Abstract: The present application provides the block copolymers and their application. The block copolymer has an excellent self assembling property and phase separation and various required functions can be freely applied thereto as necessary.
Type:
Grant
Filed:
December 8, 2014
Date of Patent:
December 11, 2018
Assignee:
LG Chem, Ltd.
Inventors:
Mi Sook Lee, Jung Keun Kim, Je Gwon Lee, No Jin Park, Se Jin Ku, Eun Young Choi, Sung Soo Yoon
Abstract: Methods for fabricating sub-lithographic, nanoscale microstructures utilizing self-assembling block copolymers, and films and devices formed from these methods are provided.
Abstract: The present invention relates to a method for preparing super absorbent polymer, and the method for preparing super absorbent polymer according to the present invention may reduce the content of non-reacted monomers in the super absorbent polymer, by using three kinds of polymerization initiators.
Type:
Grant
Filed:
December 10, 2015
Date of Patent:
December 4, 2018
Assignee:
LG Chem, Ltd.
Inventors:
Seung Mo Lee, Gi Cheul Kim, Kum Hyoung Lee, Se Yeol Park
Abstract: The present invention relates to a thermoplastic resin composition comprising a rubber graft copolymer comprising a core layer containing a rubber copolymer and a shell layer grafted on the core layer and a thermoplastic resin comprising a polycarbonate resin and an aliphatic polyester resin in the mass ratio of the rubber graft copolymer/the thermoplastic resin of 3/100 or more, wherein the shell layer is obtained by polymerizing or copolymerizing a (meth)acrylate monomer having an epoxy group, and the amount of the (meth)acrylate monomer having an epoxy group is 3 parts by mass or more and less than 29 parts by mass based on 100 parts by mass of the rubber graft copolymer. The thermoplastic resin composition of the present invention can be utilized in various applications.
Abstract: A comb copolymer with a polymer backbone having grafted lateral macromonomer segments, the method of preparing, and the use thereof as a thickener in cosmetics. The polymer backbone is more than 55% and up to 90% molar ATBS, between 1% and 20% molar cationic monomer or monomer of formula (I): CH2?C(R1)—C(?O)—Y—(CH2)m-N(R2) (R3), where m is between 1 and 4, Y is O or NH, R1 is H or CH2, and R2 and R3 are each a methyl or ethyl radical, and optionally 0.005% to 1% molar of at least one cross-linking monomer with at least two C?C bonds. The lateral macromonomer segments are polymerized from 9% to 30% molar of N-alkyl acrylamide or N,N-dialkyl acrylamide of formula (II): CH2?C(R4)—C(?O)—N(R5) (R6), where R4 is H or CH2 and R5 and R6 are H or a C1 to C3 alkyl radical, with at least one of R5 or R6 not being H.
Type:
Grant
Filed:
November 26, 2013
Date of Patent:
November 20, 2018
Assignee:
SOCIETE D'EXPLOITATION DE PRODUITS POUR LES INDUSTRIES CHIMIQUES SEPPIC
Abstract: A three-dimensional (3D) printing composition includes ceramic filaments comprising an additive having an aspect ratio of at least 2:1. 3D printed ceramic articles include the ceramic filaments.
Abstract: Directionally oriented block copolymer films and zone annealing processes for producing directionally oriented block films are provided. The zone annealing processes include methods of inducing horizontally oriented block copolymers through a soft sheer process and methods of inducing vertically oriented block copolymers via sharp dynamic zone annealing. The zone annealing processes are capable of both small and large scale production of directionally oriented block films. The cold zone annealing processes are also capable of being combined with graphoepitaxy methods.
Abstract: Process for functionalizing a polymer by treating said polymer at a temperature in the range 80-250° C. with a mono-azide of the formula wherein m is 0 or 1, n is 0 or 1, n+m=1 or 2, X is a linear or branched, aliphatic or aromatic hydrocarbon moiety with 1-12 carbon atoms, optionally containing heteroatoms, Rb is selected from the group consisting of hydrogen, linear and branched alkyl groups with 1-6 carbon atoms optionally substituted with O, S, P, Si, or N-containing functional groups, alkoxy groups with 1-6 carbon atoms, and halogens, and each Ra is individually selected from hydrogen, linear or branched alkyl groups with 1-6 carbon atoms, or may form a saturated or unsaturated aliphatic or aromatic ring structure with at least one other Ra.
Type:
Grant
Filed:
April 21, 2016
Date of Patent:
October 16, 2018
Assignee:
AKZO NOBEL CHEMICALS INTERNATIONAL B.V.
Inventors:
Joseph Christiaan Olde Boerrigter, Auke Gerardus Talma, Waldo Joseph Elisabeth Beek
Abstract: Process for modifying a polymer comprising the steps of (a) mixing the polymer with a maleimide-functionalized mono-azide and/or a citraconimide-functionalized mono-azide at a temperature in the range 80-250° C. to form a functionalized polymer, and (b) reacting the functionalized polymer with a substance containing one or more functional groups that can react with a maleimide or citraconimide functional group.
Type:
Grant
Filed:
April 21, 2016
Date of Patent:
October 9, 2018
Assignee:
AKZO NOBEL CHEMICALS INTERNATIONAL B.V.
Inventors:
Waldo Joseph Elisabeth Beek, Auke Gerardus Talma
Abstract: A processing fluid for image forming by an aqueous ink includes a flocculant to aggregate a colorant in the aqueous ink, a water-soluble organic solvent, a polymer particle, and water. The polymer particle has a core-shell structure with a core portion including a wax and a shell portion having a lower critical solution temperature of 30 degrees C. or higher.
Abstract: The present application provides the block copolymers and their application. The block copolymer has an excellent self assembling property and phase separation and various required functions can be freely applied thereto as necessary.
Type:
Grant
Filed:
December 8, 2014
Date of Patent:
October 2, 2018
Assignee:
LG Chem, Ltd.
Inventors:
No Jin Park, Jung Keun Kim, Je Gwon Lee, Sung Soo Yoon
Abstract: A resin composition comprising a modified ethylene-vinyl alcohol copolymer (A) and an unmodified ethylene-vinyl alcohol copolymer (B), wherein the modified ethylene-vinyl alcohol copolymer (A) is represented by a following formula (I), contents (mol %) of a, b, and c based on the total monomer units satisfy following formulae (1) to (3), and a degree of saponification is not less than 80 mol %, thereby providing a resin composition that is excellent in a barrier property, impact resistance, and secondary processability and moreover excellent in productivity. 18?a?55??(1) 0.01?c?20??(2) [100?(a+c)]×0.9?b?[100?(a+c)]??(3).
Abstract: Polymer blends comprising (A) at least one polystyrene (co)polymer other than styrene methyl methacrylate copolymer (SMMA), (B) at least one poly(lactic acid) (PLA) and (C) at least one styrene methyl methacrylate copolymer (SMMA) have advantageous properties.
Abstract: Polymeric compositions obtainable by free-radical polymerization of at least two different alkyl (meth)acrylates in the presence of at least one ethylene-vinyl ester copolymer, the alkyl (meth)acrylates used being a mixture comprising alkyl (meth)acrylates having linear C12- to C60-alkyl radicals and different alkyl (meth)acrylates having linear C1- to C11-alkyl radicals and/or branched C4- to C60-alkyl radicals and/or cyclic C6- to C20-alkyl radicals. The use of such polymeric compositions as pour point depressants for crude oils, mineral oils or mineral oil products.
Type:
Grant
Filed:
February 16, 2017
Date of Patent:
September 11, 2018
Assignee:
BASF SE
Inventors:
Ivette Garcia Castro, Kai Gumlich, Maria Heuken, Rouven Konrad, Karin Neubecker, Stefan Frenzel
Abstract: The invention relates to a thermoplastic molding composition which comprises at least one copolymer component made of styrene monomers and nitrile monomers, and also at least one graft copolymer based on an acrylate rubber. The invention also relates to thermoplastic moldings produced from the thermoplastic molding composition, and the use thereof.
Type:
Grant
Filed:
November 19, 2014
Date of Patent:
September 11, 2018
Assignee:
INEOS STYROLUTION GROUP GMBH
Inventors:
Philipp Boeckmann, Wolfgang Fischer, Maarten Staal
Abstract: Disclosed is an aqueous inkjet ink for a humidity-conditioning base material, the ink comprising at least a colorant, a water-dispersible resin and water, and the water-dispersible resin comprising at least one water-dispersible urethane resin and at least one water-dispersible (meth)acrylic resin or water-dispersible styrene/(meth)acrylic resin.
Abstract: The present invention relates to a method for preparing super absorbent polymer, and the method for preparing super absorbent polymer according to the present invention may reduce the content of non-reacted monomers in the super absorbent polymer, by using three kinds of polymerization initiators.
Type:
Grant
Filed:
December 10, 2015
Date of Patent:
September 4, 2018
Assignee:
LG Chem, Ltd.
Inventors:
Seung Mo Lee, Gi Cheul Kim, Kum Hyoung Lee, Se Yeol Park
Abstract: Stereoregular diblock polybutadiene composed of a polybutadiene block having a 1,4-cis structure and a polybutadiene block having a syndiotactic 1,2 structure. Said stereoregular diblock polybutadiene can be advantageously used in both the footwear industry (for example, in the production of soles for shoes) and in the production of tires for motor vehicles and/or trucks.
Type:
Grant
Filed:
November 3, 2014
Date of Patent:
September 4, 2018
Assignee:
versalis S.p.A.
Inventors:
Francesco Masi, Anna Sommazzi, Giovanni Ricci, Giuseppe Leone, Salvatore Coppola
Abstract: The invention relates to thermoplastic ABS molding compositions comprising components A) and B): A) from 5 to 80% by weight of a graft polymer A) having bimodal particle size distribution; and B) from 20 to 95% by weight of a thermoplastic polymer B) having a viscosity number VN of from 50 to 120 ml/g. The invention further relates to a process for the preparation of graft copolymer A and to the graft copolymer made by that process.
Type:
Grant
Filed:
April 16, 2014
Date of Patent:
August 28, 2018
Assignee:
INEOS STYROLUTION GROUP GMBH
Inventors:
Norbert Niessner, SangJun Ahn, Rudy Verstraeten, Gisbert Michels, Florian Patcas, YoungHwa Hwang, Brian J. Banaszak, Roland Walker, Michel Pepers, Johannes Barth