Abstract: A photosensitive resin composition comprises a modified polyimide polymer having a chemical structural formula of: photosensitive monomers, a bisphenol A epoxy resin, a photo-initiator, and a pigment. The modified polyimide polymer is made by a reaction of a polyimide polymer having a chemical structural formula of: and glycidyl methacrylate. The carboxyl group of the polyimide polymer reacts with the epoxy group of glycidyl methacrylate. The polyimide polymer is made by a reaction of dianhydride monomers each having an A group, diamine monomers each having the R group, diamine monomers each having the R1 group, and diamine monomers each having the R2 group. The diamine monomer having R group is a diamine compound having R group bonding with the carboxyl group. The diamine monomer having R1 group is a soft long-chain diamine monomer. R2 group comprises at least one secondary amine group or tertiary amine group.

Abstract: A method for producing a multilayer body, as well as a multilayer body produced thereby. A single- or multi-layered first decorative ply is applied to a carrier ply with a first and a second side. A metal layer is applied to the side of the first decorative ply facing away from the carrier ply and structured such that the metal layer is provided with a first layer thickness in one or more first zones and is provided with a second layer thickness different from the first layer thickness in one or more second zones, wherein in particular the second layer thickness is equal to zero. A single- or multi-layered second decorative ply is applied to the side of the metal layer facing away from the first decorative ply and structured using the metal layer as mask such that the first or second decorative ply is at least partially removed in the first or second zones.

Abstract: An organic light-emitting display apparatus including: a first electrode of a first group; a first organic functional layer covering the first electrode of the first group and including a first emission layer; a second electrode of the first group covering the first organic functional layer; a first electrode of a second group separate from the first electrode of the first group; a second organic functional layer separate from the first organic functional layer, covering the first electrode of the second group, having a larger area than the first organic functional layer, and including a second emission layer; a second electrode of the second group covering the second organic functional layer; and a common electrode integrally and commonly disposed on the second electrode of the first group and the second electrode of the second group.

Abstract: A polymer comprising units having a highly fused homoadamantane skeleton at side chain end bonded to the polymer backbone via a linking group has an appropriate solvent solubility and is capable of suppressing acid diffusion. A resist composition comprising the polymer and a specific photoacid generator exhibits a good DOF margin, CD uniformity, and a minimal CD change during PPD, and is quite effective in precise micropatterning.

Abstract: A photosensitive resin composition for producing a photosensitive resin film is provided, along with the manufactured photosensitive resin film and a color filter including the photosensitive resin layer. The photosensitive resin composition includes: (A) a quantum dot; (B) a binder resin having a weight average molecular weight of about 2,000 g/mol to about 12,000 g/mol; (C) a photopolymerizable monomer; (D) a photopolymerization initiator; and (E) a solvent.

Abstract: A quantum-dot color filter substrate and a quantum-dot liquid crystal display panel are disclosed in the present disclosure. The quantum-dot color filter substrate includes a glass substrate and a quantum-dot light conversion layer formed on the glass substrate and including a plurality of quantum-dot parts arrayed in sequence, wherein the quantum-dot parts include a red quantum-dot part, a green quantum-dot part and a blue quantum-dot part, and the red quantum-dot part and the green quantum-dot part contain infrared quantum-dot materials. In this way, the purity of lights emitted by a color filter can be improved, and displays can be made light and thin.

Abstract: A thermosetting coloring composition for manufacturing a color filter for a solid-state imaging element provided with a colored pattern formed by patterning a colored layer by dry etching is provided. The composition contains a pigment (A), a dispersant (B), a thermosetting compound (C), and a solvent (D). A ratio of the pigment (A) to a total solid content of the thermosetting coloring composition is 50 mass percent or more. The dispersant (B) contains a dispersant (b1) having an acidic functional group and/or a dispersant (b2) having a basic functional group. The thermosetting compound (C) contains a glycidyl therified epoxy compound of sorbitol.

Abstract: A photosensitive resin composition including (A) a quantum dot; (B) a binder resin including a structural unit represented by Chemical Formula 1; (C) a photopolymerizable monomer; (D) a photopolymerization initiator; and (E) a solvent, photosensitive resin layer manufactured using the same, and a color filter including the photosensitive resin layer. (In Chemical Formula 1, each substituent is the same as defined in the specification.

Abstract: A coloring photosensitive composition includes an oxime ester-based photopolymerization initiator containing a fluorine atom, a polymerizable compound having an ethylenically unsaturated double bond, an alkali-soluble resin, and a colorant, in which in a case where a film having a film thickness after drying of 2.0 ?m is formed using the coloring photosensitive composition, the optical density of the film at a wavelength of 365 nm is 1.5 or more.

Abstract: Embodiments provided herewith are directed to self-assembled methods of preparing a patterned surface for sequencing applications including, for example, a patterned flow cell or a patterned surface for digital fluidic devices. The methods utilize photolithography to create a patterned surface with a plurality of microscale or nanoscale contours, separated by hydrophobic interstitial regions, without the need of oxygen plasma treatment during the photolithography process. In addition, the methods avoid the use of any chemical or mechanical polishing steps after the deposition of a gel material to the contours.

Abstract: The present disclosure relates to a mask and a manufacturing method thereof as well as a display device, the mask includes a transmittable substrate and a mask pattern formed on the transmittable substrate, wherein a transmittance of the transmittable substrate decreases gradually from the edge to the center.

Abstract: Disclosed herein are a black photosensitive resin composition and a black column spacer prepared therefrom. The black photosensitive resin composition may form a cured film exhibiting good adhesion to a substrate, good height difference property, good surface roughness and high light shielding property (optical density), and may be effectively used for the formation of a cured film, particularly a black column spacer, of a liquid crystal display (LCD) or an organic light-emitting diode (OLED) display.

Abstract: Extreme ultraviolet (EUV) mask blanks, methods for their manufacture and production systems therefor are disclosed. The EUV mask blanks comprise a an absorber layer on the capping layer, the absorber layer made from an alloy of at least two absorber materials.

Abstract: A glass member for a display device, a method of fabricating a glass member, and a display device including a glass member are provided. A method of fabricating a glass member for a display device includes: preparing a glass substrate including a first surface, a second surface facing the first surface, and a side surface connecting the first surface to the second surface; forming a protection layer on the side surface to cover a portion of the side surface; and etching a portion of the glass substrate exposed by the protection layer.

Abstract: Provided are a coloring composition having excellent heat resistance and solvent resistance, a cured film, a color filter, a method for manufacturing a color filter, a solid-state imaging device, an image display device, and a polymer. The coloring composition includes a polymer TP consisting only of a repeating unit A having a triarylmethane structure and a repeating unit B having an acid group, and a polymerizable compound, in which the polymer TP contain the repeating unit B in the amount of 12% to 60% by mass with respect to all the repeating units of the polymer TP.

Abstract: A method for manufacturing a display panel, a display panel and a display device are provided. The method for manufacturing a display panel includes: mixing a liquid crystal material and a spacer preparation material, and injecting them between an array substrate and a color filter substrate which are assembled; performing a UV irradiation on the assembled array substrate and the color film substrate with ultraviolet rays by using a mask plate to polymerize the spacer preparation material to form spacers, the spacers connecting the array substrate and the color film substrate.

Abstract: The present disclosure relates to a wide color gamut film, a composition for preparing the same, a polarizing plate including the same, and a liquid crystal display including the polarizing plate. More specifically, the present disclosure relates to a wide color gamut film capable of improving color gamut by increasing color purity and exhibiting excellent physical and optical characteristics, a composition for preparing the same, a polarizing plate including the same, and a liquid crystal display including the polarizing plate.

Abstract: A method for fabricating a pellicle assembly for a lithography process includes providing a carrier. A membrane layer is fabricated over the carrier. A pellicle frame is attached to the membrane layer. The carrier is then separated from the membrane layer using a release treatment process.

Abstract: During reactive sputtering using a silicon-containing target, an inert gas, and a nitrogen-containing reactive gas, a hysteresis curve is drawn by sweeping the flow rate of the reactive gas, and plotting the sputtering voltage or current during the sweep versus the flow rate of the reactive gas. In the step of sputtering in a region corresponding to a range from more than the lower limit of reactive gas flow rate providing the hysteresis to less than the upper limit, the target power, the inert gas flow rate and/or the reactive gas flow rate is increased or decreased continuously or stepwise. The halftone phase shift film including a layer containing transition metal, silicon and nitrogen is improved in in-plane uniformity of optical properties.

Abstract: The present disclosure relates to a photoresist stripper composition for manufacturing an LCD, and relates to an integrated photoresist stripper composition capable of being used in all processes for manufacturing a TFT-LCD. More specifically, the present disclosure relates to an aqueous photoresist stripper composition capable of being used in all of transition metal, potential metal and oxide semiconductor wires.