Abstract: The claimed invention provides a novel compound not having been studied before, that is, a diene carboxylate anion that contains a specific structure, and a salt thereof. The claimed invention further provides a diene carboxylate anion and a salt thereof, especially a metal salt thereof, which are easily soluble in general organic solvents, reactive diluents, and resins, may be in a liquid state at normal temperature depending on the structure, and have high polymerizability. Polymerization/curing of these produces a resin to which many ionic bonds and a metal are introduced, providing various properties such as hardness, scratch resistance, anti-fingerprint property, gas-barrier property, water vapor barrier property, oxygen absorption property, ultraviolet protection, infrared protection, color development and coloring, high refractive index, adhesion, various catalytic abilities, fluorescence ability and light-emitting ability, optical amplification, dispersibility, and antistatic properties.

Abstract: Dental material which contains a polymerizable phthalic acid derivative of the general Formula I: with R1=H, methyl or a C1-C5 alkyl residue; R2=H, a phenyl, benzyl or C1-C8 alkyl residue; Q1=is absent or is a C1-C15 alkylene residue, wherein the carbon chain can be interrupted by O or S; Q2=is absent or a (n+1)-valent aliphatic C1-C20 residue, wherein the carbon chain can be interrupted by O or S and wherein Q1 and Q2 cannot be absent simultaneously; X=is absent, is O, S or (—CO—NR4—)—, wherein R4 is H, CH3 or C2H5; Y=is absent, is O, S or (—CO—NR5—)—, wherein R5 is H, CH3 or C2H5; n, m=independently of one another in each case mean 1, 2 or 3; R3=H, CH3, C2H5, Cl, Br or OCH3, and wherein the two carboxyl groups of the benzene ring can together form an anhydride group.

Abstract: Polyol acrylates are disclosed that are the reaction products of a modified polyol and a (meth)acrylic acid or derivative thereof. The modified polyols used in preparing the polyol acrylates are the reaction product of a natural oil or fatty carboxylic acid or derivative thereof with a polyol selected from the group consisting of polyester polyols, polyether polyols, polyester ether polyols and polyalcohols such that the natural oil or fatty carboxylic acid or derivative thereof is incorporated into the backbone of the polyol. The polyol acrylates are used to prepare pigment dispersions that are useful in formulating energy curable ink compositions.

Abstract: The present invention relates to methods for making oxidation resistant medical devices that comprise polymeric materials, for example, ultra-high molecular weight polyethylene (UHMWPE). The invention also provides methods of making antioxidant-doped medical implants, for example, doping of medical devices containing cross-linked UHMWPE with vitamin E by diffusion and materials used therein.

Abstract: The disclosure provides a curable ink including a bis-urea gelator having the structure of Formula I. wherein R and R? each, independently of the other, is a saturated aliphatic hydrocarbon group selected from the group consisting of (1) linear aliphatic groups, (2) branched aliphatic groups, (3) cyclic aliphatic groups, (4) aliphatic groups containing both cyclic and acyclic portions, any carbon atom of the saturated aliphatic hydrocarbon group may be optionally substituted with an alkyl group (cyclic or acyclic), wherein (1) and (2) groups have a carbon number of from about 1 to about 22 carbons, and wherein (3) and (4) groups have a carbon number of from about 4 to about 10 carbons; and X is selected from the group consisting of: (i) an alkylene group, (ii) an arylene group, (iii) an arylalkylene group, and (iv) an alkylarylene group.

Abstract: The disclosure relates to a coating composition comprising a component A comprising one or more acrylic polymers having one or more chemically crosslinkable functional groups X selected from hydroxyl, thiol, isocyanate, epoxy, acid, thioisocyanate, acetoacetoxy, carboxyl, amine, anhydride, ketimine, aldimine, or urethane group; and a component B comprising one or more monomers or oligomers having one or more functional groups Y that react with the functional groups X to form a crosslink and one or more radiation crosslinkable functional groups D which are radiation crosslinkable ethylenically unsaturated double bonds; wherein said functional groups X and Y are pair-wise selected from hydroxyl and isocyanate groups, thiol and isocyanate groups, epoxy and acid groups, epoxy and isocyanate groups, isocyanate and amine groups, or isocyanate and urethane groups. This disclosure is also directed to a method of using said coating composition to coat a substrate including a vehicle, a vehicle body or parts thereof.

Abstract: Provided is a positive photosensitive resin composition that includes (A) a polybenzoxazole precursor including a first polybenzoxazole precursor including a repeating unit represented by Chemical Formula 1 and a repeating unit represented by Chemical Formula 2, and having a thermally polymerizable functional group at least one terminal end; (B) a photosensitive diazoquinone compound; (C) a silane compound; (D) a phenol compound; and (E) a solvent. A photosensitive resin film fabricated using the positive photosensitive resin composition is provided.

Abstract: A composition that includes a polymeric polyol, a (meth)acrylate, a photoinitiator and solvent is disclosed.

Abstract: Disclosed is a photosensitive resin composition capable of displaying satisfactory patterning performance against an alkaline developer and yielding a cured film of a sufficiently low coefficient of linear thermal expansion. The photosensitive resin composition contains a photopolymerization initiator and a polyimide precursor obtained by the reaction of an ester-containing diamine such as 4-aminophenyl 4?-aminobenzoate, a biphenyl-based diamine such as 4,4?-diamino-2,2?-dimethylbiphenyl, and an unsaturated group-containing diamine such as 4,4?-diamino-2,2?-divinylbiphenyl with an acid anhydride such as pyromellitic dianhydride. The content of the structural unit derived from the unsaturated group-containing diamine in the polyimide precursor is 5-60 mol %.

Abstract: A process for the preparation of a polymer nanoparticle by a photoinduced emulsion polymerization includes preparing an emulsion comprising at least one surfactant, a dispersed phase and a continuous phase. The dispersed phase comprises at least one polymerizable monomer and the continuous phase comprises water and at least one photoinitiator. The at least one polymerizable monomer is polymerized by exposing the emulsion to an electromagnetic radiation having a wavelength so as to induce a generation of radicals from the at least one photoinitiator.

Abstract: This disclosure relates to a positive photosensitive resin composition including (A) a resin precursor including a polybenzoxazole precursor, a polyamic acid, or a combination thereof, (B) a dissolution-controlling agent having a boiling point ranging from about 210° C. to about 400° C. and a polarity ranging from about 1 D to about 4 D, (C) an acid generator, (D) a silane-based compound, and (E) a solvent. The polybenzoxazole precursor includes a repeating unit represented by Chemical Formula 1, or both of repeating units represented by Chemical Formulae 1 and 2 and has a thermally polymerizable functional group at at least one end. The polyamic acid includes a repeating unit of Chemical Formulae 50 and 51.

Abstract: A polyalkylether photoinitiator of the general formula I, R1(A1)r-(R2(A2)m-O)o—(R3(A3)n-O)p—R4(A4)s I wherein R1, R2, R3, R4 and m, n, o, p, r and s are as defined herein and A1, A2, A3 and A4 are identical or different photoinitiator moieties.

Abstract: A curable composition, containing a near-infrared absorptive dye represented by formula (1): wherein R1a and R1b may be the same or different, and each independently represent an alkyl group, an aryl group, or a heteroaryl group; R2 and R3 each independently represent a hydrogen atom or a substituent, and at least one of R2 and R3 is an electron withdrawing group; R2 and R3 may be bonded to each other to form a ring; and R4 represents a hydrogen atom, an alkyl group, an aryl group, a heteroaryl group, a substituted boron, or a metal atom, and R4 may be covalently bonded or coordinately bonded to at least one among R1a, R1b and R3.

Abstract: A method for producing a wear resistant polyethylene medical implant includes forming a medical implant, such as an orthopedic implant, made at least partially of ultra high molecular weight polyethylene (UHMWPE). The polyethylene may be irradiated with gamma ray or e-beam radiation to form free radicals and then crosslinked to eliminate free radicals prior to exposure to oxygen. The so treated bearing surface of the crosslinked polyethylene is then coated with a photoinitiator. Thereafter the bearing material is photocrosslinked with ultra-violet (UV) radiation. The photocrosslinking process can also be applied to non-crosslink UHMWPE.

Abstract: Provided are ultraviolet (UV)-curable polyols and polyurethane compositions made by reacting the inventive polyol with an isocyanate. The inventive ultraviolet (UV)-curable polyol is made by co-polymerizing an alkylene oxide, an unsaturated carboxylic acid or anhydride and a hydroxy functional compound in the presence of a double metal cyanide (DMC) complex catalyst such that the polyol has an ultra-low level of unsaturation. The inventive polyols may be used to produce prepolymers, which in turn may be useful in making thin films which in turn may provide such items as medical examination gloves and scientific gloves. The inventive ultraviolet (UV)-curable polyurethane compositions may also find use in or as coatings, adhesives, sealants, elastomers and the like.

Abstract: Curable compositions based on polyuretidiones, polythiols and photoactivable bases are disclosed. Also a process for generating isocyanate groups by exposing uretidiones to radiation in the range of 100-315 nm is disclosed. The process can be used in a dual curing system for curing compositions that comprise groups that under go photoinduced polymerizations and active hydrogen groups that react with the generated isocyanates.

Abstract: The object of the present invention is to provide a photosensitive resin composition which is excellent in: storage stability in a long-term storage; microfabricability; developability; low-temperature curability; flexibility in a cured film; electrical insulation reliability; solder heat resistance; resistance to an organic solvent; and flame retardancy and low in post-curing warpage when processed into a substrate. The object can be attained by use of a photosensitive resin composition production kit which includes at least two or more components including an A component and a B component. The A component contains a (A) compound having a carboxyl group. The B component contains a (B) compound having a reactive group which is reactive to a carboxyl group, a (C) oxime ester photopolymerization initiator, and a (D) compound having a photosensitive group but no carboxyl group.

Abstract: Curable adhesive compositions comprising a urethane pre-polymer are provided that exhibit a high refractive index.

Abstract: The invention relates to combined radiation- and moisture-curing compounds, which are characterized in particular by rapid curing by means of moisture. The compounds can be used as adhesives, coatings or potting materials. The use of the compounds according to the invention is particularly preferred for filling electro-optical components.

Abstract: The invention to provide curable materials, comprising photo-reactive compounds, in particular, photoinitiators and polymerizable mono- or multifunctional monomers such as acrylates or epoxides. The material may also contain fluoro-surfactants completely or partly terminated by functional groups with the ability to bind covalently to said chemical composition under curing. The curable compositions are either purely acrylate based or a hybrid of different types of monomers such as acrylates, epoxides or vinyl ethers. The polymerizable monomers may cure with the use of different types of photoinitiator, such as free radical photoinitiators or cationic photoinitiators, ultimately forming a hybrid resist comprising interpenetrating networks of different types of monomers e.g. acrylates and epoxides. The acrylate/epoxide hybrid system has showed improved replication properties in terms of high nano-imprint lithography process fidelity, due to increased conversion of acrylates and low shrinkage.