Patents Examined by Natasha N Campbell
  • Patent number: 10843223
    Abstract: A substrate processing method includes a rinse liquid supplying step of supplying a rinse liquid containing water to a major surface of a substrate, a rotating step of rotating the substrate around a rotation axis passing through a central portion of the major surface of the substrate, and a hydrophobizing agent supplying step of supplying a hydrophobizing agent containing a first dissolving agent to the major surface of the substrate to replace a liquid held on the major surface of the substrate with the hydrophobizing agent in parallel with the rotating step after the rinse liquid supplying step is performed, and the hydrophobizing agent supplying step includes a hydrophobizing agent discharging step of discharging a continuous flow of the hydrophobizing agent from a discharge port of a nozzle toward the major surface of the substrate held by a substrate holding unit with a Reynolds number at the discharge port being not more than 1500.
    Type: Grant
    Filed: May 30, 2018
    Date of Patent: November 24, 2020
    Assignee: SCREEN Holdings Co., Ltd.
    Inventors: Takayoshi Tanaka, Tetsuya Emoto, Akira Oato, Yuta Nakano, Teppei Nakano, Takashi Akiyama, Yuya Tsuchihashi, Reo Tamura, Atsuro Eitoku, Tomomi Iwata
  • Patent number: 10828678
    Abstract: Systems and methods for rinsing one or more pellicles during fabrication, including immersing and soaking the one or more pellicles in a rinse bath solution for a particular time period, forming a top layer above the rinse bath solution, the top layer having a lower surface tension than the rinse bath, and withdrawing the one or more pellicles through the top layer for drying.
    Type: Grant
    Filed: November 2, 2017
    Date of Patent: November 10, 2020
    Assignee: International Business Machines Corporation
    Inventor: Dario L. Goldfarb
  • Patent number: 10825699
    Abstract: Disclosed are a standby port and a substrate processing apparatus having the same. The standby port exhausts fumes generated when a processing liquid is discharged into the standby port before the supply of the processing liquid onto a substrate, thereby preventing pollution of a chamber atmosphere.
    Type: Grant
    Filed: December 19, 2018
    Date of Patent: November 3, 2020
    Assignee: SEMES CO., LTD.
    Inventors: Buyoung Jung, Jonghan Kim, Young Jin Jang, Jin Tack Yu, Youngjun Choi, Daehun Kim, Byungsun Bang, Jonghyeon Woo, Heehwan Kim, Cheol-Yong Shin, Gui Su Park
  • Patent number: 10807570
    Abstract: The invention relates to a cleaning system (14) for a windscreen (34) of a motor vehicle (32), comprising at least one drive arm (2) and at least one wiper blade (1, 1a, 1b), the wiper blade (1, 1a, 1b) being connected to the drive arm (2), the cleaning system (14) having at least one projection device (13) able to project a liquid onto the windscreen (34), characterized in that the cleaning system (14) comprises a determination element (16) for a zone (23) of the windscreen (34) and an activation means (15) of the determination element (16), an activation of the drive arm (2) and of the projection device (13) being subject to image information (18) as to a position of the zone (23) on the windscreen (34) transmitted by the determination element (16).
    Type: Grant
    Filed: May 30, 2018
    Date of Patent: October 20, 2020
    Assignee: Valeo Systèmes d'Essuyage
    Inventors: Frédéric Giraud, Philippe Billot, Gilles Le-Calvez, Marcel Trebouet
  • Patent number: 10766463
    Abstract: A system includes a dome, a wiper assembly, a position sensor and a control device. The wiper assembly includes a wiper blade configured to rotate around the dome. The position sensor may be configured to send a signal to a control device when a wiper blade passes the position sensor. The control device may include one or more processors configured to receive the signal from the position sensor and determine a location of the wiper blade relative to the dome based on the received signal.
    Type: Grant
    Filed: November 22, 2017
    Date of Patent: September 8, 2020
    Assignee: Waymo LLC
    Inventors: Graham Doorley, Paul Thomas Hansen Karplus, Peter Avram
  • Patent number: 10767661
    Abstract: An apparatus and method for cleaning containers using water within the container and a submersible pump exhibiting a nozzle. Air may be injected into the pumped water to increase its pressure as it exists the nozzle.
    Type: Grant
    Filed: June 28, 2017
    Date of Patent: September 8, 2020
    Assignee: U.S. Submergent Technologies, LLC
    Inventor: Henry Polston
  • Patent number: 10761013
    Abstract: A method is provided for cleaning an optical entry window (1) of a fire detector (2), wherein an intermittent gas stream is discharged from at least one gas exit opening (7) onto the surface of the optical entry window (1) of the fire detector (2), wherein the intermittent gas stream having a number of pressure pulses (14) is discharged onto the optical entry window (1), and to an apparatus for cleaning an optical entry window. The method has the advantage that the optical entry window of a fire detector can be cleaned from contamination intermittently and corresponding to the intensity of contamination with a matched and low consumption of gas.
    Type: Grant
    Filed: November 13, 2014
    Date of Patent: September 1, 2020
    Assignee: Minimax GmbH & Co. KG
    Inventor: Arne Stamer
  • Patent number: 10748788
    Abstract: A system and method for treating a substrate is described. In particular, the system and method for treating a substrate include techniques for removing particles from the surface of a microelectronic substrate. The system includes: a vacuum process chamber; a substrate stage for supporting a microelectronic substrate within the vacuum process chamber; a cryogenic fluid supply system that can provide a fluid or fluid mixture through one or more nozzles arranged within the vacuum process chamber to inject a fluid spray into the process chamber in a direction towards an upper surface of the microelectronic substrate; and a process monitoring system coupled to the vacuum process chamber, and arranged to collect fluid spray data corresponding to at least one measured attribute of the injected fluid spray downstream of an exit of the one or more nozzles.
    Type: Grant
    Filed: March 15, 2018
    Date of Patent: August 18, 2020
    Assignee: TEL FSI, INC.
    Inventors: Brent D. Schwab, Chimaobi W. Mbanaso, Gregory P. Thomes, Kevin Rolf, Jeffrey M. Lauerhaas
  • Patent number: 10737305
    Abstract: A process for cleaning a reactor, the reactor comprising a shell including catalyst for selectively converting hydrocarbons. The process includes removing catalyst from the reactor and deploying a robot into the reactor. A cleaner from the robot is applied onto a surface within the shell of the reactor that includes a foulant. The cleaner is adapted to remove the foulant from the surface within the shell of the reactor. The cleaner may be one of light radiation, heat radiation, ultra-high pressure fluid, and liquid nitrogen.
    Type: Grant
    Filed: March 15, 2018
    Date of Patent: August 11, 2020
    Assignee: UOP LLC
    Inventors: Michael Jerome Vetter, Bryan James Egolf, Louis A. Lattanzio, Clayton Colin Sadler, Mohamed Sami Elganiny
  • Patent number: 10734255
    Abstract: A substrate cleaning method includes supplying, onto a substrate, a film-forming processing liquid including a volatile component and a polar organic material that forms a processing film on the substrate, volatilizing the volatile component such that the film-forming processing liquid solidifies or cures and forms the processing film on the substrate, supplying, to the processing film formed on the substrate, a peeling processing liquid that peels off the processing film from the substrate and includes a non-polar solvent, and supplying, to the processing film, a dissolution processing liquid that dissolves the processing film and includes a polar solvent after the supplying of the peeling processing liquid. The non-polar solvent does not contain water, and the polar solvent does not contain water.
    Type: Grant
    Filed: May 18, 2017
    Date of Patent: August 4, 2020
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Kenji Sekiguchi, Itaru Kanno, Meitoku Aibara, Kouzou Tachibana
  • Patent number: 10722923
    Abstract: Systems, methods, and a hole-cleaning apparatus for cleaning machined holes before measurement. The apparatus includes a probe that is inserted into a hole, and a spool support configured to support a spool of a cleaning material. During operation, cleaning material is drawn from the spool downward along the outer surface of the probe, and cleans the machined hole. The cleaning material then passes through an opening at the lower end of the probe, moves upward through an internal passage to an opening in the upper end of the probe, and is collected on a powered take-up reel.
    Type: Grant
    Filed: March 21, 2018
    Date of Patent: July 28, 2020
    Assignee: The Boeing Company
    Inventor: Ian Dahl Cairns
  • Patent number: 10727043
    Abstract: A hole is formed on a liquid film of a low surface tension liquid which covers an entire region of an upper surface of a substrate, and a central portion of the upper surface of the substrate is exposed. The hole in the liquid film of the low surface tension liquid is expanded up to an outer circumference of the substrate. Discharge of hot water is stopped before formation of the hole in the liquid film of the low surface tension liquid. After the liquid film of the low surface tension liquid has been expelled from the upper surface of the substrate, hot water is supplied again to a lower surface of the substrate. A liquid adhering to the substrate is shaken off after stoppage of discharge of the hot water.
    Type: Grant
    Filed: March 2, 2018
    Date of Patent: July 28, 2020
    Assignee: SCREEN Holdings Co., Ltd.
    Inventors: Taiki Hinode, Sadamu Fujii
  • Patent number: 10720320
    Abstract: A substrate processing method including a center portion discharging step of discharging a low-surface-tension liquid from a first low-surface-tension liquid nozzle disposed above a substrate toward the center portion of an upper surface, an inert gas supplying step of supplying inert gas to above the substrate in parallel with the center portion discharging step in order to form a gas flow flowing along the upper surface, and a peripheral edge portion discharging and supplying step of discharging the low-surface-tension liquid from a second low-surface-tension liquid nozzle disposed above the substrate toward a peripheral edge portion of the upper surface in parallel with the center portion discharging step and the inert gas supplying step.
    Type: Grant
    Filed: September 13, 2016
    Date of Patent: July 21, 2020
    Assignee: SCREEN Holdings Co., Ltd.
    Inventors: Tetsuya Emoto, Atsuro Eitoku, Tomomi Iwata, Akihiko Taki
  • Patent number: 10712551
    Abstract: An apparatus and a method for cleaning a lens with which the lens can selectively be fed by means of a common handling device to several cleaning devices and can be moved in a lens-specific manner during cleaning.
    Type: Grant
    Filed: August 28, 2017
    Date of Patent: July 14, 2020
    Assignee: SCHNEIDER GMBH & CO. KG
    Inventors: Gunter Schneider, Jürgen Krall
  • Patent number: 10692715
    Abstract: According to one embodiment, a method for cleaning a substrate includes first cleaning process and second cleaning process. The first cleaning process subjects a substrate to a first cleaning method. The second cleaning process subjects the substrate to a second cleaning method that is different from the first cleaning method and is subsequent to the first cleaning process. The first cleaning method includes at least one of acidic cleaning or alkaline cleaning. The second cleaning method includes freeze cleaning.
    Type: Grant
    Filed: March 2, 2017
    Date of Patent: June 23, 2020
    Assignee: TOSHIBA MEMORY CORPORATION
    Inventors: Kyo Otsubo, Hideaki Sakurai, Minako Inukai
  • Patent number: 10668511
    Abstract: A method of cleaning a process chamber includes following steps. A plurality of process films and a plurality of non-process films are alternately formed on an interior surface of the process chamber. A cleaning operation is performed to remove the plurality of process films and the plurality of non-process films from the interior surface of the process chamber.
    Type: Grant
    Filed: March 20, 2018
    Date of Patent: June 2, 2020
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Tsung-Lin Lee, Yi-Ming Lin, Chih-Hung Yeh, Zi-Yuang Wang
  • Patent number: 10661757
    Abstract: A system for automatically deploying a windshield wiper blade to a deployed position includes one or more processors, an actuator coupled to the windshield wiper blade and communicatively coupled to the one or more processors, one or more optical sensors communicatively coupled to the one or more processors that output an optical signal, and one or more memory modules communicatively coupled to the one or more processors. The one or more memory modules store logic that when executed by the one or more processors cause the one or more processors to receive the optical signal output by the one or more optical sensors, detect whether an accumulation of a substance has formed on the vehicle based on the optical signal output by the one or more optical sensors, and deploy, with the actuator, the windshield wiper blade to the deployed position in response to detecting the accumulation of the substance.
    Type: Grant
    Filed: September 26, 2016
    Date of Patent: May 26, 2020
    Assignee: Toyota Motor Engineering & Manufacturing North America, Inc.
    Inventors: Sergei I. Gage, Arata Sato
  • Patent number: 10654065
    Abstract: Cleaning fixtures for a component(s) are disclosed. The cleaning fixtures may include a first and second component recess configured to receive a first and second component, respectively. Each component recess may be defined between a first and second member of the cleaning fixture. The cleaning fixture may also include a first solvent conduit in fluid communication with the first component recess, and a second solvent conduit in fluid communication with the second component recess. The first and second solvent conduit may include physical characteristic(s) configured to control delivery of solvent into the respective component recess at desired fluid parameter(s). The cleaning fixture may also include a first gas conduit in fluid communication with the first component recess, and a second gas conduit in fluid communication with the second component recess. Each of the first and second gas conduit may deliver a pressurized gas to the respective component recess.
    Type: Grant
    Filed: August 11, 2017
    Date of Patent: May 19, 2020
    Assignee: General Electric Company
    Inventors: Jose Troitino Lopez, Raymond Michael Brown
  • Patent number: 10646900
    Abstract: Disclosed herein are various embodiments of a system and method for operating a surface pressure washer with a wand component. The method may include the steps of cleaning a first surface through a first fluid path, where the first fluid path includes a pump, a pressure regulating valve, a diversion block, and a spray gun, while spray nozzles are not discharging fluid to a second surface, actuating a valve connected to the diversion block, thereby reducing the pressure available to the first fluid path and creating a second fluid path, where the second fluid path includes the pump, the pressure regulating valve, the diversion block and the spray nozzles, where the spray nozzles are configured to rotate above the second surface when the second fluid path is open, and cleaning a second surface underneath the pressure washer system through the second fluid path.
    Type: Grant
    Filed: May 29, 2018
    Date of Patent: May 12, 2020
    Inventors: Clayton Boyd, Jennifer Boyd
  • Patent number: 10639683
    Abstract: A recover piping cleaning method is a method of cleaning a recovery piping into which a chemical liquid used for processing of a substrate is led via a processing cup, the recovery piping being arranged to lead the led chemical liquid into a predetermined chemical liquid recovery piping, the method including a piping cleaning step of cleaning the interior of the recovery piping by using a cleaning liquid by, while supplying the cleaning liquid to the recovery piping, leading the liquid led into the recovery piping into a drain piping which is different from the chemical liquid recovery piping, and a cleaning chemical liquid supplying step of, supplying the cleaning chemical liquid from a cleaning chemical liquid supply piping connected to the recovery piping to the recovery piping while leading the liquid led into the recovery piping into the drain piping.
    Type: Grant
    Filed: September 20, 2017
    Date of Patent: May 5, 2020
    Assignee: SCREEN Holdings Co., Ltd.
    Inventors: Yuya Tsuchihashi, Atsuyasu Miura, Hiroki Tsujikawa, Kazuhiro Fujita, Masahide Ikeda