Abstract: A method for treating a substrate, including a solvent processing step of supplying an organic solvent onto the substrate to treat the substrate, a drying step of drying the substrate to remove the organic solvent on the substrate, and a bake step of heating the substrate to thermally decompose an impurity adhering to the substrate, where the drying step and the bake step are performed in different chambers.

Abstract: A device for cleaning items comprises an enclosure defining a wash chamber, a rotor positioned within the wash chamber and selectively rotatable about an axle, a motor for selectively rotating the axle, a dispenser, and a drain. The rotor comprises a plurality of holders spaced about the axle and adapted to selectively receive and hold a respective item to be cleaned. The dispenser at least one liquid input and at least one liquid output and is positioned such that the at least one liquid output directs cleaning fluid at one of the items to clean material out of the cavities. The drain is for draining the cleaning fluid out of the chamber. The rotor is selectively rotatable at a predefined rotational speed for a predefined amount of time to expel cleaning fluid from the cavities of each item to be cleaned.

Abstract: The present disclosure provides a cleaning system, including a first sub-chamber, a second sub-chamber adjacent to the first sub-chamber, and a third sub-chamber adjacent to the second sub-chamber. A first divider is positioned between the first and the second sub-chambers. A second divider is positioned between the second and the third sub-chambers. A vacuum system is coupled to the third sub-chamber to generate a vacuum pressure in the third sub-chamber that is less than a pressure of the first sub-chamber to create a pressure differential to induce a pressurized flow of a first cleaning media from the first sub-chamber to the third sub-chamber through an internal passage of a component positioned in the second sub-chamber. A filtering system is coupled to the first sub-chamber and the third sub-chamber to remove and filter the first cleaning media from the third sub-chamber and return the first cleaning media to the first sub-chamber.

Abstract: A substrate processing apparatus includes: a nozzle unit configured to discharge a processing liquid to a substrate; a pipe connected to the nozzle unit and a processing liquid supply unit supplying the processing liquid; a charge amount control unit disposed at the pipe, including a filter unit charged with positive charges or negative charges, and including at least one of a control valve, controlling a flow rate of the processing liquid passing through an inside of the filter unit, and a power supply unit, applying a voltage to the filter unit, to control a charge amount of the processing liquid; and a control unit connected to the charge amount control unit.

Abstract: A plating apparatus 1000 includes a plating tank, a substrate holder 20, a rotation mechanism, an elevating mechanism, a contact member 40, and a cleaning device 50 configured to clean the contact member 40. The cleaning device 50 includes a pivot shaft 51, a first arm 53, a second arm 54, and a nozzle 55 that includes at least one discharge port. Applying a cleaning fluid discharged from the discharge port to the contact member 40 cleans the contact member 40.

Abstract: The cleaning method according to an embodiment of the present invention is for cleaning a plasma processing apparatus that performs a plasma processing on a substrate. This cleaning method includes: forming a protective film; and cleaning. The forming the protective film involves forming the protective film in a plasma generation region by generating plasma while supplying a film-forming gas into a processing container in which a processing space including the plasma generation region and a diffusion region is formed. The cleaning involves cleaning an interior of the processing container in which the protective film has been formed by generating plasma while supplying a cleaning gas into the processing container.

Abstract: A system and method for cleaning disks includes a cleaning disk rotatably supported by a structural frame, the rotatable cleaning disk defining a plurality of holes, the plurality of holes carrying disks to be cleaned. The rotatable cleaning disk disposed between a first plurality of brushes and a second plurality of such that each of the first plurality of brushes and the second plurality of brushes contacting and agitating surfaces of the disks. A washing tank is supported by the structural frame and defines a reservoir of cleaning solution. At least a portion of the rotatable cleaning disk and the first and second pluralities of brushes are submerged in the cleaning solution. A blower forces heated air over the disks to be cleaned and removes cleaning solution from the disks, and a light source irradiates the disks to be cleaned for a predetermined amount of time.

Abstract: An autonomous solar collector cleaning device includes at least one main shaft, a first driver attached to a first end of the at least one main shaft, and a second driver attached to a second end of the at least one main shaft. The first and second drivers propel the cleaning device along a surface of the solar collector. A first sensor is attached to the first driver to detect an edge of the solar collector, and a second sensor is attached to the second driver to detect the edge of the solar collector. A control circuit maintains alignment of the cleaning device with respect to the solar collector based on outputs from the first and second sensors.

Abstract: An apparatus for cleaning an HVAC coil unit comprises a supply and collection assembly with a housing defining an interior space for containing a quantity of cleaning solution. A pump has an inlet positioned to be in fluid communication with the cleaning solution and is operative to deliver the cleaning solution to an outlet of the supply and collection assembly in a volume of at least 40 gallons per minute. Fluid return piping defines a conduit to conduct used cleaning solution from the HVAC coil unit back to a collection inlet. A filter assembly is positioned along the fluid return piping to filter the used cleaning solution. A fluid flow device is operative to provide pressure to move a quantity of the used cleaning solution through the fluid return piping. The used cleaning solution is returned to the interior space through the collection inlet during operation of said fluid flow device.

Abstract: A nozzle is stored in a nozzle storage hole of a waiting pod. In this state, a cleaning liquid is discharged to an outer peripheral surface of the nozzle from a plurality of discharge ports. Thus, a coating liquid and its solidified matter adhering to the nozzle are dissolved and removed from the nozzle. Subsequently, a metal removal liquid is discharged from a plurality of discharge ports to the outer peripheral surface of the nozzle. Thus, a metallic component remaining on the nozzle is dissolved and removed from the nozzle. Further, pure water is discharged to the outer peripheral surface of the nozzle from the plurality of discharge ports, and the metal removal liquid adhering to the nozzle is cleaned away.

Abstract: A medical device inspection scope may include a cylindrical outer layer having a diameter of less than 2 millimeters or even less than 1 millimeter, a cylindrical inner layer disposed concentrically within the outer layer, a circumferential space between the outer layer and the inner layer, and an inner lumen formed by the inner layer. The scope also includes multiple light transmitting fibers disposed in the circumferential space and a camera module disposed in the inner lumen. The light fibers may be designed to transmit illumination light and ultraviolet light. The scope may also optionally include a stiffening member.

Abstract: The invention proposes a modular system for loading a conveying apparatus of a conveyor dishwasher. The modular system comprises: A. at least one detection module for sensing status data relating to supplied washware; B. a plurality of interchangeable handling modules, wherein the handling modules are each intended to perform an individual handling function for handling the washware using at least one actuator; C. at least one feeding unit for selectively feeding the supplied washware to the handling modules; D.

Abstract: An improved pilot system that allows an automatic maintenance valve to be flushed of buildup. The improved pilot system is used to flush the three chambers of an automatic control valve. The pilot system comprises of lines, ball valves, a strainer, a restrainer plug, a flow stabilizer, a flow restrictor, a pressure reducing pilot, and a couple of isolating valves.

Abstract: The present invention relates to a cleaning robot having a cleaning cloth and a cleaning agent and also to the use of a concentrated cleaning agent in such a cleaning robot.

Abstract: Some implementations described herein provide techniques and apparatuses for determining a performance of a dry-clean operation within a deposition tool. A cleaning-control subsystem of the deposition tool may include a gas concentration sensor and a temperature sensor mounted in an exhaust system of the deposition tool to monitor the dry-clean operation. The gas concentration sensor may provide data related to a concentration of a chemical compound in a cleaning gas, where the chemical compound is a bi-product of the dry-clean operation. The temperature sensor may provide temperature data related to an exothermic reaction of the dry-clean operation. Such data may be used to determine an efficiency and/or an effectiveness of the dry-clean operation within the deposition tool.

Abstract: Methods, systems, and apparatus for cleaning and drying a tape-frame substrate are provided. In embodiments, an apparatus for supporting a tape-frame substrate includes a chuck having a first side and a second side opposite the first side, the first side having a convex surface configured to support the tape-frame substrate; and a plurality of channels extending through the chuck and having outlets along the first side, wherein the plurality of channels are configured to dispense fluid from the outlets along the convex surface of the first side. In embodiments, a support system includes the chuck and a holder configured to mount a tape-frame substrate to the chuck. The plurality of channels are configured to dispense fluid from the outlets and between the tape-frame substrate and the convex surface of the chuck when the tape-frame substrate is mounted to the chuck.

Abstract: An adjustable UV emission system includes a sanitizing interface having a first side and a second side opposing the first side where the first side is arranged to face an object when positioned adjacent to the first side. The system also includes a UV emission interface positioned adjacent to the second side of the sanitizing interface. The UV emission interface includes at least one sensor arranged to detect the object and at least one UV light emitter arranged to emit UV light through the sanitizing interface toward the object. The adjustable UV emission interface is arranged to: i) adjustably conform to the shape of a surface of the object facing the sanitizing interface, and ii) emit the UV light toward the sanitizing interface in the shape of the surface of the object.

Abstract: A dispensing assembly and a method for cleaning inner buttocks using partially wet toilet paper. The dispensing assembly includes a housing and a container removably coupled to the bottom of the housing. The container can be removed, refilled, and reattached to the housing. A pump enclosed within the housing can suck liquid from the container. The pump can deliver a stream of liquid through a nozzle on the toilet paper. Sensors protruding from the housing can detect the toilet paper when in proximity to the nozzle.

Abstract: A portable handheld submersible ultrasonic cleaning device has a generally elongate body defining proximal and distal ends, a power supply and an ultrasonic transducer powered thereby, wherein the distal end exposes the ultrasonic transducer to agitate surrounding water when the base is submerged in the water use. A propeller device comprising a propeller may force the water across the ultrasonic transducer. When cleaning, the device may be held with the distal end thereof submerged for enhanced cleaning and removing surface contaminants such as dust, dirt, oil, pigments, bacteria and the like. The device may be stood upright upon the base on the floor of a container for hands-free application of ultrasound whilst cleaning.

Abstract: The present disclosure relates to an apparatus and method for cleaning a chamber, and more particularly, to an apparatus and method for cleaning a chamber, which are capable of cleaning the chamber which is contaminated while depositing a thin film on a substrate. The chamber cleaning method in accordance with an exemplary embodiment is a method for cleaning a chamber configured to deposit a zinc oxide, the method comprising: supplying a chlorine (Cl)-containing gas and a hydrogen (H)-containing gas into a chamber; activating and reacting the separately supplied gases with each other inside the chamber to generate a reaction gas; and firstly cleaning the chamber with the reaction gas.