Patents Examined by Keith D. Hendricks
  • Patent number: 7501165
    Abstract: A retardation film according to the present invention consists of a single-layer film in which a birefringent chain polymer is oriented, the polymer having as a repeating unit (A), a structure represented by the following general formula (V): wherein R3 represents a hydrogen atom or an alkyl group having 1 to 8 carbon atoms; R4 and R8 each independently represent a hydrogen atom, a linear or branched alkyl group having 1 to 4 carbon atoms, a linear or branched alkoxyl group having 1 to 4 carbon atoms, a linear or branched thioalkoxyl group having 1 to 4 carbon atoms, halogen, a nitro group, an amino group, a hydroxyl group, or a thiol group (where R4 and R8 are not simultaneously hydrogen atoms); and R5, R6, and R7 each independently represent a hydrogen atom or a substituent.
    Type: Grant
    Filed: June 3, 2005
    Date of Patent: March 10, 2009
    Assignee: Nitto Denko Corporation
    Inventors: Yutaka Ohmori, Michie Sakamoto, Shuusaku Nakano, Takahisa Konishi, Seiji Umemoto
  • Patent number: 7501181
    Abstract: Coated article, e.g., a brake disc, comprising a carbon-carbon composite component or a carbon-carbon-silicon carbide component coated at least with a phosphorus-containing antioxidant undercoating, the undercoating being covered by a silicon carbide particle-containing overcoating of alkali or alkaline earth metal silicate, pH modifier, and silicon carbide particles. Also, method of protecting a carbon-carbon composite brake disc or a carbon-carbon-silicon carbide composite brake disc against oxidation, by: coating the composite brake disc with a first phosphoric acid-based penetrant system; curing the penetrant coating at a temperature of 200° C. or above to form a first coating on the composite brake disc; applying the ceramic coating composition of claim 1 over the first coating and curing the ceramic coating at a temperature below 200° C.
    Type: Grant
    Filed: March 17, 2006
    Date of Patent: March 10, 2009
    Assignee: Honeywell International Inc.
    Inventors: Terence B. Walker, Laurie A. Booker, Michelle L. Shreve, Manuel G. Koucouthakis
  • Patent number: 7501167
    Abstract: A cellulose acylate film comprising cellulose acylate which has a degree of crystallinity represented by the following expression (I) of 0.9 or more, and satisfies the following expressions (II) and (III): Degree of crystallinity=(X-ray diffraction intensity at 2? of 13°)/(X-ray diffraction intensity at 2? of 12°);??Expression (I) 2.6?A+B?3.0; and??Expression (II) 0.5?B?1.2??Expression (III) wherein A represents a substitution degree by an acetyl group of a hydroxyl group in a glucose unit of the cellulose acylate, and B represents a substitution degree by a substituent having from 3 to 4 carbon atoms of a hydroxyl group of a glucose unit of the cellulose acylate.
    Type: Grant
    Filed: September 20, 2006
    Date of Patent: March 10, 2009
    Assignee: Fujifilm Corporation
    Inventor: Susumu Sugiyama
  • Patent number: 7498068
    Abstract: A liquid crystal aligning agent capable of forming a liquid crystal alignment film having favorable electrical characteristics, and excellent in the storage stability and the productivity.
    Type: Grant
    Filed: April 27, 2005
    Date of Patent: March 3, 2009
    Assignee: Nissan Chemical Industries, Ltd.
    Inventors: Kimiaki Tsutsui, Kohei Goto, Hirobumi Shida, Masahide Ishizuya
  • Patent number: 7497966
    Abstract: The present invention is related to a chemical-mechanical polishing slurry for shallow trench isolation, more concretely, to a chemical-mechanical polishing slurry comprising an aqueous abrasive solution comprised of deionized water, polishing particles, and a polishing particle dispersant; and an aqueous additive solution comprised of a carboxylic acid polymer compound, a nitrogen-containing organic cyclic compound, and an amine-group compound. The removal selectivity of the slurry may be improved by significantly lowering the speed of polishing of nitride film by adding a nitrogen-containing organic cyclic compound to an acrylic acid polymer compound, and by increasing the speed of removal of silicon oxide film by adding an amine-group compound, which is an accelerator of hydrolysis of silicon oxide film.
    Type: Grant
    Filed: March 24, 2005
    Date of Patent: March 3, 2009
    Assignee: Hanwha Chemical Corporation
    Inventors: Ho-Seong Nam, Jin-Seo Lee, Gui-Ryong Ahn
  • Patent number: 7494712
    Abstract: Composites are prepared from resin-impregnated flexible graphite materials. Impregnated materials are compressed and cured at elevated temperature and pressure to form structures suitable for uses such as electronic thermal management (ETM) devices, supercapacitors and secondary batteries.
    Type: Grant
    Filed: March 22, 2005
    Date of Patent: February 24, 2009
    Assignee: GrafTech International Holdings Inc.
    Inventors: Julian Norley, John Joseph Brady, George Getz, Jr., Jeremy Klug
  • Patent number: 7494703
    Abstract: A thermally printable commercially functional cash register tape produced from a thin machine direction oriented, heat stabilized, multi-layer, coextruded thermoplastic film is described. This thermoplastic tape replaces the currently used paper cash register tape. It will accept printing, has sufficient machine direction stiffness and sufficiently reduced surface electrical charges to function in conventional commercial cash register printers. The thermoplastic tape is much thinner than the conventional paper tape so a roll of the plastic register tape contains about 4.7 times the paper length of a typical cash register roll.
    Type: Grant
    Filed: December 4, 2003
    Date of Patent: February 24, 2009
    Inventor: Tom Hopkins
  • Patent number: 7494705
    Abstract: An energy dense energetic material comprising a layer of material comprising one or more metals substantially not in oxide form and a layer of material comprising one or more metals substantially in oxide form, wherein the layers in combination are energetic and have a thickness of less than or equal to approximately 100 nm.
    Type: Grant
    Filed: January 15, 2004
    Date of Patent: February 24, 2009
    Assignee: Lockheed Martin Corporation
    Inventors: Edward W. Sheridan, John Jones
  • Patent number: 7491650
    Abstract: The invention includes an etchant composition containing isopropyl alcohol and one or more of HF, NH4F and tetramethyl ammonium fluoride (TMAF). The invention encompasses a method of processing a substrate. A substrate is provided which has a first material containing at least one of polysilicon, monocrystalline silicon and amorphous silicon, and a second material. The substrate is exposed to an etch composition which comprises isopropyl alcohol and at least one of HF, NH4F and TMAF. The invention includes a method of processing a semiconductor construction including providing a construction which has a capacitor electrode material and an oxide material along at least a portion of the capacitor electrode material. At least some of the oxide material is removed by isotropic etching utilizing an etchant composition comprising isopropyl alcohol.
    Type: Grant
    Filed: July 27, 2005
    Date of Patent: February 17, 2009
    Assignee: Micron Technology, Inc.
    Inventors: Janos Fucsko, Grady S. Waldo, Joseph Wiggins, Prashant Raghu
  • Patent number: 7488688
    Abstract: A method for removing an oxide layer such as a natural oxide layer and a semiconductor manufacturing apparatus which uses the method to remove the oxide layer. A vertically movable susceptor is installed at the lower portion in a processing chamber and a silicon wafer is loaded onto the susceptor when it is at the lower portion of the processing chamber. The air is exhausted from the processing chamber to form a vacuum condition therein. A hydrogen gas in a plasma state and a fluorine-containing gas are supplied into the processing chamber to induce a chemical reaction with the oxide layer on the silicon wafer, resulting in a reaction layer. Then, the susceptor is moved up to the upper portion of the processing chamber, to anneal the silicon wafer on the susceptor with a heater installed at the upper portion of the processing chamber, thus vaporizing the reaction layer. The vaporized reaction layer is exhausted out of the chamber.
    Type: Grant
    Filed: November 29, 2004
    Date of Patent: February 10, 2009
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Seung-pil Chung, Kyu-whan Chang, Sun-jung Lee, Kun-tack Lee, Im-soo Park, Kwang-wook Lee, Moon-hee Lee
  • Patent number: 7488536
    Abstract: A coating for a mechanical part comprises a first layer of hydrogenated amorphous silicon carbide designed to be in contact with the mechanical part, a stack of layers and an external layer of hydrogenated amorphous carbon. The stack is formed by an alternation of layers respectively of hydrogenated amorphous carbon and of hydrogenated amorphous silicon carbide. The coating has a total thickness preferably comprised between 10 and 20 micrometers.
    Type: Grant
    Filed: June 15, 2004
    Date of Patent: February 10, 2009
    Assignee: Commissariat A L'Energie Atomique
    Inventors: Marc Plissonnier, Frédéric Gaillard, Stéphanie Thollon
  • Patent number: 7488685
    Abstract: Methods for patterning integrated circuit (IC) device arrays employing an additional mask process for improving center-to-edge CD uniformity are disclosed. In one embodiment, a repeating pattern of features is formed in a masking layer over a first region of a substrate. Then, a blocking mask is applied over the features in the masking layer. The blocking mask is configured to differentiate array regions of the first region from peripheral regions of the first region. Subsequently, the pattern of features in the array regions is transferred into the substrate. In the embodiment, an etchant can be uniformly introduced to the masking layer because there is no distinction of center/edge in the masking layer. Thus, CD uniformity can be achieved in arrays which are later defined.
    Type: Grant
    Filed: April 25, 2006
    Date of Patent: February 10, 2009
    Assignee: Micron Technology, Inc.
    Inventor: David Kewley
  • Patent number: 7485891
    Abstract: A multi-bit phase change memory cell including a stack of a plurality of conductive layers and a plurality of phase change material layers, each of the phase change material layers disposed between a corresponding pair of conductive layers and having electrical resistances that are different from one another.
    Type: Grant
    Filed: November 20, 2003
    Date of Patent: February 3, 2009
    Assignee: International Business Machines Corporation
    Inventors: Hendrik F. Hamann, Chung Hon Lam, Michelle Leigh Steen, Hon-Sum Philip Wong
  • Patent number: 7479312
    Abstract: A retardation film which contains a cellulose derivative and a plasticizer wherein the thickness of the film is 10 to 50 ?m, Ro in Equation (i) is in the range of 30 to 100 nm, Rt in Equation (ii) is in the range of 100 to 300 nm, and S in Equation (iii) is 0.0002 or more but not exceeding 0.030. Ro=(nx?ny)×d??Equation (i) Rt=S×d??Equation (ii) S=((nx+ny)/2?nz)??Equation (iii) (where “nx” is a maximum refraction index of the film surface, “ny” is a refraction index in the direction perpendicular to “nx,” “nz” is a refraction index along the thickness of the film, and “d” is the thickness of the film.
    Type: Grant
    Filed: June 28, 2006
    Date of Patent: January 20, 2009
    Assignee: Konica Minolta Opto, Inc.
    Inventors: Minori Tamagawa, Isamu Michihata, Noriyasu Kuzuhara
  • Patent number: 7479309
    Abstract: A multilayer compensator includes one or more polymeric first layers and one or more polymeric second layers. The first layers comprise a polymer having an out-of-plane birefringence between ?0.005 and +0.005. The second layers comprise an amorphous polymer having an out-of-plane birefringence that is either less than ?0.005 or greater than +0.005. The overall in-plane retardation of the multilayer compensator is greater than 20 nm, and the out-of-plane retardation is more negative than ?20 nm or more positive than +20 nm. The amorphous polymer of the second layer(s) has a glass transition temperature (Tg) such that 110° C.?Tg?180° C. when the Rth of the multilayer compensator is more negative than ?20 nm, and 100° C.?Tg?160° C. when the Rth of the multilayer compensator is more positive than +20 nm.
    Type: Grant
    Filed: June 23, 2005
    Date of Patent: January 20, 2009
    Assignee: Nitto Denko Corporation
    Inventors: Jehuda Greener, James F. Elman, YuanQiao Rao, Jon A. Hammerschmidt, David B. Bailey
  • Patent number: 7479454
    Abstract: A method and system for monitoring status of a system component during a process. The method includes exposing a system component to a reactant gas during a process, where the reactant gas is capable of etching the system component material to form an erosion product, and monitoring release of the erosion product during the process to determine status of the system component. Processes that can be monitored include a chamber cleaning process, a chamber conditioning process, a substrate etching process, and a substrate film formation process. The system component can be a consumable system part such as a process tube, a shield, a ring, a baffle, an injector, a substrate holder, a liner, a pedestal, a cap cover, an electrode, and a heater, any of which can further include a protective coating.
    Type: Grant
    Filed: September 30, 2003
    Date of Patent: January 20, 2009
    Assignee: Tokyo Electron Limited
    Inventors: David L. O'Meara, Daniel Craig Burdett, Stephen H. Cabral, Gert Leusink, John William Kostenko, Cory Wajda
  • Patent number: 7476424
    Abstract: A liquid crystal display device has no defects caused by a rubbing process. The liquid crystal display device includes a first substrate, a second substrate, a liquid crystal layer injected between the first substrate and the second substrate, and a liquid crystal alignment layer that arranges alkane chains having at least 18 carbon atoms in parallel toward the substrate. The siloxane-based liquid crystalline alignment layer produces a uniform layer that resists defects and delamination.
    Type: Grant
    Filed: December 20, 2005
    Date of Patent: January 13, 2009
    Assignee: LG Philips LCD Co., Ltd.
    Inventors: Ho-Young Jeong, Hyeon-Ho Son
  • Patent number: 7476425
    Abstract: A wide-viewing angle compensation film contains a polarizing plate and an optical compensation film which exhibits negative birefringence and has an in-plane retardation (Re1) of 60-220 nm and an orientation parameter (Nz) in the range of 0±0.05, the optical compensation film exhibiting negative birefringence and the polarizing plate being stacked so that the slow axis of the compensation film is perpendicular or parallel to the absorption axis of the polarizing plate; and a transmission type liquid-crystal display contains a liquid-crystal cell and the wide-viewing angle compensation film disposed on at least one side of the cell.
    Type: Grant
    Filed: March 21, 2006
    Date of Patent: January 13, 2009
    Assignee: Tosoh Corporation
    Inventors: Naoto Obara, Shinsuke Toyomasu
  • Patent number: 7473448
    Abstract: The present invention relates to a photoalignable material comprising a photoactive stilbazolium-containing polymer of formula I: wherein, Ma, Mb, Mc are monomer units making up the polymer; x, y, z, are mole fractions of the monomer units Ma, Mb, Mc, wherein in each case 0<x?1; 0?y<1, 0?z<1; Sa and Sb are spacer units; Za is a stilbazolium unit which can undergo photochemical isomerization/dimerization reactions; Zb is a stilbazole unit, and n varies from 4 to 10,000. The present invention also relates to a display using a layer of the photoaligned material and methods for aligning the orientation layer as well as orienting a liquid crystal layer applied to the photoaligned orientation layer.
    Type: Grant
    Filed: December 23, 2005
    Date of Patent: January 6, 2009
    Assignee: Eastman Kodak Company
    Inventors: Deepak Shukla, David M. Teegarden, Thomas R. Welter
  • Patent number: 7473449
    Abstract: A liquid crystal panel includes a first substrate; a second substrate which opposes to the first substrate; a first alignment film which is provided on the first substrate; a second alignment film which is provided on the second substrate; and a liquid crystal layer which is interposed between the first alignment film and the second alignment film. The first alignment film and the second alignment film are formed by an oblique deposition method, and are formed by chemically bonding alcohols to a hydroxyl group which exists on at least a surface of an inorganic oxide film having a plurality of micropores, and the average molecular weight of alcohols of the first alignment film is different from the average molecular weight of alcohols of the second alignment film.
    Type: Grant
    Filed: May 25, 2006
    Date of Patent: January 6, 2009
    Assignee: Seiko Epson Corporation
    Inventors: Yuji Shinohara, Koichi Terao