Patents Examined by Michelle M Iacoletti
  • Patent number: 11415873
    Abstract: A vehicle includes at least one side bay equipped with a window, and a device for displaying at least one item of information on the window. The display device includes an image projector fastened to a ceiling of the vehicle. The display device emits light rays. A system of at least one mirror is arranged to reflect light rays emitted by the image projector in the direction of the window.
    Type: Grant
    Filed: April 5, 2021
    Date of Patent: August 16, 2022
    Assignee: ALSTOM Transport Technologies
    Inventors: Bastian Simoni, Alexandre Dubois, Michel Desjardins
  • Patent number: 11418012
    Abstract: A structured beam generation device based on beam shaping and a method adopting the device are provided. Linearly polarized beam emitted by a laser sequentially passes through an electro-optic intensity modulator, a half-wave plate, and a first beam expander, and then enters a first polarization beam-splitting prism to be transmitted and reflected. The transmitted beam sequentially passes through a beam shaper, an optical delay line, and a first reflector to form a parallel ring-shaped beam to be transmitted by a second polarization beam-splitting prism. The reflected beam sequentially passes through an electro-optic phase modulator, a second reflecting mirror, and a second beam expander, and is then reflected by the second polarization beam-splitting prism and combined with the transmitted beam into a beam, which is then adjusted by a polarizing plate have consistent polarization direction, and is finally focused at a focal plane by a focusing lens for interference.
    Type: Grant
    Filed: July 12, 2019
    Date of Patent: August 16, 2022
    Assignee: ZHEJIANG UNIVERSITY
    Inventors: Wei Gong, Ke Si, Jiajia Chen
  • Patent number: 11410785
    Abstract: An extreme ultraviolet light concentrating mirror may include a substrate, a multilayer reflection film provided on the substrate and configured to reflect extreme ultraviolet light, and a protective film provided on the multilayer reflection film. Here, the protective film may include a mixed film in which a network-forming oxide is mixed with an amorphous titanium oxide, or a mixed film in which two or more amorphous titanium oxide layers and two or more network-forming oxide layers are each alternately laminated.
    Type: Grant
    Filed: April 14, 2021
    Date of Patent: August 9, 2022
    Assignee: Gigaphoton Inc.
    Inventors: Yoshiyuki Honda, Masayuki Morita
  • Patent number: 11409190
    Abstract: An optical element has a first member having a first refractive index and a second member having a second refractive index different from the first refractive index. The optical element has a first transmissive surface, a reflective surface, and a second transmissive surface arranged from a demagnifying side toward a magnifying side in order. The first transmissive surface and the reflective surface are located in one side with respect to an optical axis of the optical element. The second transmissive surface is located in the other side with respect to the optical axis of the optical element. the reflective surface has a concave shape.
    Type: Grant
    Filed: March 4, 2020
    Date of Patent: August 9, 2022
    Assignee: SEIKO EPSON CORPORATION
    Inventor: Eiji Morikuni
  • Patent number: 11409203
    Abstract: A method including: obtaining a thin-mask transmission function of a patterning device and a M3D model for a lithographic process, wherein the thin-mask transmission function is a continuous transmission mask (CTM) and the M3D model at least represents a portion of M3D attributable to multiple edges of structures on the patterning device; determining a M3D mask transmission function of the patterning device by using the thin-mask transmission function and the M3D model; and determining an aerial image produced by the patterning device and the lithographic process, by using the M3D mask transmission function.
    Type: Grant
    Filed: May 21, 2021
    Date of Patent: August 9, 2022
    Assignee: ASML Netherlands B.V.
    Inventors: Yu Cao, Yen-Wen Lu, Peng Liu, Rafael C. Howell, Roshni Biswas
  • Patent number: 11412193
    Abstract: The present disclosure relates to a projector including a light source apparatus that outputs a light ray flux containing fluorescence, a bandpass filter provided at least in part of an optical path of the fluorescence, an integrator unit on which the light ray flux is incident and which divides the light ray flux into a plurality of partial light ray fluxes, a superimposing lens that is provided on the downstream of the integrator unit and causes the plurality of partial light ray fluxes to be incident in different positions, a light modulator including a plurality of pixels, a microlens array including a plurality of microlenses corresponding to the plurality of pixels, and a projection optical apparatus that projects light outputted from the light modulator.
    Type: Grant
    Filed: January 31, 2020
    Date of Patent: August 9, 2022
    Assignee: Seiko Epson Corporation
    Inventor: Koichi Akiyama
  • Patent number: 11397316
    Abstract: A projection device is provided. An excitation light source of the projection device emits a first light beam incident to a light wavelength conversion wheel along a first direction. The light wavelength conversion wheel outputs the first light beam at a first timing, and converts the first light beam into a second light beam to be outputted at a second timing. The second light beam exits the light wavelength conversion wheel along a second direction. The first and second light beams sequentially penetrate a color filter wheel and a light homogenizing element, so that an illumination system outputs an illumination beam. The illumination beam is incident to a light valve along a third direction to be converted into an image beam. The image beam exits the light valve along a fourth direction. The first to fourth directions are different from each other and are located on a same plane.
    Type: Grant
    Filed: March 24, 2021
    Date of Patent: July 26, 2022
    Assignee: Coretronic Corporation
    Inventor: Shi-Hao Lin
  • Patent number: 11392017
    Abstract: A light source unit includes a blue laser diode of an excitation light shining device for emitting light in a first wavelength range, a red light source of a red light source device for emitting light in a second wavelength range, a luminescent wheel including a wavelength transforming area for transforming the light in the first wavelength range into light in a third wavelength range differing in wavelength range from the light in the first wavelength range and the light in the second wavelength range and emitting the light in the third wavelength range and a transmitting area for emitting the light in the first wavelength range, the wavelength transforming area and the transmitting area being provided end to end in a circumferential direction, and a dichroic mirror configured to transmit one of the lights in the first and second wavelength ranges and reflect a remaining light.
    Type: Grant
    Filed: January 26, 2021
    Date of Patent: July 19, 2022
    Assignee: CASIO COMPUTER CO., LTD.
    Inventor: Hidehiko Mochizuki
  • Patent number: 11392049
    Abstract: A pellicle for extreme ultraviolet lithography has an extreme ultraviolet transmittance of 90% or more and also has thermal stability, mechanical stability, and chemical durability. The pellicle includes a support layer and a pellicle layer. The support layer has an opening formed in a central portion thereof. The pellicle layer is formed on the support layer to cover the opening and includes ZrBx (2<x<16).
    Type: Grant
    Filed: November 9, 2021
    Date of Patent: July 19, 2022
    Assignee: Korea Electronics Technology Institute
    Inventors: Hyeong Keun Kim, Hyun Mi Kim, Jin Woo Cho, Seul Gi Kim, Ki Hun Seong
  • Patent number: 11395398
    Abstract: An extreme ultraviolet light generation apparatus may include a chamber; a droplet generator configured to sequentially supply a first droplet of target substance to a plasma generation region in the chamber; and a gas flow generation device having a gas outlet for causing gas to flow along a travel direction of the first droplet around at least a part of a trajectory of the first droplet. Here, the droplet generator includes a vibrating element configured to generate, by applying vibration to a nozzle through which the target substance is output, a plurality of second droplets each having smaller volume than the first droplet and to cause the second droplets to be combined to generate the first droplet, and the gas outlet is located downstream, on a trajectory direction of the first droplet, of a position where the second droplets are combined and the first droplet is generated.
    Type: Grant
    Filed: September 2, 2021
    Date of Patent: July 19, 2022
    Assignee: Gigaphoton Inc.
    Inventor: Fumio Iwamoto
  • Patent number: 11385533
    Abstract: A wavelength converter according to the present disclosure includes a wavelength conversion layer having a first surface on which excitation light that belongs to a first wavelength band is incident and a second surface different from the first surface and converts the excitation light into fluorescence that belongs to a second wavelength band different from the first wavelength band, and a base so provided as to face the second surface. The base includes a first heat dissipation section so provided as to face a light incident area of the first surface that is an area on which the excitation light is incident and a second heat dissipation section the thermal conductivity of which in a first direction that intersects the first surface is lower than the thermal conductivity of the first heat dissipation section.
    Type: Grant
    Filed: June 9, 2020
    Date of Patent: July 12, 2022
    Assignee: Seiko Epson Corporation
    Inventor: Kunihiko Takagi
  • Patent number: 11385550
    Abstract: In a lithographic process, product units such as semiconductor wafers are subjected to lithographic patterning operations and chemical and physical processing operations. Alignment data or other measurements are made at stages during the performance of the process to obtain object data representing positional deviation or other parameters measured at points spatially distributed across each unit. This object data is used to obtain diagnostic information by performing a multivariate analysis to decompose a set of vectors representing the units in the multidimensional space into one or more component vectors. Diagnostic information about the industrial process is extracted using the component vectors. The performance of the industrial process for subsequent product units can be controlled based on the extracted diagnostic information.
    Type: Grant
    Filed: May 1, 2020
    Date of Patent: July 12, 2022
    Assignee: ASML Netherlands B.V.
    Inventors: Alexander Ypma, Jasper Menger, David Deckers, David Han, Adrianus Cornelis Matheus Koopman, Irina Lyulina, Scott Anderson Middlebrooks, Richard Johannes Franciscus Van Haren, Jochem Sebastiaan Wildenberg
  • Patent number: 11378874
    Abstract: A projector includes: a white light generator that uses a blue laser as a light source to generate blue light and yellow light based on the blue laser and generates white light including the generated blue light and yellow light; and an optical system that modulates light based on the white light generated by the white light generator with an image display element and projects the modulated light, wherein the white light generator includes: a dichroic mirror that is irradiated with the blue light from the blue laser as the light source; a first condenser lens that focuses blue light being reflected by or passing through the dichroic mirror; a diffusion plate that diffuses the blue light focused by the first condenser lens; a second condenser lens that focuses the blue light passing through or being reflected by the dichroic mirror; and a phosphor that emits yellow light.
    Type: Grant
    Filed: December 27, 2017
    Date of Patent: July 5, 2022
    Assignee: Maxell, Ltd.
    Inventors: Hiroshi Nakamori, Kazuo Shikita, Chiaki Kinno, Akihiro Shiraishi, Takuya Shimizu
  • Patent number: 11378879
    Abstract: A lamp projecting a starry sky is provided. The lamp projecting the starry sky includes at least one beam generator, an interference filter configured to produce nebula effect, a reflecting mirror, and at least one first lens, the at least one beam generator is placed on a first side of the interference filter, the reflecting mirror is placed on a second side of the interference filter, the at least one first lens is located on an emergent light path of the interference filter; a light beam emitted from the interference filter forms a moving and layering nebula projection after passing through the at least one first lens. In the lamp, after multiple refractions, reflection and refraction, the light beam is magnified by the lens.
    Type: Grant
    Filed: February 24, 2021
    Date of Patent: July 5, 2022
    Assignee: LONVIS TECHNOLOGY (SHENZHEN) CO., LTD
    Inventor: Xuequan Li
  • Patent number: 11372343
    Abstract: A method of aligning a substrate within an apparatus. The method includes determining a substrate grid based on measurements of a plurality of targets, each at different locations on a substrate. The determining includes repetitions of updating the substrate grid after each measurement of a target, and using the updated grid to align a measurement of a subsequent target.
    Type: Grant
    Filed: February 14, 2020
    Date of Patent: June 28, 2022
    Assignee: ASML Netherlands B.V.
    Inventors: Henricus Martinus Johannes Van De Groes, Johannes Hubertus Antonius Van De Rijdt, Marcel Pieter Jacobus Peeters, Chien-Hung Tseng, Henricus Petrus Maria Pellemans
  • Patent number: 11372333
    Abstract: A target supply device according to an aspect of the present disclosure includes a tank in which a target substance in a liquid form is housed, a vibration element configured to generate a droplet of the target substance by providing, through a vibration propagation path, vibration to the target substance output through the nozzle, a first temperature adjustment mechanism configured to adjust a temperature of a refrigerant to be supplied to the vibration propagation path component to a first temperature, a temperature sensor configured to detect a temperature of the vibration propagation path, a second temperature adjustment mechanism configured to adjust, to a second temperature, the temperature of the vibration propagation path to which the refrigerant is supplied, and a control unit configured to control the second temperature adjustment mechanism based on an output from the temperature sensor.
    Type: Grant
    Filed: August 4, 2020
    Date of Patent: June 28, 2022
    Assignee: Gigaphoton Inc.
    Inventor: Masaki Nakano
  • Patent number: 11366377
    Abstract: A wavelength conversion element according to the present disclosure includes a substrate, a reflecting layer, a wavelength conversion layer which is disposed on the reflecting layer, and which is configured to convert light in a first wavelength band into light in a second wavelength band, a structure which is disposed on the wavelength conversion layer, and which is configured to scatter the light in the first wavelength band, and an optical layer which is disposed on the structure, and which is configured to reflect a part of the light in the first wavelength band, transmit another part of the light in the first wavelength band, and transmit the light in the second wavelength band, wherein the optical layer is different in reflectance with respect to the light in the first wavelength band in accordance with an incidence angle of the light in the first wavelength band entering the optical layer.
    Type: Grant
    Filed: March 22, 2021
    Date of Patent: June 21, 2022
    Assignee: SEIKO EPSON CORPORATION
    Inventors: Koya Shiratori, Mizuha Hiroki, Ryuta Koizumi, Tetsuo Shimizu
  • Patent number: 11366390
    Abstract: An extreme ultraviolet light generation system may include a laser system emitting first prepulse laser light, second prepulse laser light, and main pulse laser light in this order; a chamber including at least one window for introducing, into the chamber, the first prepulse laser light, the second prepulse laser light, and the main pulse laser light; a target supply unit supplying a target to a predetermined region in the chamber; and a processor controlling the laser system to irradiate the target with the first prepulse laser light, irradiate the target, having been irradiated with the first prepulse laser light, with the second prepulse laser light having a pulse time width longer than a pulse time width of the main pulse laser light, and irradiate the target, having been irradiated with the second prepulse laser light, with the main pulse laser light temporally separated from the second prepulse laser light.
    Type: Grant
    Filed: June 3, 2021
    Date of Patent: June 21, 2022
    Assignee: Gigaphoton Inc.
    Inventors: Takanari Kobayashi, Hirokazu Hosoda, Yoshiyuki Honda
  • Patent number: 11366394
    Abstract: An extreme ultraviolet light generation system may include a chamber, a first partition wall having at least one opening which provides communication between a first space and a second space, an EUV light concentrating mirror located in the second space and configured to concentrate extreme ultraviolet light generated in a plasma generation region located in the first space, a first gas supply port formed at the chamber, and a gas exhaust port formed in the first partition wall, a distance between the center of the plasma generation region and an edge of the at least one opening being equal to or more than a stop distance LSTOP [mm] calculated by the following equation: LSTOP=272.8·EAVG0.4522·P?1 EAVG [eV] representing average kinetic energy of ions generated in the plasma generation region and P [Pa] representing a gas pressure inside the first partition wall.
    Type: Grant
    Filed: October 1, 2021
    Date of Patent: June 21, 2022
    Assignee: Gigaphoton Inc.
    Inventors: Koichiro Koge, Atsushi Ueda, Takayuki Osanai
  • Patent number: 11363243
    Abstract: Disclosed herein are a plurality of laser sources forming an element. Multiple laser elements are arranged in a pattern to form an array. Each laser element of the array is independently addressable, such that video and other content can be projected from the array.
    Type: Grant
    Filed: March 23, 2015
    Date of Patent: June 14, 2022
    Assignee: LIGHTWAVE INTERNATIONAL, INC.
    Inventor: George Dodworth