Patents Examined by Richard A. Rosenberger
  • Patent number: 7262851
    Abstract: Disclosed is a method and apparatus for detecting a relative positional deviation between first and second objects. In one preferred form of the invention, the detecting method includes the steps of (i) providing the first and second objects with diffraction gratings, respectively, each having a grating pitch larger than a wavelength of a light source used, (ii) placing the first and second objects so that a dielectric material layer having a thickness smaller than the wavelength of the light source used is interposed between the first and second objects, and so that the diffraction gratings of the first and second objects are opposed to each other, (iii) projecting light from the light source onto the diffraction gratings of the first and second objects, and (iv) detecting the relative positional deviation between the first and second objects on the basis of diffraction light projected from the diffraction gratings to a space.
    Type: Grant
    Filed: June 27, 2005
    Date of Patent: August 28, 2007
    Assignee: Canon Kabushiki Kaisha
    Inventors: Ryo Kuroda, Yasuhisa Inao
  • Patent number: 7259841
    Abstract: A document (10) is covered by a laminate (13) comprising a layer of microspheres (16) over an adhesive layer (14) covering a source image (12) such as a photograph, printed matter, or a bar code arranged on a substrate (11). Light impinging on the document (10) is split by the optical properties of the microspheres (16) and underlying specular reflectors. The remaining light passes through the microspheres (16), through the adhesive layer (14) and strikes the substrate (11) or source image (12) on the document (10), and is reflected (18) and scattered (20). Alternatively, the laminate (13) can comprise a plain or clear layer of polyester without microspheres over the adhesive layer (14). Light impinging on the laminate (13) passes through the polyester and laminate (14) to strike the substrate (11) or source image (12) where it is reflected and scattered. A first light source (24) directs light to the document (10).
    Type: Grant
    Filed: July 29, 2003
    Date of Patent: August 21, 2007
    Assignee: 3M Innovative Properties Company
    Inventor: Graeme R. Mann
  • Patent number: 7259855
    Abstract: There are several different applications where it is desirable to increase the amount of material that can be introduced to the surface of a microresonator that has whispering gallery modes. The use of a porous surface on the microresonator permits greater amounts of the material to be captured on or near the surface of the microresonator, resulting in an increased optical interaction between the material and the light propagating in the whispering gallery mode(s) of the microresonator.
    Type: Grant
    Filed: October 14, 2003
    Date of Patent: August 21, 2007
    Assignee: 3M Innovative Properties Company
    Inventors: Xudong Fan, Mark T. Anderson, Craig R. Schardt
  • Patent number: 7259858
    Abstract: A system for sensing imaging media along a transport path. System includes a light source positioned proximate to a selected location along transport path. A transducer in optical alignment with light source so as to receive light from light source after light crosses transport path provides an output signal having a frequency representative of the presence of imaging media at the selected location.
    Type: Grant
    Filed: November 4, 2004
    Date of Patent: August 21, 2007
    Assignee: Carestream Health, Inc.
    Inventor: Steven W. Tanamachi
  • Patent number: 7259857
    Abstract: Methods for automated uniformity assessment and modification of image non-uniformities using an image measurement device capable of determining image reflectance and/or transmitter as a function of position, such as a spectrophotometer, a calorimeter, and/or a densitometer. One or more of these devices scan an image on a substrate, such as a sheet, thereby generating data representing image characteristics, such as, for example, image non-uniformity. The sheet may contain a reference/test pattern including one column, strip or patch intended to have a uniform density. This data generated by the device after the scan of the substrate is analyzed with signal processing algorithms for image characteristics assessment, including image spatial uniformity and compared to reference image characteristics including image spatial uniformity. An image modification profile may be generated to be applied to a marking system to thereby alter subsequent image data and improve image spatial uniformity of the marking system.
    Type: Grant
    Filed: January 14, 2004
    Date of Patent: August 21, 2007
    Assignee: Xerox Corporation
    Inventors: Paul M. Butterfield, Joseph D. Hancock, Norman L. Roof, Jr., Shawn P. Updegraff
  • Patent number: 7256897
    Abstract: There is provided an apparatus and method for three-dimensional measurements by shining an object to be measured with plural laser beams while scanning. Even if the optical intensity of laser beams is weak, light disturbance is accurately separated to perform real-time three-dimensional measurement. A laser beam emitted from a laser source is separated into the plural beams of slit light with a predetermined angle at a hologram plate. These two beams are used for scanning and irradiating the object by a scanning mirror. These beams are reflected and read to determine whether or not an interval between these beams corresponds to the predetermined angle.
    Type: Grant
    Filed: January 21, 2004
    Date of Patent: August 14, 2007
    Assignee: Sony Corporation
    Inventor: Toshinobu Sugiyama
  • Patent number: 7256879
    Abstract: An array tester (10) characterizes individual ones (111) of a semiconductor devices of an array (11) based on polarization-resolving an optical far-field measurement of the individual chips (111) as a function of angular position. Two pairs of TM and TE detectors (41a-b and 42a-b) or one pair displaceable by ninety degrees, move in vertical and horizontal arc paths or fixed around a fixed position of a selected device of an array to sample the far-fields.
    Type: Grant
    Filed: December 11, 2003
    Date of Patent: August 14, 2007
    Assignee: Corning Incorporated
    Inventors: Benjamin L. Hall, Martin Hu, Mike J. White, Chung-En Zah
  • Patent number: 7253892
    Abstract: A method for measuring the wall thickness of plastic containers during a container manufacturing process includes providing a plastic container, the plastic container having a longitudinal axis and at least two side walls spaced radially from the longitudinal axis. The side walls are formed of a material that absorbs light energy in a predetermined molecular absorption band. Light energy is then directed from a source through the at least two side walls of the plastic container in a plane transverse to the longitudinal axis of the plastic container. A portion of the light energy that passes through the sidewalls of the plastic container is sensed, and a signal representing a thickness of the sidewalls of the plastic container is generated from the sensed portion of the light energy.
    Type: Grant
    Filed: October 11, 2005
    Date of Patent: August 7, 2007
    Assignee: Petwall, LLC
    Inventors: Frank E. Semersky, Dennis T. Sturgill
  • Patent number: 7253909
    Abstract: An apparatus and method for determining a physical parameter of features on a substrate by illuminating the substrate with an incident light covering an incident wavelength range ??, e.g., from 190 nm to 1000 nm, where the substrate is at least semi-transparent. A response light received from the substrate and the feature is measured to obtain a response spectrum of the response light. Further, a complex-valued response due to the feature and the substrate is computed and both the response spectrum and the complex-valued response are used in determining the physical parameter. A direct approximate phase measurement is provided when the response light is transmitted light.
    Type: Grant
    Filed: January 3, 2005
    Date of Patent: August 7, 2007
    Assignee: n&k Technology, Inc.
    Inventors: Guoguang Li, Phillip Walsh, Shuqiang Chen, Abdul Rahim Forouhi
  • Patent number: 7248375
    Abstract: A method and apparatus are disclosed for evaluating relatively small periodic structures formed on semiconductor samples. In this approach, a light source generates a probe beam which is directed to the sample. In one preferred embodiment, an incoherent light source is used. A lens is used to focus the probe beam on the sample in a manner so that rays within the probe beam create a spread of angles of incidence. The size of the probe beam spot on the sample is larger than the spacing between the features of the periodic structure so some of the light is scattered from the structure. A detector is provided for monitoring the reflected and scattered light. The detector includes multiple detector elements arranged so that multiple output signals are generated simultaneously and correspond to multiple angles of incidence. The output signals are supplied to a processor which analyzes the signals according to a scattering model which permits evaluation of the geometry of the periodic structure.
    Type: Grant
    Filed: September 21, 2005
    Date of Patent: July 24, 2007
    Assignee: Therma-Wave, Inc.
    Inventors: Jon Opsal, Allan Rosencwaig
  • Patent number: 7239399
    Abstract: Improved component placement inspection and verification is performed by a pick and place machine. Improvements include stereovision imaging of the intended placement location; enhanced illumination to facilitate the provision of relatively high-power illumination in the restricted space near the placement nozzle(s); optics to allow image acquisition device to view the placement location from an angle relative to a plane of the placement location, thereby reducing the possibility of such images being obstructed by the component; techniques for rapidly acquiring images with commercially available CCD arrays such that acquisition of before and after images does not substantially impact system throughput; and image processing techniques to provide component inspection and verification information.
    Type: Grant
    Filed: November 8, 2002
    Date of Patent: July 3, 2007
    Assignee: CyberOptics Corporation
    Inventors: David W. Duquette, Paul R. Haugen, David Fishbaine, John D. Gaida, David D. Madsen, Theodore Paul Dale, Todd D. Liberty, Brant O. Buchika, Scott D. Roth, Thomas W. Bushman
  • Patent number: 7236248
    Abstract: An apparatus and method for analyzing liquid samples employs first and second bidirectional ports that permit liquids to be introduced to first and second liquid waveguide capillary cells at the same time. The direction of liquid flow through the apparatus and roles of components may be reversed to prevent or overcome obstruction by particulates and other debris. The apparatus and method can detect and map colored dissolved organic matter and can detect, discriminate and map algal species or algal blooms including red tide in an automated, unattended manner within large aquatic systems.
    Type: Grant
    Filed: December 21, 2005
    Date of Patent: June 26, 2007
    Assignee: Mote Marine Laboratory
    Inventors: Gary J. Kirkpatrick, James R. Hillier
  • Patent number: 7233401
    Abstract: A method and apparatus for measuring wafers, thin films, or other planar layers are disclosed. This invention utilizes a tunable, monochromatic light source reflected from or transmitted through the layer to be measured. The wavelengths of light are selected such that the light is partially transmitted through the material to be measured so as optical interference is seen among the interfaces of the layer(s). The wavelengths are also controlled to sufficiently small increments to resolve these interference features. This apparatus relates to the need to monitor wafer thinning, film deposition, and other semiconductor device related processes.
    Type: Grant
    Filed: July 22, 2003
    Date of Patent: June 19, 2007
    Assignee: Foothill Instruments, LLC
    Inventor: Glenn Houser
  • Patent number: 7227642
    Abstract: This invention relates to a multi-component absorbance monitor, and the object is to provide a general-purpose and highly accurate compact absorbance monitor. Disclosed is an absorbance monitor including a light source, a sample cell and a plurality of detectors as elements, wherein a light collecting member is arranged between the light source and one detector, and an inside wall of the light collecting member has a site for guiding a part of light from the light source, that is, a light guiding opening, and light from the light guiding opening enters another detector. Preferably, the light collecting member lies between the light source and the sample cell. Preferably, an optical element used for another detector described above is arranged in the light guiding opening and adjacently to a light path formed by the light collecting member.
    Type: Grant
    Filed: October 4, 2004
    Date of Patent: June 5, 2007
    Assignee: Horiba, Ltd.
    Inventors: Takuji Oida, Shigeyuki Akiyama, Masahiko Endo, Norikazu Iwata, Satoshi Inoue, Masahiko Fujiwara
  • Patent number: 7220387
    Abstract: The present invention is a disposable sensor for use with a device that quantifies analytes in a gaseous sample. It comprises (i) a sensing element, (ii) a means for interfacing the disposable sensor with a gas analysis device, and (iii) a housing. When used with a device that can quantify the concentration of an analyte in a gas sample, the present invention facilitates the use of exhaled breath analysis as a clinical tool.
    Type: Grant
    Filed: January 28, 2004
    Date of Patent: May 22, 2007
    Assignee: Apieron Biosystems Corp.
    Inventors: Bryan Flaherty, Bhairavi Parikh, Kevin Nason, David Chazan, Johnathan Fay, John Kaiser, James Stone
  • Patent number: 7215428
    Abstract: An absorption spectroscopy apparatus including a sample cell having a central axis, and a side wall coaxially positioned about the axis. The side wall defines a generally circular cross-section of the cell as taken along a plane extending perpendicular to the axis, wherein the generally circular cross-section of the sample cell has an average radius. The side wall includes a plurality of light reflective segments arrayed about the axis, wherein each reflective segment has a cross-section taken along a plane extending perpendicular to the axis of the cell that is concave with respect to the axis. The concave cross-section of each segment has an average radius that is unequal to the average radius of the generally circular cross-section of the sample cell. Among other aspects and advantages, the apparatus of the present disclosure is able to use incoherent, non-collimated light sources while maintaining high optical throughput efficiencies.
    Type: Grant
    Filed: April 8, 2005
    Date of Patent: May 8, 2007
    Assignee: Ion Optics, Inc.
    Inventors: Mark P. McNeal, Peter G. Loges, Irina Puscasu, James T. Daly, Edward A. Johnson
  • Patent number: 7212288
    Abstract: A system for evaluating semiconductor wafers includes illumination sources for generating probe and pump beams. The pump beam is focused on the surface of a sample and a beam steering mechanism is used to modulate the point of focus in a predetermined pattern. The moving pump beam introduces thermal and plasma waves in the sample causing changes in the reflectivity of the surface of the sample. The probe beam is focused within or adjacent to the area illuminated by the pump beam. The reflected probe beam is gathered and used to measure the changes in reflectivity induced by the pump beam. By analyzing changes in reflectivity, a processor is able to deduce structure and chemical details of the sample.
    Type: Grant
    Filed: July 7, 2004
    Date of Patent: May 1, 2007
    Assignee: Therma-Wave, Inc.
    Inventors: Jon Opsal, Lena Nicolaides, Alex Salnik
  • Patent number: 7209227
    Abstract: A system for simultaneously inspecting the frontsides and backsides of semiconductor wafers for defects is disclosed. The system rotates the semiconductor wafer while the frontside and backside surfaces are generally simultaneously optically scanned for defects. Rotation is induced by providing contact between the beveled edges of the semiconductor wafer and roller bearings rotationally driven by a motor. The wafer is supported in a tilted or semi-upright orientation such that support is provided by gravity. This tilted supporting orientation permits both the frontside and the backside of the wafer to be viewed simultaneously by a frontside inspection device and a backside inspection device.
    Type: Grant
    Filed: April 19, 2006
    Date of Patent: April 24, 2007
    Assignee: KLA-Tencor Corporation
    Inventor: Rodney C. Smedt
  • Patent number: 7202945
    Abstract: The present invention relates to a device (1) and a method for determining parameters of fluid-containing samples (2) in a system (3) for individually irradiating the samples (2) with light (4) of a light source (5) in an essentially vertical irradiation direction (6). In this case, this system (3) includes a detector (7) for measuring the light (8) coming from a single sample, and this detector (7) has a detection direction (9?), which lies on an optical axis (9) that is essentially parallel to the optical axis (6) of the light source (5). This device (1) includes at least one reflective surface (10), using which the light (4) coming essentially vertically out of the light source (5) may be at least partially deflected in an essentially horizontal irradiation direction (11).
    Type: Grant
    Filed: June 28, 2004
    Date of Patent: April 10, 2007
    Assignee: Tecan Trading AG
    Inventors: Andreas Erlbacher, Lutz Niggl, Alois Krutzenbichler
  • Patent number: 7199874
    Abstract: An inspection tool embodiment includes an illumination source for directing a light beam onto a workpiece to generate scattered light that includes the ordinary scattering pattern of the workpiece as well as light scattered from defects of the workpiece. The embodiment includes a programmable light selection array that receives light scattered from the workpiece and selectively directs the light scattered from defects onto a photosensor which detects the defect signal. Processing circuitry receives the defect signal and conducts surface analysis of the workpiece that can include the characterizing of defects of the workpiece. The programmable light selection arrays can include, but are not limited to, reflector arrays and filter arrays. The invention also includes associated surface inspection methods.
    Type: Grant
    Filed: December 7, 2005
    Date of Patent: April 3, 2007
    Assignee: KLA-Tencor Technologies Corporation
    Inventors: Christopher F. Bevis, Paul J. Sullivan, David W. Shortt, George J. Kren