Abstract: A substrate processing apparatus includes a rotational holding member that rotates a substrate around a predetermined rotational axis while holding the substrate, a liquid supply member that supplies a liquid to the substrate held by the rotational holding member, and a resin-made tubular guard that surrounds the substrate held by the rotational holding member. The tubular guard has an inner peripheral surface and an uneven portion disposed at the inner peripheral surface. The uneven portion has a plurality of recessed portions and a plurality of protruding portions placed between the recessed portions adjacent to each other. The recessed portion has a width smaller than a diameter of a liquid droplet scattering from the substrate held by the rotational holding member and a depth in which the liquid droplet does not come into contact with a bottom portion of the recessed portion in a state in which the liquid droplet is in contact with the protruding portions.

Abstract: Aspects herein relate to apparatus and methods for coating medical devices. In an embodiment, a coating system is included having a two-part fluid applicator defining a central channel, the two-part fluid applicator can include a first part having a first degree of flexibility; and a second part having a second degree of flexibility. The system can further include a fluid supply conduit in fluid communication with the fluid applicator; and a fluid supply reservoir in fluid communication with the fluid supply conduit. Other embodiments are also included herein.

Abstract: A painting support assembly includes a tripod and a mounting block that is coupled to the tripod. The mounting block has a pair of channels integrated into the mounting block. A pair of extension blocks is provided and each of the extension blocks has an engagement which slidably engages a respective one of the channels in the mounting block. In this way the overall width of the mounting block is increased to support a small panel in a horizontal position for painting. A plate is positionable on top of the extension blocks and the mounting block and plate includes grips which engage the extension blocks. The plate supports a large panel in a horizontal position to facilitate painting the large panel.

Abstract: A nozzle applies a sealant to a target area that includes a coupling member and an elongated seam. The nozzle includes a primary portion positionable in line with the coupling member in the target area, a first secondary portion on a first side of the primary portion, and a second secondary portion on a second side of the primary portion. The primary portion is in fluid communication with one or more material sources. The first secondary portion extends from the primary portion such that the first secondary portion is configured to extend over at least a segment of the elongated seam in the target area when the primary portion is positioned in line with the coupling member in the target area. The first secondary portion has a first height, and the second secondary portion has a second height less than the first height.

Abstract: A dispensing system includes a frame, a support coupled to the frame, a dispensing unit configured to dispense viscous material, and a gantry assembly coupled to the frame. The gantry assembly includes a gantry configured to support the dispensing unit and to move the dispensing unit in x-axis, y-axis and z-axis directions and a tilt and rotate subassembly configured to tilt and rotate the dispensing unit. The dispensing system further includes a controller configured to control dispensing unit and the gantry assembly to perform a dispense operation on the electronic substrate. The controller is configured to simultaneously coordinate the movement of the gantry assembly and the tilt and rotate subassembly to position and orient the nozzle of the dispensing unit a predetermined distance and orientation from the electronic substrate while dispensing material along a three-dimensional path.

Abstract: A sprayer assembly for an ion source is disclosed. The sprayer includes a capillary having an outlet, a sheath for the capillary, and an elastic member. The sheath can move relative to the capillary between a first position in which the sheath covers the outlet of the capillary and a second position in which the outlet of the capillary is exposed. When the sheath moves from the first position to or towards the second position, the elastic member provides a restoring force that acts to restore the position of the sheath to or towards the first position.

Abstract: Provided is a mask assembly, including at least n evaporation masks, n being an integer greater than 2, wherein the at least n evaporation masks have a same width and the at least n evaporation masks respectively correspond to n types of display panels with different sizes, the width matching the n types of display panels with different sizes.

Abstract: The present disclosure provides a spray coater including a spray nozzle unit having at least one spray nozzle and configured to spray a coating material, a spray nozzle transfer unit configured to control a position of the spray nozzle unit by operating a transfer block, on which the spray nozzle unit is mounted, at least in a planar direction, a substrate seating unit positioned below the spray nozzle unit and configured such that a substrate, which is subjected to coating, is seated thereon, a substrate carrier configured to accommodate the substrate before the substrate is coated and accommodate the substrate after the substrate is coated, and a robot arm configured to unload the substrate from the substrate carrier and provide the substrate to the substrate seating unit before the substrate is coated or unload the substrate from the substrate seating unit and load the substrate on the substrate carrier after the substrate is coated.

Abstract: A deposition mask apparatus including a frame, a supporter including a plurality of supporting members fixed to the frame, and a deposition mask fixed to the frame is provided. The plurality of supporting members include at least a first supporting member that is closest to an intermediate position between a third portion and a fourth portion of the frame and a second supporting member that is located closer to the third portion of the frame than the first supporting member. The first supporting member in a state of warping downward from the frame with a first warping amount supports the deposition mask from below. The second supporting member in a state of warping downward from the frame with a second warping amount that is smaller than the first warping amount supports the deposition mask from below.

Abstract: A magnet assembly includes a support plate and a plurality of magnets which are removably fixed to the support plate and applies a magnetic force to a deposition mask. Each magnet among the plurality of magnets include a first surface facing the support plate, a second surface opposite to the first surface and facing the deposition mask, and a magnet groove defined therein.

Abstract: The disclosure relates to an application device for applying an application agent (e.g. heat-conducting paste) into a cavity, in particular in a battery module of an electric battery. The application device according to the disclosure comprises a nozzle for dispensing the application agent through the nozzle and a first pressure sensor for measuring a first pressure reading (pA, pB) of the application agent upstream of the nozzle. The disclosure additionally provides a second pressure sensor for measuring a second pressure reading (pD) of the coating agent downstream of the first pressure sensor, in particular in the nozzle. Furthermore, the disclosure comprises a corresponding application method.

Abstract: The disclosure relates to a coating device for edge-coating a panel with a coating medium, the device comprising at least one medium line, for guiding a coating medium, which comprises an inlet and an outlet, wherein the medium line comprises a recess for introducing a panel into a coating-medium stream, and wherein the medium line and the recess are designed such that the coating medium can be applied to the edge of the panel by means of suction in the flow direction of the medium. The present disclosure also relates to a coating system for edge-coating a panel with a coating medium.

Abstract: Embodiments disclosed herein generally provide improved control of gas flow in processing chambers. In at least one embodiment, a liner for a processing chamber includes an annular body having a sidewall and a vent formed in the annular body for exhausting gas from inside to outside the annular body. The vent comprises one or more vent holes disposed through the sidewall. The liner further includes an opening in the annular body for substrate loading and unloading.

Abstract: Embodiments of the disclosed subject matter provide a device having a print head that includes a micronozzle array of depositors to deposit a material on a substrate. A reflective optical device may reflect a signal output by at least one optical sensor, and to reflect the signal from a surface of the substrate to the optical sensor. A processor may determine a distance between the optical sensor and the target surface of the substrate. The device may include one or more actuators coupled to the at least one print head to move the print head relative to an internal reference frame and adjust a position of the print head to the substrate. The sensor may be fixedly coupled with a mount to the internal reference frame. The print head may be configured to move independently of the optical sensor in at least one axis of linear or rotational motion.

Abstract: A protective mask for a part, the part including a plurality of openings in a surface thereof, is provided. The protective mask includes a mounting member at least partially within each of at least two of the plurality of openings. Each mounting member includes a water soluble material. A masking member couples the at least two mounting members. The masking member includes a non-water soluble material. Each mounting member includes a first plurality of integral layers of the water soluble material, and the masking member includes a second plurality of integral layers of the non-water soluble material. The protective mask can be made by a two material additive manufacturing system. A related method is also provided.

Abstract: A mask frame includes a support substrate including a plurality of inner side surfaces. The plurality of inner side surfaces defines a first opening through the support substrate. A heat dissipation plate is disposed on the plurality of inner side surfaces. A plurality of fixing portions is disposed between the support substrate and the heat dissipation plate. The plurality of fixing portions includes a plurality of adhesive portions attaching the support substrate to the heat dissipation plate.

Abstract: The inventive concept provides an apparatus for processing a substrate. The apparatus includes a mount; a processing liquid supply nozzle configured to provide a processing liquid to the substrate and a discharge container including: a base plate including a liquid outlet and an exhaust port; an inner wall standing on an inner circumference of the base plate; an outer wall standing on an outer circumference of the base plate; and a barrier standing on the base plate to separate a first space connected to the liquid outlet from a second space connected to the exhaust port. The apparatus further includes an inner cover configured to guide the flow of a processing liquid from the substrate supported by the mount to the first space of the discharge container; and a flow guide mounted in the first space of the discharge container.

Abstract: An apparatus includes substrate holders each configured to hold a substrate, a first nozzle provided for each substrate holder and for discharging a first processing liquid to the substrate at a first position, a second nozzle provided to be shared by the substrate holders and for discharging a second processing liquid to the substrate at a second position, a third nozzle provided for each substrate holder and for discharging a third processing liquid to the substrate at a third position while the first and second processing liquids are not supplied to the substrate, first to third standby parts for respectively allowing the first to third nozzles to wait outside a substrate holding region, a turning mechanism for turning the first nozzle between the first standby part and the first position, and a linear motion mechanism for linearly moving the third nozzle between the third standby part and the third position.

Abstract: A spray gun cover is made of flashspun high-density polyethylene fibers (e.g., Tyvek), another cloth-like material, plastic, or fabric. The cover is self-sustaining, and an elastic material is disposed at openings of the cover to secure the cover at the nozzle around the nozzle opening of the spray gun cover and at the back of the spray gun around a large opening of the spray gun cover. Through the cover, the paint cup or reservoir and the spray gun are covered and protected from airborne fluid or dry particles that bounce back from the surface of the item being sprayed with paint, stain, or other fluid (overspray). Additionally, an air hose cover is also made of flashspun high-density polyethylene fibers or the like and covers and protects an air hose for a spray gun.

Abstract: A substrate processing apparatus includes a processing tub, a liquid recovery unit, a liquid recovery unit drain line, a storage, a first and a second liquid supply lines, a discharge line, a first and a second liquid flow rate controllers. The liquid recovery unit receives a processing liquid overflown from the processing tub. The liquid recovery unit drain line drains the processing liquid from the liquid recovery unit. The first and the second liquid supply lines supply a first and a second liquids, respectively. The cleaning liquid contains the first liquid and the second liquid, and removes a precipitate from the processing liquid. The discharge line discharges the cleaning liquid, the first liquid or the second liquid toward the liquid recovery unit. The first and the second liquid flow rate controllers are provided at the first and the second liquid supply lines, and adjust flow rates thereof, respectively.