Patents Examined by Martin J. Angebranndt
  • Patent number: 10663853
    Abstract: An extreme ultraviolet (EUV) mask includes: a substrate having a first region and a second region; a reflective layer on the substrate; an absorbing layer on the reflective layer; and a first recess in the absorbing layer and in part of the reflective layer on the first region. Preferably, a bottom surface of the first recess exposes a top surface of the reflective layer.
    Type: Grant
    Filed: April 7, 2017
    Date of Patent: May 26, 2020
    Assignee: UNITED MICROELECTRONICS CORP.
    Inventors: En-Chiuan Liou, Yu-Cheng Tung
  • Patent number: 10649339
    Abstract: A resist material and methods for forming a semiconductor structure including using the resist material are provided. The method for forming a semiconductor structure includes forming a resist layer over a substrate and exposing a portion of the resist layer to form an exposed portion of the resist layer by performing an exposure process. The method for forming a semiconductor structure further includes developing the resist layer in a developer. In addition, the resist layer is made of a resist material including a photosensitive polymer and a contrast promoter, and a protected functional group of the photosensitive polymer is deprotected to form a deprotected functional group during the exposure process, and a functional group of the contrast promoter bonds to the deprotected functional group of the photosensitive polymer.
    Type: Grant
    Filed: April 7, 2017
    Date of Patent: May 12, 2020
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventors: Ya-Ching Chang, Chen-Yu Liu, Cheng-Han Wu, Ching-Yu Chang, Chin-Hsiang Lin
  • Patent number: 10642150
    Abstract: The present invention relates to a photomask and a method for manufacturing a column spacer for a color filter using the same, and according to one aspect of the present invention, a photomask is provided, which comprises a central region having a first transmittance, a first perimeter region surrounding the central region and having a second transmittance lower than the first transmittance, and a second perimeter region surrounding the first perimeter region and having the first transmittance.
    Type: Grant
    Filed: March 31, 2017
    Date of Patent: May 5, 2020
    Assignee: LG CHEM, LTD.
    Inventors: Dae Han Seo, Dong Chang Choi, Kwang Han Park, Sang Choll Han, Jae Jin Kim, Eun Joo Choi, Min Soo Song
  • Patent number: 10642151
    Abstract: A pellicle support frame is provided with a frame body made of aluminum alloy and has a pellicle film bonded to the upper surface of the frame body and a transparent substrate bonded to the lower surface of the frame body. Within the frame body, a plurality of hollow portions are provided to be lined up in the circumferential direction of the frame body, and a through-hole which leads from the outer peripheral surface to the inner peripheral surface of the frame body is formed between two adjacent hollow portions. This configuration makes it possible to prevent strain from arising in the support frame and the transparent substrate after the support frame is bonded to the transparent substrate.
    Type: Grant
    Filed: September 9, 2015
    Date of Patent: May 5, 2020
    Assignee: NIPPON LIGHT METAL COMPANY, LTD.
    Inventor: Nobuyuki Ishito
  • Patent number: 10626329
    Abstract: A method of making a shape-programmable liquid crystal elastomer. The method includes preparing an alignment cell having a surface programmed with a plurality of domains. A cavity of the alignment cell is filled with a monomer solution. The monomers of the monomer solution are configured to align to the surface of the alignment cell. The aligned monomers are polymerized by Michael Addition. The polymerized monomers are then cross-linked to form a cross-linked liquid crystal elastomer. The cross-linking traps monomer alignment into a plurality of voxels with each voxel having a director orientation.
    Type: Grant
    Filed: April 21, 2016
    Date of Patent: April 21, 2020
    Assignee: United States of America as represented by the Secretary of the Air Force
    Inventors: Timothy J. White, Taylor H. Ware, Michael E. McConney, Vincent P. Tondiglia, Benjamin A. Kowalski
  • Patent number: 10625534
    Abstract: Disclosed herein is a method for forming a surface relief microstructure, including the steps of A) applying a curable composition to at least a portion of the frontside of the paper substrate, B) contacting at least a portion of the curable composition with surface relief microstructure, C) curing the composition by using at least one UV lamp which is arranged on the backside of the paper substrate, and D) depositing a metallic layer, and optionally a layer of a transparent high refractive index material, on at least a portion of the cured composition, wherein the UV lamp has an emission peak in a UV-A range of 320 nm to 400 nm and additionally in a near VIS range of 400 nm to 450 nm, the curable composition comprises a photoinitiator which absorbs in the UV-A range and also in the near VIS range.
    Type: Grant
    Filed: April 5, 2019
    Date of Patent: April 21, 2020
    Assignee: BASF SE
    Inventors: Michelle Richert, Thomas Bolle, Roland Fleury
  • Patent number: 10620529
    Abstract: Disclosed is a photomask. The photomask comprises a substrate, a reflective layer on the substrate, and an absorption structure on the reflective layer. The absorption structure comprises absorption patterns spaced apart from each other on the reflective layer. The absorption structure may include dummy holes in at least one of the absorption patterns. The dummy holes exhaust hydrogen from the absorption structure. The photomask may include a barrier layer on the absorption structure. The barrier layer may reduce the amount of hydrogen entering the absorption structure.
    Type: Grant
    Filed: May 23, 2017
    Date of Patent: April 14, 2020
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Sungwon Kwon, Yongkyu Kim, Jinsu Kim
  • Patent number: 10613268
    Abstract: A manufacturing system for fabricating self-aligned grating elements with a variable refractive index includes a patterning system, a deposition system, and an etching system. The manufacturing system performs a lithographic patterning of one or more photoresists to create a stack over a substrate. The manufacturing system performs a conformal deposition of a protective coating on the stack. The manufacturing system performs a deposition of a first photoresist of a first refractive index on the protective coating. The manufacturing system performs a removal of the first photoresist to achieve a threshold value of first thickness. The manufacturing system performs a deposition of a second photoresist of a second refractive index on the first photoresist. The second refractive index is greater than the first refractive index. The manufacturing system performs a removal of the second photoresist to achieve a threshold value of second thickness to form a portion of an optical grating.
    Type: Grant
    Filed: January 23, 2018
    Date of Patent: April 7, 2020
    Assignee: Facebook Technologies, LLC
    Inventors: Matthew E. Colburn, Giuseppe Calafiore, Matthieu Charles Raoul Leibovici, Erik Shipton, Pasi Saarikko
  • Patent number: 10606212
    Abstract: The invention relates to a method for selecting compounds which can be used as additives in photopolymer formulations for producing light holographic media, and to photopolymer formulations which contain at least one softener which are selected according to the claimed method. The invention also relates to the use of photopolymer formulations for producing holographic media.
    Type: Grant
    Filed: March 29, 2017
    Date of Patent: March 31, 2020
    Assignee: Covestro Deutschland AG
    Inventors: Thomas Roelle, Friedrich-Karl Bruder, Thomas Fäcke, Marc-Stephan Weiser, Dennis Hönel, Christian Diedrich
  • Patent number: 10599033
    Abstract: A salt represented by formula (I): wherein Q1 and Q2 independently represent a fluorine atom or a C1 to C6 perfluoroalkyl group, R1 and R2 in each occurrence independently represent a hydrogen atom, a fluorine atom or a C1 to C6 perfluoroalkyl group, z represents an integer of 0 to 6, X1 represents *—CO—O—, *—O—CO— or —O—, * represents a binding position to C(R1)(R2) or C(Q1)(Q2), A1 represents a C4 to C24 hydrocarbon group having a C4 to C18 divalent alicyclic hydrocarbon moiety, A2 represents a C2 to C12 divalent hydrocarbon group, R3 and R4 independently represent a hydrogen atom or a C1 to C6 monovalent saturated hydrocarbon group, R5 represents a hydrogen atom, a fluorine atom, or a C1 to C6 alkyl group where a hydrogen atom may be replaced by a fluorine atom, and Z+ represents an organic cation.
    Type: Grant
    Filed: December 20, 2017
    Date of Patent: March 24, 2020
    Assignee: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Takashi Nishimura, Koji Ichikawa
  • Patent number: 10585348
    Abstract: Provided are a pellicle for extreme ultraviolet light lithography, a method for producing the same, and an exposure method. A pellicle according to the present invention includes a first frame having a pellicle film located thereon; a second frame supporting the first frame; a through-hole running through the first frame; and a filter covering the through-hole on the side of a surface of the first frame on which the pellicle film is located. The through-hole may run through the pellicle film; and the filter may be located on the pellicle film. The filter may be located, adjacent to the pellicle film, on the first frame.
    Type: Grant
    Filed: March 9, 2017
    Date of Patent: March 10, 2020
    Assignee: MITSUI CHEMICALS, INC.
    Inventors: Kazuo Kohmura, Daiki Taneichi, Takashi Kozeki, Yosuke Ono, Hisako Ishikawa, Tsuneaki Biyajima, Atsushi Okubo, Yasuyuki Sato, Toshiaki Hirota
  • Patent number: 10577323
    Abstract: A compound represented by the following formula (1).
    Type: Grant
    Filed: March 9, 2016
    Date of Patent: March 3, 2020
    Assignee: Mitsubishi Gas Chemical Company, Inc.
    Inventors: Kana Okada, Junya Horiuchi, Takashi Makinoshima, Masatoshi Echigo
  • Patent number: 10578961
    Abstract: The object is to provide a mask blank substrate, a mask blank, and a transfer mask which can achieve easy correction of a wavefront by a wavefront correction function of an exposure apparatus. The further object is to provide methods for manufacturing them. A virtual surface shape, which is an optically effective flat reference surface shape defined by a Zernike polynomial, is determined, wherein the Zernike polynomial is composed of only terms in which the order of variables related to a radius is second or lower order and includes one or more terms in which the order of the variables related to a radius is second-order; and the mask blank substrate, in which difference data (PV value) between the maximum value and the minimum value of difference shape between a virtual surface shape and a composite surface shape obtained by composing respective surface shapes of two main surfaces is 25 nm or less, is selected.
    Type: Grant
    Filed: August 14, 2017
    Date of Patent: March 3, 2020
    Assignee: HOYA CORPORATION
    Inventors: Yohei Ikebe, Masaru Tanabe
  • Patent number: 10571796
    Abstract: An extreme ultraviolet (EUV) photomask includes a mask substrate, a reflection layer and a light-absorbing pattern layer. The reflection layer is disposed on the mask substrate, wherein the reflection layer has a concave pattern. The light-absorbing pattern layer is in the reflection layer, to fill the concave pattern. The light-absorbing pattern layer is exposed.
    Type: Grant
    Filed: May 2, 2017
    Date of Patent: February 25, 2020
    Assignee: United Microelectronics Corp.
    Inventors: En-Chiuan Liou, Yu-Cheng Tung
  • Patent number: 10571797
    Abstract: A mask blank is provided, which makes it possible to form a fine transfer pattern in a light-semitransmissive film with high accuracy even if the light-semitransmissive film is made of a material containing silicon and a light shielding film is made of a material containing chromium. The mask blank 100 has a structure in which the light-semitransmissive film 2, etching mask film 3, and light shielding film 4 are laminated in this order on the transparent substrate 1. It is featured in that the light-semitransmissive film 2 is made of the material containing silicon, the etching mask film 3 is made of the material containing chromium, the light shielding film 4 is made of a material containing chromium and oxygen, and a ratio of the etching rate of the light shielding film 4 to the etching rate of the etching mask film 3 in the dry etching with an oxygen-containing chlorine-based gas is not less than 3 and not more than 12.
    Type: Grant
    Filed: December 24, 2015
    Date of Patent: February 25, 2020
    Assignee: HOYA CORPORATION
    Inventors: Osamu Nozawa, Hiroaki Shishido, Ryo Ohkubo
  • Patent number: 10564543
    Abstract: A photosensitive resin composition includes (A) a binder polymer having a structural unit derived from a hydroxyalkyl (meth)acrylate ester having a hydroxyalkyl group having from 1 to 12 carbon atoms, and a structural unit derived from a (meth)acrylic acid; (B) a photopolymerizable compound having an ethylenically unsaturated bond group; (C) a photopolymerization initiator; and (D) a styryl pyridine represented by the Formula (1). In Formula (1), each of R1, R2 and R3 independently represents an alkyl group having from 1 to 20 carbon atoms, an alkoxy group having from 1 to 6 carbon atoms, an alkyl ester group having from 1 to 6 carbon atoms, an amino group, an alkyl amino group having from 1 to 20 carbon atoms, a carboxy group, a ciano group, a nitro group, an acetyl group or a (meth)acryloyl group, each of a, b and c independently represents an integer of from 0 to 5. In a case in which each of a, b and c is independently 2 or more, the plural R1s, R2s, and R3s independently may be the same or different.
    Type: Grant
    Filed: September 14, 2015
    Date of Patent: February 18, 2020
    Assignee: HITACHI CHEMICAL COMPANY, LTD.
    Inventors: Shota Okade, Yukiko Muramatsu, Emiko Oota, Ken Sawabe, Sanchoru Ri
  • Patent number: 10558118
    Abstract: Provided are a photosensitive resin composition including (A) a binder resin, the binder resin including a polymer that includes a structural unit represented by Chemical Formula 1; (B) a black colorant; (C) a photopolymerizable monomer; and (D) a photopolymerization initiator a black pixel defining layer manufactured using the same, and a display device including the black pixel defining layer, wherein, in Chemical Formula 1, each substituent is the same as defined in the detailed description.
    Type: Grant
    Filed: September 14, 2017
    Date of Patent: February 11, 2020
    Assignee: Samsung SDI Co., Ltd.
    Inventors: Sang Soo Kim, Jinhee Kang, Heekyoung Kang, Chang-Hyun Kwon, Jiyun Kwon, ChanWoo Kim, Bumjin Lee, Junho Lee, Chungbeum Hong
  • Patent number: 10553428
    Abstract: A method of fabricating a mask blank includes depositing a reflective multilayer over a substrate, depositing a capping layer over the reflective multilayer, depositing an absorber layer over the capping layer, and depositing an anti-reflective coating (ARC) layer over the absorber layer. The ARC layer is a single material film.
    Type: Grant
    Filed: August 22, 2017
    Date of Patent: February 4, 2020
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
    Inventors: Chun-Lang Chen, Chih-Chiang Tu
  • Patent number: 10551738
    Abstract: A photoresist composition includes a photoresist polymer including a repeating unit to which a silicon-containing leaving group is combined, a photo-fluorine generator including a sulfonium fluoride, and a solvent.
    Type: Grant
    Filed: January 24, 2019
    Date of Patent: February 4, 2020
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Jin Park, Hyun-Woo Kim, Jin-Kyu Han
  • Patent number: 10539872
    Abstract: A photosensitive composition having excellent sensitivity, an insulating film formed using the composition, a color filter formed using the composition, a display device provided with the insulating film or color filter, and a compound suitable for incorporation as a photopolymerization initiator into the composition. This photosensitive composition includes a photopolymerizable compound and a photopolymerization initiator. The photopolymerization initiator contains a compound represented by formula (1) below in which R1 is a hydrogen atom, a nitro group, or a monovalent organic group; R2 and R3 are each an optionally substituted linear alkyl group, an optionally substituted cyclic organic group, or a hydrogen atom, and R2 and R3 may be bonded to one another to form a ring; R4 is a monovalent organic group; R5 is a hydrogen atom, an optionally substituted C1-11 alkyl group, or an optionally substituted aryl group; n is an integer from 0 to 4; and m is 0 or 1.
    Type: Grant
    Filed: July 14, 2015
    Date of Patent: January 21, 2020
    Assignee: TOKYO OHKA KOGYO CO., LTD.
    Inventors: Yoshinori Tadokoro, Dai Shiota