Patents Examined by Johnnie L Smith, II
  • Patent number: 7728311
    Abstract: Among other things, an accelerator is mounted on a gantry to enable the accelerator to move through a range of positions around a patient on a patient support. The accelerator is configured to produce a proton or ion beam having an energy level sufficient to reach any arbitrary target in the patient from positions within the range. The proton or ion beam passes essentially directly from the accelerator to the patient. In some examples, the synchrocyclotron has a superconducting electromagnetic structure that generates a field strength of at least 6 Tesla, produces a beam of particles having an energy level of at least 150 MeV, has a volume no larger than 4.5 cubic meters, and has a weight less than 30 Tons.
    Type: Grant
    Filed: November 17, 2006
    Date of Patent: June 1, 2010
    Assignee: Still River Systems Incorporated
    Inventor: Kenneth Gall
  • Patent number: 7598509
    Abstract: An EUV light source is disclosed that may include a laser source, e.g. CO2 laser, a plasma chamber, and a beam delivery system for passing a laser beam from the laser source into the plasma chamber. Embodiments are disclosed which may include one or more of the following; a bypass line may be provided to establish fluid communication between the plasma chamber and the auxiliary chamber, a focusing optic, e.g. mirror, for focusing the laser beam to a focal spot in the plasma chamber, a steering optic for steering the laser beam focal spot in the plasma chamber, and an optical arrangement for adjusting focal power.
    Type: Grant
    Filed: February 21, 2006
    Date of Patent: October 6, 2009
    Assignee: Cymer, Inc.
    Inventors: Alexander I. Ershov, William N. Partlo, Norbert Bowering, Bjorn Hansson
  • Patent number: 7541577
    Abstract: Disclosed herein are methods for analyzing ion mobility data. In one embodiment, a method for analyzing ion mobility spectrometry data is disclosed. The method comprises conducting a number of ion mobility scans on a sample, generating an ion map comprising a first ion line, comparing the first ion line to a standard deviation, wherein the standard deviation is calculated from the system measurement noise, and determining if the sample is a contraband substance.
    Type: Grant
    Filed: June 26, 2006
    Date of Patent: June 2, 2009
    Assignees: General Electric Company, GE Homeland Protection, Inc.
    Inventors: David Michael Davenport, Thomas Paul Repoff, Pierino Gianni Bonanni, Richard Louis Zinser
  • Patent number: 7534996
    Abstract: A mass spectrometer that employs ion velocity mapping. The mass spectrometer includes velocity mapping ion optics that focus the ions based on their velocity. The focused ions are then directed into a deflection region between two deflection plates. A pulse is applied to the deflection plates that deflect the ions in a transverse direction also according to their mass. The pulse is turned on before the first ion in an ion packet reaches the deflection region, and is turned off before the first ion exits the deflection region. The focused and deflected ions are then reflected by a reflecting device that directs the ions along separate paths to a detector. The detector provides an image of the ion paths, where the location of a spot on the image represents ions of a certain mass and the size of the spot indicates the various velocities of the ions of that mass.
    Type: Grant
    Filed: February 20, 2007
    Date of Patent: May 19, 2009
    Assignee: Wayne State University
    Inventors: Arthur Suits, Myung Hwa Kim, Brian D. Leskiw
  • Patent number: 7534999
    Abstract: A quantum beam aided atomic force microscopy and quantum beam aided atomic force microscope that can simultaneously perform atomic-level configuration observation and elemental analysis with the use of an atomic force microscope and further can effect analysis of the chemical state of sample surface and that as being operable in liquids, can realize the elemental analysis and chemical state analysis of biosamples with an atomic-level resolving power. Accordingly, atoms of sample surface are irradiated with quantum beams, such as charged particles, electrons and photons, having a given electron transition energy characteristic of element, and any change in interaction force between the atoms of sample surface having been irradiated with quantum beams and the distal end of the probe is detected.
    Type: Grant
    Filed: December 21, 2004
    Date of Patent: May 19, 2009
    Assignee: Japan Science and Technology Agency
    Inventors: Shushi Suzuki, Wang-Jae Chun, Kiyotaka Asakura, Masaharu Nomura
  • Patent number: 7531799
    Abstract: A scanning electron microscope includes an electron gun to generate an electron beam, and an electron optical system directing the electron beam to a specimen. The electron optical system includes an objective lens that converges the electron beam to a surface of the specimen, an aberration corrector disposed between the electron gun and the objective lens so as to at least compensate for aberration caused by the objective lens, and a tilter which tilts electron beam to be incident into the aberration corrector. The aberration corrector further compensates for aberration caused by the tilter.
    Type: Grant
    Filed: May 22, 2007
    Date of Patent: May 12, 2009
    Inventors: Takeshi Kawasaki, Takaho Yoshida, Tomonori Nakano
  • Patent number: 7531820
    Abstract: The object of an arrangement and a method for the generation of extreme ultraviolet radiation is to construct the radiation source with an increased lifetime of the electrodes for using various emitters, wherein deposits inside the discharge chamber are reduced considerably when using metal emitters. The starting material is supplied as a continuous series of individual volumes which are introduced successively by directed injection and are pre-ionized by a pulsed energy beam. At least the electrode that is thermally loaded to a comparatively greater degree is constructed as a rotating electrode.
    Type: Grant
    Filed: June 23, 2006
    Date of Patent: May 12, 2009
    Assignee: Xtreme Technologies GmbH
    Inventors: Guido Hergenhan, Christian Ziener, Juergen Kleinschmidt
  • Patent number: 7528369
    Abstract: An improved sample introduction probe is disclosed for the production of ions from liquid sample solutions in an electrospray ion source. Nebulization of a liquid sample emerging from the end of an inner flow tube is pneumatically assisted by gas flowing from the end of an outer gas flow tube essentially coaxial with the inner sample flow tube. The disclosed probe provides for adjustment of the relative axial positions of the ends of the liquid and gas flow tubes without degrading the precise concentricity between the inner and outer tubes. Additionally, the terminal portion of the outer gas flow tube may be fabricated either from a conductive or dielectric material, thereby allowing the pneumatic nebulization and electrospray processes to be optimized separately and independently. Hence, the disclosed invention provides a pneumatically-assisted electrospray probe with improved mechanical and operational stability, reliability, reproducibility, and ease of use compared to prior art probes.
    Type: Grant
    Filed: December 27, 2007
    Date of Patent: May 5, 2009
    Assignee: Analytica of Branford, Inc
    Inventors: Craig M. Whitehouse, Allan Burt, Glenn Whitehouse, Mike Sansone
  • Patent number: 7528389
    Abstract: A method and apparatus are directed to providing a dopant profile adjustment solution in plasma doping systems for meeting both concentration and junction depth requirements. Bias ramping and bias ramp rate adjusting may be performed to achieve a desired dopant profile so that shallow and abrupt junctions in vertical and lateral directions are realized that are critical to device scaling in plasma doping systems.
    Type: Grant
    Filed: March 15, 2006
    Date of Patent: May 5, 2009
    Assignee: Varian Semiconductor Equipment Associates, Inc.
    Inventors: Ziwei Fang, Richard Appel, Vincent Deno, Vikram Singh, Harold M. Persing
  • Patent number: 7525103
    Abstract: A technique for improving uniformity of a ribbon beam is disclosed. In one particular exemplary embodiment, an apparatus may comprise a first corrector-bar assembly and a second corrector-bar assembly, wherein the second corrector-bar assembly is located at a predetermined distance from the first corrector-bar assembly. Each of a first plurality of coils in the first corrector-bar assembly may be individually excited to deflect at least one beamlet in the ribbon beam, thereby causing the beamlets to arrive at the second corrector-bar assembly in a desired spatial spread. Each of a second plurality of coils in the second corrector-bar assembly may be individually excited to further deflect one or more beamlets in the ribbon beam, thereby causing the beamlets to exit the second corrector-bar assembly at desired angles.
    Type: Grant
    Filed: September 29, 2006
    Date of Patent: April 28, 2009
    Assignee: Varian Semiconductor Equipment Associates, Inc.
    Inventors: Kenneth H. Purser, Atul Gupta
  • Patent number: 7518108
    Abstract: This invention provides methods, devices and device components for preparing ions from liquid samples containing chemical species and methods and devices for analyzing chemical species in liquid samples. The present invention provides an ion source for generating analyte ions having a selected charge state distribution, such as a reduced charged state distribution, that may be effectively interfaced with a variety of charged particle analyzers, including virtually any type of mass spectrometer.
    Type: Grant
    Filed: November 10, 2005
    Date of Patent: April 14, 2009
    Assignee: Wisconsin Alumni Research Foundation
    Inventors: Brian L. Frey, Lloyd M. Smith, Michael S. Westphall
  • Patent number: 7518110
    Abstract: A pattern measuring method and device are provided which set a reference position for a measuring point to be measured by a scanning electron microscope and the like, based on position information of a reference pattern on an image acquired from the scanning electron microscope and based on a positional relation, detected by using design data, between the measuring point and the reference pattern formed at a position isolated from the measuring point.
    Type: Grant
    Filed: February 23, 2006
    Date of Patent: April 14, 2009
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Takumichi Sutani, Ryoichi Matsuoka, Hidetoshi Morokuma, Hitoshi Komuro, Akiyuki Sugiyama
  • Patent number: 7514214
    Abstract: Embodiments in accordance with the present invention relate to techniques for the growth and attachment of single wall carbon nanotubes (SWNT), facilitating their use as robust and well-characterized tools for AFM imaging and other applications. In accordance with one embodiment, SWNTs attached to an AFM tip can function as a structural scaffold for nanoscale device fabrication on a scanning probe. Such a probe can trigger, with nanometer precision, specific biochemical reactions or conformational changes in biological systems. The consequences of such triggering can be observed in real time by single-molecule fluorescence, electrical, and/or AFM sensing. Specific embodiments in accordance with the present invention utilize sensing and manipulation of individual molecules with carbon nanotubes, coupled with single-molecule fluorescence imaging, to allow observation of spectroscopic signals in response to mechanically induced molecular changes.
    Type: Grant
    Filed: February 20, 2004
    Date of Patent: April 7, 2009
    Assignee: California Institute of Technology
    Inventors: Lawrence A. Wade, Ian R. Shapiro, Charles Patrick Collier, Maria J. Esplandiu, Vern Garrett Bittner, Jr., Konstantinos P. Giapis
  • Patent number: 7511287
    Abstract: A contamination mitigation or surface modification system for ion implantation processes includes a gas source, a controller, a valve, and a process chamber. The gas source provides delivery of a gas, be it atmospheric or reactive, to the valve and is controlled by the controller. The valve is located on or about the process chamber and controllably adjusts flow rate and/or composition of the gas to the process chamber. The process chamber holds a target device, such as a target wafer and permits interaction of the gas with an ion beam to mitigate contamination of the target wafer and/or to modify the existing properties of the processing environment or target device to change a physical or chemical state or characteristic thereof. The controller selects and adjusts composition of the gas and flow rate according to contaminants present within the ion beam, or lack thereof, as well total or partial pressure analysis.
    Type: Grant
    Filed: November 14, 2005
    Date of Patent: March 31, 2009
    Assignee: Axcelis Technologies, Inc.
    Inventors: Ronald N. Reece, Serguei I. Kondratenko, Geumjoo Ra, Louis P. Wainwright, Gary N. Cai
  • Patent number: 7511270
    Abstract: The present invention realizes a nanotube probe with high durability that can be manufactured in short time with less impurities adhered to the holder sustaining the nanotube. The nanotube probe according to this invention is constructed by fastening a nanotube 8 on the protruded portion 4 of a cantilever by way of at least two partial coating films 12a and 12b. One or more additional partial coating films may be formed in the intermediate area between these two partial coating films. Each partial coating film is formed by irradiating electron beam 10 on the position where the nanotube 8 is in contact with the protruded portion 4 of the cantilever. The partial coating films are separated not to overlap each other. By minimizing the size of partial coating film as well as by narrowing down the beam diameter, coating time may be further shortened. With the beam diameter narrowed down, excessive deposit of impurities can be put under control.
    Type: Grant
    Filed: September 8, 2004
    Date of Patent: March 31, 2009
    Assignees: Daiken Chemical Co., Ltd.
    Inventors: Yoshikazu Nakayama, Takashi Okawa, Shigenobu Yamanaka, Akio Harada
  • Patent number: 7507980
    Abstract: A disinfecting device is presented having a UV light source for radiation of a cleaning medium to eradicate the medium of infestation agents such as molds, viuses, bacteria and dust mites. The device enhances the disinfection of the medium by providing mechanisms for enhanced penetration of the UV light into the cleaning medium. The device also offers enhanced heat dissipation to promote effective use of the device. Also provided are safety mechanisms to promote the safe and advantageous use of the UV device.
    Type: Grant
    Filed: February 22, 2006
    Date of Patent: March 24, 2009
    Assignee: Oreck Corporation
    Inventors: Ken V. Garcia, Carrie P. Garcia
  • Patent number: 7504621
    Abstract: A system and method of analyzing a sample is described. The system includes an ion source and a deflector for producing a plurality of ion beams each of which is detected in distinct detection regions. A detection system uses the information obtained from the detection region to analyze the sample.
    Type: Grant
    Filed: June 22, 2006
    Date of Patent: March 17, 2009
    Assignee: MDS Inc.
    Inventor: Igor Chernushevich
  • Patent number: 7498566
    Abstract: A quality control mechanism for a nuclear camera system having a field of view includes at least one source assembly for a radioactive material. The source assembly is configured to automatically remotely move the radioactive material into the field of view and automatically remotely move the radioactive material out of the field of view. The nuclear camera system may have a patient handling system. The quality control mechanism is integrated with the patient handling system at the front end. The radioactive material may be configured as a line source or a point source. A multiple head registration shield tube assembly may extend over the line source to substantially limit the radioactivity emitted by a number of slots in the shield tube assembly.
    Type: Grant
    Filed: June 16, 2006
    Date of Patent: March 3, 2009
    Assignee: Siemens Medical Solutions USA, Inc.
    Inventors: Robert Kasper, Jeffrey A. Giannini
  • Patent number: 7491932
    Abstract: An ion guide having a plurality of spheroidal or similarly shaped electrodes is disclosed. The electrodes are arranged in pairs about a central ion flow axis, and an RF voltage is applied in a prescribed phase relation to create an electric field that focuses and radially confines an ion beam. A defocusing effect associated with the electrode shape may be reduced by placement of a separate skirt electrode immediately downstream in the ion path, or by forming the electrodes in a composite structure, whereby the trailing portion of the electrode is fabricated from or coated with an insulative material.
    Type: Grant
    Filed: June 16, 2006
    Date of Patent: February 17, 2009
    Assignee: Thermo Finnigan LLC
    Inventors: Rohan A. Thakur, Maurizio Splendore, Eloy R. Wouters
  • Patent number: 7491953
    Abstract: An ion implantation device and a method of manufacturing a semiconductor device is described, wherein ionized boron hydride molecular clusters are implanted to form P-type transistor structures. The molecular cluster ions have the chemical form BnHx+ and BnHx?, where 10<n<100 and 0?x?n+4. The use of such boron hydride clusters results in a dramatic increase in wafer throughput, as well as improved device yields through the reduction of wafer charging. A method of manufacturing a semiconductor device is further described, comprising the steps of: providing a supply of molecules containing a plurality of dopant atoms into an ionization chamber, ionizing said molecules into dopant cluster ions, extracting and accelerating the dopant cluster ions with an electric field, selecting the desired cluster ions by mass analysis, modifying the final implant energy of the cluster ion through post-analysis ion optics, and implanting the dopant cluster ions into a semiconductor substrate.
    Type: Grant
    Filed: December 29, 2006
    Date of Patent: February 17, 2009
    Assignee: Semequip, Inc.
    Inventors: Thomas N. Horsky, Dale C. Jacobson