Patents Examined by Michael G Miller
  • Patent number: 11139173
    Abstract: A production method of a semiconductor device includes introducing a reduction gas for reducing metal to a space containing a target to be used as the semiconductor device. The method also includes introducing a material gas and a first gas simultaneously to the space on a basis of a predetermined partial pressure ratio after introducing the reduction gas, to form a film that contains the metal, on the target. The material gas etches the metal when only the material gas is flowed. The first gas is different from the material gas. The predetermined partial pressure ratio is a ratio of the material gas and the first gas.
    Type: Grant
    Filed: July 10, 2018
    Date of Patent: October 5, 2021
    Assignee: TOSHIBA MEMORY CORPORATION
    Inventors: Katsuaki Natori, Satoshi Wakatsuki, Masayuki Kitamura
  • Patent number: 11090917
    Abstract: A laminate includes a substrate made of an organic polymer having a functional group containing an oxygen atom or a nitrogen atom, a functional layer bonded to the functional group of the organic polymer contained in the substrate and formed by an atomic layer deposition process, and an overcoat layer provided to cover the functional layer and containing transition metal atoms. Because the adhesion between the substrate and the functional layer is improved and the functional layer is protected by the overcoat layer, it is possible to achieve both improved gas barrier properties and/or improved durability against an environmental stress such as heat, humidity and the like.
    Type: Grant
    Filed: October 12, 2017
    Date of Patent: August 17, 2021
    Assignee: TOPPAN PRINTING CO., LTD.
    Inventors: Jin Sato, Mitsuru Kano
  • Patent number: 11085110
    Abstract: Provided is a method of manufacturing a mask includes preparing a first conductive layer. The first conductive layer includes a third portion having a mesh shape in a plurality of cell regions on a substrate, a second portion disposed between the cell regions, and a first portion surrounding the third portion and the second portion. The method further includes preparing a second conductive layer including at least one opening on the first conductive layer. The method also includes oxidizing a part of the first conductive layer exposed through the at least one opening of the second conductive layer. The method further includes preparing a plating layer on the first conductive layer and the second conductive layer, and removing the first conductive layer and the second conductive layer from the plating layer.
    Type: Grant
    Filed: December 16, 2019
    Date of Patent: August 10, 2021
    Assignee: LG DISPLAY CO., LTD.
    Inventor: Hyunjun Kim
  • Patent number: 11078570
    Abstract: A method for adjusting a position of a showerhead in a processing chamber includes arranging a substrate that includes a plurality of mandrels on a substrate support in the processing chamber and adjusting a position of the showerhead relative to the substrate support. Adjusting the position of the showerhead includes adjusting the showerhead to a tilted position based on data indicating a correlation between the position of the showerhead and azimuthal non-uniformities associated with etching the substrate. The method further includes, with the showerhead in the tilted position as adjusted based on the data, performing a trim step to etch the plurality of mandrels.
    Type: Grant
    Filed: June 29, 2018
    Date of Patent: August 3, 2021
    Assignee: Lam Research Corporation
    Inventors: Pulkit Agarwal, Adrien Lavoie, Frank Loren Pasquale, Ravi Kumar
  • Patent number: 11075074
    Abstract: A method for depositing a silicon nitride film is provided to fill a recessed pattern formed in a surface of a substrate with a silicon nitride film. In the method, a first silicon nitride film is deposited in the recessed pattern formed in the surface of the substrate. The first silicon nitride film has a V-shaped cross section decreasing its film thickness upward from a bottom portion of the recessed pattern. A second silicon nitride film conformal to a surface shape of the first silicon nitride film is deposited.
    Type: Grant
    Filed: August 7, 2018
    Date of Patent: July 27, 2021
    Assignee: Tokyo Electron Limited
    Inventors: Hitoshi Kato, Yutaka Takahashi, Kazumi Kubo
  • Patent number: 11072565
    Abstract: According to a method set forth herein a plurality of preform plies having first and second preform plies can be associated together to define a preform. The preform can be subject to chemical vapor infiltration (CVI) processing to define a ceramic matrix composite (CMC) structure.
    Type: Grant
    Filed: February 27, 2015
    Date of Patent: July 27, 2021
    Assignee: GENERAL ELECTRIC COMPANY
    Inventors: Jared Hogg Weaver, Gregory Scot Corman, Krishan Lal Luthra
  • Patent number: 11053395
    Abstract: Example embodiments relate to a method of protecting a surface of an e-vaping device portion from corrosion, the method including preparing a coating mixture configured to protect the surface from corrosion, and coating the surface with a protective coating based on the coating mixture, wherein the coating is performed via one of electrodeposition, dipping, spraying, and vapor deposition, and the coating mixture includes at least one of a silane and a resin.
    Type: Grant
    Filed: June 12, 2017
    Date of Patent: July 6, 2021
    Assignee: ALTRIA CLIENT SERVICES LLC
    Inventors: Georgios D. Karles, Rangaraj S. Sundar
  • Patent number: 11047044
    Abstract: A film forming apparatus includes: a substrate holding member for vertically holding target substrates at predetermined intervals in multiple stages; a process vessel for accommodating the substrate holding member; a processing gas introduction member each having gas discharge holes which discharge a processing gas for film formation in a direction parallel to each target substrate and introduce the processing gas into the process vessel; an exhaust mechanism for exhausting the interior of the process vessel; and a plurality of gas flow adjustment members installed to face the target substrates, respectively. Each of the gas flow adjustment members adjusts a gas flow of the processing gas discharged horizontally above each of the target substrates from the gas discharge holes of the processing gas introduction member, to be directed from above the respective target substrate located below the respective gas flow adjustment member toward the surface of the respective target substrate.
    Type: Grant
    Filed: December 13, 2017
    Date of Patent: June 29, 2021
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Yoshihiro Takezawa, Kuniyasu Sakashita, Shigeru Nakajima
  • Patent number: 11021793
    Abstract: Disclosed are Group 6 transition metal-containing thin film forming precursors to deposit Group 6 transition metal-containing films on one or more substrates via vapor deposition processes.
    Type: Grant
    Filed: May 31, 2018
    Date of Patent: June 1, 2021
    Assignee: L'Air Liquide, Société Anonyme pour I'Etude et I'Exploitation des Procédés Georges Claude
    Inventors: Rocio Arteaga, Raphael Rochat, Antonio Sanchez, Jean-Marc Girard, Nicolas Blasco, Santiago Marques-Gonzalez, Clément Lansalot-Matras, Jooho Lee, Zhiwen Wan
  • Patent number: 11021789
    Abstract: A conical supply tube is provided, along with deposition systems using such a tube and methods of its use. The conical supply tube includes a conical head formed from a hollow structure defining a having a fitting end and an opposite, shower end, with the fitting end has an initial diameter that is less than a diameter at the shower end. A MOCVD chamber is also generally provided that includes such a conical supply tube and a susceptor configured to hold a substrate facing the shower end of the conical supply tube. Methods are provided for growing a group III nitride layer on a surface of a substrate.
    Type: Grant
    Filed: June 22, 2016
    Date of Patent: June 1, 2021
    Assignee: University of South Carolina
    Inventor: Asif Khan
  • Patent number: 10988844
    Abstract: Processes for producing flexible organic-inorganic laminates by atomic layer deposition are described, as well as barrier films comprising flexible organic-inorganic laminates. In particular, a process for producing a laminate including (a) depositing an inorganic layer by an atomic layer deposition process, and (b) depositing an organic layer comprising selenium by a molecular layer deposition process is provided.
    Type: Grant
    Filed: December 22, 2015
    Date of Patent: April 27, 2021
    Assignee: BASF Coatings GmbH
    Inventors: Maraike Ahlf, Juergen Frank, Torben Adermann, Stephan Klotz
  • Patent number: 10988842
    Abstract: A two-dimensional transition-metal dichalcogenide layer is grown by reacting a non- or low-volatile source material with a volatilized halogen or halide compound to produce a volatilized composition comprising at least one reaction product. The volatilized composition is flowed through an open chamber of a tube furnace with a temperature gradient, wherein the temperature changes along a path through which the volatilized composition flows through the open chamber of the tube furnace. Where the temperature along the path in the open chamber is in a reaction-temperature range, the volatilized composition is deposited as a two-dimensional crystalline transition-metal dichalcogenide layer.
    Type: Grant
    Filed: April 17, 2018
    Date of Patent: April 27, 2021
    Assignee: Massachusetts Institute of Technology
    Inventors: Brian J. Modtland, Jing Kong, Marc A. Baldo, Efren Navarro-Moratalla, Xiang Ji
  • Patent number: 10981372
    Abstract: A three-dimensional inkjet printer and method for printing an aperture mask on a multi-spectral filter array. A custom tray is used by the printer allowing for printing on a prefabricated filter array. Photopolymer resin is deposited on the prefabricated filter array to form the aperture mask of dark mirror coating. An ultraviolet lamp illuminates the deposited photopolymer resin on the surface of the prefabricated multi-spectral optical filter array to cure the resin, thereby forming the mask. The prefabricated multi-spectral optical filter array includes an optical coating on at least one side, the aperture mask being formed on the optical coating, without the use of heat, chemical etching, or deformation of the optical coating.
    Type: Grant
    Filed: December 11, 2018
    Date of Patent: April 20, 2021
    Assignee: Materion Corporation
    Inventor: Kevin R. Downing
  • Patent number: 10928552
    Abstract: As described above, one or more aspects of the present disclosure provide articles having structural color, and methods of making articles having structural color. The articles incorporate a primer layer having a percent transmittance of about 40% or less in conjunction with an optical element. The optical element and primer layer impart a structural color to the article.
    Type: Grant
    Filed: September 28, 2018
    Date of Patent: February 23, 2021
    Assignee: NIKE, Inc.
    Inventors: Jennifer Bee, Jeremy Gantz, Kim Kovel
  • Patent number: 10927446
    Abstract: This method for producing a transparent optical film includes a film formation step of forming a silver layer and a high standard electrode potential metal layer so as to be laminated on a substrate, the film formation step including a silver deposition step of forming the silver layer, at a thickness of 6 nm or less by vacuum deposition, and a high standard electrode potential metal deposition step of forming the high standard electrode potential metal layer formed of a high standard electrode potential metal having a higher standard electrode potential than that of silver by vacuum deposition, and an alloying step of forming a silver alloy layer by diffusing the high standard electrode potential metal within the silver layer by performing a heating treatment at a temperature of 50° C. or higher and 400° C. or lower.
    Type: Grant
    Filed: September 12, 2019
    Date of Patent: February 23, 2021
    Assignee: FUJIFILM Corporation
    Inventors: Seigo Nakamura, Kenichi Umeda, Yuichiro Itai, Shinichiro Sonoda
  • Patent number: 10914006
    Abstract: A nanoparticle continuous-coating device based on spatial atomic layer deposition. A first-stage pipeline unit, a second-stage pipeline unit, a third-stage pipeline unit and a fourth-stage pipeline unit which are connected sequentially. The first-stage pipeline unit is used for providing a first precursor and enabling the first precursor to be adsorbed on surfaces of nanoparticles. The third-stage pipeline unit is used for providing a second precursor and enabling the second precursor to react with the first precursor on the surfaces of the nanoparticles, so that a monomolecular thin film layer is generated on the surfaces of the nanoparticles. The second-stage and fourth-stage pipeline units are used for cleaning the nanoparticles and discharging the redundant first precursor, the redundant second precursor or reaction by-products.
    Type: Grant
    Filed: May 14, 2018
    Date of Patent: February 9, 2021
    Assignee: Huazhong University of Science and Technology
    Inventors: Rong Chen, Weiming Ba, Kai Qu, Yun Li, Kun Cao, Wei Dan
  • Patent number: 10914863
    Abstract: Techniques include receiving a design of an integrated computational element (ICE) including specification of a substrate and a plurality of layers, their respective target thicknesses and complex refractive indices, complex refractive indices of adjacent layers being different from each other, and a notional ICE fabricated in accordance with the ICE design being related to a characteristic of a sample; forming at least some of the layers of a plurality of ICEs in accordance with the ICE design using a deposition source, where the layers of the ICEs being formed are supported on a support that is periodically moved relative to the deposition source during the forming; monitoring characteristics of the layers of the ICEs during the forming, the monitoring of the characteristics being performed using a timing of the periodic motion of the support relative to the deposition source; and adjusting the forming based on results of the monitoring.
    Type: Grant
    Filed: December 24, 2013
    Date of Patent: February 9, 2021
    Assignee: Halliburton Energy Services, Inc.
    Inventors: James M. Price, Aditya B. Nayak, David L. Perkins
  • Patent number: 10907038
    Abstract: Methods are provided for fabricating functional nanostructures (e.g., nanowires/nanofibers) via chemical vapor deposition polymerization of paracyclophanes or substituted paracyclophanes onto and through a structured fluid, such as a film of liquid crystals, on a substrate. A one-step process is provided that does not require the use of any solid templates, nor does it require any volatile solvents, additives or catalysts. The resulting nanowires/nanofibers can be in the form of aligned nanowires/nanofibers arrays supported on any solid material, in the form of nanofibers mats supported on porous materials, or as individual free-standing nanowires/nanofibers. By using chiral liquid crystals, chiral nanofibers can be fabricated. The functional nanowires/nanofibers can contain one or more type of surface reactive groups that allows for post surface chemical modifications on the nanowires/nanofibers. Such nanostructures can be used in a range of different applications, including in biomedical applications.
    Type: Grant
    Filed: April 14, 2017
    Date of Patent: February 2, 2021
    Assignees: THE REGENTS OF THE UNIVERSITY OF MICHIGAN, Wisconsin Alumni Research Foundation
    Inventors: Marco A. Bedolla Pantoja, Nicholas L. Abbott, Kenneth Cheng, Joerg Lahann
  • Patent number: 10892143
    Abstract: Implementations of the present disclosure provide methods for treating a processing chamber. In one implementation, the method includes purging a 300 mm substrate processing chamber, without the presence of a substrate, by flowing a purging gas into the substrate processing chamber at a flow rate of about 0.14 sccm/mm2 to about 0.33 sccm/mm2 and a chamber pressure of about 1 Torr to about 30 Torr, with a throttle valve of a vacuum pump system of the substrate processing chamber in a fully opened position, wherein the purging gas is chemically reactive with deposition residue on exposed surfaces of the substrate processing chamber.
    Type: Grant
    Filed: September 28, 2017
    Date of Patent: January 12, 2021
    Assignee: Applied Materials, Inc.
    Inventors: Vivek Bharat Shah, Bhaskar Kumar, Anup Kumar Singh, Ganesh Balasubramanian
  • Patent number: 10888894
    Abstract: A method of applying a coating liquid to an optical fiber is described. An optical fiber is drawn through a guide die into a pressurized coating chamber and through the pressurized coating chamber to a sizing die. The pressurized coating chamber contains a coating liquid. The method includes directing coating liquid in a direction transverse to the processing pathway of the optical fiber in the pressurized coating chamber. The transverse flow of coating liquid counteracts detrimental effects associated with gyres that form in the pressurized coating chamber during the draw process. Benefits of the transverse flow include removal of bubbles, reduction in the temperature of the gyre, improved wetting, homogenization of the properties of the coating liquid in the pressurized coating chamber, and stabilization of the meniscus.
    Type: Grant
    Filed: April 11, 2018
    Date of Patent: January 12, 2021
    Assignee: Corning Incorporated
    Inventors: Robert Clark Moore, Douglas Gregg Neilson, Johnnie Edward Watson