Abstract: A method of calibrating magnification of optical devices includes providing a mask with a predetermined pattern, projecting radiation through the mask so as to form a pattern image, and comparing a pattern of the image with a pattern of the mask to determine deviations of the image of the projected image from the image of the mask.

Abstract: A lithography system and method for cost-effective device manufacture that can employ a continuous lithography mode of operation is disclosed, wherein exposure fields are formed with single pulses of radiation. The system includes a pulsed radiation source (14), an illumination system (24), a mask (M), a projection lens (40) and a workpiece stage (50) that supports a workpiece (W) having an image-bearing surface (WS). A radiation source controller (16) and a workpiece stage position system (60), which includes a metrology device (62), are used to coordinate and control the exposure of the mask with radiation pulses so that adjacent radiation pulses form adjacent exposure fields (EF). Where pulse-to-pulse uniformity from the radiation source is lacking, a pulse stabilization system (18) may be optionally used to attain the desired pulse-to-pulse uniformity in exposure dose.

Abstract: A dry processing apparatus includes a processing chamber provided with a measurement window having a reflection portion which totally reflects light on the side of an inner surface thereof and a transmission portion. When a layer is not deposited, measurement light is irradiated so that the light is totally reflected by the reflection portion. A deviation between the measurement light reflected by a surface of the deposited layer and the measurement light reflected by the reflection portion is measured to determine a thickness of the deposited layer. A quantity of light reflected by the surface of the deposited layer is compared with the light quantity in case where irregularities are not formed in the surface of the deposited layer to evaluate a state of irregularities of the surface. The thickness of the deposited layer and a state of the surface of the layer are monitored separately.

Abstract: The present invention is a cost-effective and compact micro-spectrometer for rapid detection of chemical compounds in the low concentration limit. The invention provides for significantly higher sensitivity compared to conventional spectroscopy techniques (continuous wave and Fourier transform methods) by placing the sample within a high Finesse etalon cavity. An Optical Spectrum Analyzer (OSA) built on either continuous wave (CW-SPEC), or Fourier Transform Absorption Spectroscopy (FT-SPEC) is used to monitor the spectrum from the etalon cavity/sample combination during tuning of the etalon cavity˜this information is then used to reconstruct the absorption spectrum.

Abstract: The present invention provides a method and system for determining three-dimensional refractive gradient index distribution. The method and system of the present invention determine inhomogeneity data and calculate index of refraction changes in three-dimensions (3D). The method and system provide 3D modeling of an optical object or system that determines the three-dimensional distribution of the refractive index in the object. In one embodiment, the optical object is a blank. In different embodiments, the optical system is more than one blank. In alternative embodiments, the optical system can be a projection optics system that can include optical components such as lenses, filters, plates, and prisms. The present invention also provides a method for selecting a plurality of preferred optical elements to assemble a composite optical system with predetermined parameters.

Abstract: The method of correcting a residual aberration of a projection optical system, which is used for projecting a pattern of a photo mask onto a photosensitive film located on a substrate, the method includes calculating an effect of a residual aberration on a given pattern on the basis of the residual aberration of the projection optical system obtained by measurement, calculating a moving amount of an adjustable aberration in the projection optical system such that the effect of the residual aberration becomes minimum in a given area, and moving the adjustable aberration in accordance with the calculated moving amount.

Abstract: A low-power, plasma source-based, portable molecular light emission generator/detector employing an atmospheric pressure pulsed-plasma for molecular fragmentation and excitation is described. The average power required for the operation of the plasma is between 0.02 W and 5 W. The features of the optical emission spectra obtained with the pulsed plasma source are significantly different from those obtained with direct current (dc) discharge higher power; for example, strong CH emission at 431.2 nm which is only weakly observed with dc plasma sources was observed, and the intense CN emission observed at 383-388 nm using dc plasma sources was weak in most cases. Strong CN emission was only observed using the present apparatus when compounds containing nitrogen, such as aniline were employed as samples. The present apparatus detects dimethylsulfoxide at 200 ppb using helium as the plasma gas by observing the emission band of the CH radical.

Abstract: Systems and methods for reducing colinearity effects in the formation of microdevices are disclosed. A mask with at least one column of microdevice cells is illuminated with pulses of radiation such that only a single column is illuminated. Images of the column are used to form adjacent columnar exposure fields on a workpiece. The columnar exposure fields so formed each have a width much less than that of the full exposure field capable of being formed by the projection lens. One method of the invention includes forming each columnar exposure field with a single pulse of radiation while the workpiece moves continuously relative to a projection lens and mask. Another method includes forming each columnar exposure field with a burst of radiation pulses or a long continuous pulse while stepping the workpiece beneath a projection lens between bursts. By forming columnar exposure fields that contain a single row of devices, a substantial number of error sources that contribute to co-linearity error are eliminated.

Abstract: The image of a pattern of reticle 12 is, being illuminated with exposure light IL of vacuum ultraviolet range, projected, via projection optical system PL, onto wafer 17a on wafer stage 18a in wafer chamber 24. By providing gas blowing plate 15 in which aperture portion 15a for the exposure light optical path is provided between projection optical system PL and wafer 17a, exhausting a gas in the first space S1 over gas blowing plate 15 via exhaust port G1e, purifying the exhausted gas, and then by blowing the purified gas again into space S1 via gas supply port G1i, outgases from wafer 17a are efficiently exhausted. Into the second space S2 under gas blowing plate 15 is supplied a gas of which contamination degree of impurities is controlled to be more relaxed compared with the gas in the first space S1. By this, even when using vacuum ultraviolet light as exposure light, with the decrease of transmittance on the optical path being controlled, a high exposure light intensity can be obtained.

Abstract: A method for performing optical adjustments of an exposure apparatus is based on an exposure apparatus having a light source for generating illumination light for exposure, and illumination optics for irradiating a mask with the illumination light generated from the exposure light source so as to imprint a mask pattern on a substrate base.

Abstract: A photolithography exposure apparatus exposes a substrate to a pattern image formed on a mask to transfer the pattern onto the substrate. The apparatus includes a substrate stage on which the substrate is mounted. The substrate stage together with the substrate is movable when the substrate is being exposed to the pattern image. A memory stores pattern image distortion information generated in accordance with an exposure position on the substrate when the pattern image is being transferred onto the substrate. A compensator compensates for the distortion so that the pattern is formed cleanly on the substrate.

Abstract: A method for accurately measuring the reflectance of translucent objects by illuminating small areas of the object is disclosed. The method involves determining the lateral diffusion error by use of a predetermined set of calibration standards. The lateral diffusion error is added to the uncorrected reflectance to produce the corrected reflectance value. The method has widespread potential applications in the paper, printing, textile, coating, and food industries.

Abstract: A method of obtaining a spectrum in a Fourier transformation infrared spectrophotometer includes the following steps: sampling a set of data while a movable mirror of the Fourier transformation infrared spectrophotometer performs a reciprocal movement, wherein the set of data constitutes an interferogram; judging whether the interferogram is reliable or not by comparing the shape of the interferogram with a shape of another interferogram or shapes of other interferograms obtained through neighboring measurement of measurements; accumulating the data of interferograms that are judged to be reliable; and constituting an absorption spectrum using a Fourier transformation method based on the accumulated data. Since unreliable data are adequately avoided from the data accumulation, the reliability of the accumulated data is assured, and an accurate absorption spectrum can be obtained.

Abstract: A method and apparatus for temperature-independent determination of a concentration of a probe gas in a sample over a selected temperature range between a low temperature TL corresponding to a lowest temperature expected or found in the sample and a high temperature TH corresponding to a highest temperature expected or found in the sample. In accordance with the method, a probe temperature function of the probe gas is determined over the temperature range using a first spectroscopic technique. Then, a second spectroscopic technique is selected, a reference gas is identified and a reference temperature function of the reference gas is determined using the second spectroscopic technique over the temperature range. In particular, the reference gas is identified such that a ratio of the probe temperature function and the reference temperature function is substantially constant over the temperature range.

Abstract: The invention measures a thickness variation at a high accuracy around a wide range of a thin plate by a comparatively large spot diameter between 0.5 mm and 2 mm. A polarization beam splitter separating a laser beam emitted from a laser generator and transmitting through an isolator into a measurement light and a reference light is provided. A quarter wavelength plate is provided between the polarization beam splitter and a measurement surface, and between the polarization beam splitter and a reference surface. A focusing and reflecting means for focusing and reflecting the measurement light reflected by the measurement surface and reflected by the polarization beam splitter, and the reference light reflecting by the reference surface and transmitting through the polarization beam splitter is provided. A half mirror reflecting the measurement light and the reference light which return from the polarization beam splitter is provided.

Abstract: Disclosed is an environmental control apparatus for controlling a working environment in an exposure apparatus for effecting exposure using exposure light having a wavelength range in which oxygen absorbs the exposure light. The apparatus comprises an ozone removing filter for removing ozone in the air supplied to the exposure apparatus. By use of the environmental control apparatus of the present invention, ozone which is present in the air supplied to the exposure apparatus and absorbs the exposure light can be removed, so that a decrease in the amount of exposure light can be suppressed and hence, the amount of exposure light can be stabilized during exposure.

Abstract: A wafer stage assembly, wafer table servo control system, and method for operating the same, are provided for use in combination with a projection lens assembly in a semiconductor wafer manufacturing process. The wafer stage assembly includes a wafer stage base supporting a wafer stage to position the semiconductor wafer, a wafer table connected to the wafer stage to support the wafer, a plurality of sensors, and an actuator. The sensors include a first sensor to determine a position of an exposure point on the wafer relative to the projection lens assembly, and a second sensor to determine a position of a focal point of the projection lens assembly relative to the exposure point. To increase focusing properties of the projection lens assembly, in response to the determined positions of the exposure point and the focal point, the actuator moves the wafer table so that the exposure point substantially coincides with the focal point.

Abstract: Using a nebulizer gas, sub micron and micron size particulates can be generated from a solution containing salts covering a broad range of elements. The fractional concentration of elements can be determined by bubbling the aerosol through aqueous acid and analyzing the aqueous acid for metals. The nebulizer can be coupled to an ICP (Inductively Coupled Plasma) torch and the ICPMS (Inductively Coupled Plasma Mass Spectrometer) or ICPOES (Inductively Coupled Plasma Optical Emission Spectrometer) response to different elements can be determined. This provides the response factor of the ICPMS or ICPOES for different elements.

Abstract: An optical/analog/digital pulse detector receives an input signal and drives a Bragg cell illuminated by a collimated light beam. The Bragg cell spatially modulates the collimated light beam and upon exiting the Bragg cell is imaged by lenses of an optics network to the plane of an opaque plate. A binary optical plate replicates the image of the Bragg cell on the opaque plate. The opaque plate contains slits of various lengths located where the images of the Bragg cell are replicated. To obtain the power spectrum of each of the images on the opaque plate an anamorphic lens is positioned in the path of light passing through the opaque plate. Light passing through the anamorphic lens is sensed by a detector array having outputs coupled to a focal plane processor that processes the analog outputs from the detector array into initial tuning commands for detection and characterization of pulses in the input signal.

Abstract: There is provided an image recording device which is compact and free of waste materials, which has a completely dry system and a simplified exposure system, and which can carry out high speed image recording. The image recording device includes, within a housing of the image recording device, an accommodating section for accommodating a light and heat sensitive recording material; a light recording section for exposing the light and heat sensitive recording material, which is supplied from the accommodating section, with light to record a latent image; a heat developing section for developing the latent image by applying heat; a light fixing section for irradiating light to fix the developed image; and a discharging section for discharging the light and heat sensitive recording material having an image recorded thereon. Exposure is carried out by a plurality of LEDs provided at a light source section of an exposure unit of the light recording section.