Patents Examined by Pamela Wilson
  • Patent number: 6557267
    Abstract: A heat treatment process for fiber feedstock, comprises repeatedly subjecting the bale to a reduced pressure atmosphere followed by the introduction of steam which permeates the bale. The interior of the bale may ultimately reach a temperature of about 80° C., which conditions and sanitizes the cotton fibers. Reduced pressure in the range of 20-200 mbar and steam treatment time in the order of 5 minutes can be employed.
    Type: Grant
    Filed: April 27, 2001
    Date of Patent: May 6, 2003
    Inventor: Freddy Wanger
  • Patent number: 6546646
    Abstract: A process and apparatus for removing moisture from a material, without spoiling the processed product, through the implementation of microwave irradiation heating, drying, dehydration, curing, disinfection, pasteurization, sterilization or vaporization or any combination thereof. The process and apparatus provide for a controlled processing of planar material, a combination of materials organic or inorganic, in natural or processed form, in sheet leaf, granular, prepared or transportable planar form.
    Type: Grant
    Filed: August 29, 2001
    Date of Patent: April 15, 2003
    Assignee: Microwave Processing Technologies Pty. Limited
    Inventor: Donald S. Thomas
  • Patent number: 6549809
    Abstract: A far infrared radiation health appliance which can effectively stimulate sebaceous glands together with perspiratory glands for dioxins egestion. The appliance includes a plurality of semicylindrical members to be axially coupled to each other in a bush-like manner, and carbon-black-containing planar heating elements arranged over the general entire inner surfaces thereof. The planar heating elements are energized and heated to a temperature of 55-70° C.
    Type: Grant
    Filed: April 10, 2001
    Date of Patent: April 15, 2003
    Assignee: Patent Kaihatsu Co., Ltd.
    Inventor: Hisata Ono
  • Patent number: 6543156
    Abstract: A system for high-pressure drying of semiconductor wafers includes the insertion of a wafer into an open vessel, the immersion of the wafer in a liquid, pressure-sealing of the vessel, pressurization of the vessel with an inert gas, and then the controlled draining of the liquid using a moveable drain that extracts water from a depth maintained just below the gas-liquid interface. Thereafter, the pressure may be reduced in the vessel and the dry and clean wafer may be removed. The high pressure suppresses the boiling point of liquids, thus allowing higher temperatures to be used to optimize reactivity. Megasonic waves are used with pressurized fluid to enhance cleaning performance. Supercritical substances are provided in a sealed vessel containing a wafer to promote cleaning and other treatment.
    Type: Grant
    Filed: March 18, 2002
    Date of Patent: April 8, 2003
    Assignee: Semitool, Inc.
    Inventors: Eric J. Bergman, Ian Sharp, Craig P. Meuchel, H. Frederick Woods
  • Patent number: 6536132
    Abstract: A reusable device, and alternative methods of manufacture, for fast, efficient, fingernail preserving, and unfragmented removal of accumulated lint from clothes dryer filters. Each embodiment comprises a mitt and an attached storage pouch having upper and lower ends that can be independently manipulated for the addition and removal of lint. It also comprises magnetic means for attachment of the pouch to a dryer so that it remains conveniently accessible for use. The mitt preferably has two thumbs for interchangeable right-handed and left-handed use.
    Type: Grant
    Filed: October 23, 2001
    Date of Patent: March 25, 2003
    Inventor: Lisa Dawn Helmer
  • Patent number: 6536133
    Abstract: Reduction of moisture in harvested crop particles. Waste heat from an internal engine carried by a harvester is applied to the crop during the harvesting process. Microwave energy is applied to the crop, concurrently with application of the heat, or separately from it. The objective is to reduce the moisture to a level acceptable to a storage facility, or at least to reduce the cost of further reduction.
    Type: Grant
    Filed: September 7, 2001
    Date of Patent: March 25, 2003
    Inventor: Alvin A. Snaper
  • Patent number: 6532683
    Abstract: A process for the drying of woven glass fabric to be used in a reinforcing laminate in sensitive electronic equipment is disclosed. The process implements a drying technique utilizing microwave energy for drying.
    Type: Grant
    Filed: April 20, 2001
    Date of Patent: March 18, 2003
    Assignee: BGF Industries, Inc.
    Inventor: Michael I. Bryant
  • Patent number: 6526675
    Abstract: A method of dewatering fine particulate materials is disclosed. In this method, an aqueous slurry of fine particles is treated with appropriate hydrophobizing reagents so that the particulate material becomes moderately hydrophobic. A lipid of vegetable or animal origin is then added to the slurry in solutions of light hydrocarbon oils and short-chain alcohols, so that the hydrophobic lipid molecules adsorb on the moderately hydrophobic surface and, thereby, greatly enhance its hydrophobicity. By virtue of the enhanced hydrophobicty, the water molecules adhering to the surface are destabilized and more readily removed during the process of mechanical dewatering. The moisture reduction can be further improved using appropriate electrolytes in conjunction with the lipids, spraying surface tension lowering reagents onto the filter cake, subjecting the cake to a suitable vibratory means, and using combinations thereof.
    Type: Grant
    Filed: June 7, 1999
    Date of Patent: March 4, 2003
    Inventor: Roe-Hoan Yoon
  • Patent number: 6519869
    Abstract: A method and an apparatus for drying semiconductor wafers by using an IPA drying apparatus. The present invention uses a vapor generator to generate an IPA vapor. The IPA vapor is generated and saved in a closed surrounding and then transferred in a porous hollow plate in the dryer tank by using a quartz pipe. The IPA vapor is diffused evenly from the porous hollow plate. Furthermore, the present invention increases the safety of the process and can easily control the input amount of the IPA vapor.
    Type: Grant
    Filed: May 15, 2001
    Date of Patent: February 18, 2003
    Assignee: United Microelectronics, Corp.
    Inventor: Fu-Sheng Peng
  • Patent number: 6519871
    Abstract: A method and apparatus for operating an automatic cycle of a clothes dryer wherein after initiation of an automatic cycle, a CPU displays the expected time remaining during the current cycle. At various times during the cycle, the expected time remaining is updated by comparing the time required to reach certain moisture levels of the articles contained therein to reference times. The comparison also results in the expected times being updated for future uses of the clothes dryer. Finally, the invention includes a system for updating the amount of time required to reach a desired final temperature during a cooldown sequence.
    Type: Grant
    Filed: May 25, 2001
    Date of Patent: February 18, 2003
    Assignee: Maytag Corporation
    Inventors: Douglas W. Gardner, Michael D. Lafrenz, Kim L. Wright
  • Patent number: 6517205
    Abstract: Apparatus (1) for treatment with light for personal care comprising a housing (2) with a light source, which housing (2) is covered with a wall (4) made from a translucent material, on which wall (4) a focusing area (5) is provided, to which focusing area (5) a user's eyes are mainly directed during use. On the wall (4), side areas (6) are provided adjacent said focusing area (5), and at least a portion of the wall (4) has a reference brightness during operation. Means (8) are provided in the apparatus (1) for varying a brightness of the focusing area (5) of the wall (4) during operation between the reference brightness and a minimum brightness which is lower than the reference brightness. In this way, the brightness of the focusing area (5) can be adjusted to a level which is low relative to the brightness of the side areas (6). A user thus experiences looking at the wall (4) during operation as more comfortable because he/she is not looking at a whole area of uniform brightness.
    Type: Grant
    Filed: May 18, 2001
    Date of Patent: February 11, 2003
    Assignee: Koninklijke Philips Electronics N.V.
    Inventors: Jan Alfons Catarina Mewissen, Henriet Jacqueline Corina Hinnen
  • Patent number: 6513263
    Abstract: The ventilator is used to ventilate an offset pocket in the drying section of a papermaking machine. The papermaking machine comprises a row of spaced-apart upper drying rolls and a row of spaced-apart lower drying rolls. It also comprises two rows of spaced-apart felt rolls disposed intermediate the upper drying rolls and the lower drying rolls, respectively, and a paper web intermittently carried by two felts entrained over the upper drying rolls and over the lower drying rolls, respectively. The ventilator comprises a ventral face and a dorsal face. The ventral face comprises at least one ventral orifice disposed adjacent to the felt and the dorsal face comprises at least one dorsal orifice disposed adjacent to a combined draw of felt and paper web.
    Type: Grant
    Filed: May 11, 2001
    Date of Patent: February 4, 2003
    Assignee: Enerquin Air Inc.
    Inventor: RĂ©mi Turcotte
  • Patent number: 6510623
    Abstract: A cantilevered frame in a paper machine dryer group of a dryer section supports a drying wire loop to run by at least one impingement drying unit positioned outside the loop. The frame structure (60) supports devices and rolls situated inside the wire loop (13) of the dryer group (R) which guide and support the run of the wire (13) and the web (W). A dryer section may have multiple such dryer groups which overlap one another with closed draws therebetween.
    Type: Grant
    Filed: May 29, 2001
    Date of Patent: January 28, 2003
    Assignee: Metso Paper, Inc.
    Inventor: Juhani Pajula
  • Patent number: 6505417
    Abstract: In a method for controlling airflow on a backside of a semiconductor wafer during spin processing, a wafer backing plate is first disposed below a semiconductor wafer. Air is then supplied to the volume defined by the wafer backing plate and the semiconductor wafer. The air may be supplied to the volume through a hollow core spindle, a rotary union, or apertures in the wafer backing plate. The separation distance between the wafer and the wafer backing plate and the flow rate of air supplied to the volume may be controlled to avoid any substantial recirculation of contaminated air into the volume. In addition to serving as one of the boundaries that define the volume, the wafer backing plate reduces particle recontamination on the backside of the wafer by preventing particles from contacting the backside of the wafer during spin processing.
    Type: Grant
    Filed: December 23, 1999
    Date of Patent: January 14, 2003
    Assignee: Lam Research Corporation
    Inventors: Roy Winston Pascal, Brian M. Bliven
  • Patent number: 6502328
    Abstract: A seal for an opening defined by a sidewall portion of the pressurizable tank. The tank contains desiccant for drying gases which pass through the desiccant. An elongate antenna extends from an interior portion to an exterior portion of the tank and is used for carrying microwave energy to the desiccant for regeneration of the desiccant. The seal has an insulator with an interior surface for receiving engagement with the antenna at the opening of the tank. In one embodiment, the interior surface of the insulator is tapered such that a distance between opposing portions of the insulator reduces as the insulator extends in a direction through the opening toward the exterior of the tank. The antenna has a cross sectional dimension which reduces in size as the antenna extends in the direction through the opening toward the exterior of the tank.
    Type: Grant
    Filed: May 17, 2000
    Date of Patent: January 7, 2003
    Assignee: Arrow Pneumatics, Inc.
    Inventors: Wayne G. Love, Clyde R. Kerns, Stephen B. Ciotti
  • Patent number: 6499230
    Abstract: A golf club grip drying device includes one chamber for receipt of a golf club grip and an adjacent chamber for receipt of an aerosol gas dispenser with a transfer tube conveying gas from the aerosol gas dispenser chamber to the golf club grip chamber. An actuator is provided which is responsive to movement of the golf club grip within its chamber so that when the golf club grip is so inserted, it engages the actuator which in turn engages the aerosol gas dispenser to open a valve contained within the aerosol gas dispenser and cause dispensing of aerosol gas within the golf club grip chamber to remove moisture from the surface of the golf club grip and therefore dry it.
    Type: Grant
    Filed: July 24, 2000
    Date of Patent: December 31, 2002
    Inventor: Mark Eugene Fix
  • Patent number: 6493963
    Abstract: A method of programming and controlling an automatic cycle of a clothes dryer provides that, after positioning of a selection dial, a motor associated with the selection dial is rapidly moved to a predetermined location at a constant speed, while the time to do so is measured. With the rotational velocity being known, the exact, initially setting position of the dial is determined in advance.
    Type: Grant
    Filed: May 25, 2001
    Date of Patent: December 17, 2002
    Assignee: Maytag Corporation
    Inventor: Brent A. England
  • Patent number: 6493961
    Abstract: A processing unit for a substrate has a vertical thermal processing furnace 4 having a bottom and an opening 4a provided at the bottom. A boat 3 holding substrates W in vertical multistairs can be placed on a first lid 17, and the first lid 17 can open and close the opening 4a of the vertical thermal processing furnace 4 with the boat 3 placed thereon. The processing unit also has a boat-placing portion 19 on which the boat 3 and another boat 3 can be placed and a boat conveying mechanism 21 for conveying the two boats 3 alternatively between the boat-placing portion 19 and the first lid 17. A second lid 18 hermetically closes the opening 4a of the vertical thermal processing furnace 4 when the first lid 17 opens the opening 4a but no boat 3 passes through the opening 4a.
    Type: Grant
    Filed: October 23, 2001
    Date of Patent: December 17, 2002
    Assignee: Tokyo Electron Limited
    Inventor: Katsumi Ishii
  • Patent number: 6487794
    Abstract: A substrate changing-over mechanism in a vacuum processing apparatus which includes a substrate supporting means arranged within a vacuum tank which has at least two openings at a side wall of the tank, the openings being openable or closable by gate valves, the substrate supporting sections in upper and lower spaces and an ascending or descending driver section for driving the substrate supporting means; thereby allowing the supporting means to be stopped in a vertical direction at a plurality of predetermined positions.
    Type: Grant
    Filed: February 14, 2001
    Date of Patent: December 3, 2002
    Assignee: Hitachi, Ltd.
    Inventors: Shigekazu Kato, Kouji Nishihata, Tsunehiko Tsubone, Atsushi Itou
  • Patent number: 6487792
    Abstract: An apparatus for agitating a workpiece in a high pressure environment comprises a workpiece holder, a bearing, a pressure chamber housing, and a nozzle. The workpiece holder couples to the pressure chamber housing via the bearing. The nozzle couples to the pressure chamber housing. The workpiece holder comprises protrusions and a region for holding the workpiece. In operation a fluid exits the nozzle and impinges the protrusions of the workpiece holder causing the workpiece holder to rotate, which agitates the workpiece.
    Type: Grant
    Filed: May 7, 2001
    Date of Patent: December 3, 2002
    Assignee: Tokyo Electron Limited
    Inventors: Thomas R. Sutton, Robert Koch