko Instruments Inc., Masamichi Fujihira
    Inventors: Masamichi Fujihira, Tatsuaki Ataka, Hiroshi Muramatsu
  • Patent number: 5448061
    Abstract: A method of using a quadrupole ion trap mass spectrometer for high resolution mass spectroscopy is disclosed. In the preferred embodiment, the space charge in the ion trap is controlled to high accuracy. This is done by using a prescan of the trap before each analytical scan, where the ionization parameters used in the prescan are not fixed, but rather are based on the previous analytical scan. The method is especially useful in connection with performance of high resolution MS/MS experiments of the type described in the inventor's prior U.S. Pat. No. 5,198,665.
    Type: Grant
    Filed: January 10, 1994
    Date of Patent: September 5, 1995
    Assignee: Varian Associates, Inc.
    Inventor: Gregory J. Wells
  • Patent number: 5444243
    Abstract: A Wien filter is used with secondary electrons that are emitted from a primary electron beam scanning a sample surface in a scanning electron microscope (SEM) used as an energy analyzer or a spin rotater with charged particle beams. The beam is focussed into an interior area of the filter that has magnetic and electric fields generated to cross one another. The beam intersects the crossed fields perpendicularly. The faces of either the magnetic pole pieces or the electrodes have a shape approximating the shape of a portion of a hyperbola, while the other of the faces are substantially planar. Auxiliary electrodes extend parallel to the beam's path of travel between the electrodes. The filter provides a wide area that enables stigmatic focussing of a wide diameter beam.
    Type: Grant
    Filed: August 15, 1994
    Date of Patent: August 22, 1995
    Assignee: Hitachi, Ltd.
    Inventors: Teruo Kohhashi, Hideo Matsuyama
  • Patent number: 5444263
    Abstract: An object of the invention is to provide a pocket sized instrument for reliable recognition of authenticity features of banknotes and other security documents. A basic embodiment of the instrument includes an elongated rod with a handle part at one end. The handle part contains the battery housing and the switch and is provided with a clip for facilitating handling. The other end of the rod includes a frontal test part. A banknote can be passed through a slit in the frontal test part and exposed to the enclosed optical elements. Authenticity features of the document become visible through illumination.
    Type: Grant
    Filed: June 9, 1994
    Date of Patent: August 22, 1995
    Assignee: Systec Ausbausysteme GmbH
    Inventor: Wolfgang R. Mastnak
  • Patent number: 5442185
    Abstract: A large area ion implantation apparatus which selects ions having predetermined characteristics for implantation. The ions having predetermined characteristics are selected from a plasma contained within a magnetic bottle and heated by a radio frequency source. The selected ions in one embodiment escape from the magnetic bottle and bombard a substrate located external to the magnetic bottle. In another embodiment the selected ions are retained within the magnetic bottle and bombard a substrate which is also located within the bottle. In yet another embodiment of the apparatus, a positive potential on an electrostatic grid located between the substrate and the plasma prevents ions from bombarding a substrate maintained at a negative potential until the potential on the grid is reduced to approximately zero volts.
    Type: Grant
    Filed: December 9, 1994
    Date of Patent: August 15, 1995
    Assignee: Northeastern University
    Inventor: Chung Chan
  • Patent number: 5442186
    Abstract: A source capsule containing a radioactive isotope is put inside of an outer protective jacket or capsule and the outer jacket is sealed. The outer protective jacket is so designed that it can be reopened without disturbing the radioactive isotope source capsule contained therein. Thus, when it becomes necessary to recondition the source capsule, the inner source capsule can be removed from the outer protective jacket and it can be re-encapsulated in another outer protective jacket. There is provided an encapsulated radioactive isotope source which comprises an outer protective jacket in the form of a can having a side wall, an integrally formed bottom wall and an open upper end. A source capsule containing a radioactive isotope is received within this outer protective jacket. A jacket cap is received within the outer protective jacket so as to close the open end of the jacket, with the source capsule thus located within the outer protective jacket.
    Type: Grant
    Filed: December 7, 1993
    Date of Patent: August 15, 1995
    Assignee: Troxler Electronic Laboratories, Inc.
    Inventors: William F. Walker, Peter D. Muse
  • Patent number: 5442183
    Abstract: A charged particle beam apparatus includes a charged particle beam generating system for causing a charged particle source to generate a charged particle beam. A focusing system focuses the charged particle beam onto a sample. A deflecting system causes the focused charged particle beam to scan the surface of the sample. An evacuating system evacuates a space through which the charged particle beam passes. A detector detects information obtained by irradiating the charged particle beam onto the sample. An image display system displays as an image the status of distribution of the information over the sample surface based on a detection signal forwarded from the detector. The focusing system is entirely constituted by an electrostatic lens containing a plurality of lens electrodes, one of the lens electrodes being a final electrode located closest to the sample.
    Type: Grant
    Filed: October 19, 1993
    Date of Patent: August 15, 1995
    Assignee: Hitachi, Ltd.
    Inventors: Hironobu Matsui, Mikio Ichihashi, Shinjiroo Ueda, Tadashi Otaka, Kazue Takahashi, Toshiaki Kobari, Kenji Odaka
  • Patent number: 5440123
    Abstract: A method for processing sample material for use with transmission electron microscopes utilizes a sheet mesh for supporting the sample material during irradiation processing. The sheet mesh is formed of a metallic sheet material having a single opening provided in a central portion thereof, a circumferential edge portion of the opening is tapered from one side of the sheet mesh through to the other and the ankle of the taper corresponds to the ankle of irradiation. Position determining portions are provided on the sheet mesh to assure reliable positioning of the sample material. Also, the method provides a for preparation of the sample material including a protective layer formed over a membrane layer for allowing adhesion of membrane layers made of materials which would otherwise degrade the adhesion layer during processing.
    Type: Grant
    Filed: August 27, 1993
    Date of Patent: August 8, 1995
    Assignee: Sony Corporation
    Inventor: Yuji Ikeda
  • Patent number: 5440131
    Abstract: A wiper assembly is provided for cleaning the reactor tubes of an ultraviolet-light reactor. The wiper assembly is positioned inside a reactor chamber of the ultraviolet-light reactor. The wiper assembly includes a wiper that has a circular opening sufficiently large to accommodate a reactor tube. A wiper blade is formed on the wiper circumferential of the opening and being deflected such that when the reactor tube is positioned through the opening, the blade engages the outer surface of the reactor tube. The wiper is formed of a plastic material. The wiper is connected to a platform positioned within the reactor chamber. The platform supports the wiper in the reactor chamber such that the reactor tube extends through the opening in the wiper. According to one aspect of the invention, at least one rod is connected to the platform. The rod extends out of the reactor chamber.
    Type: Grant
    Filed: July 21, 1994
    Date of Patent: August 8, 1995
    Assignee: Solar Kinetics Inc.
    Inventors: Joseph A. Hutchison, Paul T. Schertz
  • Patent number: 5440137
    Abstract: An apparatus and method for curing radiation curable material includes a lamp unit providing radiation in a converging beam directed toward a focal plane and forming a curing zone at a curing position for receiving the curable material. The lamp unit is mounted in a boot member having a spiral external thread for engaging a spiral internal thread on the wall of a housing chamber for receiving the boot member. The engagement of the threads is such that rotation of the boot member controllably varies the intensity of radiation in the curing zone by changing the distance between the radiation outlet of the lamp unit and the curing position. The curing zone may be an elongated band such that rotation of the boot member also provides angular adjustment of the elongated band relative to a curing path for the curable material. The boot member may include internal cooling passages and these passages may contain overlapping light baffles blocking the escape of harmful radiation.
    Type: Grant
    Filed: September 6, 1994
    Date of Patent: August 8, 1995
    Assignee: Fusion Systems Corporation
    Inventor: Kenneth G. Sowers
  • Patent number: 5438203
    Abstract: A magnetic deflection system for scanning an ion beam over a selected surface comprising: a magnetic structure having poles with respective scanning coils and respective pole faces that define therebetween a gap through which the ion beam passes; a primary current source coupled to the scanning coils adapted to apply to the scanning coils an excitation current to generate a substantially unipolar oscillatory magnetic field in the gap that alternates in polarity as a function of time to cause scanning of the ion beam, the substantially unipolar magnetic field having a magnitude sufficiently greater than zero to prevent the transverse cross-section of the ion beam from substantially fluctuating in size while the ion beam is being scanned across the selected surface.
    Type: Grant
    Filed: June 10, 1994
    Date of Patent: August 1, 1995
    Assignee: Nissin Electric Company
    Inventors: Hilton F. Glavish, Michael A. Guerra, Tadashi Kawai, Masao Naito, Nobuo Nagai