Abstract: An organic light emitting diode display comprises a substrate comprising a major surface; first, second, third and fourth electrodes positioned over the substrate; a pixel defining layer positioned over the plurality of electrodes and comprising first, second, third and fourth openings; and a spacer positioned over the pixel defining layer. The first, second, third and fourth openings overlap the first, second, third and fourth electrodes, respectively, when viewed in a viewing direction perpendicular to the major surface. The first, second, third and fourth openings comprise first, second, third and fourth corners, respectively, wherein the first, second, third and fourth corners neighbor one another when viewed in the viewing direction. When viewed in the viewing direction, the spacer comprises at least a portion placed within an imaginary polygon defined by the first, second, third and fourth corners.

Abstract: A technique relates to a trilayer Josephson junction structure. A dielectric layer is on a base electrode layer that is on a substrate. A counter electrode layer is on the dielectric layer. First and second counter electrodes are formed from the counter electrode layer. First and second dielectric layers are formed from the dielectric layer. First and second base electrodes are formed from base electrode layer. The first counter electrode, first dielectric layer, and first base electrode form a first stack. The second counter electrode, second dielectric layer, and second base electrode form a second stack. A shunting capacitor is between first and second base electrodes. An ILD layer is deposited on the substrate, the first and second counter electrodes, and the first and second base electrodes. A contact bridge connects the first and second counter electrodes. An air gap is formed underneath the contact bridge by removing ILD.

Abstract: An electrical device that includes at least two active wafers having at least one through silicon via, and at least one unitary electrical communication and spacer structure present between a set of adjacently stacked active wafers of the at least two active wafers. The unitary electrical communication and spacer structure including an electrically conductive material core providing electrical communication to the at least one through silicon via structure in the set of adjacently stacked active wafers and a substrate material outer layer. The at least one unitary electrical communication and spacer structure being separate from and engaged to the adjacently stacked active wafers, wherein coolant passages are defined between surfaces of the adjacently stacked active wafers and the at least one unitary electrical communication and spacer structure.

Abstract: One or more cross-wafer capacitors are formed in an electronic component, circuit, or device that includes stacked wafers. One example of such a device is a stacked image sensor. The image sensor can include two or more wafers, with two wafers that are bonded to each other each including a conductive segment adjacent to, proximate, or abutting a bonding surface of the respective wafer. The conductive segments are positioned relative to each other such that each conductive element forms a plate of a capacitor. A cross-wafer capacitor is formed when the two wafers are attached to each other.

Abstract: An array substrate includes a display region and a wiring region. The wiring region includes a plurality of sets of signal line leads and a plurality of wiring regions, and a same set of signal line leads extends to a same bonding region disposed in the wiring region. The wiring region further includes at least one auxiliary wiring structure. Each auxiliary wiring structure is disposed between adjacent two sets of signal line leads and includes a peripheral closed wiring loop. Each peripheral closed wiring loop includes a plurality of corner portion, and a shape of at least one corner portion proximate to the display region is a curve.

Abstract: A tunnel field-effect transistor has a stacked structure including a second active region, a first active region, and a control electrode. The first active region includes a first-A active region and a first-B active region between the first-A active region and a first active region extension portion. A second active region exists below the first-A active region, and the second active region does not exist below the first-B active region. Where an orthographic projection image of the second active region and an orthographic projection image of the first active region overlap with each other is defined as L2-Total, and a length in a Y direction of the first active region is defined as L1-Y, when an axial direction of the first active region is defined as an X direction, and a stacked direction of the stacked structure is defined as a Z direction, L1-Y<L2-Total is satisfied.

Abstract: A MONOS transistor as a first transistor can have improved reliability and a change in channel-width dependence of the property of a second transistor can be suppressed. The semiconductor device according to one embodiment includes a semiconductor substrate having first and second regions on the first main surface, an insulating film on the second region, a semiconductor layer on the insulating film, a memory transistor region in the first region, a first transistor region in the second main surface of the semiconductor layer, a first element isolation film surrounding the memory transistor region, and a second element isolation film surrounding the first transistor region. A first recess depth between the bottom of the first recess and the first main surface in the memory transistor region is larger than a second recess depth between the bottom of a second recess and the second main surface in the first transistor region.

Abstract: A method for forming a semiconductor device is provided. A dielectric layer is formed on a substrate. First and second gate trenches are formed in the dielectric layer. First and second spacers are disposed in the first and the second gate trenches, respectively. A patterned photoresist is formed on the dielectric layer. The patterned photoresist masks the first region and exposes the second region. Multiple cycles of spacer trimming process are performed to trim a sidewall profile of the second spacer. Each cycle comprises a step of oxygen stripping and a successive step of chemical oxide removal. The patterned photoresist is then removed to reveal the first region.

Abstract: A lateral bipolar junction transistor including an emitter region, base region and collector region laterally orientated over a type IV semiconductor substrate, each of the emitter region, the base region and the collector region being composed of a type III-V semiconductor material. A buried oxide layer is present between the type IV semiconductor substrate and the emitter region, the base region and the collector region. The buried oxide layer having a pedestal aligned with the base region.

Abstract: An organic electroluminescence (EL) display panel includes a substrate; a plurality of organic EL elements; and a sealing layer in this order. In the organic EL display panel, the sealing layer has a three-layered structure in the order of a first sealing layer, a second sealing layer, and a third sealing layer. In the organic EL display panel, the first sealing layer, the second sealing layer, and the third sealing layer each include amorphous silicon nitride. In the organic EL display panel, when composition of the first sealing layer, composition of the second sealing layer, and composition of the third sealing layer are each indicated as SiNx, a value of x in the composition of the second sealing layer is greater than both a value of x in the composition of the first sealing layer and a value of x in the composition of the third sealing layer.

Abstract: A hybrid-bonding-type solid-state imaging device is provided that prevents moisture from entering through the bonded interface and other areas. The solid-state imaging device includes a first interconnect structure over a sensor substrate and a second interconnect structure over a logic substrate, and the first and second interconnect structures are bonded together. At the bonded surface between the first and second interconnect structures, bonding pads formed in the first interconnect structure are bonded to bonding pads formed in the second interconnect structure. Eighth layer portions of a first seal ring formed in the first interconnect structure are bonded to eighth layer portions of a second seal ring formed in the second interconnect structure.

Abstract: A device and method for manufacturing a two-dimensional electrostrictive field effect transistor having a substrate, a source, a drain, and a channel disposed between the source and the drain. The channel is a two-dimensional layered material and a gate proximate the channel. The gate has a column of an electrostrictive or piezoelectric or ferroelectric material, wherein an electrical input to the gate produces an elongation of the column that applies a force or mechanical stress on the channel and reduces a bandgap of two-dimensional material such that the two-dimensional electrostrictive field effect transistor operates with a subthreshold slope that is less than 60 mV/decade.

Abstract: The present disclosure provides a flexible display device, a display apparatus, and a method for manufacturing the flexible display device. The flexible display device comprises a flexible display panel, a hardened layer, and an integrated circuit layer with bumps. A front surface of the flexible display panel is provided with a circuit bonding region. The flexible display panel comprises a first flexible substrate. The hardened layer is on the first flexible substrate. The hardened layer is at a position corresponding to the circuit bonding region. The integrated circuit layer is bonded to the circuit bonding region by the bumps.

Abstract: A chip package structure includes a circuit structure, a redistribution structure, a heat conductive component, a chip, and a heat sink. The circuit structure includes a first circuit layer. The redistribution structure is disposed on the circuit structure and includes a second circuit layer, wherein the redistribution structure has an opening. The heat conductive component is disposed on the circuit structure and covered by the redistribution structure. The heat conductive component has a horizontal portion and a vertical portion. The horizontal portion extends toward the opening until it exceeds the opening. The vertical portion extends upward beyond the top surface of the redistribution structure from a part of the horizontal portion. The chip is disposed in the opening, and the bottom of the chip contacts the heat conductive component. The heat sink is disposed over the redistribution structure and the chip.

Abstract: The present disclosure relates to a semiconductor device and a manufacturing method, and more particularly to forming via rail and deep via structures to reduce parasitic capacitances in standard cell structures. Via rail structures are formed in a level different from the conductive lines. The via rail structure can reduce the number of conductive lines and provide larger separations between conductive lines that are on the same interconnect level and thus reduce parasitic capacitance between conductive lines.

Abstract: In accordance with disclosed embodiments, there are provided systems, methods, and apparatuses for implementing bi-layer semiconducting oxides in a source/drain for low access and contact resistance of thin film transistors.

Abstract: A display device includes a display region including a plurality of first regions, and a plurality of second regions arranged with a certain gap between the plurality of first regions, wherein each of the plurality of first regions includes a transistor, a first organic layer, a wiring, a first organic insulating layer on the wiring and the transistor, a display element on the first organic insulating layer, a first sealing layer on the display element and stacked in order with a first inorganic insulating layer, a second organic insulating layer and a second inorganic insulating layer, each of the plurality of second regions includes the wiring, a second organic layer on the wiring, a second sealing layer stacked in order with the first inorganic insulating layer and the second inorganic insulating layer, and a thickness of the second organic layer is smaller than the thickness of the first organic layer.

Abstract: A semiconductor device has a leadframe with a plurality of bodies extending from the base plate. A first semiconductor die is mounted to the base plate of the leadframe between the bodies. An encapsulant is deposited over the first semiconductor die and base plate and around the bodies of the leadframe. A portion of the encapsulant over the bodies of the leadframe is removed to form first openings in the encapsulant that expose the bodies. An interconnect structure is formed over the encapsulant and extending into the first openings to the bodies of the leadframe. The leadframe and bodies are removed to form second openings in the encapsulant corresponding to space previously occupied by the bodies to expose the interconnect structure. A second semiconductor die is mounted over the first semiconductor die with bumps extending into the second openings of the encapsulant to electrically connect to the interconnect structure.

Abstract: A display device and a method for manufacturing the same are disclosed, in which excitation and side permeability of a flexible substrate are minimized to prevent defects of a display panel from occurring. The display device comprises a first substrate; a buffer layer arranged on the first substrate; a pixel array layer arranged on the buffer layer; and an encapsulation layer covering the pixel array layer, wherein the buffer layer surrounds a front surface and a side of the first substrate.

Abstract: Micro pick-and-bond heads, assembly methods, and device assemblies. In, embodiments, micro pick-and-bond heads transfer micro device elements, such as (micro) LEDs, en masse from a source substrate to a target substrate, such as a LED display substrate. Anchor and release structures on the source substrate enable device elements to be separated from a source substrate, while pressure sensitive adhesive (PSA) enables device elements to be temporarily affixed to pedestals of a micro pick-and bond head. Once the device elements are permanently affixed to a target substrate, the PSA interface may be defeated through peeling and/or thermal decomposition of an interface layer.