Abstract: A method of projecting a pattern from a patterning device onto a substrate using a projection system, the method including using an optical phase adjustment apparatus in the projection system to apply a phase modification to radiation which has been diffracted from an assist feature of the pattern, the phase modification acting to reduce the size of an assist feature image exposed in resist on the substrate or prevent printing of the assist feature image in the resist on the substrate, while maintaining a contribution of the assist feature image to an image enhancement of a functional feature of the pattern.

Abstract: The disclosure relates to an optical system, such as an illumination system or a projection objective of a microlithographic projection exposure apparatus, including such an optical system having a polarization-influencing optical arrangement which permits enhanced flexibility in affording a desired polarization distribution.

Abstract: A movable support is configured to hold an exchangeable object. The support includes a movable structure movably arranged with respect to a reference object, an object holder movably arranged with respect to the movable structure and configured to hold the exchangeable object, an actuator configured to move the movable structure with respect to the reference object, and an ultra short stroke actuator configured to move the object holder with respect to the movable structure, wherein a stiffness of the ultra short stroke actuator is substantially larger than a stiffness of the at least one actuator.

Abstract: An exposure apparatus includes an atmosphere maintaining unit which maintains an exposure chamber in an air atmosphere, a gas supply unit which supplies air or a mixed gas containing air and an inert gas to a local space, between a final surface of a projection optical system and a substrate, a detector which detects an alignment mark and a reference mark formed on the substrate stage, and a controller. The controller controls the gas supply unit not to supply the mixed gas to the local space when the detector detects the reference mark, and controls the gas supply unit to supply the mixed gas to the local space when an instruction to detect the alignment mark upon setting the local space in a mixed gas atmosphere, and expose the substrate based on the detection results of the reference mark and the alignment mark is issued from the recipe.

Abstract: A method of treating an object with radiation that includes generating volumetric image data of an area of interest of an object and emitting a therapeutic radiation beam towards the area of interest of the object in accordance with a reference plan. The method further includes evaluating the volumetric image data and at least one parameter of the therapeutic radiation beam to provide a real-time, on-line or off-line evaluation and on-line or off-line modification of the reference plan.

Abstract: A lithographic projection apparatus is disclosed that includes a table, a shutter member, a fluid handling structure, and a fluid extraction system. The fluid handling structure may be configured to supply and confine liquid between a projection system and (i) a substrate, or (ii) the table, or (iii) a surface of the shutter member, or (iv) a combination selected from (i)-(iii). The surface of the shutter member may adjoin and be co-planar with a surface of the table. The surfaces of the shutter member and the table may be spaced apart by a gap. The fluid extraction system may be configured to remove liquid from the gap.

Abstract: One pair each of a Y linear motor (a total of four) on the +X side and the ?X side that drive a reticle stage include one pair each of a stator section (a total of four) and three each of a mover section (a total of six) on the +X side and the ?X side. In this case, the three each of the mover sections on the +X side and the ?X side configure one each of a mover. The mover section located in the center in the Z-axis direction of each of the movers is used in common by each pair of the Y linear motors. Therefore, the weight of the mover section (reticle stage) of the reticle stage device is reduced, which allows a higher acceleration. Further, the mover section located in the center in the Z-axis direction of each of the movers coincides with a neutral plane of the reticle stage.

Abstract: Methods and systems for adaptively correcting exposure parameters during digital radiographic imaging are disclosed.

Abstract: A processing apparatus of the present invention processes for a wafer. The processing apparatus includes an XY stage which includes a wafer chuck which holds the wafer and an elevating device which rises relative to the wafer chuck to hold the wafer, and a wafer conveying robot hand which conveys the wafer from the XY stage at a wafer transfer position. The XY stage moves to change a direction at an angle between degree and degree via the wafer transfer position in a state where the elevating device rises relative to the wafer chuck. The wafer conveying robot hand has a shape which does not interfere with the XY stage which moves to change the direction at the angle when the wafer conveying hand is positioned at the wafer transfer position.

Abstract: A two step method of scanning objects to gain information about material content comprises the steps of providing a radiation source and a radiation detector system spaced therefrom to define a scanning zone therebetween. In a first scanning step, an object is moved relative to the source and detector system, intensity information about radiation incident at the detector system after interaction with the object as it passes through the scanning zone is collected, variation of intensity as the object moves through the scanning zone is used to identify anomalous structures and/or absence of homogeneity in the object. In a second, subsequent scanning step an object is located in fixed position in the scanning zone and collecting intensity information collected, analysed against a suitable functional relationship relating transmitted to incident intensity, and the results compared with a library of suitable data to provide an indication of material content.

Abstract: Provided is a diagnostic method and system capable of applying tomography to industrial long cylindrical process systems, such as a pipe line, which are difficult to diagnose using existing medical or industrial computed tomography (CT) scanners. Existing industrial X-ray CT scanners cannot be used for such a pipe that is attached to the process system and thus cannot be placed on the turntable, and existing image diagnostic apparatuses of a fan beam type, a collimated beam type, etc. having a stereotyped structure are next to impossible to move and use for undetachable process systems and their peripheral devices. To solve these problems, there is provided a gamma-ray tomography scanning system that is capable of being directly attached to a pipe in operation and measuring a cross section of the pipe.

Abstract: A motion tracker including a head band and laser devices that direct laser beams having non-concentric axes to a charge coupled device is used to determine movement of a patient during a CT scan. When the patient is motionless, the laser devices each direct a laser beam along a line, and the laser beams contact the charge coupled device at a contact location. If the patient moves, the laser devices, and therefore the contact locations, move. The charge coupled device detects the movement of the contact locations to determine the movement of the patient. A computer adjusts the x-ray image taken at the time of the movement to accommodate for this movement.

Abstract: An exposure apparatus is provided which can supply and collect a liquid in a prescribed state, and that can suppress degradation of a pattern image projected onto a substrate. The exposure apparatus is provided with a nozzle member having a supply outlet that supplies a liquid and a collection inlet that collects a liquid, and a vibration isolating mechanism that supports the nozzle member and vibrationally isolates the nozzle member from a lower side step part of a main column.

Abstract: In a high-voltage apparatus according to this invention, a predetermined voltage is applied to a rotating anode after waiting until the number of rotations increases to such an extent that the rotating anode is not damaged. That is, X-rays of desired intensity are already outputted from a point of time when the voltage is applied to the rotating anode. Therefore, diagnosis can be performed immediately after the voltage is applied to the rotating anode. That is, unlike the prior art, there is no need to wait until X-ray intensity becomes suitable for diagnosis after X-ray emission is started, and there is no need to irradiate the patient with unnecessary X-rays. Therefore, the patient can be inhibited from being irradiated with excessive X-rays (with an improvement made in a response from when the operator gives instructions for starting fluoroscopy until emission of X-rays suitable for diagnosis).

Abstract: A method of treating an object with radiation that includes generating volumetric image data of an area of interest of an object and emitting a therapeutic radiation beam towards the area of interest of the object in accordance with a reference plan. The method further includes evaluating the volumetric image data and at least one parameter of the therapeutic radiation beam to provide a real-time, on-line or off-line evaluation and on-line or off-line modification of the reference plan.

Abstract: In order to effectively transfer heat from inner layers of an actuator coil to an area external to the coil, heat transfer elements, located proximate to the actuator coil, can be used. In an embodiment, a heat transfer apparatus for the actuator coil can include one or more heat transfer elements located proximate to one or more layers or one or more windings of the actuator coil and a cooling surface located proximate to the one or more heat transfer elements and to the actuator coil. In this configuration, the heat transfer apparatus can transfer heat from inner layers of the actuator coil to the cooling surface, which in turn transfers the heat to an area external to the actuator coil.

Abstract: A method evaluating an imaging performance of a projection optical system according to a polarization state of light in a pupil of an illumination optical system for an exposure apparatus, comprises a representation step of numerically representing the polarization state in the pupil of the illumination optical system, an assumption step of virtually dividing the pupil of the illumination optical system into a plurality of partial regions, each of which includes a light incident region and a light non-incident region, and assuming individual polarization states for the plurality of partial regions so that one polarization state is assumed for the whole of each partial region based on the polarization state numerically represented in the representation step; and a calculation step of calculating the imaging performance of the projection optical system under a condition in which the plurality of partial regions have the polarization states individually assumed in the assumption step.

Abstract: A lithographic apparatus includes an illumination system configured to condition a radiation beam, a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam, a substrate table constructed to hold a substrate, a projection system configured to project the patterned radiation beam onto a target portion of the substrate, a chuck configured to hold and position an object, for example, the patterning device onto the support or the substrate onto the substrate table, the chuck including a base and a constraining layer. A damping layer including a viscoelastic material is provided between the base and the constraining layer.

Abstract: Radiographic images for different imaging directions taken by applying radiation to a subject from the different imaging directions are obtained, and a plurality of first tomographic images having a first slice thickness are generated based on the obtained plurality of radiographic images and a plurality of second tomographic images having a second slice thickness that is greater than the first slice thickness are generated based on the radiographic images. Then, MinIP processing is applied to the first tomographic images to generate a MinIP image, and MIP processing is applied to the second tomographic images to generate a MIP image. Then, combining processing is performed using the MinIP image and the MIP image to generate a composite image.

Abstract: An exposure apparatus comprises a measurement system which measures an aberration of a projection optical system. The measurement system includes a first pattern positioned on an original stage, a second pattern positioned on a substrate stage, a third pattern positioned on the original stage to align the first and second patterns, a fourth pattern positioned on the substrate stage to align the first and second patterns, a detection system which detects a relative position between the third pattern and the fourth pattern, and a controller which controls at least one of the stages to align the first pattern positioned at a position spaced apart from the third pattern by a predetermined distance, and the second pattern positioned at a position spaced apart from the fourth pattern by a predetermined distance, based on the relative position between the third pattern and the fourth pattern detected by the detection system.