Patents Examined by James M Mellott
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Patent number: 11701917Abstract: Disclosed is a method of producing a pattern for a decorative panel. The method includes applying a clear gel coat on a mold to form a clear layer. The clear layer is cured and then digitally printed with one or more inks so as to produce a pattern on the clear layer. Also disclosed is a decorative panel including a clear layer, an opaque layer and a pattern digitally printed on the clear layer, between the clear and opaque layers, such that the pattern is visible through the clear layer.Type: GrantFiled: June 23, 2021Date of Patent: July 18, 2023Inventor: Yan Bilodeau
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Patent number: 11673827Abstract: Described herein is a method of forming a reflective article comprising applying an anti-fog composition to a major surface of a reflective substrate, the anti-fog composition comprising an anti-fog agent and a liquid carrier and having a solid's content between about 15 wt. % to about 35 wt. % based on the total weight of the anti-fog composition, and subsequently heating the reflective substrate to a temperature of about 80° F. to about 325° F. for a drying period, and wherein the liquid carrier comprises water and a hydroxyl-containing component.Type: GrantFiled: October 4, 2018Date of Patent: June 13, 2023Inventor: Dallas Aaron Kohler
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Patent number: 11673364Abstract: A method and related apparatus for producing an embossing on a substrate using a digital printing technology includes the application of an embossing liquid, for example a water-based liquid, on a non-polymerized resin layer and the subsequent polymerization of the resin with UV curing.Type: GrantFiled: October 13, 2017Date of Patent: June 13, 2023Inventor: Giorgio Macor
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Patent number: 11655374Abstract: A method of making pigments, such as special effect pigment includes forming a first slurry including a substrate, a polymer precursor, and a radical initiator; forming a solution including an emulsifier; and combining the first slurry and the solution so that the substrate is encapsulated by a first coating. Special effect pigments formed by the method are also disclosed.Type: GrantFiled: April 12, 2019Date of Patent: May 23, 2023Assignee: VIAVI SOLUTIONS INC.Inventor: Kangning Liang
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Patent number: 11634636Abstract: A method for producing flakes of a resin thin film including: a step (1) of forming a resin thin film on a substrate film to obtain a multilayer film; a step (2) of pressing the multilayer film by a member having a concavo-convex shape to form cracks in the resin thin film; and a step (3) of stripping the resin thin film from the substrate film to obtain flakes. The step (2) is preferably performed with a pressing pressure of 100 MPa or less. The resin thin film is preferably formed of a cured product of a photocurable liquid crystal composition. The resin thin film is preferably a cholesteric resin layer.Type: GrantFiled: March 26, 2019Date of Patent: April 25, 2023Assignee: ZEON CORPORATIONInventor: Yusuke Warabiminami
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Patent number: 11628623Abstract: The present application describes apparatus (100) for colouring an additively manufactured polymer part, comprising a chamber (106) for locating at least one additively manufactured polymer part (105) to be coloured, a first reservoir (102) for containing dye pigment particles to be suspended in a gas, and fluidly coupled to the chamber, and a further reservoir (104) for containing a solvent vapour, and fluidly coupled to the chamber. A method of colouring an additively manufactured polymer part is also described.Type: GrantFiled: July 30, 2019Date of Patent: April 18, 2023Assignee: SHAWBROOK BANK LIMITEDInventors: Joseph Gwilliam Crabtree, Konstantin Rybalcenko, Andre Gaio, Giorgio Ioannides, Rory Evan Charlesworth, Viktor Pap-Kovacs
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Patent number: 11592246Abstract: Nanostructured coating materials, methods of their production, and methods of use in a variety of applications are described. The nanostructured materials described herein include one or more 2+ and/or 3+ metal ion(s), optionally in a ternary phase, on a substrate.Type: GrantFiled: September 19, 2017Date of Patent: February 28, 2023Assignee: Nelumbo Inc.Inventors: Lance R. Brockway, David C. Walther
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Patent number: 11592741Abstract: An imprinting method includes dispensing a first liquid on a first region of a substrate. The first liquid is a photocurable resist precursor. A second liquid is dispensed on a second region of the substrate. The second region is adjacent to and surrounding the first region. The second liquid is non-photocurable as dispensed. The first region is then irradiated with light while a patterned template is being pressed against the first liquid. The light cures the first liquid and forms a resist pattern corresponding to the patterned template. The patterned template and the substrate are then separated from each other. The second liquid is then selectively removed from the substrate while leaving the resist pattern on the substrate.Type: GrantFiled: August 27, 2020Date of Patent: February 28, 2023Assignee: Kioxia CorporationInventors: Takeshi Higuchi, Hirokazu Kato, Kasumi Okabe
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Patent number: 11592748Abstract: A multi-spray RRC process with dynamic control to improve final yield and further reduce resist cost is disclosed. In one embodiment, a method, includes: dispensing a first layer of solvent on a semiconductor substrate while spinning at a first speed for a first time period; dispensing the solvent on the semiconductor substrate while spinning at a second speed for a second time period so as to transform the first layer to a second layer of the solvent; dispensing the solvent on the semiconductor substrate while spinning at a third speed for a third time period so as to transform the second layer to a third layer of the solvent; dispensing the solvent on the semiconductor substrate while spinning at a fourth speed for a fourth time period so as to transform the third layer to a fourth layer of the solvent; and dispensing a first layer of photoresist on the fourth layer of the solvent while spinning at a fifth speed for a fifth period of time.Type: GrantFiled: November 14, 2019Date of Patent: February 28, 2023Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.Inventors: Ming-Hsuan Chuang, Po-Sheng Lu, Shou-Wen Kuo, Cheng-Yi Huang, Chia-Hung Chu
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Patent number: 11571709Abstract: A substrate treatment method for treating a substrate, includes: (a) applying a coating solution to a front surface of the substrate by a spin coating method to form a coating film; (b) supplying a solvent for the coating solution to a projection of the coating film formed at a front surface peripheral edge of the substrate at (a); and (c) rotating the substrate in a state where the supply of the solvent is stopped, to move a top of the projection to an outside in a radial direction of the substrate. (b) and (c) are repeatedly performed. The projection is a buildup of the coating solution protruding from the coating film.Type: GrantFiled: April 10, 2020Date of Patent: February 7, 2023Assignee: Tokyo Electron LimitedInventor: Teppei Takahashi
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Patent number: 11567401Abstract: A nanofabrication method comprises receiving information regarding a distortion within an imprint system, generating a first drop pattern of formable material based on the received information, dispensing a first plurality of drops onto a substrate according to the first drop pattern, contacting the dispensed first plurality of drops with a patternless superstrate to form a first layer of formable material, forming a first cured layer by curing the first layer of formable material while the superstrate is contacting the first layer of formable material, separating the superstrate from the first cured layer, depositing an etch resistant layer on the first cured layer, generating a second drop pattern of formable material, dispensing a second plurality of drops onto the etch resistant layer according to the second drop pattern, and contacting the dispensed second plurality of drops with a patterned template to form a second layer of formable material.Type: GrantFiled: December 20, 2019Date of Patent: January 31, 2023Assignee: Canon Kabushiki KaishaInventors: Byung-Jin Choi, Anshuman Cherala
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Patent number: 11550223Abstract: The present disclosure provides a coating method and a coating system. The coating method comprises: providing a substrate, and dropping a first liquid onto the substrate; dropping, onto the first liquid, a second liquid which is immiscible with the first liquid and has a density greater than that of the first liquid; and rotating the substrate, such that the first liquid is diffused on the surface of the substrate, and the second liquid is diffused on the surface of the first liquid.Type: GrantFiled: July 16, 2021Date of Patent: January 10, 2023Assignee: CHONGQING KONKA PHOTOELECTRIC TECHNOLOGY RESEARCH INSTITUTE CO., LTD.Inventor: Chaochao Xiong
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Patent number: 11524316Abstract: Forming a two-dimensional polymeric sheet includes translating a portion of a flexible substrate through a first liquid precursor to coat the portion of the flexible substrate with the first liquid precursor, thereby yielding a precursor-coated portion of the flexible substrate. The precursor-coated portion of the flexible substrate is translated through an interface between the first liquid precursor and a second liquid precursor, thereby reacting the first liquid precursor on the precursor-coated portion of the flexible substrate with the second liquid precursor to yield a polymer-coated portion of the flexible substrate.Type: GrantFiled: January 31, 2020Date of Patent: December 13, 2022Assignee: Arizona Board of Regents on behalf of Arizona State UniversityInventors: Meng Wang, Yuxia Shen, Sefaattin Tongay, Matthew Green, Ying Qin, Sijie Yang
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Patent number: 11520226Abstract: The present invention provides an imprint method of performing a forming process which includes supplying an imprint material on a substrate and then forming a pattern of the imprint material on the substrate by using a mold, the method comprising: dispensing, on the substrate, an adhesion material to bring the substrate and the imprint material into tight contact with each other; performing a first annealing process of heating and cooling the substrate on which the adhesion material has been dispensed; conveying the substrate to which the first annealing process has been performed; performing a second annealing process of heating and cooling the substrate which has been conveyed in the conveying; and performing the forming process on the substrate to which the second annealing process has been performed.Type: GrantFiled: May 8, 2018Date of Patent: December 6, 2022Assignee: CANON KABUSHIKI KAISHAInventors: Tadayasu Nishikawa, Tsutomu Hashimoto
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Patent number: 11484908Abstract: Web lifter and/or stabilizer and method of lifting and/or stabilizing a travelling web and for coating a web. The device creates a web hold down force via a negative pressure slot at its exit side, which draws the web down against the surface on the entry side. The device can be actuated to move the web relative to a slot die coater off the die lips and stop the application of slurry to the web, thereby creating uncoated regions on the web surface. The device can then be actuated to move the web back into contact with the coater to start the application of slurry to the web, thereby creating coated regions on the web surface. Web lifting can be accomplished by rotating the device in first and second directions to lift the web off of the slot die coater and return the web back into contact with the coater.Type: GrantFiled: November 13, 2019Date of Patent: November 1, 2022Assignee: Durr Systems, Inc.Inventors: Kim A. Anderson, Eric Maki, George Glenn
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Patent number: 11479917Abstract: The invention refers to a method to produce a packaging material comprising the steps of; treating at least one surface of a paperboard substrate with a binder and with a metal salt, printing at least a part of said treated surface with ink, and applying at least one polymer layer on said printed surface. The packaging material produced in accordance with the invention shows good printability and simultaneously good adhesion of the applied polymer layer.Type: GrantFiled: March 13, 2015Date of Patent: October 25, 2022Assignee: Stora Enso OYJInventors: Nina Miikki, Petri Sirvió, Kaj Backfolk
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Patent number: 11459465Abstract: A method of coating a roofing material is described. The method comprises providing an aqueous roof coating composition comprising an inorganic binder material, a chemical curing agent, inorganic particulate filler; applying the aqueous roof coating composition to an inorganic roofing material; and allowing the aqueous roof coating composition to dry and chemically curing agent. The roof coating composition has a total solar reflectance of at least 0.7 after allowing the aqueous roof coating composition to dry and chemically cure. Also described are aqueous roof coating compositions and inorganic (e.g. roofing) materials comprising a surface coating having a total solar reflectance of at least 0.7; wherein the surface coating comprises silicate, a chemical curing agent; and inorganic particulate filler.Type: GrantFiled: November 2, 2018Date of Patent: October 4, 2022Assignee: 3M Innovative Properties CompanyInventors: Taisiya Skorina, Rebecca L. A. Everman, Jean A. Tangeman, Kenton D. Budd
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Patent number: 11440049Abstract: A low friction, wear-resistant surface operable at high temperatures and high loads with a low coefficient of friction including boron nitride and graphene-oxide on steel or nanodiamonds and graphene on aluminum. The low friction, wear-resistant surface remains with a coefficient of friction in the superlubric regime at temperatures in between about 200° C. and 970° C.Type: GrantFiled: September 30, 2019Date of Patent: September 13, 2022Assignee: UChicago Argonne, LLCInventors: Anirudha V. Sumant, Venkata Aditya Ayyagari
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Patent number: 11415881Abstract: A method for functionalising a substrate intended for the self-assembly of a block copolymer, includes depositing on the surface of a substrate a layer of a first polymer material, the first polymer having a first chemical affinity with respect to the block copolymer; grafting one part only of the first polymer material layer onto the surface of the substrate; printing, using a mould, patterns in a sacrificial layer arranged above the grafted part of the first polymer material layer; transferring the patterns of the sacrificial layer into the grafted part of the first polymer material layer, until the substrate is reached; and removing at least one part of the sacrificial layer by wet etching, so as to uncover the grafted part of the first polymer material layer.Type: GrantFiled: December 7, 2017Date of Patent: August 16, 2022Assignee: COMMISSARIAT A L'ENERGIE ATOMIQUE ET AUX ENERGIES ALTERNATIVESInventors: Stefan Landis, Raluca Tiron
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Patent number: 11402749Abstract: A preliminary drop pattern is provided that defines a predetermined location on a substrate for a center of mass of each drop of a plurality of drops. The preliminary drop pattern is adjusted to generate an adjusted drop pattern by radially shifting each drop of a subset of drops of the plurality of drops from the predetermined location by a radial offset. The plurality of drops is dispensed according to the adjusted drop pattern. A template or a superstrate is contacted with the dispensed drops, after which the center of mass of each drop of the subset of drops is radially displaced to a displaced location on the substrate prior to the plurality of drops forming a continuous layer. The radial offset is selected such that the displaced location is within 50 ?m of the predetermined location of the corresponding drop of the preliminary drop pattern.Type: GrantFiled: June 19, 2019Date of Patent: August 2, 2022Assignee: Canon Kabushiki KaishaInventor: Niyaz Khusnatdinov