Patents Examined by Pamela Wilson
  • Patent number: 6655044
    Abstract: This invention relates to a vacuum processing apparatus having vacuum processing chambers the insides of which must be dry cleaned, and to a method of operating such an apparatus. When the vacuum processing chambers are dry-cleaned, dummy substrates are transferred into the vacuum processing chamber by substrates conveyor means from dummy substrate storage means which is disposed in the air atmosphere together with storage means for storing substrates to be processed, and the inside of the vacuum processing chamber is dry-cleaned by generating a plasma. The dummy substrate is returned to the dummy substrate storage means after dry cleaning is completed. Accordingly, any specific mechanism for only the cleaning purpose is not necessary and the construction of the apparatus can be made simple.
    Type: Grant
    Filed: January 23, 2001
    Date of Patent: December 2, 2003
    Assignee: Hitachi, Ltd.
    Inventors: Shigekazu Kato, Kouji Nishihata, Tsunehiko Tsubone, Atsushi Itou
  • Patent number: 6647642
    Abstract: A cleaning processing apparatus and method of wafers W held by a rotor capable of holding a plurality of wafers W, which is one embodiment of the liquid processing apparatus of the present invention, comprises an outside chamber, an inside chamber arranged slidable between a process position and a retreat position, and a cleaning mechanism for cleaning the inside chamber in the retreat position. The cleaning mechanism includes a cylindrical body arranged in the inside chamber so as to form a substantially cylindrical cleaning processing space between the inside chamber and the cylindrical body, a cleaning liquid spurting nozzle for spurting a cleaning liquid into the cleaning processing space, and a gas supply nozzle for supplying a predetermined drying gas into the cleaning processing space so as to make it possible to clean and dry the inside chamber.
    Type: Grant
    Filed: December 14, 2001
    Date of Patent: November 18, 2003
    Assignee: Tokyo Electron Limited
    Inventors: Yuji Kamikawa, Taichi Sakaguchi
  • Patent number: 6637128
    Abstract: A transversely stretched nonwoven fabric is manufactured by transversely stretching a nonwoven fabric. First, an original web comprising a plurality of un-oriented filaments is heated to a temperature higher than its stretch suitable temperature by 5° C. or more. Next, the heated original web is stretched at a rate of 1.2 to 3 in its transverse direction to stretch the filaments of the original web with almost no molecular orientation involved. Then, the original web stretched transversely at a rate of 1.2 to 3 is heated to the stretch suitable temperature and the original web is further stretched transversely at the stretch suitable temperature. With these steps, a transversely stretched nonwoven fabric in which the original web is stretched transversely at a rate of 7 times or more in total as compared with the state of the stretch thereof is manufactured with a high tensile strength of 132.5 mN/tex (1.5 g/d) in the transverse direction.
    Type: Grant
    Filed: December 4, 2002
    Date of Patent: October 28, 2003
    Assignees: Nippon Petrochemicals Co., Ltd., Polymer Processing Research Institute Ltd.
    Inventors: Yuki Kuroiwa, Yoshiro Morino, Kazuhiko Kurihara, Shuichi Murakami
  • Patent number: 6634116
    Abstract: A wafer conveyor system for use in a vacuum processing apparatus wherein the conveyor structure is provided with a transfer structure, and a robot apparatus is arranged on the transfer structure. The robot provides for rotation of the wafer in a horizontally from a position in a cassette to an opposite position of the cassette.
    Type: Grant
    Filed: February 13, 2001
    Date of Patent: October 21, 2003
    Assignee: Hitachi, Ltd.
    Inventors: Shigekazu Kato, Kouji Nishihata, Tsunehiko Tsubone, Atsushi Itou
  • Patent number: 6634119
    Abstract: Disclosed is an adsorptive ethanol drying apparatus in which microwaves are applied during the regeneration of an absorbent conducted in a continuous adsorption process for drying ethanol, so that the absorbent regeneration can be rapidly achieved at a temperature lower than that used in a conventional heating type regeneration method and within a reduced processing time, thereby being capable of allowing an efficient use of energy while improving the productivity per adsorbent mass. A method for operating the adsorptive ethanol drying apparatus is also disclosed. At an adsorption step, a vaporized ethanol azeotropic mixture is forced to pass through adsorption towers to adsorb water contained in the vaporized ethanol azeotropic mixture to an adsorbent charged in each of the adsorption towers while condensing ethanol in a storage tank.
    Type: Grant
    Filed: June 29, 2001
    Date of Patent: October 21, 2003
    Assignee: Korea Institute of Energy Research
    Inventors: Jong Kee Park, Soon Haeng Cho, Jong Nam Kim, Jung Il Yang, Hee Tae Beom
  • Patent number: 6629375
    Abstract: The invention provides an apparatus for collecting ablated material generated by exposure of an imaging layer to a source of radiation, said apparatus comprising a vacuum supply means, and a vacuum head connected to, and in close proximity with, a centrifugal separator, said vacuum head being for direct attachment to a movable mounting means having guide means. The centrifugal separator preferably comprises a reverse flow gas cyclone or a uniflow gas cyclone. The apparatus preferably also includes a filtration system capable of removing any remaining contaminants Typically, the vacuum supply means comprises a vacuum pump, the movable mounting means comprises a carriage to which the vacuum head may be attached and the guide means comprises a guide rail. A method of preparing an imaged member is also disclosed, preferably from an imaging member which comprises a lithographic printing plate precursor comprising a substrate and a metal imaging layer.
    Type: Grant
    Filed: December 18, 2000
    Date of Patent: October 7, 2003
    Assignee: Agfa-Gevaert
    Inventors: Malcolm James Mallsion, Philip John Watkiss, Susan Anne Wilkinson
  • Patent number: 6625899
    Abstract: A vacuum processing apparatus which includes a means for transferring substrates from a loader with a transferring device to a double lock chamber and then to a selected vacuum processing chamber. The substrates are then returned to a substrate by the vacuum loader and back into the substrate table. The surfaces of the substrates are maintained in a horizontal position during processing.
    Type: Grant
    Filed: January 23, 2001
    Date of Patent: September 30, 2003
    Assignee: Hitachi, Ltd.
    Inventors: Shigekazu Kato, Kouji Nishihata, Tsunehiko Tsubone, Atsushi Itou
  • Patent number: 6622398
    Abstract: A method for processing semiconductor wafers and similar articles has an ozone remover connected to a processing chamber. The ozone remover has a light chamber surrounded by reflectors. Ozone and other processing gases and vapors flow out of the processing chamber and into the light chamber. Ultraviolet lights in the ozone remover flood the light chamber with ultraviolet light, converting ozone into oxygen. The amount of ozone released into the environment is reduced. A recirculation line receives the gases and vapors flowing out of the ozone remover. Oxygen and any remaining ozone are separated from other gas and vapor components and are recycled back to an ozone generator, to increase the ozone generator efficiency in supplying the machine with ozone.
    Type: Grant
    Filed: May 22, 2002
    Date of Patent: September 23, 2003
    Assignee: Semitool, Inc.
    Inventor: Ralph Wayne Thomas
  • Patent number: 6610081
    Abstract: The present invention generally relates to various systems and methods for the treatment of a migraine headache and related malady(s) through the filtering a portion of ambient light transmitted to the eye of a patient.
    Type: Grant
    Filed: April 18, 2001
    Date of Patent: August 26, 2003
    Inventor: Myra K. Saathoff
  • Patent number: 6601316
    Abstract: A hair dryer in which a first air blower (12, 82) having a mating member (44, 128) selectively engages a second air blower (14, 84) having an opposing mating member (52, 134), each air blower (12, 82) and (14, 84) having a fan motor for operating a fan and a housing (20), (22) with an air inlet and an air outlet, for selective operation for directing air in a common direction or detached for operation for directing air in independent separate directions. Mating members of a lug and recess and of a magnetically attractive plate and magnet are disclosed. A method for drying hair is disclosed.
    Type: Grant
    Filed: August 16, 2002
    Date of Patent: August 5, 2003
    Inventor: James Malcomb Shaw, II
  • Patent number: 6601317
    Abstract: A high-efficiency drying kiln, particularly for wood-like material, constituted by an internal chamber, which is covered with thermally insulating material and is provided with at least one opening for loading and extracting the material to be treated; two flues for recirculation of the air inside the chamber by aspirating and delivering air respectively from and into the outside environment; an air heating device; an air acceleration duct and air acceleration elements located inside the acceleration duct; the air acceleration duct has, at least at its output section, elements for orienting in an axial direction the air stream that is forced by the acceleration elements.
    Type: Grant
    Filed: May 14, 2001
    Date of Patent: August 5, 2003
    Assignee: Nardi S.p.A.
    Inventor: Renzo Nardi
  • Patent number: 6598316
    Abstract: A line for processing semiconductor wafers into integrated circuits (ICs) is provided with an input-output (I-O) chamber to help purge residual contamination from the wafers before they are transferred into a processing line. After a cassette containing semiconductor wafers is placed in the chamber, it is sealed from the line and from the atmosphere. Then a dry inert gas such as nitrogen is dispersed into the top of the chamber to form a covering blanket around the wafers to displace and sweep away contaminants such as air-borne particles, moisture and organic vapors. While the purge gas is flowing, gasses and residual contamination are exhausted from the bottom of the chamber at a relatively slow rate until an intermediate pressure level is reached at which pressure droplets of liquid from residual moisture and vapor can no longer condense. Then the flow of purge gas is stopped and the pressure within the chamber is relatively quickly reduced to a base operating value (e.g.
    Type: Grant
    Filed: May 2, 2002
    Date of Patent: July 29, 2003
    Assignee: Applied Materials, Inc.
    Inventor: Alan Hiroshi Ouye
  • Patent number: 6591516
    Abstract: A hair dryer including a main body, a centrifugal fan, at least one air inlet and at least one inlet guide. The main body has an air outlet. The centrifugal fan is provided in the main body and configured to blow air toward the air outlet. The centrifugal fan has an intake side and an outer circumferential surface around a central axis of the centrifugal fan. The at least one air inlet is formed in the main body to face the intake side of the centrifugal fan. The at least one inlet guide is provided to project from an inside surface of the main body and extends along a circumference of the at least one air inlet to surround and face a part of the outer circumferential surface of the centrifugal fan along a circumference of the centrifugal fan.
    Type: Grant
    Filed: May 24, 2001
    Date of Patent: July 15, 2003
    Assignee: Matsushita Electric Works, Ltd.
    Inventors: Kenji Kamada, Yuji Yamane, Kazunori Nakasai, Kouji Asakawa
  • Patent number: 6588123
    Abstract: An apparatus and a method for preventing a wafer mapping system of an SMIF system from being polluted by a corrosive gas remaining on wafers according to the present invention are disclosed. The wafer mapping system includes a plurality of mirrors and sensors used to detect the positions of the wafers. The apparatus of the prevent invention comprises a pipe having a plurality of holes thereon and a purge gas flowing inside the pipe, and is characterized in that the purge gas is emitted out from the plurality of holes toward the mirrors of the wafer mapping system, thereby preventing the mirrors from being polluted by the corrosive gas remaining on the wafers. The method of the prevent invention is characterized by emitting a purge gas from a pipe toward the mirrors of the wafer mapping system, thereby preventing the mirrors from being polluted by the corrosive gas remaining on the wafers.
    Type: Grant
    Filed: December 5, 2001
    Date of Patent: July 8, 2003
    Assignee: Promos Technologies, Inc.
    Inventors: San-Pen Chen, Shun-Lian Wu, William Wang
  • Patent number: 6584702
    Abstract: A metal plate (52) is connected to a wall (10). Plate (42) includes a vent opening (48) that communicates with vent ducting (18) with the wall (10). A magnetic sheet body (52) is connected to a vent tube (60) located at the back of a clothes dryer (64). The clothes dryer (64) is moved towards the wall (10) and the magnetic sheet body (52) is moved against the metal plate (42). A vent opening (54) in the magnetic sheet body (52) is put into alignment with the vent opening (48) in the metal plate (42). The magnetic sheet body (52) provides a seal between the two vent openings (54, 48).
    Type: Grant
    Filed: December 22, 2000
    Date of Patent: July 1, 2003
    Inventor: Greg A. Irey
  • Patent number: 6578287
    Abstract: A method and apparatus is disclosed for staging or cooling a substrate between high temperature thermal processing steps. In the disclosed embodiment, one or more cooling stations are located off-line within a wafer handling chamber, outside the thermal processing chamber. After thermal processing, a hot wafer can be loaded on to one station, where the wafer is subjected to forced convection cooling. In particular, the wafer is subjected to cooling gas from above and below through perforated upper and lower showerhead assemblies. The wafer can thus be cooled rapidly on a station while other wafers are transferred into and out of the processing chamber. Desirably, the wafer is cooled on the station to a point at which it can be handled by a low temperature wafer handler and stored in a low temperature cassette.
    Type: Grant
    Filed: April 24, 2002
    Date of Patent: June 17, 2003
    Assignee: ASM America, Inc.
    Inventor: Thomas W. Aswad
  • Patent number: 6571489
    Abstract: For a single chamber air drier in a compressed air system on a vehicle the volume of dry regeneration air required to regenerate a desiccant in the air drier has to be determined. This can be accomplished in that data regarding system pressure, outdoor temperature and supplied air volume are continuously provided to a compute, which in relation to these parameters controls the supply of regeneration air to the air drier.
    Type: Grant
    Filed: September 24, 2001
    Date of Patent: June 3, 2003
    Assignee: Haldex Brake Products AB
    Inventors: Sven-Olof Larsson, Mats-Örjan Pogen
  • Patent number: 6564474
    Abstract: The present invention relates to a method for subjecting a substrate on which a coating film is formed to heat processing, and the method comprises the steps of heating the substrate to a predetermined high temperature and decreasing the temperature of the substrate to a predetermined low temperature, wherein in the step of decreasing the temperature of the substrate to the low temperature, a first step of decreasing the temperature of the substrate from the predetermined high temperature to a predetermined intermediate temperature and a second step of decreasing the temperature of the substrate from the intermediate temperature to the predetermined low temperature are performed separately.
    Type: Grant
    Filed: September 10, 2001
    Date of Patent: May 20, 2003
    Assignee: Tokyo Electron Limited
    Inventor: Shinji Nagashima
  • Patent number: 6560857
    Abstract: An assembly device, in particular a fully automatic assembly device for producing microsystem technical products and for assembling components in the semiconductor industries, comprising an assembly table, a material transport system that transports the products to be placed with components, at least one transport system mounted on the assembly table, and at least one movable component transport unit with at least one assembly head. The component transport unit(s) is/are arranged on one or more carrier system(s) displaceable by means of a transport system in parallel to the direction of transport of the products to be placed with components, which products are in turn displaced by the material transport system(s).
    Type: Grant
    Filed: May 10, 2001
    Date of Patent: May 13, 2003
    Assignees: Simotech GmbH, Osram Opto Semiconductors GmbH & Co. OHG
    Inventors: Günter Waitl, Johann Feraric
  • Patent number: 6560897
    Abstract: Improved spray drying apparati, and methods of use thereof, have been developed. The spray drying equipment includes a primary drying chamber and a secondary drying apparatus which includes tubing having a length sufficient to increase the contact time between the drying gas and the droplets/particles to dry the particles to the extent desired, at a drying rate and temperature which would be too low to provide adequate drying without the secondary drying apparatus. The secondary drying apparatus increases the drying efficiency of the spray dryer system without increasing the drying rate, while minimizing loss in yield. Te secondary drying apparatus can include multiple secondary apparati, which are independently controlled for temperature and/or have different dimensions (cross-sectional areas and/or lengths), to allow for optimization of drying conditions.
    Type: Grant
    Filed: October 26, 2001
    Date of Patent: May 13, 2003
    Assignee: Acusphere, Inc.
    Inventors: Donald E. Chickering, III, Mark J. Keegan, Greg Randall, Howard Bernstein, Julie Straub