Abstract: A method for analyzing charged particles may include generating, in or into an ion source region, charged particles from a sample of particles, causing the charged particles to enter a mass spectrometer from the ion source region at each of a plurality of differing physical and/or chemical conditions in a range of physical and/or chemical conditions in which the sample particles undergo structural changes, controlling the mass spectrometer to measure at least the charge magnitudes of the generated charged particles at each of the plurality of differing physical and/or chemical conditions, determining, with a processor, an average charge magnitude of the generated charged particles at each of the plurality of differing physical and/or chemical conditions based on the measured charge magnitudes, and determining, with the processor, an average charge magnitude profile over the range of physical and/or chemical conditions based on the determined average charge magnitudes.

Abstract: Non-destructive sensing methods and devices for inspection and measuring in manufacturing applications for removal of contaminants from composite surfaces coupled with sensing and activation of the composite surfaces.

Abstract: A BEC-station and a cloud-based server cooperate to provide Bose-Einstein condensates as a service (BECaaS). The BEC station serves as a system for implementing “recipes” for producing, manipulating, and/or using cold (<1 mK) a BEC, e.g., of cold Rubidium 87 atoms. The cloud-based server acts as an interface between the station (or stations) and authorized users of account holders. To this end the server hosts an account manager and a session manager. The account manager manages accounts and associated account-based and user-specific permissions that define what actions any given authorized user for an account may perform with respect to a BEC station. The session manager controls (in some cases real-time) interactions between a user and a BEC station, some interactions allowing a user to select a recipe based on results returned earlier in the same session.

Abstract: The invention concerns an ion trap, including a first ring-shaped end cap electrode and a second ring-shaped end cap electrode, between which is formed a ring-shaped ion storage cell, as well as a plurality of radially inner disk-shaped ring electrodes and a plurality of radially outer disk-shaped ring electrodes, which delimit the ring-shaped ion storage cell. The invention also relates to a mass spectrometer that has such an ion trap as well as a control device that is designed to actuate the disk-shaped ring electrodes and the end cap electrodes for the storage, selection, excitation and/or detection of ions in the ring-shaped ion storage cell.

Abstract: The present invention relates to a method for the detection of at least one nano or micro plastic particle comprised in a heterogeneous matrix material comprising the following steps: applying of at least one part of a heterogeneous matrix material comprising at least one nano or micro plastic particle onto at least a portion of a surface of a conductive support thereby forming a first layer onto said surface, irradiating of at least a portion of said first layer with at least one ion beam, thereby forming an irradiated layer, detecting of the at least one nano or micro plastic particle comprised in said irradiated layer by a detection method chosen from the group of Raman nanoscopic techniques, or infrared nanoscopic techniques, or charge dependent detection methods or combination thereof. The present invention allowed good detection of micro and nano plastic particles with high resolution and sensitivity.

Abstract: A sample support is a sample support for sample ionization, including: a substrate formed with a plurality of through holes opening to a first surface and a second surface on a side opposite to the first surface; a conductive layer provided not to block the through hole in the first surface; and a reinforcement member disposed inside a part of the plurality of through holes.

Abstract: An example apparatus includes a sampling layer to position microscopic objects thereon, a light encoding layer to encode light from passing through the microscopic objects of the sampling layer, the light encoding layer having a substantially flat form, and an imaging layer to capture an image of the sampling layer, the image being encoded by the light encoding layer.

Abstract: This disclosure is directed to solutions of detecting and classifying wafer defects using machine learning techniques. The solutions take only one coarse resolution digital microscope image of a target wafer, and use machine learning techniques to process the coarse SEM image to review and classify a defect on the target wafer. Because only one coarse SEM image of the wafer is needed, the defect review and classification throughput and efficiency are improved. Further, the techniques are not distractive and may be integrated with other defect detecting and classification techniques.

Abstract: In one aspect, a mass analyzer is disclosed, which comprises a quadrupole having an input end for receiving ions and an output end through which ions can exit the quadrupole, said quadrupole having a plurality of rods to at least some of which a drive RF signal and an excitation signal can be applied. A fixed phase relationship is maintained between the drive RF signal and the excitation signal, thereby enhancing the signal-to-noise ratio of the mass detection signal.

Abstract: A sample support body for ionization of a sample, including: a substrate having a first surface, a second surface on a side opposite to the first surface, and a plurality of through-holes opening on each of the first surface and the second surface; a conductive layer provided on the first surface; and a matrix crystal layer provided on at least one of the conductive layer and the second surface, in which the matrix crystal layer is formed of a plurality of matrix crystal grains so as to include a gap communicating the plurality of through-holes with an outside.

Abstract: The present disclosure provides an inspection system and a method of stray field mitigation. The system includes an array of electron beam columns, a first permanent magnet array, and a plurality of shielding plates. The array of electron beam columns each includes an electron source configured to emit electrons toward a stage. The first permanent magnet array is configured to condense the electrons from each electron source into an array of electron beams. The first permanent magnet array is arranged at a first end of the array of electron beam columns. The plurality of shielding plates extend across the array electron beam columns downstream of the first permanent magnet array in a direction of electron emission. The array of electron beams pass through a plurality of apertures in each of the plurality of shielding plates, which reduces stray magnetic field in a radial direction of the array of electron beams.

Abstract: The present disclosure relates to a rotationally symmetric dielectric structure for optical beam shaping and for trapping and manipulating individual particles and living biological cells in aqueous medium, concentrically mounted on the facet of a single-mode optical fiber, wherein the structure comprises at least three total reflection surfaces configured to split a light field emerging from the single-mode optical fiber into at least two separate light paths and wherein the at least three total reflection surfaces are further configured to bring the separate light paths together as a ring beam in a common focal point.

Abstract: An atomtronics station and a cloud-based server cooperate to provide Bose-Einstein condensates as a service (ATaaS). The atomtronics station serves as a system for implementing “recipes” for producing, manipulating, and/or using atomtronic devices based on cold atoms that are, in some respects, analogous to classical electronic devices based on electricity. The cloud-based server acts as an interface between the station (or stations) and authorized users of account holders. To this end the server hosts an account manager and a session manager. The account manager manages accounts and associated account-based and user-specific permissions that define what actions any given authorized user for an account may perform with respect to an atomtronics station. The session manager controls (in some cases, real-time) interactions between a user and an atomtronics station, some interactions allowing a user to select a recipe based on results returned earlier in the same session.

Abstract: A first spray unit (201) sprays a first sample into a first space (20) while charging the first sample. A second spray unit (202) sprays a second sample into the first space (20) or a second space (21) communicating with the first space (20) while charging the second sample. A determination unit (62) determines whether or not the second sample is sprayed from the second spray unit (202). A gas supply unit (74) supplies gas into the first space (20). A control unit (63) controls supply of the gas from the gas supply unit (74). In a case where the determination unit (62) determines that the second sample is sprayed from the second spray unit (202), the control unit (63) starts the supply of the gas from the gas supply unit (74) into the first space (20).

Abstract: A system for cooling an inductively coupled plasma (ICP) instrument includes: the ICP instrument; a pump in fluid communication with the instrument via a first conduit; and a micro-channel heat exchanger in fluid communication with the instrument via a second conduit, and in fluid communication with the pump via a third conduit. The pump is configured to generate a pump outlet pressure of coolant that exceeds a back pressure of the instrument such that a pressure of the coolant traveling through the second conduit and into the heat exchanger is less than or equal to 5 pounds per square inch (psi) above atmospheric pressure, as measured at an inlet to the heat exchanger.

Abstract: A method of scanning a wafer includes placing the wafer over a substrate holder inside a processing chamber, where the wafer is placed at a first twist angle relative to a reference axis of a rotatable feedthrough of the processing chamber. The method further includes performing a first pass scan by exposing the wafer to an ion beam while driving two rotary drives disposed in a scanning chamber synchronously to generate a planar motion of the wafer from a rotational motion of the two rotary drives, where the wafer is oriented continuously at the first twist angle when performing the first pass scan.

Abstract: Methods for using electron diffraction holography to investigate a sample, according to the present disclosure include the initial steps of emitting a plurality of electrons toward the sample, forming the plurality of electrons into a first electron beam and a second electron beam, and modifying the focal properties of at least one of the two beams such that the two beams have different focal planes. Once the two beams have different focal planes, the methods include focusing the first electron beam such that it has a focal plane at or near the sample, and focusing the second electron beam so that it is incident on the sample, and has a focal plane in the diffraction plane. An interference pattern of the first electron beam and the diffracted second electron beam is then detected in the diffraction plane, and then used to generate a diffraction holograph.

Abstract: A poling apparatus for poling a polymer thin film formed on a workpiece carried by a workpiece carrier. The workpiece has multiple grounding electrodes, grounding pads located at its edges, and a polymer thin film including multiple areas each covering only one grounding electrode. The poling apparatus includes, in a poling chamber, a poling source generating a plasma, a shadow mask below the poling source, and a Z-elevator to raise the workpiece carrier toward the shadow mask and poling source. When the workpiece in the workpiece carrier is raised to contact the underside of the shadow mask, multiple openings of the shadow mask expose only the corresponding multiple thin film areas of the workpiece to the plasma; meanwhile, conductive grounding terminals on the underside of the shadow mask electrically connect the grounding pads of the workpiece with carrier electrodes on the workpiece carrier, to ground the workpiece.

Abstract: A self-sanitizing stylus for use in combination with a touch screen device and method of using the same is disclosed. The self-sanitizing stylus comprises a body including a component retaining enclosure and longitudinal member. The longitudinal member has a body defined between a distal end with a touch tip disposed thereon, and a proximal end secured with an operative end of the component retaining enclosure. At least one ultraviolet radiation emitting device is disposed on the body. The component retaining enclosure includes a power source and switch connected between the power source, and the ultraviolet radiation emitting device, which when pressed establishes an electrical connection between the power source and the ultraviolet radiation emitting device, which emits UV radiation to disinfect the body or portion thereof.

Abstract: An ultraviolet (“UV”) emission device may emit energy towards a movable surface of a conveyor system. A housing of the UV emission device may attach to a frame of the conveyor system. A lateral edge of the housing may extend across the moveable surface. The housing and a portion of the moveable surface may be inclined with respect to the frame. A barrier bracket of the UV emission device may support an absorptive barrier along the lateral edge, the absorptive barrier configured to contact the moveable surface. In a first position of the barrier bracket, the absorptive barrier contacts the moveable surface and the barrier bracket activates an interlock switch. In a second position of the barrier bracket, the barrier bracket deactivates the interlock switch. Responsive to deactivation of the interlock switch, a controller may provide a control signal to decrease power to the UV energy emission element.