Abstract: The mask guiding device of the present invention has a mask guiding device that guides a substrate received from the outside. The mask guiding device is provided with a plurality of receiving portions that receives said mask from the outside.

Abstract: An interferometer measuring system comprising two moveable members and a reference member that may have significantly less movement, the group having a number of attached measurement mirrors, interferometers for measuring position and two optical support blocks for the interferometers. The interferometers are used to determine the measured optical path lengths to each of the moveable members and reference member and these positions are used to calculate the misalignment, or error in the relative positions of the moveable members with respect to the reference member. This calculated error is then used to correct the misalignment by moving the appropriate members in the manner directed by the calculation.

Abstract: A pattern of a reticle is irradiated with excimer laser light to expose an image of the pattern of the reticle onto a wafer through a projection optical system. Driving elements for driving optical elements in the projection optical system and a transfer mechanism for transferring a pupil filter into the projection optical system are covered by covers to isolate the inside of the projection optical system from its outside. During exposure, helium gas is supplied to the inside of the projection optical system with a purity and a temperature of the helium gas being continuously monitored and the purity and the temperature of the helium gas in the projection optical system being maintained within a predetermined tolerance range based upon the monitored results.

Abstract: On a circuit-board intended for constant-wire-length (CWL) bonding, one or more special “test” pairs of bonding pads are provided along with, in each case, a series of markings adjacent the pads. In use, the board is populated with CWL bonds (this includes the normal circuit-related RF bond-pads as well as the test bond-pads) and the test bonds are distorted so that the bond-wires in question lie aligned against the markings. The alignment position relative to the markings indicates whether the bond-wires for the whole board are of correct or incorrect length. Measurement may be either absolute, in which case the markings are associated with a scale indication, or relative, in which case one of the markings will usually be visibly distinguished from the rest in some way. Depending on the length determination, the bond-forming device (e.g.

Abstract: The apparatus comprises the first air conditioning room which includes the edge surface of the image plane side of the projection optical system and the substrate stage and its driving unit, the second air conditioning room which includes the edge surface of the object surface side of the projection optical system and the mask stage and its driving unit, the third air conditioning room which includes the projection optical system, and the fourth air conditioning room which includes the illumination optical system. It also comprises the first air conditioning control unit, which supplies helium gas of a moderate level to the first and second air conditioning rooms, and the second air conditioning control unit, which supplies helium gas with a high purity level to the third and fourth air conditioning rooms.

Abstract: A stage device includes a switching device that switches between a first state in which a stage can move along a first movement reference surface, and a second state in which the stage can move along a second movement reference surface. The stage device can have first and second stages, and the switching device can switch both stages between the first and second states, such that the first stage is switched to the first movement reference surface while the second stage is switched to the second movement reference surface and vice-versa. Because of this, even if the first movement reference surface is formed on a first reference member (e.g., a holding plate) and the second reference surface is formed on a second reference member (e.g., guides), no problems are generated due to movement of the first and second stages. Compared to a case on which the first and second movement reference surfaces are formed on a single reference member, the first reference member can be made smaller.

Abstract: A media width detecting system is adapted to measure an absolute width of media without the need for human intervention or without the need for media to be referenced against a known location. The media width detecting system includes a measuring pattern that is provided across a media path for media. The measuring pattern can be in the form of, for example, a bar code pattern. The system further includes a reader that is provided relative to the measuring pattern so as to read the width of the measuring pattern. When media traverses the measuring pattern, a portion of the measuring pattern, for example, a subset of the bars of the bar code pattern, is covered by the media. The reader would then be adapted to determined a width of the measuring based on the covered portion of the media pattern in relation to the uncovered portion or uncovered bars.

Abstract: Optical exposure apparatus and methods of using same, for patterning a workpiece and photo-cleaning the optical components in the apparatus, which can be contaminated by moisture and organic compounds in the atmosphere. The apparatus comprises an illumination optical system having a light source and one or more optical components, and a projection lens having an object plane and an image plane and one or more optical components. The optical exposure apparatus includes an exposure optical path or an exposure light beam through a predetermined space in the optical exposure system. An optical path deflection member for deflecting light is introduced into the exposure optical path so as to create a second optical path that differs from the exposure optical path. Also disclosed is a method of photo-cleaning the aforementioned optical components, including the steps of forming an exposure optical path and then changing this path to create a second optical path that differs from the exposure optical path.

Abstract: A method including the acts of providing a semiconductor device having a plurality of misalignment ruler markers formed therein for measuring removable layer opening misalignment in the X and Y directions, a bond pad and the passivation layer with an opening therein down to the bond pad. A removable layer is formed over the semiconductor device and includes an opening therein down to the bond pad. Preferably this action includes depositing, patterning and developing a dry photoresist film layer over the semiconductor device with an opening therein down to the bond pad. The next act includes measuring the misalignment of the opening in the passivation layer by counting the number of misalignment ruler markers visibly exposed by the opening in the X-direction and also the Y-direction.

Abstract: A device having a substrate and a pattern structure formed on the substrate in accordance with plural processes including a multiple exposure process having (i) a step for photoprinting a fine stripe pattern on the substrate and (ii) a step for photoprinting a predetermined mask pattern on the substrate, such that the fine stripe pattern and the mask pattern are printed superposedly, wherein, in the pattern structure, a particular structural portion of the device is disposed in a portion where the fine stripe pattern and the mask pattern are printed superposedly.

Abstract: Various options for improving throughput in an e-beam lithography apparatus are described. A slider lens moves in synchronism with the scanning motion of the electron beam.

Abstract: Changes transmittance of an optical system used to expose a substrate are determined and used to control an exposure quantity of exposing light that is provided to the substrate. For example, the transmittance is measured before and after exposure of one surface in order to control the exposure quantity that is to be used to expose another surface.

Abstract: An optical channel monitor (OCM) or filter for analyzing an incident light carrying a number of narrow band signal channels such as WDM or DWDM channels. The OCM or filter use an acousto-optic tunable filter to receive and refract from an incident light a refracted light such that the refracted light contains a test channel with a center frequency &ngr;0. A first birefringent element is provided for filtering from the refracted light a first polarized light and a second polarized light orthogonal to the first polarized light. The transmission curves are engineered such that the transmissions of the first and second polarized light are substantially equal at the center frequency &ngr;0 of the test channel. The OCM or filter has a second birefringent element for filtering from the first polarized light a first polarized portion and a second polarized portion.

Abstract: Microsystems or micro-biotechnical components (1) are aligned, assembled, and dispensed onto a substrate (2). An image of a microsystem receiving region of the substrate is focused along hollow cones onto an image plane (23). The microsystem (1) is positioned within the hollow cones such that the image passes around it unaffected. A semi-transparent plate (24) permits the substrate image to pass therethrough and reflects an image of a surface of the microsystem which is facing the substrate to be reflected and pass along the same hollow conical paths to the image plane. In this manner, the images of the substrate and the micro component are superimposed. A mechanical device (11) adjusts the position of the microsystem until the images of the facing surfaces of the microsystem and the substrate are brought into preselected alignment.

Abstract: The invention accurately sets a polarization direction of a polarization element, and prevents deterioration of the usage efficiency of the light and a reduction in image contrast. Field lenses are provided on a projection display device. A polarizer is placed on a flat surface of a field lens. The flat surface of the field lens is provided with a reference shape to place the polarizer at the end thereof. The reference shape may be one or more planes provided on the end of the field lens. In addition, the reference shape may be a straight line drawn on the flat surface of the field lens.

Abstract: An image forming apparatus for sequentially superimposes images formed by a plurality of image forming stations for forming images of different colors, respectively, on a transferring material born and transported by a transferring material transporting member, which forms a misregister detection mark on the transferring material transporting member, illuminates to read the mark, calculates a misregister amount of the read misregister detection mark, and corrects the misregister of an image based on calculated results, wherein the apparatus adjusts an illuminating light amount according to a color of a misregister detection mark.

Abstract: A stage device, usable in, e.g., an exposure apparatus, can include an inexpensive passive type vibration control pad system, while avoiding problems such as contact between stationary and movable parts and deterioration of stage control performance. The stage device includes a stage main body that moves on a base, and a support that is vibrationally isolated from the base. A movable part is disposed on the stage main body. A stationary part is supported by the support, the movable part moving relative to the stationary part. A detector detects a size of a gap between the movable part and the stationary part. An actuator adjusts a relative positional relationship between the movable part and the stationary part based on the detected gap size.

Abstract: An illuminance measurement apparatus of the present invention is comprised of a chassis (20) having a detection surface (22) formed with a light receiving aperture (21) and a light receiving element having a light receiving surface arranged at a position corresponding to the light receiving aperture (21) in the chassis (20), wherein the chassis (20) is provided with a reflection surface (23) for detection light for detecting at least one of the position and posture of the detection surface (22).

Abstract: The present invention overcomes many of the disadvantages of prior lithographic microfabrication processes while providing further improvements that can significantly enhance the ability to make more complicated semiconductor chips at lower cost. A new type of programmable structure for exposing a wafer allows the lithographic pattern to be changed under electronic control. This provides great flexibility, increasing the throughput and decreasing the cost of chip manufacture and providing numerous other advantages. The programmable structure consists of an array of shutters that can be programmed to either transmit light to the wafer (referred to as its “open” state) or not transmit light to the wafer (referred to as its “closed” state). The programmable structure can comprise or include an array of selective amplifiers.

Abstract: The invention relates to a system for projecting or displaying images comprising a valve exhibiting a plurality of image-forming elements having a light transmission coefficient which can be controlled so as to present the image, and a means of illuminating the valve comprising a light source and an integrator having two lens arrays associated in such a way that each lens of the second array distributes over the valve the light received from a corresponding lens of the first array. This system comprises a means for focusing the illuminating beam onto the integrator. The dimensions of the integrator are thus minimized. The focusing means comprises, for example, a reflector which reflects the light produced by the source, the integrator being arranged substantially in the focal plane of the reflector.