Abstract: A method of treating a particle beam is disclosed, of interest in particular for mass spectrometry for 14C. A particle beam including positive ions is passed through a charge exchange cell containing a target gas. The target gas is electrically insulating at room temperature and pressure. At least some of the positive ions of the particle beam are converted to negative ions by interaction with the target gas. The particle beam incident at the charge exchange cell includes molecules and/or molecular ions which interact with the target gas to reduce the concentration of molecules as a result of repeated collisions with particles of the target gas. A corresponding mass spectrometry system is also disclosed.

Abstract: A solution for disinfecting an area using ultraviolet radiation is provided. The solution can include an enclosure including at least one ultraviolet transparent window and a set of ultraviolet radiation sources located adjacent to the at least one ultraviolet transparent window. The set of ultraviolet radiation sources can be configured to generate ultraviolet radiation directed through the at least one ultraviolet transparent window. An input unit can be located on the enclosure and configured to generate an electrical signal in response to pressure applied to the enclosure. A control unit can be configured to manage the ultraviolet radiation by monitoring the electrical signal generated by the input unit and controlling, based on the monitoring, the ultraviolet radiation generated by the set of ultraviolet radiation sources.

Abstract: A composite charged particle beam apparatus modulates an irradiation condition of a charged particle beam at high speed and detects a signal in synchronization with a modulation period to extract a signal arising from a particular charged particle beam when a sample is irradiated with a plurality of charged particle beams simultaneously. Light emitted from two or more kinds of scintillators having different light emitting properties is dispersed, signal strength is detected, and a signal is processed based on a ratio of first signal strength when the sample is irradiated with a first charged particle beam alone to second signal strength when the sample is irradiated with a second charged particle beam alone. The apparatus can extract only a signal arising from a desired charged particle beam even when the sample is irradiated with the plurality of charged particle beams simultaneously.

Abstract: A multi charged particle beam writing apparatus according to one aspect of the present invention includes a plurality of first blankers to respectively perform blanking deflection of a corresponding beam in multiple beams having passed through the plurality of openings of the aperture member, a plurality of second blankers to deflect a defective beam in the multiple beams having passed through the plurality of openings of the aperture member to be in a direction orthogonal to a deflection direction of the plurality of first blankers, a blanking aperture member to block each of beams which were deflected to be in a beam off state by at least one of the plurality of first blankers and the plurality of second blankers, and a detection processing unit to detect a defective beam in the multiple beams having passed through the plurality of openings of the aperture member.

Abstract: An imaging system that selectively alternates a first, non-destructive imaging mode and a second, destructive imaging mode to analyze a specimen so as to determine an atomic structure and composition of the specimen is provided. The field ionization mode can be used to acquire first images of ionized atoms of an imaging gas present in a chamber having the specimen disposed therein, and the field evaporation mode can be used to acquire second images of ionized specimen atoms evaporated from a surface of the specimen with the imaging gas remaining in the chamber. The first and second image data can be analyzed in real time, during the specimen analysis, and results can be used to dynamically adjust operating parameters of the imaging system.

Abstract: There are provided a radiographic imaging apparatus that is movable in response to a relatively small application of force and a method for controlling the same. A radiographic imaging apparatus includes a radiographic image generator; a motor configured to move the radiographic image generator; and a controller configured to calculate a disturbance applied to the radiographic image generator and to drive the motor based on the disturbance.

Abstract: A system includes an aperture array comprising a plurality of active apertures, respective ones of the active apertures configured to selectively deflect beams passing therethrough. The system also includes a limiting aperture configured to pass beams not deflected by the active apertures to a target object. The system further includes a control circuit configured to control the active apertures to provide first and second different exposure duration resolutions.

Abstract: In one embodiment, a multi charged-particle beam writing apparatus includes a plurality of blankers switching between ON and OFF state of a corresponding beam among multiple beams, a main deflector deflecting beams having been subjected to blanking deflection to a writing position of the beams in accordance with movement of a stage, a detector scanning a mark on the stage with each of the beams having been deflected by the main deflector and detecting a beam position from a change in intensity of reflected charged particles and a position of the stage, and a beam shape calculator switching an ON beam, scanning the mark with the ON beam, and calculating a shape of the multiple beams from a beam position. A shape of a deflection field of the main deflector is corrected by using a polynomial representing an amount of beam position shift that is dependent on a beam deflection position of the main deflector and then the mark is scanned with the ON beam. The polynomial is different for each ON beam.

Abstract: A system can include a processor; memory accessible by the processor; a display; and processor-executable instructions stored in the memory and executable by the processor to render a graphical user interface to the display, where the graphical user interface includes a graphic of a machine where the machine includes a conveyor; a UV zone that includes LED-based UV radiation sources; a heating zone; and a controller that controls power to at least one of the LED-based UV radiation sources and where the graphical user interface includes a functional graphic that responsive to actuation renders a menu to the display where the menu includes menu items for the UV zone.

Abstract: A sterilization system is configured to emit energy, such as UV radiation, for sterilizing a surface, such as a door handle, faucet handle, elevator button, or other target surfaces known in the art. The sterilization system is configured to operate automatically in response to detection of a user's hand interfacing with the handle. After a user releases a handle, the sterilization system is actuated to sanitize the handle for subsequent users.

Abstract: A tapered optical needle includes a tapered light-transmissive needle and a surface plasmon wave transport layer. The tapered light-transmissive needle has a first tip, a bottom, and a curved surface connecting the first tip and the bottom. The surface plasmon wave transport layer is disposed on the curved surface and covers the first tip, wherein the surface plasmon wave transport layer has a curved slit structure. The curved slit structure includes a plurality of curved portions arranged from the first tip to an edge of the bottom and located between the first tip and the edge of the bottom, and extending directions of the curved portions are different to a direction from the first tip to the edge of the bottom.

Abstract: A shutter assembly includes a first shutter blade having a first toothed arm extending therefrom and a first light transmitting aperture therein, and a second shutter blade positioned adjacent and parallel to the first shutter blade. The second shutter blade has a second toothed arm extending therefrom and a second light transmitting aperture therein. The first and second shutter blades are supported to allow parallel linear motion. A motor gear is disposed between, and meshed with, the first and second toothed arms such that rotation of the gear causes the first and second shutter blades to move linearly in opposite directions between an open position in which the first and second light transmitting apertures are in an overlapping relationship with respect to one another, and a closed position in which the first and second light transmitting apertures are in a non-overlapping relationship with respect to one another.

Abstract: This sample holder for a scanning probe microscope is constituted of (1) a container that retains a liquid and (2) a flat-plate-shaped upper cover that covers an upper opening of the container and that has a narrow slit above the position where a sample is placed. In the upper cover, the slit has a slit width with which a thin film of the liquid is formed over the upper surface of the sample when the liquid fills the space between the container and the upper cover. The thin film of the liquid has a film thickness smaller than the distance between the upper surface of the sample and the upper cover.

Abstract: An initial pulse of radiation is generated; a section of the initial pulse of radiation is extracted to form a modified pulse of radiation, the modified pulse of radiation including a first portion and a second portion, the first portion being temporally connected to the second portion, and the first portion having a maximum energy that is less than a maximum energy of the second portion; the first portion of the modified pulse of radiation is interacted with a target material to form a modified target; and the second portion of the modified pulse of radiation is interacted with the modified target to generate plasma that emits extreme ultraviolet (EUV) light.

Abstract: A charged particle beam specimen inspection system is described. The system includes an emitter for emitting at least one charged particle beam, a specimen support table configured for supporting the specimen, an objective lens for focusing the at least one charged particle beam, a charge control electrode provided between the objective lens and the specimen support table, wherein the charge control electrode has at least one aperture opening for the at least one charged particle beam, and a flood gun configured to emit further charged particles for charging of the specimen, wherein the charge control electrode has a flood gun aperture opening.

Abstract: A method is provided of measuring the mass thickness of a target sample for use in electron microscopy. Reference data are obtained which is representative of the X-rays (28) generated within a reference sample (12) when a particle beam (7) is caused to impinge upon a region (14) of the reference sample (12). The region (14) is of a predetermined thickness of less than 300 nm and has a predetermined composition. The particle beam (7) is caused to impinge upon a region (18) of the target sample (16). The resulting X-rays (29) generated within the target sample (16) are monitored (27) so as to produce monitored data. Output data are then calculated based upon the monitored data and the reference data, the output data including the mass thickness of the region (18) of the target sample (16).

Abstract: In an approach for providing simulation results of an interaction between a transducer head and a magnetic medium, a computer identifies a first raster scan of a sample via a scanning probe microscope. The computer generates a topography image based on the first raster scan of the sample. The computer identifies one or more reference features within the created topography image. The computer calculates an average height based on the one or more reference features. The computer determines a lift distance associated with a probe of the scanning probe microscope. The computer defines a uniform plane based on the calculated average height and the determined lift distance. The computer performs a second raster scan of the sample based on the defined uniform plane. The computer generates a fly-height image based on the second raster scan. The computer provides simulation results based at least in part on the second raster scan.

Abstract: A structure for discharging an extreme ultraviolet mask (EUV mask) is provided to discharge the EUV mask during the inspection by an electron beam inspection tool. The structure for discharging an EUV mask includes at least one grounding pin to contact conductive areas on the EUV mask, wherein the EUV mask may have further conductive layer on sidewalls or/and bottom. The inspection quality of the EUV mask is enhanced by using the electron beam inspection system because the accumulated charging on the EUU mask is grounded.

Abstract: A microscope system and method allow for a desired x?-direction scanning along a specimen to be angularly offset from an x-direction of the XY translation stage, and rotates an image sensor associated with the microscope to place the pixel rows of the image sensor substantially parallel to the desired x?-direction. The angle of offset of the x?-direction relative to the x-direction is determined and the XY translation stage is employed to move the specimen relative to the image sensor to different positions along the desired x?-direction without a substantial shift of the image sensor relative to the specimen in a y?-direction, the y?-direction being orthogonal to the x? direction of the specimen. The movement is based on the angle of offset.

Abstract: A device for transmitting and projecting greater photonic energy. The device includes at least one photonic source for generating and emitting photonic energy in a wavelength or in a range of wavelengths of visible light. The device also includes a lens formed of a fluoropolymer material wherein the at least one photonic source is sealed within an interior and underneath an outer surface of the fluoropolymer material so as to be surrounded by the fluoropolymer material. The at least one photonic source is coupled with the lens such that the photonic energy emitting from the at least one photonic source transmits through and projects beyond the fluoropolymer material. The lens propagates photons in an omnidirectional pattern simultaneously throughout the entirety of the lens. The joining of the at least one photonic source and the fluoropolymer material comprises all components for generating and emitting photonic energy when the photonic source is activated, such that it is an operable source.