Patents Examined by Phillip A Johnston
  • Patent number: 11404256
    Abstract: A sample support body is for ionization of a sample. The sample support body includes a substrate including a first surface and a second surface on sides opposite to each other, and a conduction layer provided at least on the first surface. A plurality of through-holes opening on the first surface and the second surface are formed in an effective region of the substrate, the effective region being for ionizing components of the sample. A width of a second opening on the second surface side is larger than a width of a first opening on the first surface side in each of the plurality of through-holes.
    Type: Grant
    Filed: January 16, 2019
    Date of Patent: August 2, 2022
    Assignee: HAMAMATSU PHOTONICS K.K.
    Inventors: Masahiro Kotani, Takayuki Ohmura
  • Patent number: 11342158
    Abstract: There is provided a charged particle beam system capable of determining the type of each cartridge precisely. An electron microscope that embodies the charged particle beam system includes a discriminator for determining the type of each cartridge based on the range or distance measured by a laser range finder. Plural cartridges are received in a magazine. The laser range finder measures the range to a selected one of the plural cartridges which is placed in a measurement position. A first cartridge of a first type included in the plural cartridges has a first measurement surface at a first distance to the laser range finder when placed in the measurement position. A second cartridge of a second type has a second measurement surface at a second range to the laser range finder when placed in the measurement position.
    Type: Grant
    Filed: April 6, 2021
    Date of Patent: May 24, 2022
    Assignee: JEOL Ltd.
    Inventors: Izuru Chiyo, Naoki Fujimoto, Tomoyuki Naganuma
  • Patent number: 11335608
    Abstract: An electron beam system for wafer inspection and review of 3D devices provides a depth of focus up to 20 microns. To inspect and review wafer surfaces or sub-micron-below surface defects with low landing energies in hundreds to thousands of electron Volts, a Wien-filter-free beam splitting optics with three magnetic deflectors can be used with an energy-boosting upper Wehnelt electrode to reduce spherical and chromatic aberration coefficients of the objective lens.
    Type: Grant
    Filed: April 7, 2021
    Date of Patent: May 17, 2022
    Assignee: KLA Corporation
    Inventors: Xinrong Jiang, Christopher Sears
  • Patent number: 11315791
    Abstract: A method and system for fluorine ion implantation is described, where a fluorine compound capable of forming multiple fluorine ionic species is introduced into an ion implanter at a predetermined flow rate. Fluorine ionic species are generated at a predetermined arc power and source magnetic field, providing an optimized beam current for the desired fluorine ionic specie. The desired fluorine ionic specie, such as one having multiple fluorine atoms, is implanted into the substrate under the selected operating conditions.
    Type: Grant
    Filed: December 13, 2019
    Date of Patent: April 26, 2022
    Assignee: ENTEGRIS, INC.
    Inventors: Ying Tang, Sharad N. Yedave
  • Patent number: 11313879
    Abstract: A device for analyzing a physical characteristic of a film sample is described herein. The device includes a clamping system configured to hold the film sample. The device further includes a dart probe system configured to test a physical characteristic of the film sample. The dart probe system has a dart probe, a propulsion system configured to move the dart probe relative to the clamping system, and a force sensor configured to measure a force that the dart probe is subjected to during a movement of the dart probe. The force sensor is configured to measure a force imparted to the film sample when the dart probe comes in contact with the film sample.
    Type: Grant
    Filed: April 30, 2018
    Date of Patent: April 26, 2022
    Assignees: Dow Global Technologies LLC, Rohm and Haas Company
    Inventors: Donald L. McCarty, II, Erick Sutanto, Larry Dotson, Brayden E. Glad, Hitendra Singh, John Lund
  • Patent number: 11315781
    Abstract: A sampling period of an A/D converter is set in accordance with an ion pulse ejection operation of a collision cell of an accumulation type. Start timing of the sampling period is changed in accordance with a selected m/z of a second mass analysis unit. In addition, end timing of the sampling period may be changed in accordance with the selected m/z of the second mass analysis unit. In place of the sampling period, a data cut-out period may be changed.
    Type: Grant
    Filed: December 3, 2020
    Date of Patent: April 26, 2022
    Assignee: JEOL Ltd.
    Inventors: Masatoshi Fujii, Junkei Kou
  • Patent number: 11299244
    Abstract: The invention provides a waveguide element (1000) comprising a first face (1001) and a second face (1002) with radiation transmissive material (1005) configured between the first face (1001) and the second face (1002), wherein the radiation transmissive material (1005) is transmissive for UV radiation, wherein the radiation transmissive material (1005) is a matrix material for a phase (1010) of another composition than the radiation transmissive material (1005), wherein the phase (1010) is available in the matrix as regions (1110) with the regions (1110) having mean particle radii (r1) selected from the range of 50-1500 nm and having an average region concentration selected from the range of 1*104-1.5*108/mm3 of the radiation transmissive material (1005).
    Type: Grant
    Filed: March 15, 2021
    Date of Patent: April 12, 2022
    Assignee: Koninklijke Philips N.V.
    Inventors: Elvira Johanna Maria Paulussen, Bart Andre Salters, Hugo Johan Cornelissen
  • Patent number: 11286179
    Abstract: A flow-through fluid purification device (1), which comprises a container (5) arranged such that fluid to be purified can flow-through a volume (8) of the container (5) from an inlet (3) to an outlet (7), a receptacle (10) for accommodating a radiation source in the form of a lamp (13), wherein the receptacle (10) has an interface wall (11) permeable for radiation with a wavelength in the UV-range, preferably between 150 nm and 200 nm, more preferably of 172±8 nm, and arranged to let radiation pass into the volume (8) of the container (5), a plurality of baffle plates (9) located in the volume (8) of the container (5) with an inter-baffle distance (D) in the flow direction from the inlet (3) to the outlet (7), wherein the baffle plates (9) are arranged to force the fluid flowing from the inlet (3) to the outlet (7) to flow substantially along the interface wall (11) and through gaps (G) between the interface wall (11) and the baffle plates (9) defining the shortest distance between the interface wall (11) and
    Type: Grant
    Filed: February 20, 2018
    Date of Patent: March 29, 2022
    Inventors: Pascal Rajagopalan, Julien Gross, Ichiro Kano
  • Patent number: 11282674
    Abstract: In one embodiment, a charged particle beam writing method is for writing a pattern in a writing area on a substrate by irradiating a charged particle beam onto the substrate while moving the substrate to write stripes sequentially, each of the stripes having a width W and shapes obtained by dividing the writing area by the width W. The method includes performing S times (S is an integer greater than or equal to two) strokes, each of the strokes which is a process writing the stripes in a multiplicity of 2n (n is an integer greater than or equal to one) while shifting a reference point of each of the stripes in the width direction by a preset stripe shift amount and changing a moving direction of the substrate for each of the stripes, and writing while the reference point of the stripes in the each of the strokes in the width direction of the stripes is shifted by a preset stroke shift amount in each of the strokes.
    Type: Grant
    Filed: February 24, 2020
    Date of Patent: March 22, 2022
    Assignee: NuFlare Technology, Inc.
    Inventor: Hideki Matsui
  • Patent number: 11276543
    Abstract: A terminal for an ion implantation system is provided, wherein the terminal has a terminal housing for supporting an ion source configured to form an ion beam. A gas box within the terminal housing has a hydrogen generator configured to produce hydrogen gas for the ion source. The gas box is electrically insulated from the terminal housing, and is further electrically coupled to the ion source. The ion source and gas box are electrically isolated from the terminal housing by a plurality of electrical insulators. A plurality of insulating standoffs electrically isolate the terminal housing from an earth ground. A terminal power supply electrically biases the terminal housing to a terminal potential with respect to the earth ground. An ion source power supply electrically biases the ion source to an ion source potential with respect to the terminal potential. Electrically conductive tubing electrically couples the gas box and ion source.
    Type: Grant
    Filed: November 20, 2020
    Date of Patent: March 15, 2022
    Assignee: Axcelis Technologies, Inc.
    Inventors: Neil K Colvin, Tseh-Jen Hsieh, Richard Rzeszut, Wendy Colby
  • Patent number: 11266858
    Abstract: Systems, devices, and methods for quality assurance for verification of radiation dose delivery in arc-based radiation therapy devices using a 3D gamma evaluation method.
    Type: Grant
    Filed: March 30, 2020
    Date of Patent: March 8, 2022
    Assignee: VARIAN MEDICAL SYSTEMS INTERNATIONAL AG
    Inventors: Lasse Heikki Toimela, Janne Nord
  • Patent number: 11268915
    Abstract: To provide, in observation of a sample that requires a movement between various devices, a charged particle beam device, a method for processing the sample, and an observation method which facilitate the movement between the devices. The charged particle beam device that processes an observation target on the sample using a charged particle beam includes: a sample stage on which the sample is placed; an observation unit configured to observe the observation target; and a writing unit configured to write information of the observation target in a writing position of the sample.
    Type: Grant
    Filed: May 15, 2018
    Date of Patent: March 8, 2022
    Assignee: Hitachi High-Tech Corporation
    Inventors: Tsunenori Nomaguchi, Hiromi Mise
  • Patent number: 11264205
    Abstract: A method, including using an implant recipe to perform an implant by scanning an ion beam along a first axis over a substrate, coated with a photoresist layer, while the substrate is scanned along a perpendicular axis; measuring an implant current (I) during the implant, using a first detector, positioned to a side of a substrate position; determining a value of a difference ratio (I?B)/(B), based upon the implant current, where B is current measured by the first detector, during a calibration at base pressure; determining a plurality of values of a current ratio (CR) for the plurality of instances, based upon the difference ratio, the current ratio being a ratio of the implant current to a current measured by a second detector, positioned over the substrate position, during the calibration; and adjusting scanning the ion beam, scanning of the substrate, or a combination thereof, based upon the current ratio.
    Type: Grant
    Filed: November 9, 2020
    Date of Patent: March 1, 2022
    Assignee: APPLIED Materials, Inc.
    Inventors: Eric Donald Wilson, George Gammel
  • Patent number: 11264212
    Abstract: A measurement system for a plasma processing system includes a detector and an ion current meter coupled to the ion current collector and configured to provide a signal based on the measurements from the ion current collector. The detector includes an insulating substrate including a cavity, an ion angle selection grid configured to be exposed to a bulk plasma disposed in an upper portion of the cavity, and an ion current collector disposed within the cavity at an opposite side of the cavity below the ion angle selection grid. The ion angle selection grid includes an ion angle selection substrate and a plurality of through openings extending through the ion angle selection substrate, where each of the plurality of through openings has a depth into the ion angle selection substrate and a width orthogonal to the depth, where a ratio of the depth to the width is greater than or equal to 40.
    Type: Grant
    Filed: September 29, 2020
    Date of Patent: March 1, 2022
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Zhiying Chen, Joel Blakeney, Megan Carruth, Peter Ventzek, Alok Ranjan
  • Patent number: 11262331
    Abstract: An ion filter for filtering ions in a gas sample. The ion filter has a first ion channel for filtering ions from a target chemical in the gas sample. The ion filter has a second ion channel for filtering ions from the target chemical in the gas sample. The second ion channel is separated from the first ion channel. A temperature control region is in thermal contact with the first and second ion channels for controlling a difference in temperature between the first and second ion channels. A method of filtering ions from a target chemical in a gas sample is also provided.
    Type: Grant
    Filed: September 10, 2018
    Date of Patent: March 1, 2022
    Assignees: Owlstone Medical Limited, Owlstone Inc.
    Inventors: Daniel Melhirst, Jonathan Pearson, Max Allsworth
  • Patent number: 11266002
    Abstract: An amplified optical beam is provided to a region that receives a target including target material, an interaction between the amplified optical beam and the target converting at least some of the target material from a first form to a second form to form a light-emitting plasma; first data comprising information related to the amplified optical beam is accessed; second data comprising information related to the light-emitting plasma is accessed; and an amount of the target material converted from the first form to the second form is determined. The determination is based on at least the first data and the second data, and the second form of the target material is less dense than the first form of the target material.
    Type: Grant
    Filed: October 19, 2018
    Date of Patent: March 1, 2022
    Assignee: ASML Netherlands B.V.
    Inventors: Michael Anthony Purvis, Klaus Martin Hummler, Chengyuan Ding, Robert Jay Rafac, Igor Vladimirovich Fomenkov
  • Patent number: 11251014
    Abstract: The disclosure relates to a sample holder for a charged particle microscope, comprising a holder body with a recess for releasably receiving a sample carrier with a sample therein; and at least one fixing element that is connectable to said holder body for fixing said sample carrier in said recess of said holder body. As described herein, said fixing element comprises a clamping member that is movably connected to said holder body, wherein said clamping member is movable between a closed and an open position, wherein in the open position said sample carrier can be placed in said recess, and wherein in said closed position said sample carrier can be locked in said recess. With this, a more reliable mounting of a sample carrier onto the sample holder can be established.
    Type: Grant
    Filed: February 5, 2020
    Date of Patent: February 15, 2022
    Assignee: FEI Company
    Inventors: Mathijs Petrus Wilhelmus van den Boogaard, Martijn LaGrange, Nestor Hernandez Rodriguez
  • Patent number: 11244807
    Abstract: In one embodiment, a settling time determination method includes deflecting a charged particle beam by applying a voltage outputted from an amplifier to a first deflector while changing a deflection settling time, and writing an evaluation pattern, measuring a position of the evaluation pattern, and determining a position displacement amount of the measured position from a design position, performing fitting of the position displacement amount for the deflection settling time on a first output waveform of the amplifier, and determining a deflection settling time in which the position displacement amount is within a predetermined range.
    Type: Grant
    Filed: November 24, 2020
    Date of Patent: February 8, 2022
    Assignee: NuFlare Technology, Inc.
    Inventor: Tomoo Motosugi
  • Patent number: 11243079
    Abstract: Embodiments relate to a sensor system configured to detect physical rotation, entire or relative, of one or more objects and/or their environment and/or proximity of a magnetic field, by measuring the degree of localization of a medium trapped in a ring-shaped artificial lattice. The lattice structure can be configured to comprise of lattice sites distributed with a lattice period around an azimuth of a closed ring. The site depths of the plurality of lattice sites can be configured to be modulated with a modulation period different from the lattice period to affect the onsite energies of each lattice site and the eigenstates of the system. Physical rotation of the sensor and/or the proximity of magnetic field will alter the localization properties so as to cause the degree of localization of the medium to change (e.g., the medium becomes more confined in space or more spread out in space).
    Type: Grant
    Filed: November 12, 2019
    Date of Patent: February 8, 2022
    Assignee: Kutztown University of Pennsylvania
    Inventor: Kunal Das
  • Patent number: 11239041
    Abstract: The present invention relates to a multi-stage vacuum equipment, preferably a two-stage equipment, whose normal operation requires different pressures to be set, wherein the pressure variation may be achieved by a Shape Memory Alloy (SMA) wire movement of a suitable element. The invention further discloses a method for operating said multi-stage vacuum equipment controlled by a SMA actuator.
    Type: Grant
    Filed: July 19, 2019
    Date of Patent: February 1, 2022
    Assignee: Saes Getters S.p.A.
    Inventor: Marco Urbano